97894 ⎘
Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof; Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof; Esters Esters containing halogen
Sub-classes:RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND
#2RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND
#3RESIST COMPOSITION AND PATTERNING PROCESS
#4METHOD FOR THE PREPARATION OF PHOTOALIGNING POLYMER MATERIALS AND COMPOSITIONS
#5ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
#6RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID-GENERATING AGENT
#7ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
#8POLYMER AND WATER-REPELLENT OIL-RESISTANT COMPOSITION
#9COPOLYMERS OF HALOGENATED OLEFINS AND HALOGENATED CO-MONOMERS
#10FLUORINE-CONTAINING POLYMER, COMPOSITION, OPTICAL FILM, LIQUID CRYSTAL FILM, HARDCOAT FILM, AND POLARIZING PLATE
#11BINDER COMPOSITION, COMPOUND, BINDER LAYER, OPTICAL LAMINATE, OPTICAL LAMINATE MANUFACTURING METHOD, AND IMAGE DISPLAY DEVICE
#12AMPHIPHILIC COPOLYMER WITH ZWITTERIONIC AND FLUORINATED MOIETIES
#13CROSSLINKABLE POLYMERIC MATERIALS FOR DIELECTRIC LAYERS IN ELECTRONIC DEVICES
#14MULTILAYER FILM AND TWO-LIQUID CURABLE COATING AGENT
#15Curable composition and cured product
#16METHOD FOR THE PREPARATION OF PHOTOALIGNING POLYMER MATERIALS AND COMPOSITIONS
#17COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD OF BASE MATERIAL SURFACE, PATTERN-FORMING METHOD, AND POLYMER
#18Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same
#19Method for producing polymerizable compound
#20Crosslinkable polymeric materials for dielectric layers in electronic devices
#21Curable composition and cured product
#22Flooring Coating Formulation And Floor Covering Having Wear Layer Formed With Same
#23Bromine-containing polymers and methods for producing the same
#24Methods of making crosslinked copolymer films from inimer-containing random copolymers
#25Film obtained by laminating coating layer made of fluorine-containing acrylic resin on base film
#26Polymer compound for a conductive polymer and method for producing same
#27Optical fiber, optical fiber cable and communication equipment
#28Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
#29Acrylic elastomer, acrylic elastomer composition, laminate, crosslinked product, and molded article
#30Block copolymers and lithographic patterning using same
#31Inimer-containing random copolymers and crosslinked copolymer films for dense polymer brush growth
#32Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
#33Process for preparing novel copolymers with a fluoropolymer backbone comprising polyoxyalkylene pendant chains
#34Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
#35Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer
#36OVERPRINT VARNISH FORMULATIONS
#37Optical fiber and method for manufacturing same
#38Top coating composition
#39Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same
#40Polymer, chemically amplified positive resist composition and pattern forming process
#41POLYMER, COMPOSITION FOR PROTECTIVE LAYER, AND PATTERNING METHOD USING THE SAME
#42Polymerizable fluorine-containing compound
#43Curable composition for imprint, patterning method and pattern
#44Mixture of fluoroalkyl alcohol-unsaturated carboxylic acid derivatives, polymer of the mixture, and water-and oil-repellent containing the polymer as active ingredient
#45Method for producing fluorine-containing polymer, aqueous dispersion of fluorine-containing polymer, 2-acyloxycarboxylic acid derivative, and surface active agent
#46Fluorinated compositions and surface treatments made therefrom
#47Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
#48Method for producing fluorine-containing polymer, aqueous dispersion of fluorine-containing polymer, 2-acyloxycarboxylic acid derivative, and surface active agent.
#49Polymer, polymer electrolyte membrane for polymer electrolyte fuel cell, and membrane/electrode assembly
#50Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same
#51Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
#52Fluorine-containing photocurable composition
#53Fluorine-containing polymerisable monomer and polymer prepared by using same
#54Method for producing fluorine-containing polymer, aqueous dispersion of fluorine-containing polymer,2-acyloxycarboxylic acid derivative, and surface active agent
#55Fluorine-containing optical material and fluorine-containing copolymer
#56Optical material containing photocurable fluoropolymer and photocurable fluororesin composition
#57Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound