Patents-Review.com
🔗 Permalink
Assignee profile:

SK ENPULSE CO., LTD.

City:

Gyeonggi-do

Country:

South Korea

Published Applications:

27

Last publication date:

2026-02-19

Patent Grants:

26

Last grant date:

2024-11-05

Top Inventors for applications by SK ENPULSE CO., LTD.

These are the the leading inventors for applications assigned to SK ENPULSE CO., LTD.:

Recent patent applications by SK ENPULSE CO., LTD.

SK ENPULSE CO., LTD. based in Gyeonggi-do, KR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2026-02-19
US20260049239A1
Chemistry; metallurgy

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD FOR POLISHING SUBSTRATE USING SAME

 #2 | 2024-10-31 ✅ Patent 12,136,539 granted on 2024-11-05
US20240363314A1
Electricity

Semiconductor device fabrication apparatus

 #3 | 2024-01-25 ✅ Patent 12,444,616 granted on 2025-10-14
US20240030041A1
Electricity

POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESSING POLISHING COMPOSITION PREPARATION METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO WHICH POLISHING COMPOSITION IS APPLIED

 #4 | 2023-07-20 ✅ Patent 12,480,021 granted on 2025-11-25
US20230227696A1
Chemistry; metallurgy

COMPOSITION FOR SEMICONDUCTOR PROCESS, METHOD FOR PREPARING THE SAME AND METHOD FOR PREPARING SEMICONDUCTOR DEVICE USING THE SAME

 #5 | 2023-02-09 ✅ Patent 12,486,428 granted on 2025-12-02
US20230040931A1
Chemistry; metallurgy

POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME

 #6 | 2022-12-01 ✅ Patent 12,042,900 granted on 2024-07-23
US20220379427A1
Performing operations; transporting

Polishing system, polishing pad and method of manufacturing semiconductor device

 #7 | 2022-11-17 ✅ Patent 12,116,503 granted on 2024-10-15
US20220363948A1
Chemistry; metallurgy

Polishing composition for semiconductor process and method for manufacturing semiconductor device by using the same

 #8 | 2022-07-14 ✅ Patent 12,110,421 granted on 2024-10-08
US20220220340A1
Chemistry; metallurgy

Composition for semiconductor processing and method of fabricating semiconductor device using the same

 #9 | 2022-06-09 ✅ Patent 12,138,736 granted on 2024-11-12
US20220176514A1
Performing operations; transporting

Polishing pad sheet, polishing pad, and method for manufacturing semiconductor device

 #10 | 2022-05-19 ✅ Patent 11,931,856 granted on 2024-03-19
US20220152776A1
Performing operations; transporting

Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same

 #11 | 2022-05-12 ✅ Patent 11,951,591 granted on 2024-04-09
US20220143778A1
Performing operations; transporting

Polishing pad, method for producing the same and method of fabricating semiconductor device using the same

 #12 | 2022-03-31 ✅ Patent 12,162,114 granted on 2024-12-10
US20220097201A1
Performing operations; transporting

Polishing pad, manufacturing method thereof and preparing method of semiconductor device using the same

 #13 | 2022-03-10 ✅ Patent 12,258,460 granted on 2025-03-25
US20220073694A1
Chemistry; metallurgy

Polishing pad and method of fabricating semiconductor device using the same

 #14 | 2022-03-10 ✅ Patent 12,246,408 granted on 2025-03-11
US20220072678A1
Performing operations; transporting

Polishing pad and method of fabricating semiconductor device using the same

 #15 | 2022-02-24 ✅ Patent 12,362,232 granted on 2025-07-15
US20220059401A1
Electricity

POLISHING PAD AND METHOD FOR PREPARING SEMICONDUCTOR DEVICE USING THE SAME

 #16 | 2021-12-23 ✅ Patent 11,759,909 granted on 2023-09-19
US20210394335A1
Performing operations; transporting

Polishing pad, preparation method thereof and method for preparing semiconductor device using same

 #17 | 2021-12-23 ✅ Patent 12,138,738 granted on 2024-11-12
US20210394334A1
Performing operations; transporting

Polishing pad, preparation method thereof and method for preparing semiconductor device using same

 #18 | 2021-12-16 ✅ Patent 12,027,395 granted on 2024-07-02
US20210391196A1
Electricity

Method and apparatus for measuring displacement of an end effector

 #19 | 2021-12-16 ✅ Patent 11,724,391 granted on 2023-08-15
US20210387339A1
Performing operations; transporting

Method and apparatus for determining status of a robot

 #20 | 2021-11-18 ✅ Patent 11,780,057 granted on 2023-10-10
US20210354267A1
Performing operations; transporting

Polishing pad and method for producing same

 #21 | 2021-07-29 ✅ Patent 11,642,752 granted on 2023-05-09
US20210229237A1
Performing operations; transporting

Porous polyurethane polishing pad and process for preparing the same

 #22 | 2021-04-29 ✅ Patent 12,122,013 granted on 2024-10-22
US20210122007A1
Performing operations; transporting

Composition for polishing pad and polishing pad

 #23 | 2020-11-26 ✅ Patent 12,076,832 granted on 2024-09-03
US20200368873A1
Performing operations; transporting

Polishing pad with improved crosslinking density and process for preparing the same

 #24 | 2020-05-28 ✅ Patent 11,964,360 granted on 2024-04-23
US20200164483A1
Performing operations; transporting

Polishing pad comprising window similar in hardness to polishing layer

 #25 | 2019-10-24 ✅ Patent 11,766,759 granted on 2023-09-26
US20190321937A1
Performing operations; transporting

Porous polyurethane polishing pad and process for producing the same

 #26 | 2019-10-17 ✅ Patent 11,772,236 granted on 2023-10-03
US20190314954A1
Performing operations; transporting

Porous polishing pad and process for producing the same all fees

 #27 | 2019-02-28 ✅ Patent 11,724,356 granted on 2023-08-15
US20190061097A1
Performing operations; transporting

Porous polyurethane polishing pad and preparation method thereof

Also check out SK enpulse Co., Ltd.'s (Gyeonggi-do, South Korea) applicant profile with 47 patent applications submitted.

AssigneeID:

598876 ⎘