Patents-Review.com
ClassID:

103461 ⎘

C09G1/00 - CPC Classification

Classification description:

Polishing compositions

Sub-classes:
Recent Application in this class:
#1
20250144609
2025-05-08

PHOTOELECTRIC FLUID FIELD CLUSTER CATALYTIC METHOD FOR ATOMIC-SCALE DETERMINISTIC PROCESSING

 #2
20250033081
2025-01-30

METHODS OF TEMPORARILY ENHANCING THE LUSTER AND BRILLIANCE OF JEWELRY AND GEM STONES

 #3
20240327677
2024-10-03

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER

 #4
20240254273
2024-08-01

POLYURETHANES, POLISHING ARTICLES AND POLISHING SYSTEMS THEREFROM AND METHOD OF USE THEREOF

 #5
20240246853
2024-07-25

CHEMICAL LIQUID STORAGE BODY

 #6
20240199917
2024-06-20

NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS

 #7
20240174892
2024-05-30

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

 #8
20230323157
2023-10-12

Methods of temporarily enhancing the luster and brilliance of jewelry and gem stones

 #9
20230265313
2023-08-24

Polishing Compositions and Methods of Using Same

 #10
20230197455
2023-06-22

METHODS FOR POLISHING SEMICONDUCTOR SUBSTRATES

 #11
20230136591
2023-05-04

MXene with excellent mechanical strength and fast and high-yield anhydrous synthesis method thereof

 #12
20230104949
2023-04-06

Slurry composition for chemical mechanical polishing

 #13
20230026568
2023-01-26

CHEMICAL MECHANICAL POLISHING SOLUTION

 #14
20220406612
2022-12-22

Methods for polishing dielectric layer in forming semiconductor device

 #15
20220298382
2022-09-22

CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same

 #16
20220267643
2022-08-25

COMPOSITIONS FOR TUNGSTEN ETCHING INHIBITION

 #17
20220199416
2022-06-23

Methods for polishing dielectric layer in forming semiconductor device

 #18
20220195246
2022-06-23

Chemical mechanical polishing slurry composition and method of polishing metal layer

 #19
20220145130
2022-05-12

Polishing compositions and methods of using same

 #20
20220089910
2022-03-24

Calcium carbonate slurry

 #21
20220049362
2022-02-17

Use of silicon dioxide for improving the cathodic anticorrosion effect of ground coats

 #22
20220043095
2022-02-10

Resistivity-based adjustment of thresholds for in-situ monitoring

 #23
20210269676
2021-09-02

Polishing slurry, method for polishing glass, and method for manufacturing glass

 #24
20210261825
2021-08-26

Chemical mechanical polishing composition, chemical mechanical polishing slurry and method for polishing substrate

 #25
20210261824
2021-08-26

Polishing agent, polishing method, and liquid additive for polishing

 #26
20210261822
2021-08-26

Barrier ruthenium chemical mechanical polishing slurry

 #27
20210246334
2021-08-12

POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #28
20210206920
2021-07-08

Derivatized polyamino acids

 #29
20210130651
2021-05-06

CMP slurry compositions and methods of fabricating a semiconductor device using the same

 #30
20210130650
2021-05-06

Chemical mechanical polishing slurry composition and method of polishing metal layer

 #31
20210115335
2021-04-22

Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same

 #32
20210108106
2021-04-15

Polishing compositions and methods of use thereof

 #33
20210079265
2021-03-18

Polishing slurry, method for polishing glass, and method for manufacturing glass

 #34
20210071037
2021-03-11

Polishing liquid, polishing liquid set and polishing method

 #35
20210071034
2021-03-11

Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films

 #36
20210062089
2021-03-04

Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices

 #37
20210062043
2021-03-04

Composition and method for polysilicon CMP

 #38
20210054233
2021-02-25

Polishing liquid, polishing liquid set, and polishing method

 #39
20200392375
2020-12-17

Slurry composition and method of manufacturing integrated circuit device by using the same

 #40
20200239736
2020-07-30

Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates

 #41
20200239734
2020-07-30

Acid polishing composition and method of polishing a substrate having enhanced defect inhibition

 #42
20200224058
2020-07-16

Polishing compositions and methods of use thereof

 #43
20200194278
2020-06-18

Roughness reduction methods for materials using illuminated etch solutions

 #44
20200181453
2020-06-11

Method of polishing substrate and polishing composition set

 #45
20200181008
2020-06-11

Chemical liquid storage body

 #46
20200172760
2020-06-04

Composition and method for metal CMP

 #47
20200152471
2020-05-14

Polishing method

 #48
20200148951
2020-05-14

Etching composition, method for forming pattern and method for manufacturing a display device using the same

