103464 ⎘
Polishing compositions Other polishing compositions
Sub-classes:PHOTOELECTRIC FLUID FIELD CLUSTER CATALYTIC METHOD FOR ATOMIC-SCALE DETERMINISTIC PROCESSING
#2METHODS OF TEMPORARILY ENHANCING THE LUSTER AND BRILLIANCE OF JEWELRY AND GEM STONES
#3CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER
#4NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS
#5Ruthenium CMP chemistry based on halogenation
#6Methods of temporarily enhancing the luster and brilliance of jewelry and gem stones
#7Polishing Compositions and Methods of Using Same
#8MXene with excellent mechanical strength and fast and high-yield anhydrous synthesis method thereof
#9Ruthenium CMP chemistry based on halogenation
#10Slurry composition for chemical mechanical polishing
#11CHEMICAL MECHANICAL POLISHING SOLUTION
#12Methods for polishing dielectric layer in forming semiconductor device
#13CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same
#14COMPOSITIONS FOR TUNGSTEN ETCHING INHIBITION
#15Methods for polishing dielectric layer in forming semiconductor device
#16Chemical mechanical polishing slurry composition and method of polishing metal layer
#17Polishing compositions and methods of using same
#18Calcium carbonate slurry
#19Polishing slurry, method for polishing glass, and method for manufacturing glass
#20Chemical mechanical polishing composition, chemical mechanical polishing slurry and method for polishing substrate
#21Polishing agent, polishing method, and liquid additive for polishing
#22Barrier ruthenium chemical mechanical polishing slurry
#23Derivatized polyamino acids
#24Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing
#25Chemical mechanical polishing slurry composition and method of polishing metal layer
#26Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same
#27Polishing compositions and methods of use thereof
#28Polishing slurry, method for polishing glass, and method for manufacturing glass
#29Polishing liquid, polishing liquid set and polishing method
#30Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films
#31Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices
#32Composition and method for polysilicon CMP
#33Polishing liquid, polishing liquid set, and polishing method
#34Slurry composition and method of manufacturing integrated circuit device by using the same
#35Acid polishing composition and method of polishing a substrate having enhanced defect inhibition
#36Roughness reduction methods for materials using illuminated etch solutions
#37Method of polishing substrate and polishing composition set
#38Polishing method
#39Slurry composition for chemical mechanical polishing, method of preparing the same, and method of fabricating semiconductor device by using the same
#40Chemical mechanical planarization composition for polishing oxide materials and method of use thereof
#41Chemical mechanical planarization of films comprising elemental silicon
#42Calcium carbonate slurry
#43Polishing liquid and polishing method
#44Barrier ruthenium chemical mechanical polishing slurry
#45Chemical mechanical polishing slurry composition for polishing polycrystalline silicon film
#46Silica-based composite fine particle dispersion and method for manufacturing same
#47Polishing agent, polishing method, and liquid additive for polishing
#48Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
#49COMPOSITION FOR TUNGSTEN CMP
#50Organic film CMP slurry composition and polishing method using same
#51Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
#52Oxidizing fluid for the chemical-mechanical polishing of ceramic materials
#53Slurry for polishing of integrated circuit packaging
#54Polishing liquid, polishing liquid set, and substrate polishing method
#55Polishing slurry for cobalt-containing substrate
#56Composition comprising HF and 3,3,3-trifluoro-2-chloropropene
#57DIAMOND-BASED SLURRIES WITH IMPROVED SAPPHIRE REMOVAL RATE AND SURFACE ROUGHNESS
#58Semiconductor treatment composition and treatment method
#59Polishing composition for magnetic disc substrate
#60Polishing composition containing ceria abrasive
#61Polishing composition containing ceria abrasive
#62Composition and method for polishing memory hard disks exhibiting reduced edge roll-off
#63Composition comprising HF, 3,3,3-trifluoro-2-chloropropene, and E-3,3,3-trifluoro-1-chloropropene
#64Methods for fabricating a chemical-mechanical polishing composition
#65Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications
#66Abrasive composition and method for producing semiconductor substrate
#67Polishing method
#68COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF PLATINUM AND RUTHENIUM MATERIALS
#69Method of mixing reactive chemicals contained in separate containers on the vehicle surface to create a sealant
#70Ethylene-tetrafluoroethylene phosphate composition
#71Fluoroalkyl acid amide surfactants
#72Leveling agent for floor polish and aqueous floor polish composition
#73Solubilizing agents for active or functional organic compounds
#74Chemical mechanical polishing composition and method for tungsten
#75Aqueous compositions of low abrasive silica particles
#76Aqueous compositions of stabilized aminosilane group containing silica particles