93334 ⎘
Sulfonic acids; Halides, esters, or anhydrides thereof; Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton
Sub-classes:ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#2ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND
#3Non-chromatographic purification of macrocyclic peptides by a resin catch and release
#4Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition
#5SUPRAMOLECULAR IONIC LIQUID, SOLID-STATE ELECTROLYTE MEMBRANE, SOLID-STATE LITHIUM METAL BATTERY, AND APPARATUS
#6Formulations for enhanced oil recovery comprising sulfonates
#7ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
#8Resist composition, patterning process, and barium salt
#9Resist composition and patterning process
#10Resist composition and patterning process
#11Resist composition and patterning process
#12PRECIPITATED CALCIUM CARBONATE, A METHOD FOR ITS MANUFACTURE AND USES THEREOF
#13Formulations for enhanced oil recovery comprising sulfonates
#14Salt and photoresist composition containing the same
#15Resist composition and method for forming resist pattern
#16Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition
#17Chemically amplified resist material and resist pattern-forming method
#18Chemically amplified resist material, pattern-forming method, compound, and production method of compound
#19Resist-pattern-forming method and chemically amplified resist material
#20Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
#21Resist composition, method for forming resist pattern, photo-reactive quencher and compound
#22Salt, resin, resist composition and method for producing resist pattern
#23Polymer conductor for lithium-ion batteries
#24Sulfonium salt, resist composition and resist pattern forming process
#25Ketone compounds and compositions for cholesterol management and related uses
#26Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
#27Electrolyte solution for a secondary battery
#28Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound
#29Process for the preparation of enantiomerically pure 1-substituted-3-aminoalcohols
#30Salt, photoresist composition, and method for producing photoresist pattern
#31Radiation-sensitive composition and compound
#32Ketone compounds and compositions for cholesterol management and related uses
#33Secondary battery using an electrolyte solution
#34Method for Preparing Sulfur-Containing Compounds
#35Photoacid generators and photoresists comprising same
#36Ketone compounds and compositions for cholesterol management and related uses
#37Process for the preparation of enantiomerically pure 1-substituted-3-aminoalcohols
#38Ketone compounds and compositions for cholesterol management and related uses
#39Ketone compounds and compositions for cholesterol management and related uses
#40Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
#41Salts and methods for their preparation
#42Isethionyl nitrates and compounds thereof
#43Additive for an electrolyte solution for an electrochemical device
#44Salt form of dopamine agonist