37488 ⎘
Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
Method for removing ceramic coatings from component surfaces
#302Method and system for supplying carbon dioxide to a semiconductor tool having variable flow requirement
#303Reactive fluid systems for removing deposition materials and methods for using same
#304Method, process, chemistry and apparatus for treating a substrate
#305Method and apparatus for removing substances from solid matrix with energy saving
#306Extraction of impurities in a semiconductor process with a supercritical fluid
#307Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition
#308Method for the rapid thermal control of a work piece in liquid or supercritical fluid
#309Cleaning method and cleaning apparatus
#310Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
#311Using supercritical fluids and/or dense fluids in semiconductor applications
#312Method for cleaning substrates using supercritical fluids
#313Method and system for maintaining a solution of a sparingly soluble additive in a process fluid
#314Process and apparatus for removing residues from semiconductor substrates
#315Cleaning apparatus
#316Methods of treating polymeric subtrates
#317Megasonic cleaning vessel using supercritical CO2
#318Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
#319Composition and method for removing photoresist materials from electronic components
#320Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations
#321Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations
#322Removal of post etch residues and copper contamination from low-k dielectrics using supercritical CO2 with diketone additives
#323Method of cleaning semiconductor surfaces
#324Processing chamber including a circulation loop integrally formed in a chamber housing
#325Method for high-pressure processing
#326Process and system for cleaning surfaces of semiconductor wafers
#327Supercritical fluid technology for cleaning processing chambers and systems
#328Regulation of flow of processing chemistry only into a processing chamber
#329Purification and recovery of fluids in processing applications
#330Cleaning apparatus for cleaning objects to be treated with use of cleaning composition
#331System for use of land fills and recyclable materials
#332Method of processing semiconductor device
#333Composition for cleaning disarticulated skeletons