Patents-Review.com
ClassID:

44780 ⎘

B24B37/20 - CPC Classification

Classification description:

Lapping machines or devices; Accessories; Lapping tools Lapping pads for working plane surfaces

Sub-classes:
Recent Application in this class:
#1
20260124715
2026-05-07

POLISHING SYSTEM FOR SEMICONDUCTING WAFER SUBSTRATES

 #2
20260107722
2026-04-16

TOOLS FOR CHEMICAL PLANARIZATION

 #3
20260061546
2026-03-05

POLISHING PAD FOR SEMICONDUCTOR HYBRID BONDING AND PREPARATION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

 #4
20260048474
2026-02-19

AUTOMATED CMP PAD CHANGE FOR CMP SYSTEM

 #5
20260048470
2026-02-19

SUBSTRATE POLISHING APPARATUS

 #6
20260014665
2026-01-15

DOUBLE-SIDE GRINDING APPARATUS AND METHODS HAVING A WHEELBASE WITH POROUS ABRASIVE MEMBERS

 #7
20250381644
2025-12-18

SUBSTRATE POLISHING APPARATUS

 #8
20250364266
2025-11-27

INTEGRATED WET PASSIVATION ON CMP FOR HYBRID BONDING POST-CU PAD POLISH CAPPING

 #9
20250353142
2025-11-20

POLISHING PAD CONDITIONING APPARATUS

 #10
20250312891
2025-10-09

CHEMICAL MECHANICAL POLISHING SYSTEM WITH CONDITIONING RING

 #11
20250312887
2025-10-09

AUTOMATIC POLISHING PAD REPLACEMENT DEVICE AND POLISHING DEVICE INCLUDING THE SAME

 #12
20250269493
2025-08-28

CHEMICAL MECHANICAL POLISHING APPARATUS, METHOD OF CONDITIONING POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING, CONDITIONING ASSEMBLY FOR CONDITIONING POLISHING PAD USED IN CHEMICAL MECHANICAL POLISHING

 #13
20250269487
2025-08-28

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD

 #14
20250262710
2025-08-21

PROCESSING APPARATUS AND POLISHING SURFACE SHAPING METHOD

 #15
20250235980
2025-07-24

SUBSTRATE LAPPING APPARATUS AND SUBSTRATE LAPPING METHOD USING THE SAME

 #16
20250196283
2025-06-19

SYSTEMS AND METHODS FOR PANEL POLISHING

 #17
20250191925
2025-06-12

PLANARIZATION METHOD OF WAFER

 #18
20250187138
2025-06-12

MODULAR CHEMICAL MECHANICAL POLISHER WITH SIMULTANEOUS POLISHING AND PAD TREATMENT

 #19
20250178152
2025-06-05

POLISHING DEVICE AND METHOD FOR DETECTING POLISHING END POINT IN POLISHING DEVICE

 #20
20250170688
2025-05-29

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD

 #21
20250170684
2025-05-29

APPARATUS FOR POLISHING A WAFER

 #22
20250162100
2025-05-22

POLISHING HEAD AND POLISHING APPARATUS

 #23
20250114909
2025-04-10

COLD LIQUID POLISHING CONTROL

 #24
20250114896
2025-04-10

INDIVIDUALLY ROTATABLE PLATENS AND CONTROL OF CARRIER HEAD SWEEP

 #25
20250058426
2025-02-20

LEVERAGED POROMERIC POLISHING PAD

 #26
20250019568
2025-01-16

Tungsten Chemical Mechanical Polishing Slurries

 #27
20250018526
2025-01-16

POLISHING PAD, PREPARATION METHOD THEREOF AND METHOD FOR PREPARING SEMICONDUCTOR DEVICE USING SAME

 #28
20240399532
2024-12-05

POLISHING HEAD AND SEGMENTATION TYPE HEAD MODULE OF A CHEMICAL MECHANICAL POLISHING APPARATUS

 #29
20240379270
2024-11-14

Perpendicularly Magnetized Ferromagnetic Layers Having an Oxide Interface Allowing for Improved Control of Oxidation

 #30
20240367285
2024-11-07

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #31
20240316598
2024-09-26

COMPRESSION GAP CONTROL FOR PAD-BASED CHEMICAL BUFF POST CMP CLEANING

 #32
20240278381
2024-08-22

POLISHING HEAD, POLISHING DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR WAFER

