Patents-Review.com
ClassID:

44761 ⎘

B24B37/015 - CPC Classification

Classification description:

Lapping machines or devices; Accessories; Control means for lapping machines or devices Temperature control

Recent Application in this class:
#1
20260131416
2026-05-14

DOUBLE-SIDE POLISHING APPARATUS FOR WORKPIECE AND DOUBLE-SIDE POLISHING METHOD FOR WORKPIECE

 #2
20260115856
2026-04-30

POLISHING APPARATUS

 #3
20260070183
2026-03-12

THERMALLY CONDUCTIVE CHEMICAL MECHANICAL POLISHING (CMP) PAD

 #4
20260027671
2026-01-29

POLISHING APPARATUS

 #5
20250375853
2025-12-11

SLURRY-BASED TEMPERATURE CONTROL FOR CMP

 #6
20250353134
2025-11-20

HEAT CLEANING SYSTEM AND METHOD FOR CMP PAD BY-PRODUCT CONTROL

 #7
20250312884
2025-10-09

POLISHING PAD WITH HEAT DISSIPATION PATTERN

 #8
20250303514
2025-10-02

INFORMATION PROCESSING DEVICE, SUBSTRATE POLISHING DEVICE, INFERENCE DEVICE, MACHINE LEARNING DEVICE, INFORMATION PROCESSING METHOD, INFERENCE METHOD, AND MACHINE LEARNING METHOD

 #9
20250296198
2025-09-25

CHEMICAL MECHANICAL POLISHING APPARATUS

 #10
20250269486
2025-08-28

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

 #11
20250249545
2025-08-07

POLISHING PROCESS APPARATUS

 #12
20250235980
2025-07-24

SUBSTRATE LAPPING APPARATUS AND SUBSTRATE LAPPING METHOD USING THE SAME

 #13
20250235978
2025-07-24

COOLING CONTROL IN CHEMICAL MECHANICAL POLISHING

 #14
20250205847
2025-06-26

METHOD FOR CMP TEMPERATURE CONTROL

 #15
20250153303
2025-05-15

SUBSTRATE HOT SPOT CORRECTION FOR A CHEMICAL MECHANICAL POLISHING PROCESSS

 #16
20250149358
2025-05-08

SUBSTRATE TREATING APPARATUS

 #17
20250135600
2025-05-01

POLISHING HEAD AND POLISHING CARRIER APPARATUS HAVING THE SAME

 #18
20250118604
2025-04-10

SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD

 #19
20250114909
2025-04-10

COLD LIQUID POLISHING CONTROL

 #20
20250108476
2025-04-03

TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING

 #21
20250018523
2025-01-16

POLISHING DEVICE, SUBSTRATE TREATING APPARATUS, AND POLISHING METHOD

 #22
20250006522
2025-01-02

SUBSTRATE TREATING APPARATUS

 #23
20240342855
2024-10-17

STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING

 #24
20240308021
2024-09-19

CHEMICAL MECHANICAL POLISHING METHOD

 #25
20240286243
2024-08-29

SUBSTRATE POLISHING APPARATUS

 #26
20240269797
2024-08-15

Wafer Temperature Control System and Control Method, Computer Device, and Storage Medium

 #27
20240261930
2024-08-08

SUBSTRATE POLISHING APPARATUS AND METHOD OF POLISHING SUBSTRATE

 #28
20240253183
2024-08-01

APPARATUS AND METHOD FOR CONTROLLING SUBSTRATE POLISH EDGE UNIFORMITY

 #29
20240246191
2024-07-25

METHOD OF CREATING CORRELATION RELATIONAL FORMULA FOR DETERMINING POLISHING CONDITION, METHOD OF DETERMINING POLISHING CONDITION, AND SEMICONDUCTOR WAFER MANUFACTURING METHOD

