Hsinchu
Taiwan
140
2019-08-22
135
2020-05-05
These are the the leading inventors for applications assigned to Hermes-Microvision, Inc.:
Hermes-Microvision, Inc. based in Hsinchu, TW has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Apparatus of plural charged-particle beams
#2 | 2019-08-13 ✅ Patent 10,380,731 granted on 2019-08-13Method and system for fast inspecting defects
#3 | 2019-02-21 ✅ Patent 10,276,347 granted on 2019-04-30Apparatus of plural charged-particle beams
#4 | 2019-02-21 ✅ Patent 10,468,227 granted on 2019-11-05Charged particle source
#5 | 2018-10-16 ✅ Patent 10,102,619 granted on 2018-10-16Inspection method and system
#6 | 2018-08-23 ✅ Patent 10,176,967 granted on 2019-01-08Load lock system for charged particle beam imaging
#7 | 2018-05-08 ✅ Patent 9,965,844 granted on 2018-05-08Inspection method and system
#8 | 2017-10-26 ✅ Patent 10,109,456 granted on 2018-10-23Apparatus of plural charged-particle beams
#9 | 2017-07-27 ✅ Patent 10,062,541 granted on 2018-08-28Apparatus of plural charged-particle beams
#10 | 2017-06-22 ✅ Patent 10,274,537 granted on 2019-04-30Test device for defect inspection
#11 | 2017-06-01 ✅ Patent 10,141,160 granted on 2018-11-27Apparatus of plural charged-particle beams
#12 | 2017-05-04 ✅ Patent 9,691,586 granted on 2017-06-27Apparatus of plural charged-particle beams
#13 | 2017-05-04 ✅ Patent 10,115,559 granted on 2018-10-30Apparatus of plural charged-particle beams
#14 | 2017-05-04 ✅ Patent 9,754,760 granted on 2017-09-05Charged particle source
#15 | 2017-05-04 ✅ Patent 10,032,600 granted on 2018-07-24Charged particle source
#16 | 2017-05-04 ✅ Patent 9,812,283 granted on 2017-11-07Charged particle source
#17 | 2017-02-23 ✅ Patent 10,054,556 granted on 2018-08-21Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
#18 | 2017-02-23 ✅ Patent 10,088,438 granted on 2018-10-02Method and system for inspecting an EUV mask
#19 | 2017-01-26 ✅ Patent 9,922,799 granted on 2018-03-20Apparatus of plural charged-particle beams
#20 | 2017-01-10 ✅ Patent 9,541,824 granted on 2017-01-10Method and system for fast inspecting defects
#21 | 2016-11-24 ✅ Patent 9,536,697 granted on 2017-01-03System and method for calibrating charge-regulating module
#22 | 2016-11-17 ✅ Patent 9,607,805 granted on 2017-03-28Apparatus of plural charged-particle beams
#23 | 2016-11-15 ✅ Patent 9,494,856 granted on 2016-11-15Method and system for fast inspecting defects
#24 | 2016-09-29 ✅ Patent 10,236,156 granted on 2019-03-19Apparatus of plural charged-particle beams
#25 | 2016-09-15 ✅ Patent 9,691,588 granted on 2017-06-27Apparatus of plural charged-particle beams
#26 | 2016-09-08 ✅ Patent 9,601,311 granted on 2017-03-21Laser SDE effect compensation by adaptive tuning
#27 | 2016-09-06 ✅ Patent 9,436,985 granted on 2016-09-06Method and system for enhancing image quality
#28 | 2016-08-25 ✅ Patent 9,953,803 granted on 2018-04-24Local alignment point calibration method in die inspection
#29 | 2016-07-28 ✅ Patent 10,008,360 granted on 2018-06-26Objective lens system for fast scanning large FOV
#30 | 2016-06-16 ✅ Patent 9,583,306 granted on 2017-02-28Swing objective lens
#31 | 2016-06-09 ✅ Patent 9,437,395 granted on 2016-09-06Method and compound system for inspecting and reviewing defects
#32 | 2016-06-09 ✅ Patent 9,799,484 granted on 2017-10-24Charged particle source
#33 | 2016-03-03 ✅ Patent 9,431,209 granted on 2016-08-30Apparatus of plural charged particle beams with multi-axis magnetic lenses
#34 | 2016-02-04 ✅ Patent 9,384,936 granted on 2016-07-05Energy filter for charged particle beam apparatus
#35 | 2016-02-02 ✅ Patent 9,251,581 granted on 2016-02-02Methods for promoting semiconductor manufacturing yield and classifying defects during fabricating a semiconductor device, and computer readable mediums encoded with a computer program implementing the same