 #33
20240278378
2024-08-22

POLISHING APPARATUS

 #34
20240274440
2024-08-15

CMP System and Method of Use

 #35
20240269798
2024-08-15

CONDITIONING APPARATUS

 #36
20240149388
2024-05-09

Temperature control in chemical mechanical polish

 #37
20240082983
2024-03-14

Polishing head, and polishing treatment device

 #38
20240082982
2024-03-14

PROCESSING SYSTEM, PAD TRANSPORTING APPARATUS, LIQUID-RECEIVING APPARATUS, AND POLISHING APPARATUS

 #39
20240075582
2024-03-07

Modular chemical mechanical polisher with simultaneous polishing and pad treatment

 #40
20240075581
2024-03-07

SLURRY ARM AND CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME

 #41
20240051081
2024-02-15

MULTIPLE DISK PAD CONDITIONER

 #42
20240033877
2024-02-01

Apparatus and methods for susceptor deposition material removal

 #43
20240025009
2024-01-25

POLISHING PADS HAVING SELECTIVELY ARRANGED POROSITY

 #44
20240009801
2024-01-11

POLISHING PAD CONDITIONING SYSTEM AND METHOD OF USING

 #45
20230381918
2023-11-30

Chemical mechanical polishing apparatus and method

 #46
20230364734
2023-11-16

Novel CMP Pad Design and Method of Using the Same

 #47
20230364731
2023-11-16

Chemical mechanical polishing apparatus using a magnetically coupled pad conditioning disk

 #48
20230330804
2023-10-19

SINGLE-SIDE POLISHING APPARATUS, SINGLE-SIDE POLISHING METHOD, AND POLISHING PAD

 #49
20230321789
2023-10-12

Chemical mechanical planarization tool

 #50
20230294237
2023-09-21

EXTERNAL HEATING SYSTEM FOR USE IN CHEMICAL MECHANICAL POLISHING SYSTEM

 #51
20230278158
2023-09-07

Polishing Pad with Secondary Window Seal

 #52
20230264319
2023-08-24

PAD CARRIER ASSEMBLY FOR HORIZONTAL PRE-CLEAN MODULE

 #53
20230264317
2023-08-24

Chemical mechanical polishing apparatus and method

 #54
20230256567
2023-08-17

USING SACRIFICIAL MATERIAL IN ADDITIVE MANUFACTURING OF POLISHING PADS

 #55
20230249225
2023-08-10

STEAM CLEANING OF CMP COMPONENTS

 #56
20230234184
2023-07-27

POLISHING PAD CONDITIONING APPARATUS

 #57
20230150086
2023-05-18

POLISHING APPARATUS

 #58
20230150084
2023-05-18

Wafer surface chemical distribution sensing system and methods for operating the same

 #59
20230130235
2023-04-27

POLISHING SLURRY DISPENSE NOZZLE

 #60
20230125195
2023-04-27

CMP polishing head design for improving removal rate uniformity

 #61
20230077988
2023-03-16

TOOLS FOR CHEMICAL PLANARIZATION

 #62
20230063687
2023-03-02

APPARATUS FOR POLISHING A WAFER

 #63
20230052048
2023-02-16

Integrated abrasive polishing pads and manufacturing methods

 #64
20230029290
2023-01-26

TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING

 #65
20230024009
2023-01-26

FACE-UP WAFER EDGE POLISHING APPARATUS

 #66
20220410345
2022-12-29

Polishing apparatus and polishing member dressing method

 #67
20220410335
2022-12-29

Polishing system with annular platen or polishing pad

 #68
20220384198
2022-12-01

Method for polishing semiconductor substrate

 #69
20220379429
2022-12-01

Wafer polishing head, method for manufacturing wafer polishing head, and wafer polishing apparatus comprising same

 #70
20220375775
2022-11-24

Substrate processing apparatus, substrate processing system, and substrate processing method

 #71
20220371151
2022-11-24

POLISHING APPARATUS, INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING METHOD, AND PROGRAM

 #72
20220362907
2022-11-17

Methods to clean chemical mechanical polishing systems

 #73
20220331931
2022-10-20

Conditioner, chemical mechanical polishing apparatus including the same and method of manufacturing a semiconductor device using the apparatus