 #30
20240238939
2024-07-18

SUBSTRATE POLISHING APPARATUS

 #31
20240238935
2024-07-18

CHEMICAL MECHANICAL POLISHING APPARATUS

 #32
20240234164
2024-07-11

SUBSTRATE PROCESSING DEVICE AND METHOD FOR OPERATING THE SAME

 #33
20240207997
2024-06-27

LIGHT INTENSITY ADJUSTMENT METHOD FOR OPTICAL FILM THICKNESS MEASURING DEVICE AND POLISHING APPARATUS

 #34
20240181594
2024-06-06

POLISHING METHOD, AND POLISHING APPARATUS

 #35
20240157504
2024-05-16

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

 #36
20240157503
2024-05-16

POLISHING APPARATUS

 #37
20240149388
2024-05-09

Temperature control in chemical mechanical polish

 #38
20240109163
2024-04-04

METHOD FOR CMP TEMPERATURE CONTROL

 #39
20240087963
2024-03-14

SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD

 #40
20240066660
2024-02-29

LOW-TEMPERATURE METAL CMP FOR MINIMIZING DISHING AND CORROSION, AND IMPROVING PAD ASPERITY

 #41
20240066659
2024-02-29

PROCESSING APPARATUS

 #42
20240042570
2024-02-08

CLEANING OF CMP TEMPERATURE CONTROL SYSTEM

 #43
20240033876
2024-02-01

POLISHING APPARATUS

 #44
20240025006
2024-01-25

TEMPERATURE AND SLURRY FLOW RATE CONTROL IN CMP

 #45
20230415297
2023-12-28

CONTROL OF STEAM GENERATION FOR CHEMICAL MECHANICAL POLISHING

 #46
20230415296
2023-12-28

Apparatus and method for CMP temperature control

 #47
20230381914
2023-11-30

APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

 #48
20230381913
2023-11-30

POLISHING PAD AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

 #49
20230364733
2023-11-16

Chemical Mechanical Polishing Apparatus Including a Multi-Zone Platen

 #50
20230356351
2023-11-09

CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TEMPERATURE CONTROL

 #51
20230347469
2023-11-02

SEMICONDUCTOR WAFER THERMAL REMOVAL CONTROL

 #52
20230339066
2023-10-26

SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE

 #53
20230294237
2023-09-21

EXTERNAL HEATING SYSTEM FOR USE IN CHEMICAL MECHANICAL POLISHING SYSTEM

 #54
20230286106
2023-09-14

Chemical-mechanical polishing apparatus

 #55
20230219187
2023-07-13

Polishing method and polishing apparatus

 #56
20230182259
2023-06-15

GAS ENTRAINMENT DURING JETTING OF FLUID FOR TEMPERATURE CONTROL IN CHEMICAL MECHANICAL POLISHING

 #57
20230128739
2023-04-27

CMP PROCESS APPLIED TO A THIN SIC WAFER FOR STRESS RELEASE AND DAMAGE RECOVERY

 #58
20230095741
2023-03-30

WET CHEMICAL HEATING SYSTEM AND A METHOD OF CHEMICAL MECHANICAL POLISHING

 #59
20230064706
2023-03-02

APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

 #60
20230029290
2023-01-26

TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING

 #61
20220305617
2022-09-29

Pad-temperature regulating apparatus, and polishing apparatus

 #62
20220305611
2022-09-29

SUBSTRATE POLISHING SYSTEM AND SUBSTRATE POLISHING METHOD

 #63
20220290009
2022-09-15

Polishing solution, polishing apparatus, and polishing method

 #64
20220281061
2022-09-08

TEMPERATURE CONTROL WITH INTRA-LAYER TRANSITION DURING CMP

 #65
20220266415
2022-08-25

SUBSTRATE POLISHING APPARATUS

 #66
20220258300
2022-08-18

Double-side or one-side machine tool

 #67
20220228924
2022-07-21

Method of calibrating radiation thermometer and system thereof

 #68
20220212312
2022-07-07

Temperature regulating apparatus and polishing apparatus

 #69
20220184773
2022-06-16

Chemical mechanical planarization membrane

 #70
20220152780
2022-05-19

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #71
20220143778
2022-05-12

Polishing pad, method for producing the same and method of fabricating semiconductor device using the same