#36 | 2015-11-12 ✅ Patent 9,859,089 granted on 2018-01-02Method and system for inspecting and grounding an EUV mask
#37 | 2015-10-22 ✅ Patent 9,572,237 granted on 2017-02-14Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
#38 | 2015-09-03 ✅ Patent 9,117,626 granted on 2015-08-25Energy-discrimination detection device
#39 | 2015-06-25 ✅ Patent 9,202,658 granted on 2015-12-01Multi-axis magnetic lens for focusing a plurality of charged particle beams
#40 | 2015-06-04 ✅ Patent 9,362,087 granted on 2016-06-07Charged particle beam apparatus
#41 | 2015-06-02 ✅ Patent 9,048,063 granted on 2015-06-02Electron beam apparatus
#42 | 2015-06-02 ✅ Patent 9,048,062 granted on 2015-06-02Method for improving performance of an energy filter
#43 | 2015-05-28 ✅ Patent 9,177,758 granted on 2015-11-03Charged particle beam apparatus
#44 | 2015-04-16 ✅ Patent 9,485,846 granted on 2016-11-01Method and system for inspecting an EUV mask
#45 | 2015-04-07 ✅ Patent 9,002,097 granted on 2015-04-07Method and system for enhancing image quality
#46 | 2015-04-02 ✅ Patent 9,605,759 granted on 2017-03-28Metal seal for ultra high vacuum system
#47 | 2015-03-26 ✅ Patent 10,020,164 granted on 2018-07-10Charged particle beam apparatus
#48 | 2015-03-12 ✅ Patent 9,330,987 granted on 2016-05-03Hot spot identification, inspection, and review
#49 | 2015-03-05 ✅ Patent 9,000,369 granted on 2015-04-07System and method for controlling charge-up in an electron beam apparatus
#50 | 2015-03-05 ✅ Patent 9,000,370 granted on 2015-04-07System and method for controlling charge-up in an electron beam apparatus
#51 | 2015-03-05 ✅ Patent 9,105,440 granted on 2015-08-11Apparatus of plural charged particle beams with multi-axis magnetic lens
#52 | 2014-10-30 ✅ Patent 9,436,988 granted on 2016-09-06Method and system of classifying defects on a wafer
#53 | 2014-10-02 ✅ Patent 9,400,176 granted on 2016-07-26Dynamic focus adjustment with optical height detection apparatus in electron beam system
#54 | 2014-10-02 ✅ Patent 9,190,241 granted on 2015-11-17Charged particle beam apparatus
#55 | 2014-09-25 ✅ Patent 9,000,395 granted on 2015-04-07Energy filter for charged particle beam apparatus
#56 | 2014-06-10 ✅ Patent 8,748,814 granted on 2014-06-10Structure for inspecting defects in word line array fabricated by SADP process and method thereof
#57 | 2014-06-05 ✅ Patent 8,907,281 granted on 2014-12-09System and method for controlling charge-up in an electron beam apparatus
#58 | 2014-04-29 ✅ Patent 8,712,184 granted on 2014-04-29Method and system for filtering noises in an image scanned by charged particles
#59 | 2014-01-30 ✅ Patent 9,113,538 granted on 2015-08-18Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask
#60 | 2013-12-19 ✅ Patent 8,829,451 granted on 2014-09-09High efficiency scintillator detector for charged particle detection
#61 | 2013-12-12 ✅ Patent 9,076,629 granted on 2015-07-07Particle detection system
#62 | 2013-12-10 ✅ Patent 8,606,017 granted on 2013-12-10Method for inspecting localized image and system thereof
#63 | 2013-10-24 ✅ Patent 8,618,480 granted on 2013-12-31Charged particle beam apparatus
#64 | 2013-10-03 ✅ Patent 9,581,245 granted on 2017-02-28Metal seal for ultra high vacuum system
#65 | 2013-09-26 ✅ Patent 8,791,425 granted on 2014-07-29Multi-axis magnetic lens for focusing a plurality of charged particle beams
#66 | 2013-09-12 ✅ Patent 8,895,935 granted on 2014-11-25High efficiency secondary and back scattered electron detector
#67 | 2013-08-08 ✅ Patent 9,282,293 granted on 2016-03-08Method and system for measuring critical dimension and monitoring fabrication uniformity
#68 | 2013-07-25 ✅ Patent 9,041,795 granted on 2015-05-26Method and system for measuring critical dimension and monitoring fabrication uniformity