 #74
20220305611
2022-09-29

SUBSTRATE POLISHING SYSTEM AND SUBSTRATE POLISHING METHOD

 #75
20220266413
2022-08-25

Polishing system with contactless platen edge control

 #76
20220241927
2022-08-04

Method for polishing single-crystal diamond

 #77
20220234165
2022-07-28

Chemical mechanical polishing apparatus using a magnetically coupled pad conditioning disk

 #78
20220226956
2022-07-21

METHOD OF MANUFACTURE OF POLISHING PADS HAVING TWO OR MORE ENDPOINT DETECTION WINDOWS

 #79
20220219285
2022-07-14

Chemical mechanical polishing method

 #80
20220219284
2022-07-14

Apparatus and method for manufacturing display device

 #81
20220193859
2022-06-23

Chemical mechanical polishing with applied magnetic field

 #82
20220184773
2022-06-16

Chemical mechanical planarization membrane

 #83
20220168866
2022-06-02

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING PHOTOCATALYST

 #84
20220152774
2022-05-19

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #85
20220134506
2022-05-05

Polishing head and polishing apparatus

 #86
20220118582
2022-04-21

Chemical mechanical polishing apparatus, chemical mechanical polishing method and method for fabricating semiconductor device

 #87
20220111482
2022-04-14

Substrate polishing apparatus with contact extension or adjustable stop

 #88
20220080549
2022-03-17

METHOD FOR POLISHING A SEMICONDUCTIOR WAFER

 #89
20220072679
2022-03-10

Pad-temperature regulating apparatus, method of regulating pad-temperature, polishing apparatus, and polishing system

 #90
20220059401
2022-02-24

POLISHING PAD AND METHOD FOR PREPARING SEMICONDUCTOR DEVICE USING THE SAME

 #91
20220055179
2022-02-24

Apparatus and methods for susceptor deposition material removal

 #92
20220048155
2022-02-17

POLISHING APPARATUS AND POLISHING METHOD

 #93
20220016742
2022-01-20

Dressing apparatus and polishing apparatus

 #94
20220016740
2022-01-20

POLISHING APPARATUS AND POLISHING METHOD

 #95
20220010866
2022-01-13

Multi-Motion Appliance

 #96
20220009052
2022-01-13

Retaining ring

 #97
20220001507
2022-01-06

Correction of fabricated shapes in additive manufacturing

 #98
20210394334
2021-12-23

Polishing pad, preparation method thereof and method for preparing semiconductor device using same

 #99
20210394331
2021-12-23

SEMICONDUCTOR SUBSTRATE POLISHING WITH POLISHING PAD TEMPERATURE CONTROL

 #100
20210370466
2021-12-02

Chemical mechanical polishing system and method of using

 #101
20210343538
2021-11-04

CMP system and method of use

 #102
20210323116
2021-10-21

OFFSET PORE POROMERIC POLISHING PAD

 #103
20210316416
2021-10-14

FOCUS RING AND SUBSTRATE PROCESSING APPARATUS

 #104
20210308824
2021-10-07

DOUBLE-SIDED POLISHING OR SANDING MEMBER FOR ATTACHMENT TO A HAND-GUIDED POWER TOOL AND POWER TOOL WITH SUCH A POLISHING OR SANDING MEMBER

 #105
20210268625
2021-09-02

One or more conformal members used in the manufacture of a lapping plate, and related apparatuses and methods of making

 #106
20210260718
2021-08-26

CHEMICAL MECHANICAL POLISHING USING FLUORESCENCE-BASED ENDPOINT DETECTION

 #107
20210229236
2021-07-29

Apparatus and method for manufacturing display device

 #108
20210220965
2021-07-22

Wafer polishing head, system thereof, and method using the same

 #109
20210220962
2021-07-22

Chemical Mechanical Polishing Apparatus and Method

 #110
20210213586
2021-07-15

LCD glass lapping apparatus

 #111
20210193494
2021-06-24

Substrate processing apparatus and substrate processing method

 #112
20210187693
2021-06-24

Polishing pads having selectively arranged porosity

 #113
20210175106
2021-06-10

RFID part authentication and tracking of processing components

 #114
20210170545
2021-06-10

System for adjusting pad surface temperature and polishing apparatus

 #115
20210170542
2021-06-10

Polishing device, polishing head, polishing method, and method of manufacturing semiconductor device