 #49
20200048551
2020-02-13

Chemical mechanical planarization composition for polishing oxide materials and method of use thereof

 #50
20200032108
2020-01-30

Chemical mechanical planarization of films comprising elemental silicon

 #51
20200024482
2020-01-23

Polishing slurry, method of manufacturing the same, and method of manufacturing semiconductor device

 #52
20200002575
2020-01-02

Calcium carbonate slurry

 #53
20190367777
2019-12-05

Polishing composition

 #54
20190359868
2019-11-28

Composite particles, method of refining and use thereof

 #55
20190352537
2019-11-21

Polishing liquid and polishing method

 #56
20190318962
2019-10-17

Modulating metal interconnect surface topography

 #57
20190300749
2019-10-03

Barrier ruthenium chemical mechanical polishing slurry

 #58
20190292406
2019-09-26

Polishing slurry and method of polishing substrate by using the polishing slurry

 #59
20190276739
2019-09-12

Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ germanium stack during manufacture of a semiconductor device

 #60
20190248668
2019-08-15

Ceria composite particle dispersion, method for producing same, and polishing abrasive grain dispersion comprising ceria composite particle dispersion

 #61
20190161645
2019-05-30

Chemical mechanical polishing slurry composition for polishing polycrystalline silicon film

 #62
20190153279
2019-05-23

Silica-based composite fine particle dispersion and method for manufacturing same

 #63
20190136089
2019-05-09

Polishing agent, polishing method, and liquid additive for polishing

 #64
20190119525
2019-04-25

Composition for conducting material removal operations and method for forming same

 #65
20190119422
2019-04-25

Polishing composition for magnetic disk substrate

 #66
20190092974
2019-03-28

Polishing composition, method for producing polishing composition, polishing method, and method for producing semiconductor substrate

 #67
20190092971
2019-03-28

Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them

 #68
20190085209
2019-03-21

COMPOSITION FOR TUNGSTEN CMP

 #69
20190085206
2019-03-21

Chemical mechanical polishing method for cobalt

 #70
20190055431
2019-02-21

Polishing compositions and methods of use thereof

 #71
20190010359
2019-01-10

Polishing slurry and polishing material

 #72
20180362807
2018-12-20

Organic film CMP slurry composition and polishing method using same

 #73
20180362805
2018-12-20

Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them

 #74
20180282580
2018-10-04

Polishing compositions and methods of use thereof

 #75
20180277384
2018-09-27

Slurry for polishing of integrated circuit packaging

 #76
20180258319
2018-09-13

Polishing liquid, polishing liquid set, and substrate polishing method

 #77
20180254193
2018-09-06

Polishing slurry for cobalt-containing substrate

 #78
20180251658
2018-09-06

Method for polishing cobalt-containing substrate

 #79
20180203090
2018-07-19

Resistivity-based calibration of in-situ electromagnetic inductive monitoring

 #80
20180203089
2018-07-19

Resistivity-based adjustment of measurements from in-situ monitoring

 #81
20180127618
2018-05-10

Buffered slurry formulation for cobalt CMP

 #82
20180016468
2018-01-18

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

 #83
20180016467
2018-01-18

Composition for chemical mechanical polishing and method for reducing chemical mechanical polishing surface defects

 #84
20180002571
2018-01-04

Additives for barrier chemical mechanical planarization

 #85
20170355881
2017-12-14

Polishing composition, polishing method, and method for manufacturing ceramic component

 #86
20170330763
2017-11-16

Semiconductor treatment composition and treatment method

 #87
20170283673
2017-10-05

Composite particles, method of refining and use thereof

 #88
20170278718
2017-09-28

CMP polishing agent, manufacturing method thereof, and method for polishing substrate

 #89
20170158911
2017-06-08

Halite salts as silicon carbide etchants for enhancing CMP material removal rate for SiC wafer

 #90
20170044403
2017-02-16

Polishing composition containing ceria abrasive

 #91
20170043004
2017-02-16

Capsular polysaccharide solubilisation and combination vaccines

 #92
20160376408
2016-12-29

Consumer goods product comprising functionalised lignin oligomer

 #93
20160375549
2016-12-29

Method and blasting means for producing a satinized finish on an aluminium substrate

 #94
20160375138
2016-12-29

Consumer goods product comprising functionalised lignin oligomer

 #95
20160374935
2016-12-29

Consumer goods product comprising lignin oligomer

 #96
20160374928
2016-12-29

Consumer goods product comprising functionalised lignin oligomer

 #97
20160374922
2016-12-29

Consumer goods product comprising functionalised lignin oligomer

 #98
20160257856
2016-09-08

Polishing composition containing ceria abrasive

 #99
20160257853
2016-09-08

Polishing composition containing cationic polymer additive

 #100
20160244639
2016-08-25

Composition and method for polishing memory hard disks exhibiting reduced edge roll-off

