44781 ⎘
Lapping machines or devices; Accessories; Lapping tools; Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
Polishing pad and method of producing semiconductor device
#302Method and apparatus of eddy current monitoring for chemical mechanical polishing
#303Polishing pad with window and method of fabricating a window in a polishing pad
#304Eddy current sensing of metal removal for chemical mechanical polishing
#305Polishing pad having a pressure relief channel
#306Method of forming a polishing pad with reduced stress window
#307Polishing pad with window
#308Integral polishing pad and manufacturing method thereof
#309Polishing pad
#310Substrate polishing apparatus
#311Multi-layer polishing pad for low-pressure polishing
#312Low surface energy CMP pad
#313Multi-layer polishing pad material for CMP
#314Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of making
#315Method of forming a layered polishing pad
#316Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
#317Polishing pad, platen hole cover, polishing apparatus, polishing method, and method for fabricating semiconductor device
#318Polishing pad and method of producing same
#319Conductive polishing article for electrochemical mechanical polishing
#320Method of forming a polishing pad for endpoint detection
#321Chemical mechanical polishing pad
#322Polishing pad with high optical transmission window
#323Polishing pad comprising biodegradable polymer
#324Polishing pad having grooved window therein and method of forming the same
#325Methods and systems for planarizing workpieces, e.g., microelectronic workpieces
#326Resilient polishing pad for chemical mechanical polishing
#327Polishing pad with window
#328Polishing pad with recessed window
#329Electrochemical mechanical processing apparatus
#330Chemical mechanical polishing pad and chemical mechanical polishing method
#331Polishing pad with built-in optical sensor