 #116
20210138606
2021-05-13

SUBSTRATE HOLDING APPARATUS AND METHOD OF MANUFACTURING A DRIVE RING

 #117
20210122008
2021-04-29

Small batch polishing fluid delivery for CMP

 #118
20210114172
2021-04-22

Using sacrificial material in additive manufacturing of polishing pads

 #119
20210114164
2021-04-22

Polishing apparatus

 #120
20210098261
2021-04-01

CLEANING APPARATUS, CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING THE SAME, CLEANING METHOD AFTER CHEMICAL MECHANICAL POLISHING, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING THE SAME

 #121
20210094146
2021-04-01

Chemical mechanical polishing (CMP) polishing head with improved vacuum sealing

 #122
20210084842
2021-03-25

Multifunctional robotic device

 #123
20210078129
2021-03-18

External heating system for use in chemical mechanical polishing system

 #124
20210069854
2021-03-11

Polishing apparatus

 #125
20210060727
2021-03-04

Polishing pad conditioning apparatus

 #126
20210060624
2021-03-04

System for cleaning wafer in CMP process of semiconductor manufacturing fabrication

 #127
20210053184
2021-02-25

Chemical mechanical planarization tool

 #128
20210053179
2021-02-25

Novel CMP Pad Design and Method of Using the Same

 #129
20210046606
2021-02-18

Method for repairing polishing pad in real time

 #130
20210039223
2021-02-11

Device and methods for chemical mechanical polishing

 #131
20210035812
2021-02-04

CHEMICAL MECHANICAL POLISHING METHOD AND CHEMICAL MECHANICAL POLISHING DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #132
20210028049
2021-01-28

Article transporter in semiconductor fabrication

 #133
20210020449
2021-01-21

CMP system and method of use

 #134
20210008686
2021-01-14

Rotary body module and chemical mechanical polishing apparatus having the same

 #135
20210008684
2021-01-14

SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM

 #136
20210008681
2021-01-14

Cleaning method for optical surface monitoring device

 #137
20200398318
2020-12-24

Liquid supplying device and method for draining liquid thereof

 #138
20200376522
2020-12-03

Steam cleaning of CMP components

 #139
20200368874
2020-11-26

POLISHING APPARATUS AND POLISHING METHOD

 #140
20200361778
2020-11-19

Body obtained by processing solid carbon-containing material, producing method thereof, and producing apparatus thereof

 #141
20200361054
2020-11-19

Polishing pad with secondary window seal

 #142
20200361053
2020-11-19

Chemical-mechanical polishing system and method

 #143
20200346317
2020-11-05

Conditioner, chemical mechanical polishing apparatus including the same and method of manufacturing a semiconductor device using the apparatus

 #144
20200306921
2020-10-01

Polishing pad that minimizes occurrence of defects and process for preparing the same

 #145
20200306920
2020-10-01

Cleaning apparatus for heat exchanger and polishing apparatus

 #146
20200298365
2020-09-24

POLISHING APPARATUS AND POLISHING METHOD

 #147
20200262027
2020-08-20

Polishing apparatus and polishing method

 #148
20200243364
2020-07-30

Substrate processing apparatus, substrate processing system, and substrate processing method