 #72
20220118582
2022-04-21

Chemical mechanical polishing apparatus, chemical mechanical polishing method and method for fabricating semiconductor device

 #73
20220097198
2022-03-31

Substrate polish edge uniformity control with secondary fluid dispense

 #74
20220072679
2022-03-10

Pad-temperature regulating apparatus, method of regulating pad-temperature, polishing apparatus, and polishing system

 #75
20220063050
2022-03-03

POLISHING APPARATUS

 #76
20220055178
2022-02-24

NOVEL AUTOMATED POLISHING SYSTEMS AND METHODS RELATING THERETO

 #77
20220016739
2022-01-20

Methods of detecting non-conforming substrate processing events during chemical mechanical polishing

 #78
20210402555
2021-12-30

Apparatus and method for CMP temperature control

 #79
20210402554
2021-12-30

Control of steam generation for chemical mechanical polishing

 #80
20210402553
2021-12-30

Temperature and slurry flow rate control in CMP

 #81
20210402552
2021-12-30

Gas entrainment during jetting of fluid for temperature control in chemical mechanical polishing

 #82
20210394332
2021-12-23

Substrate processing apparatus

 #83
20210394331
2021-12-23

SEMICONDUCTOR SUBSTRATE POLISHING WITH POLISHING PAD TEMPERATURE CONTROL

 #84
20210370462
2021-12-02

Chemical-mechanical polishing apparatus

 #85
20210347004
2021-11-11

Pad-temperature regulating apparatus, pad-temperature regulating method, and polishing apparatus

 #86
20210299815
2021-09-30

Grinding/polishing devices with recall

 #87
20210299814
2021-09-30

Polishing method, polishing agent and cleaning agent for polishing

 #88
20210229240
2021-07-29

Polishing apparatus and polishing method

 #89
20210229235
2021-07-29

SUBSTRATE POLISHING APPARATUS, SUBSTRATE POLISHING METHOD, AND APPARATUS FOR REGULATING TEMPERATURE OF POLISHING SURFACE OF POLISHING PAD USED IN POLISHING APPARATUS

 #90
20210220964
2021-07-22

Chemical mechanical polishing apparatus including a multi-zone platen

 #91
20210178547
2021-06-17

Semiconductor wafer thermal removal control

 #92
20210170545
2021-06-10

System for adjusting pad surface temperature and polishing apparatus

 #93
20210166967
2021-06-03

SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD

 #94
20210114164
2021-04-22

Polishing apparatus

 #95
20210114163
2021-04-22

Polishing head, substrate processing apparatus including the same and processing method of substrate using the same

 #96
20210078129
2021-03-18

External heating system for use in chemical mechanical polishing system

 #97
20210066086
2021-03-04

CHEMICAL MECHANICAL POLISHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND POLISHING PAD AND CHEMICAL MECHANICAL POLISHING DEVICE

 #98
20210046604
2021-02-18

Apparatus and method for CMP temperature control

 #99
20210046603
2021-02-18

SLURRY TEMPERATURE CONTROL BY MIXING AT DISPENSING

 #100
20210046602
2021-02-18

Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity

 #101
20210035812
2021-02-04

CHEMICAL MECHANICAL POLISHING METHOD AND CHEMICAL MECHANICAL POLISHING DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #102
20210031328
2021-02-04

Efficient ultra-precise shear thickening and chemical synergy polishing method

 #103
20200391342
2020-12-17

Polishing method and polishing apparatus

 #104
20200368875
2020-11-26

Channel cut polishing machine

 #105
20200331117
2020-10-22

Temperature-based assymetry correction during CMP and nozzle for media dispensing

 #106
20200331114
2020-10-22

Temperature-based in-situ edge assymetry correction during CMP

 #107
20200331113
2020-10-22

Chemical mechanical polishing temperature scanning apparatus for temperature control