#69 | 2013-07-18 ✅ Patent 9,100,553 granted on 2015-08-04Method and system for measuring critical dimension and monitoring fabrication uniformity
#70 | 2013-07-18 ✅ Patent 8,835,867 granted on 2014-09-16Multi-axis magnetic lens for focusing a plurality of charged particle beams
#71 | 2013-07-11 ✅ Patent 9,164,399 granted on 2015-10-20Reticle operation system
#72 | 2013-06-20 ✅ Patent 9,000,394 granted on 2015-04-07Multi-axis magnetic lens for focusing a plurality of charged particle beams
#73 | 2013-05-09 ✅ Patent 8,436,317 granted on 2013-05-07Wien filter
#74 | 2013-04-18 ✅ Patent 8,698,070 granted on 2014-04-15Phase detector
#75 | 2013-04-16 ✅ Patent 8,421,029 granted on 2013-04-16Wien filter with reduced field leakage
#76 | 2012-12-20 ✅ Patent 8,592,761 granted on 2013-11-26Monochromator for charged particle beam apparatus
#77 | 2012-12-13 ✅ Patent 9,768,082 granted on 2017-09-19Method and machine for examining wafers
#78 | 2012-11-22 ✅ Patent 8,575,573 granted on 2013-11-05Structure for discharging extreme ultraviolet mask
#79 | 2012-11-08 ✅ Patent 8,519,333 granted on 2013-08-27Charged particle system for reticle/wafer defects inspection and review
#80 | 2012-11-01 ✅ Patent 8,937,281 granted on 2015-01-20Method for examining a sample by using a charged particle beam
#81 | 2012-10-23 ✅ Patent 8,294,094 granted on 2012-10-23Method and apparatus for reducing substrate edge effect during inspection
#82 | 2012-09-25 ✅ Patent 8,274,046 granted on 2012-09-25Monochromator for charged particle beam apparatus
#83 | 2012-09-13 ✅ Patent 8,692,193 granted on 2014-04-08Method for inspecting EUV reticle and apparatus thereof
#84 | 2012-08-23 ✅ Patent 8,432,441 granted on 2013-04-30Method and system for measuring critical dimension and monitoring fabrication uniformity
#85 | 2012-06-14 ✅ Patent 8,445,862 granted on 2013-05-21Apparatus of plural charged particle beams with multi-axis magnetic lens
#86 | 2012-04-05 ✅ Patent 9,035,674 granted on 2015-05-19Structure and method for determining a defect in integrated circuit manufacturing process
#87 | 2012-03-29 ✅ Patent 8,754,372 granted on 2014-06-17Structure and method for determining a defect in integrated circuit manufacturing process
#88 | 2012-03-22 ✅ Patent 8,923,601 granted on 2014-12-30Method for inspecting overlay shift defect during semiconductor manufacturing and apparatus thereof
#89 | 2012-03-01 ✅ Patent 8,319,192 granted on 2012-11-27Charged particle apparatus
#90 | 2012-02-23 ✅ Patent 8,497,475 granted on 2013-07-30Method and apparatus for charged particle beam inspection
#91 | 2012-02-09 ✅ Patent 8,217,349 granted on 2012-07-10Method for inspecting EUV reticle and apparatus thereof
#92 | 2012-02-02 ✅ Patent 8,805,054 granted on 2014-08-12Method and system of classifying defects on a wafer
#93 | 2012-01-12 ✅ Patent 8,604,428 granted on 2013-12-10Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system
#94 | 2012-01-10 ✅ Patent 8,092,641 granted on 2012-01-10System and method for removing organic residue from a charged particle beam system
#95 | 2011-08-11 ✅ Patent 9,184,024 granted on 2015-11-10Selectable coulomb aperture in E-beam system
#96 | 2011-05-05 ✅ Patent 8,031,344 granted on 2011-10-04Z-stage configuration and application thereof
#97 | 2011-04-14THERMAL FIELD EMISSION CATHODE
#98 | 2011-02-22 ✅ Patent 7,893,406 granted on 2011-02-22Electron gun with magnetic immersion double condenser lenses
#99 | 2011-01-27 ✅ Patent 8,314,401 granted on 2012-11-20Electron gun with magnetic immersion double condenser lenses
#100 | 2011-01-20 ✅ Patent 8,299,463 granted on 2012-10-30Test structure for charged particle beam inspection and method for defect determination using the same
Also check out Hermes Microvision, Inc.'s (Hsinchu, Taiwan) applicant profile with 65 patent applications submitted.
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