 #149
20200243337
2020-07-30

Semiconductor wafer thinning systems and related methods

 #150
20200206867
2020-07-02

Polishing apparatus and polishing method

 #151
20200203146
2020-06-25

MODULE AND SYSTEM FOR TRIMMING WAFER EDGE

 #152
20200198094
2020-06-25

Polishing apparatus and polishing member dressing method

 #153
20200171618
2020-06-04

Polishing machine and a polishing method for a substrate

 #154
20200164483
2020-05-28

Polishing pad comprising window similar in hardness to polishing layer

 #155
20200156205
2020-05-21

Apparatus and methods for chemical mechanical polishing

 #156
20200139507
2020-05-07

Correction of fabricated shapes in additive manufacturing

 #157
20200130139
2020-04-30

DEVICE FOR CONDITIONING CHEMICAL MECHANICAL POLISHING

 #158
20200130138
2020-04-30

Methods to clean chemical mechanical polishing systems

 #159
20200130136
2020-04-30

Chemical mechanical polishing apparatus and method

 #160
20200130132
2020-04-30

Chemical mechanical polishing apparatus having scraping fixture

 #161
20200118823
2020-04-16

Systems and methods for chemical mechanical polish and clean

 #162
20200114487
2020-04-16

Polishing system with support post and annular platen or polishing pad

 #163
20200101577
2020-04-02

Carrier wafers and methods of forming carrier wafers

 #164
20200101576
2020-04-02

PLATEN ASSEMBLY AND METHOD OF ASSEMBLING A PLATEN ASSEMBLY

 #165
20200090923
2020-03-19

Wafer surface beveling method, method of manufacturing wafer, and wafer

 #166
20200075213
2020-03-05

Perpendicularly magnetized ferromagnetic layers having an oxide interface allowing for improved control of oxidation

 #167
20200070307
2020-03-05

Chemical mechanical planarization system and a method of using the same

 #168
20200055161
2020-02-20

Apparatus and method of forming a polishing article that has a desired zeta potential

 #169
20200047308
2020-02-13

Substrate holding device, substrate polishing apparatus, and method of manufacturing the substrate holding device

 #170
20200040221
2020-02-06

Compositions for use in chemical mechanical polishing

 #171
20200039021
2020-02-06

Method of double-side polishing semiconductor wafer

 #172
20200035539
2020-01-30

Direct bond method providing thermal expansion matched devices

 #173
20200016720
2020-01-16

POLISHING APPARATUS AND POLISHING METHOD

 #174
20200001428
2020-01-02

Polishing apparatus and polishing method

 #175
20200001427
2020-01-02

Temperature control of chemical mechanical polishing

 #176
20200001426
2020-01-02

Temperature Control of Chemical Mechanical Polishing

 #177
20190358767
2019-11-28

Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system

 #178
20190337116
2019-11-07

Method of using a polishing system

 #179
20190337115
2019-11-07

Temperature control in chemical mechanical polish

 #180
20190326117
2019-10-24

Semiconductor wafer thinning systems and related methods

 #181
20190287826
2019-09-19

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

 #182
20190247974
2019-08-15

METHOD FOR POLISHING WAFER

 #183
20190240801
2019-08-08

Method and apparatus for polishing a substrate

 #184
20190232460
2019-08-01

Polishing pad and polishing method using same

 #185
20190224808
2019-07-25

Polishing apparatus

 #186
20190189421
2019-06-20

Semiconductor wafer, and method for polishing semiconductor wafer

 #187
20190160625
2019-05-30

System, control method and apparatus for chemical mechanical polishing

 #188
20190157129
2019-05-23

Article transferring method in semiconductor fabrication

 #189
20190152016
2019-05-23

Chemical mechanical polishing apparatus and method

 #190
20190143475
2019-05-16

Predictive filter for polishing pad wear rate monitoring

 #191
20190134774
2019-05-09

Polishing method and polishing apparatus

 #192
20190126430
2019-05-02

SUBSTRATE TREATMENT APPARATUS

 #193
20190126429
2019-05-02

CMP polishing head design for improving removal rate uniformity

 #194
20190126427
2019-05-02

SUBSTRATE PROCESSING APPARATUS

 #195
20190105848
2019-04-11

Process for spraying back-adhesive on CMP pad

 #196
20190099856
2019-04-04

Polishing pad, method for manufacturing polishing pad, and polishing method

 #197
20190099854
2019-04-04

Chemical mechanical polishing apparatus and method

 #198
20190096722
2019-03-28

SEMICONDUCTOR FABRICATION USING PROCESS CONTROL PARAMETER MATRIX

 #199
20190095797
2019-03-28

SEMICONDUCTOR FABRICATION USING MACHINE LEARNING APPROACH TO GENERATING PROCESS CONTROL PARAMETERS

 #200
20190091829
2019-03-28

Chemical mechanical planarization membrane

 #201
20190084119
2019-03-21

Chattering correction for accurate sensor position determination on wafer

 #202
20190076982
2019-03-14

Method and system for monitoring polishing pad

 #203
20190070709
2019-03-07

One or more conformal members used in the manufacture of a lapping plate, and related apparatuses and methods of making