 #108
20200306922
2020-10-01

Method of polishing silicon wafer

 #109
20200262024
2020-08-20

Apparatus and method for CMP temperature control

 #110
20200246935
2020-08-06

Chemical mechanical polishing system with platen temperature control

 #111
20200198090
2020-06-25

CMP APPARATUS AND METHOD OF PERFORMING CERIA-BASED CMP PROCESS

 #112
20200164480
2020-05-28

Temperature adjusting device and polishing device

 #113
20200130131
2020-04-30

Polishing apparatus of substrate

 #114
20200116570
2020-04-16

Apparatus and method for adjusting installation location of temperature sensor configured to measure surface temperature of wafer in semiconductor wafer cleaning apparatus

 #115
20200114488
2020-04-16

Method for polishing silicon wafer

 #116
20200070301
2020-03-05

Wet chemical heating system and a method of chemical mechanical polishing

 #117
20200055160
2020-02-20

Chemical mechanical polishing method

 #118
20200001427
2020-01-02

Temperature control of chemical mechanical polishing

 #119
20200001426
2020-01-02

Temperature Control of Chemical Mechanical Polishing

 #120
20200001425
2020-01-02

Chemical mechanical polishing apparatus and method

 #121
20190389032
2019-12-26

Methods and apparatus to control a fluid dispenser on a metallurgical specimen preparation machine

 #122
20190381628
2019-12-19

Lapping system that includes a lapping plate temperature control system, and related methods

 #123
20190337115
2019-11-07

Temperature control in chemical mechanical polish

 #124
20190308293
2019-10-10

METHOD OF REGULATING A SURFACE TEMPERATURE OF POLISHING PAD, AND POLISHING APPARATUS

 #125
20190287866
2019-09-19

Chemical mechanical polishing apparatus containing hydraulic multi-chamber bladder and method of using thereof

 #126
20190287826
2019-09-19

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

 #127
20190193246
2019-06-27

Polishing device

 #128
20190193237
2019-06-27

PAD TEMPERATURE ADJUSTMENT APPARATUS FOR ADJUSTING TEMPERATURE OF POLISHING PAD, AND POLISHING APPARATUS

 #129
20190168354
2019-06-06

SUBSTRATE POLISHING APPARATUS, SUBSTRATE POLISHING METHOD, AND APPARATUS FOR REGULATING TEMPERATURE OF POLISHING SURFACE OF POLISHING PAD USED IN POLISHING APPARATUS

 #130
20190143476
2019-05-16

Temperature control of chemical mechanical polishing

 #131
20190131148
2019-05-02

Planarization apparatus and planarization method thereof

 #132
20190126428
2019-05-02

HEAT EXCHANGER FOR REGULATING TEMPERATURE OF POLISHING SURFACE OF POLISHING PAD, POLISHING APPARATUS HAVING SUCH HEAT EXCHANGER, POLISHING METHOD FOR SUBSTRATE USING SUCH HEAT EXCHANGER, AND COMPUTER-READABLE STORAGE MEDIUM STORING A PROGRAM FOR REGULATING TEMPERATURE OF POLISHING SURFACE OF POLISHING PAD

 #133
20190118334
2019-04-25

Polishing method and polishing apparatus

 #134
20190091829
2019-03-28

Chemical mechanical planarization membrane

 #135
20190091828
2019-03-28

Method of controlling a temperature of a chemical mechanical polishing process, temperature control, and CMP apparatus including the temperature control

 #136
20190081238
2019-03-14

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #137
20190054590
2019-02-21

Chemical-mechanical planarization system

 #138
20190030675
2019-01-31

Temperature control in chemical mechanical polish

 #139
20180369985
2018-12-27

Wafer polishing method and apparatus

 #140
20180369984
2018-12-27

Polishing method

 #141
20180304437
2018-10-25

Methods and systems for polishing pad control

 #142
20180304436
2018-10-25

Methods and systems for polishing pad control

 #143
20180290263
2018-10-11

Polishing apparatus and polishing method

 #144
20180236631
2018-08-23

Heat exchanger for regulating surface temperature of a polishing pad, polishing apparatus, polishing method, and medium storing computer program

