83967 ⎘
Manufacture or treatment of devices or systems in or on a substrate; Etch mask forming Mask characterised by its size, orientation or shape
METHOD FOR MANUFACTURING A MICROELECTROMECHANICAL SYSTEM MIRROR DEVICE, MANUFACTURING APPARATUS, SET OF MIRROR DEVICES AND WAFER
#2METHOD FOR PRODUCING AT LEAST ONE FIRST AND ONE SECOND MICROMIRROR DEVICE
#3Surface micromachined structures
#4Copper-alloy capping layers for metallization in touch-panel displays
#5MICROMACHINED MIRROR ASSEMBLY HAVING REFLECTIVE LAYERS ON BOTH SIDES
#6DEEP CAVITY ETCHING METHOD
#7Copper-alloy capping layers for metallization in touch-panel displays
#8Surface micromachined structures
#9Micromachined mirror assembly having reflective layers on both sides
#10Superhydrophobic and superoleophobic nanosurfaces
#11Fence structure to prevent stiction in a MEMS motion sensor
#12Selective step coverage for micro-fabricated structures
#13Methods for multiple-patterning nanosphere lithography for fabrication of periodic three-dimensional hierarchical nanostructures
#14METHODS AND APPARATUS TO CONTROL GRAYSCALE PHOTOLITHOGRAPHY
#15Methods and apparatus to control grayscale photolithography
#16Fence structure to prevent stiction in a MEMS motion sensor
#17Microelectromechanical system device and method for manufacturing the same
#18Superhydrophobic and superoleophobic nanosurfaces
#19Thin-film transistor and method of forming an electrode of a thin-film transistor
#20Wire grid polarizer and method of fabricating the same
#21Protective coating on trench features of a wafer and method of fabrication thereof
#22Field emission devices and methods of making thereof
#23Method of etching semiconductor structures with etch gas
#24Method for modifying spacer profile
#25Self-organization material and pattern formation method
#26SENSOR ELEMENT AND METHOD OF MANUFACTURING THE SAME
#27Method for processing photoresist materials and structures
#28Polarizer, method of manufacturing the polarizer and display panel having the polarizer
#29Semiconductor device
#30Method for manufacturing electronic component
#31Method for producing nanoimprint mold
#32Rigid mask for protecting selective portions of a chip, and use of the rigid mask
#33Wire grid polarizer and method of fabricating the same
#34Method of manufacturing a MEMS structure and use of the method
#35Method of manufacturing a MEMS structure
#36Semiconductor devices and methods of forming thereof
#37Superhydrophobic films
#38MEMS device with non-planar features
#39Copper-alloy capping layers for metallization in touch-panel displays
#40Semiconductor devices and methods of forming thereof
#41Micropores and methods of making and using thereof
#42Field emission devices and methods of making thereof
#43Superhydrophobic and superoleophobic nanosurfaces
#44Superhydrophobic films
#45MEMS lithography mask with improved tungsten deposition topography and method for the same
#46Method for forming trenches in a semiconductor component
#47Method for transferring nanostructures into a substrate
#48Methods and devices for immobilization of single particles in a virtual channel in a hydrodynamic trap
#49Micropores and methods of making and using thereof
#50Directed self-assembly of block copolymers using segmented prepatterns
#51MEMS sensor, and MEMS sensor manufacturing method
#52Silicon processing method and silicon substrate with etching mask
#53Materials and methods for creating imaging layers
#54METHOD OF MANUFACTURING A STRUCTURE BASED ON ANISOTROPIC ETCHING, AND SILICON SUBSTRATE WITH ETCHING MASK
#55INTEGRATED DEVICE FABRICATED USING ONE OR MORE EMBEDDED MASKS
#56Manufacturing method of microelectromechanical system
#57Materials and methods for creating imaging layers
#58Fabricating integrated devices using embedded masks
#59Method for fabricating a shadow mask in a trench of a microelectronic or micromechanical structure
#60Integrated chemical microreactor with large area channels and manufacturing process thereof