 #204
20190047117
2019-02-14

SUBSTRATE POLISHING APPARATUS AND METHOD

 #205
20190039206
2019-02-07

Polishing device, polishing method, and record medium

 #206
20190039203
2019-02-07

SUBSTRATE PROCESSING APPARATUS

 #207
20190030678
2019-01-31

Integrated abrasive polishing pads and manufacturing methods

 #208
20190030675
2019-01-31

Temperature control in chemical mechanical polish

 #209
20190001463
2019-01-03

WORKPIECE POLISHING APPARATUS

 #210
20180369985
2018-12-27

Wafer polishing method and apparatus

 #211
20180339447
2018-11-29

Correction of fabricated shapes in additive manufacturing using modified edge

 #212
20180339402
2018-11-29

Correction of fabricated shapes in additive manufacturing using sacrificial material

 #213
20180339401
2018-11-29

Correction of fabricated shapes in additive manufacturing using initial layer

 #214
20180339394
2018-11-29

Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same

 #215
20180339393
2018-11-29

Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same

 #216
20180339392
2018-11-29

Polishing apparatus and polishing method

 #217
20180330956
2018-11-15

Chemical mechanical polishing apparatus

 #218
20180315613
2018-11-01

CLEANING APPARATUS, CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING THE SAME, CLEANING METHOD AFTER CHEMICAL MECHANICAL POLISHING, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE INCLUDING THE SAME

 #219
20180291234
2018-10-11

System for chemical mechanical polishing of Ge-based materials and devices

 #220
20180290261
2018-10-11

Method for polishing wafer and polishing apparatus

 #221
20180281151
2018-10-04

ADHESIVE-LESS CARRIERS FOR CHEMICAL MECHANICAL POLISHING

 #222
20180226263
2018-08-09

Method and apparatus for within-wafer profile localized tuning

 #223
20180222008
2018-08-09

Polishing apparatus with a waste liquid receiver

 #224
20180185978
2018-07-05

Actuator tilt interposer for within-row lapping mount tool for magnetic recording read-write heads

 #225
20180185977
2018-07-05

Within-row stripe height and wedge angle control for magnetic recording read-write heads

 #226
20180169825
2018-06-21

Method and system for monitoring polishing pad before CMP process

 #227
20180158707
2018-06-07

RFID part authentication and tracking of processing components

 #228
20180148537
2018-05-31

Formulations for chemical mechanical polishing pads and CMP pads made therewith

 #229
20180147687
2018-05-31

Polishing apparatus and polishing method

 #230
20180122650
2018-05-03

Techniques for processing a polycrystalline layer using an angled ion beam

 #231
20180114713
2018-04-26

Direct bond method providing thermal expansion matched devices

 #232
20180099373
2018-04-12

Grinding apparatus and wafer processing method

 #233
20180093411
2018-04-05

ADDITIVE MANUFACTURING OF POLISHING PADS ON A CONVEYOR

 #234
20180086943
2018-03-29

TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND CLEANING METHOD

 #235
20180079152
2018-03-22

Tiltable platform for additive manufacturing of a polishing pad

 #236
20180079147
2018-03-22

Two step curing of polishing pad material in additive manufacturing

 #237
20180071891
2018-03-15

CMP pad conditioning assembly

 #238
20180065227
2018-03-08

Polishing pad with secondary window seal

 #239
20180056477
2018-03-01

Polishing system with annular platen or polishing pad for substrate monitoring

 #240
20180036859
2018-02-08

Method of processing thin layer

 #241
20180029189
2018-02-01

Surface planarization system and method

 #242
20180009078
2018-01-11

Chemical mechanical polishing apparatus

 #243
20180009077
2018-01-11

Chemical mechanical polishing head

 #244
20180005746
2018-01-04

Perpendicularly magnetized ferromagnetic layers having an oxide interface allowing for improved control of oxidation