 #145
20180229344
2018-08-16

Polishing method and polishing apparatus

 #146
20180222007
2018-08-09

Method and apparatus for polishing a substrate

 #147
20180043498
2018-02-15

Lapping pads and systems and methods of making and using the same

 #148
20180029189
2018-02-01

Surface planarization system and method

 #149
20180021917
2018-01-25

Polishing method and polishing apparatus

 #150
20170361420
2017-12-21

Polishing method and polishing apparatus

 #151
20170361419
2017-12-21

System and method of delivering slurry for chemical mechanical polishing

 #152
20170239778
2017-08-24

Apparatus and method for regulating surface temperature of polishing pad

 #153
20170232572
2017-08-17

In-situ temperature control during chemical mechanical polishing with a condensed gas

 #154
20170136601
2017-05-18

Chemical mechanical polishing method

 #155
20170106492
2017-04-20

Polishing apparatus including pad contact member with baffle in liquid flow path therein

 #156
20170001281
2017-01-05

Methods and systems for polishing pad control

 #157
20160343578
2016-11-24

Methods and apparatus for forming a resist array using chemical mechanical planarization

 #158
20160318148
2016-11-03

Surface planarization system and method

 #159
20160214224
2016-07-28

Monitoring device, monitoring method, and device for cutting and grinding display substrate

 #160
20160121452
2016-05-05

POLISHING APPARATUS AND POLISHING METHOD

 #161
20160101500
2016-04-14

CHEMICAL MECHANICAL POLISHING PAD WITH INTERNAL CHANNELS

 #162
20160008948
2016-01-14

Polishing apparatus

 #163
20150352686
2015-12-10

Chemical mechanical polishing (CMP) platform for local profile control

 #164
20150290764
2015-10-15

Thermographic characterization for surface finishing process development

 #165
20150273650
2015-10-01

Polishing device and polishing method

 #166
20150251293
2015-09-10

POLISHING METHOD AND METHOD FOR PRODUCING ALLOY MATERIAL

 #167
20150231760
2015-08-20

Method and apparatus for conditioning polishing pad

 #168
20150224621
2015-08-13

Method and apparatus for polishing a substrate

 #169
20150196988
2015-07-16

POLISH APPARATUS AND POLISH METHOD

 #170
20150093971
2015-04-02

Polishing apparatus having substrate holding apparatus

 #171
20150093968
2015-04-02

Polishing apparatus having thermal energy measuring means

 #172
20150090351
2015-04-02

Exhaust flow rate control apparatus and substrate processing apparatus provided therewith

 #173
20150079881
2015-03-19

Polishing method and polishing apparatus

 #174
20150038056
2015-02-05

Temperature modification for chemical mechanical polishing

 #175
20150004878
2015-01-01

Manufacturing method of semiconductor device

 #176
20140364040
2014-12-11

SUBSTRATE POLISHING APPARATUS, SUBSTRATE POLISHING METHOD, AND APPARATUS FOR REGULATING TEMPERATURE OF POLISHING SURFACE OF POLISHING PAD USED IN POLISHING APPARATUS

 #177
20140020829
2014-01-23

Sensors in Carrier Head of a CMP System

 #178
20140015107
2014-01-16

METHOD TO IMPROVE WITHIN WAFER UNIFORMITY OF CMP PROCESS

 #179
20140004626
2014-01-02

Temperature control of chemical mechanical polishing

 #180
20130337723
2013-12-19

Method and apparatus for polishing workpiece

 #181
20130210173
2013-08-15

Multiple Zone Temperature Control for CMP

 #182
20130115855
2013-05-09

Polishing method and polishing apparatus

 #183
20130052917
2013-02-28

Polishing apparatus, polishing pad, and polishing information management system

 #184
20130023186
2013-01-24

Method and apparatus for polishing a substrate

 #185
20120276816
2012-11-01

Polishing method

 #186
20120244784
2012-09-27

CHEMICAL-MECHANICAL POLISHING TOOL AND METHOD FOR PREHEATING THE SAME

 #187
20120220196
2012-08-30

Polishing apparatus having temperature regulator for polishing pad

 #188
20120220195
2012-08-30

CMP APPARATUS, POLISHING PAD AND CMP METHOD

 #189
20120190273
2012-07-26

POLISHING METHOD AND POLISHING APPARATUS

 #190
20120058709
2012-03-08

Polishing apparatus having thermal energy measuring means

 #191
20120040592
2012-02-16

Apparatus and method for temperature control during polishing

 #192
20120034846
2012-02-09

Semiconductor device manufacturing method

 #193
20110204027
2011-08-25

SLURRY MANUFACTURING METHOD, SLURRY AND POLISHING METHOD AND APPARATUS USING SLURRY

 #194
20110159782
2011-06-30

Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus

 #195
20110143636
2011-06-16

Optical disk restoration method and apparatus

 #196
20100279435
2010-11-04

TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING

 #197
20100227435
2010-09-09

Chemical-mechanical polishing method for polishing phase-change material and method of fabricating phase-change memory device using the same

 #198
20100216373
2010-08-26

METHOD FOR CMP UNIFORMITY CONTROL

 #199
20100203806
2010-08-12

SEMICONDUCTOR MANUFACTURING APPARATUS

 #200
20100151771
2010-06-17

POLISHING APPARATUS AND POLISHING METHOD

 #201
20100144249
2010-06-10

Polishing apparatus

 #202
20100081360
2010-04-01

Use of pad conditioning in temperature controlled CMP

 #203
20100062691
2010-03-11

Substrate holding mechanism, substrate polishing apparatus and substrate polishing method

 #204
20100035515
2010-02-11

Chemical mechanical polisher with heater and method

 #205
20100015894
2010-01-21

CMP by controlling polish temperature

 #206
20090170320
2009-07-02

CMP system and method using individually controlled temperature zones

 #207
20090036032
2009-02-05

TEMPERATURE CONTROL FOR ECMP PROCESS

 #208
20080318503
2008-12-25

Substrate holding mechanism, substrate polishing apparatus and substrate polishing method

 #209
20080311823
2008-12-18

Apparatus for heating or cooling a polishing surface of a polishing apparatus

 #210
20080304929
2008-12-11

Machining machine with means for acquiring machining parameters

 #211
20080076335
2008-03-27

Polishing apparatus and polishing method

 #212
20080057831
2008-03-06

Double face polishing apparatus

 #213
20070227901
2007-10-04

Temperature control for ECMP process

 #214
20070135020
2007-06-14

Polishing apparatus and polishing method

 #215
20070093064
2007-04-26

Polishing method of Cu film and method for manufacturing semiconductor device

 #216
20060252352
2006-11-09

Method of monitoring surface status and life of pad by detecting temperature of polishing interface during chemical mechanical process

 #217
20060205323
2006-09-14

Substrate holding mechanism, substrate polishing apparatus and substrate polishing method

 #218
20060063472
2006-03-23

Method for polishing substrate

 #219
20060040589
2006-02-23

Double sided polishing machine

 #220
20050260938
2005-11-24

Table of wafer polishing apparatus, method for polishing semiconductor wafer, and method for manufacturing semiconductor wafer

 #221
20050150777
2005-07-14

Method and system for material removal and planarization

 #222
20050118839
2005-06-02

Chemical mechanical polish process control method using thermal imaging of polishing pad

 #223
20050066739
2005-03-31

Method and apparatus for wafer mechanical stress monitoring and wafer thermal stress monitoring

 #224
20050048882
2005-03-03

Polishing apparatus and method

 #225
20050003218
2005-01-06

Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing

 #226
13862025
2016-10-11

System and method for dissipating heat from a rotary power tool