Weimar
Germany
9
2021-08-19
The entities that hold a legal rights for patent applications filed by inventor Beyer Dirk:
Dirk Beyer from Weimar, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Method for measuring photomasks
#2 | 2018-10-11Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system
#3 | 2016-11-24Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
#4 | 2014-02-06Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
#5 | 2013-05-23Method for determining the performance of a photolithographic mask
#6 | 2012-06-21METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY A PHOTOLITHOGRAPHIC MASK
#7 | 2011-09-22Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section
#8 | 2005-12-29Method for reducing the fogging effect
#9 | 2005-12-29Process for controlling the proximity effect correction
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