 #245
20180001437
2018-01-04

Film thickness signal processing apparatus, and polishing apparatus

 #246
20170362464
2017-12-21

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

 #247
20170361419
2017-12-21

System and method of delivering slurry for chemical mechanical polishing

 #248
20170348819
2017-12-07

Chemical mechanical polishing (CMP) apparatus and method

 #249
20170341201
2017-11-30

RETAINER RING FOR SEMICONDUCTOR MANUFACTURING PROCESSES

 #250
20170320188
2017-11-09

Substrate processing system

 #251
20170312881
2017-11-02

Polishing system

 #252
20170304990
2017-10-26

Chemical mechanical polishing apparatus and method

 #253
20170301553
2017-10-19

Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the same

 #254
20170297164
2017-10-19

CLEANING APPARATUS AND SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME

 #255
20170291274
2017-10-12

Substrate processing apparatus

 #256
20170274495
2017-09-28

Polishing system with local area rate control and oscillation mode

 #257
20170266779
2017-09-21

Substrate polishing method, top ring, and substrate polishing apparatus

 #258
20170266778
2017-09-21

Polishing apparatus and polishing method

 #259
20170259399
2017-09-14

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

 #260
20170259396
2017-09-14

Correction of fabricated shapes in additive manufacturing

 #261
20170259395
2017-09-14

POLISHING MACHINE AND A POLISHING METHOD FOR A SUBSTRATE

 #262
20170259394
2017-09-14

Polishing apparatus

 #263
20170239783
2017-08-24

MOUNTING SHEET, POLISHING APPARATUS, AND METHOD FOR MAKING THE SAME

 #264
20170239778
2017-08-24

Apparatus and method for regulating surface temperature of polishing pad

 #265
20170232576
2017-08-17

CMP PAD CONDITIONERS WITH MOSAIC ABRASIVE SEGMENTS AND ASSOCIATED METHODS

 #266
20170232574
2017-08-17

Chemical-mechanical wafer polishing device

 #267
20170232573
2017-08-17

POLISHING MEMBER AND SEMICONDUCTOR MANUFACTURING METHOD

 #268
20170225294
2017-08-10

Systems, apparatus, and methods for chemical polishing

 #269
20170225288
2017-08-10

Polishing apparatus

 #270
20170225287
2017-08-10

Grinding tool

 #271
20170216994
2017-08-03

CHEMICAL MECHANICAL POLISHING CONDITIONER AND FABRICATION METHOD THEREOF

 #272
20170216992
2017-08-03

METHOD FOR POLISHING GERMANIUM WAFER

 #273
20170209979
2017-07-27

Polishing layer analyzer and method

 #274
20170204293
2017-07-20

Slurry composition and method of use

 #275
20170203405
2017-07-20

Carrier for small pad for chemical mechanical polishing

 #276
20170190018
2017-07-06

Method of polishing work and method of dressing polishing pad

 #277
20170190017
2017-07-06

Polisher, polishing tool, and polishing method

 #278
20170189944
2017-07-06

System for cleaning wafer in CMP process of semiconductor manufacturing fabrication

 #279
20170182628
2017-06-29

Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system

 #280
20170178890
2017-06-22

Semiconductor substrate polishing methods with dynamic control

 #281
20170173756
2017-06-22

Polishing apparatus, control method and recording medium

 #282
20170157735
2017-06-08

Work processing apparatus and liquid chemical bag for the same

 #283
20170157733
2017-06-08

Polishing pad

 #284
20170152402
2017-06-01

pH-adjuster free chemical mechanical planarization slurry

 #285
20170151649
2017-06-01

Polishing table replacement apparatus, polishing table replacement method, and apparatus for replacing a component of semiconductor-device manufacturing machine

 #286
20170151648
2017-06-01

Polishing pad, method for manufacturing polishing pad, and polishing method

 #287
20170144265
2017-05-25

Calibration method of substrate polishing apparatus, calibration apparatus of the same, and non-transitory computer readable recording medium for recording calibration program of the same

 #288
20170136602
2017-05-18

CMP polishing head design for improving removal rate uniformity

 #289
20170136601
2017-05-18

Chemical mechanical polishing method

 #290
20170133238
2017-05-11

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SLURRY FOR CHEMICAL MECHANICAL POLISHING

 #291
20170120416
2017-05-04

Apparatus for forming a polishing article that has a desired zeta potential

 #292
20170120415
2017-05-04

Vibration assistant polishing module

 #293
20170120414
2017-05-04

Chemical mechanical polishing system

 #294
20170106497
2017-04-20

Substrate holding device, and substrate polishing apparatus

 #295
20170106494
2017-04-20

POLISHING DEVICE

 #296
20170106493
2017-04-20

Polishing endpoint detection method

 #297
20170106492
2017-04-20

Polishing apparatus including pad contact member with baffle in liquid flow path therein

 #298
20170106491
2017-04-20

Polishers

 #299
20170103928
2017-04-13

Polishing method and polishing apparatus

 #300
20170098560
2017-04-06

Slurry composition for chemical mechanical polishing of GE-based materials and devices