ClassID:

103232

C09D125/16 - CPC Classification

Classification description:

Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers; Homopolymers or copolymers of hydrocarbons Homopolymers or copolymers of alkyl-substituted styrenes

Recent Application in this class:
#1
20260103604
2026-04-16

LAMINATE CONTAINING AN ADHESION PROMOTER LAYER AND METHOD OF MAKING THE LAMINATE

#2
20260028499
2026-01-29

COATING COMPOSITIONS AND METHODS FOR MAKING SAME

#3
20250066522
2025-02-27

CORE-SHELL POLYMER, WATER-BASED PRIMER SLURRY, SECONDARY BATTERY AND ELECTRICAL APPARATUS

#4
20250043050
2025-02-06

CURABLE POLYMER, CURABLE COMPOSITION, PREPREG, MULTILAYER BODY, METAL CLAD LAMINATE AND WIRING BOARD

#5
20250034306
2025-01-30

DEVELOPMENT OF NOVEL NEUTRAL LAYER AND HYDROPHOBIC PINNING MAT MATERIALS FOR USE IN DSA WITH IMPROVED SUBSTRATE COMPATIBILITY

#6
20240352275
2024-10-24

CURED RESIN FILM, SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#7
20240228765
2024-07-11

RESIN COMPOSITION, INSULATING RESIN FILM AND USE THEREOF

#8
20240218188
2024-07-04

ENCAPSULANT COMPOSITION AND FILM

#9
20230391900
2023-12-07

HOLLOW RESIN PARTICLES, METHOD FOR PRODUCING HOLLOW RESIN PARTICLES, AND USE OF HOLLOW RESIN PARTICLES

#10
20230152702
2023-05-18

MATERIAL FOR FORMING FILLING FILM FOR INHIBITING SEMICONDUCTOR SUBSTRATE PATTERN COLLAPSE, AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE

#11
20220380981
2022-12-01

Aqueous compositions with improved barrier properties

#12
20220049103
2022-02-17

Photochromic composition

#13
20210389673
2021-12-16

Random copolymer, laminate, and method for forming pattern

#14
20210189553
2021-06-24

Composition, polymer, and method of producing substrate

#15
20210062428
2021-03-04

Aqueous water barrier coatings

#16
20210018843
2021-01-21

Random copolymer for forming neutral layer, laminate for forming pattern including the same, and method for forming pattern using the same

#17
20200299902
2020-09-24

Aqueous water barrier coatings

#18
20200199379
2020-06-25

METHOD OF FORMING A LOW SPECULAR REFLECTANCE SURFACE

#19
20200135454
2020-04-30

Method for manufacturing a semiconductor device and a coating material

#20
20190359749
2019-11-28

Underlayer film-forming composition for use in forming a microphase-separated pattern

#21
20190284320
2019-09-19

Fluorescent resin particles and use thereof

#22
20190237734
2019-08-01

Separator, lithium battery including the same, and method of manufacturing separator

#23
20190233660
2019-08-01

Copper-containing articles

#24
20190198317
2019-06-27

Method and composition for selectively modifying base material surface

#25
20190164746
2019-05-30

Method for manufacturing a semiconductor device and a coating material

#26
20190064671
2019-02-28

Random copolymer, laminate, and method for forming pattern

#27
20190064670
2019-02-28

Random copolymer for forming neutral layer, laminate for forming pattern including the same, and method for forming pattern using the same

#28
20190023916
2019-01-24

Radiation curable hybrid inks

#29
20170293227
2017-10-12

Coating liquid for resist pattern coating

#30
20170205711
2017-07-20

Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition

#31
20170162848
2017-06-08

Water-based composition used for modifying diaphragm for lithium batteries and modified diaphragm and batteries

#32
20170010535
2017-01-12

Resist overlayer film forming composition and method for producing semiconductor device including the same

#33
20160272737
2016-09-22

Resin composition, dry-etching resist mask, and patterning method

#34
20150340624
2015-11-26

Organic thin film transistor, organic semiconductor thin film, and organic semiconductor material

#35
20150267046
2015-09-24

Composition for film formation, resist underlayer film, and forming method of resist underlayer film, and pattern-forming method

#36
20150210793
2015-07-30

CROSSLINKABLE POLYMERS AND UNDERLAYER COMPOSITIONS

#37
20150197592
2015-07-16

Semi-cured product, cured product and method for producing these, optical component, curable resin composition, and compound

#38
20150105528
2015-04-16

Low viscosity high solids copolymer

#39
20150030773
2015-01-29

Undercoat agent and method of producing structure containing phase-separated structure

#40
20140329960
2014-11-06

Styrenic (meth)acrylic oligomers

#41
20140171584
2014-06-19

Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

#42
20130078576
2013-03-28

Compositions of neutral layer for directed self assembly block copolymers and processes thereof

#43
20120178884
2012-07-12

Low viscosity high solids copolymer

#44
20120083572
2012-04-05

Styrenic (meth)acrylic oligomers

#45
20110196121
2011-08-11

Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

#46
20110039077
2011-02-17

Stain-Resistant Overcoat

#47
20070010624
2007-01-11

Polymer binder for intumescent coatings

#48
20060264591
2006-11-23

Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions

#49
20060264562
2006-11-23

Polymer binder for intumescent coatings

#50
20060241196
2006-10-26

Polymer binder for intumescent coatings