 #101
20160222254
2016-08-04

CMP composition for silicon nitride removal

 #102
20160208141
2016-07-21

Polishing composition

 #103
20160108284
2016-04-21

POLISHING COMPOSITION

 #104
20160068713
2016-03-10

Slurry composition and method of substrate polishing

 #105
20160027663
2016-01-28

Method for chemical mechanical polishing substrates containing ruthenium and copper

 #106
20160002500
2016-01-07

Polishing composition

 #107
20150376461
2015-12-31

Colloidal silica chemical-mechanical polishing concentrate

 #108
20150376460
2015-12-31

Methods for fabricating a chemical-mechanical polishing composition

 #109
20150376459
2015-12-31

Colloidal silica chemical-mechanical polishing composition

 #110
20150376458
2015-12-31

Colloidal silica chemical-mechanical polishing composition

 #111
20150246426
2015-09-03

Method and blasting means for producing a sanitized finish on an aluminum substrate

 #112
20150197669
2015-07-16

Composition and method for polishing memory hard disks

 #113
20150159050
2015-06-11

Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivatives

 #114
20150132958
2015-05-14

Contact release capsule useful for chemical mechanical planarization slurry

 #115
20150132956
2015-05-14

Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications

 #116
20150079789
2015-03-19

Abrasive composition and method for producing semiconductor substrate

 #117
20150031205
2015-01-29

Polishing method

 #118
20150024595
2015-01-22

Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials

 #119
20140370707
2014-12-18

Polishing liquid for metal and polishing method

 #120
20140213057
2014-07-31

Chemical mechanical polishing (CMP) composition comprising a glycoside

 #121
20140141612
2014-05-22

Polishing composition, polishing method using same, and method for producing semiconductor device

 #122
20140054266
2014-02-27

COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF PLATINUM AND RUTHENIUM MATERIALS

 #123
20130309449
2013-11-21

Method for treating the surface of a silicon substrate

 #124
20100246016
2010-09-30

Glass having anti-glare surface and method of making

 #125
20090182129
2009-07-16

Capsular polysaccharide solubilisation and combination vaccines

 #126
20090182128
2009-07-16

Capsular polysaccharide solubilisation and combination vaccines

 #127
20090181053
2009-07-16

Capsular polysaccharide solubilisation and combination vaccines

 #128
20090181049
2009-07-16

Capsular polysaccharide solubilisation and combination vaccines

 #129
20090130147
2009-05-21

Capsular polysaccharide solubilisation and combination vaccines

 #130
20090130140
2009-05-21

Capsular polysaccharide solubilisation and combination vaccines

 #131
20090117148
2009-05-07

Capsular polysaccharides solubilisation and combination vaccines

 #132
20080299485
2008-12-04

Fluorochemical sulfonamide surfactants

 #133
20080182774
2008-07-31

MIXTURES CONTAINING 3-(4-METHYLCYCLOHEX-3-ENYL)BUTYRALDEHYDE AND 2,6-DIMETHYL-7-OCTEN-2-OL

 #134
20080153253
2008-06-26

Chemical mechanical polishing process and method of fabricating semiconductor device using the same

 #135
20070079446
2007-04-12

Stabilized body care products, household products, textiles and fabrics

 #136
20070000872
2007-01-04

Method for chemically mechanically polishing organic film, method of manufacturing semiconductor device, and program therefor

 #137
20060293521
2006-12-28

Cationic surfactants

 #138
20060264345
2006-11-23

Stabilized body care products, household products, textiles and fabrics

 #139
20060094618
2006-05-04

CD cleaner and restorer composition and method

 #140
20050166797
2005-08-04

Floor finish composition, laminates, and methods for treating floors

 #141
20050154109
2005-07-14

Floor finish with lightening agent

 #142
20050154108
2005-07-14

Floor finish with lightening agent

 #143
20050154107
2005-07-14

Floor finish with lightening agent

 #144
20050154084
2005-07-14

Floor finish with lightening agent

 #145
20050148491
2005-07-07

Fluorochemical sulfonamide surfactants

 #146
20050148483
2005-07-07

Combination cleaning and waxing composition and method

 #147
20050139120
2005-06-30

Auto care compositions with UV absorbers

 #148
20050106181
2005-05-19

Capsular polysaccharide solubilisation and combination vaccines

 #149
20050049159
2005-03-03

Combination cleaning and waxing composition and method

 #150
16166085
2020-03-24

Chemical mechanical polishing composition and method for tungsten

 #151
15297716
2017-10-10

Aqueous compositions of low abrasive silica particles

 #152
15297706
2017-10-31

Aqueous compositions of stabilized aminosilane group containing silica particles