VEECO INSTRUMENTS, INC.

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IN-SITU PYROMETER FOR SILICON CARBIDE WAFER

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DEPOSITION SYSTEM WITH INTEGRATED CARRIER CLEANING MODULES

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GRID SURFACE CONDITIONING FOR ION BEAM SYSTEM

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MULTI-DISC CHEMICAL VAPOR DEPOSITION SYSTEM WITH CROSS FLOW GAS INJECTION

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MULTI-DISC CHEMICAL VAPOR DEPOSITION SYSTEM

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LIGHTPIPE FOR HIGH TEMPERATURE SUBSTRATE PROCESSING

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WAFER CARRIER ASSEMBLY WITH IMPROVED TEMPERATURE UNIFORMITY

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Scatter Melt Detection Systems and Methods of Using the Same

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Rotating Disk Reactor with Split Substrate Carrier

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Self-Centering Wafer Carrier System for Chemical Vapor Deposition

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Gas Injection System For Chemical Vapor Deposition Using Sequenced Valves

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Enhanced enclosures for acoustical gas concentration sensing and flow control

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Temperature control for GaN based materials

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Gas Flow Flange For A Rotating Disk Reactor For Chemical Vapor Deposition

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Self-cleaning shutter for CVD reactor

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Insertion/Extraction Tool For Components In Housing

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HEATING ELEMENT FOR A PLANAR HEATER OF A MOCVD REACTOR

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Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle Beam

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ION BEAM DEPOSITION OF FLUORINE-BASED OPTICAL FILMS

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