Fine-processing agent and fine-processing method

Defect etching of germanium

SEMICONDUCTOR WET ETCHANT AND METHOD OF FORMING INTERCONNECTION STRUCTURE USING THE SAME

WET ETCHING SOLUTION

Inertial sensor and method of manufacturing the same

Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon

SOLUTION FOR REMOVING TITANIUM-CONTAINING COATINGS AND REMOVING METHOD USING SAME

Method of fabricating structured particles composed of silicon or a silicon-based material

Titanium etchant composition and method of forming a semiconductor device using the same

Etchant for metal wiring and method for manufacturing metal wiring using the same

ETCHANT COMPOSITION FOR METAL WIRING AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR ARRAY PANEL USING THE SAME

Etching composition, in particular for strained or stressed silicon materials, method for characterizing defects on surfaces of such materials and process of treating such surfaces with the etching composition

Composition for etching silicon oxide and method of forming a contact hole using the same

Process for the rough-etching of silicon solar cells

Methods for etching doped oxides in the manufacture of microfeature devices

Method of manufacturing a capacitor

ETCHANT COMPOSITIONS AND ETCHING METHOD FOR METALS Cu/Mo

Textured silicon substrate and method

Dry non-plasma treatment system and method of using

Method of etching a silicon-based material

Acid corrosion solution for preparing polysilicon suede and the applied method of it

Method for etching glass substrate

Etching composition for metal material and method for manufacturing semiconductor device by using same

Compositions and methods for the selective removal of silicon nitride

LIQUID CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES

Etching solution

METHODS FOR STRIPPING MATERIAL FOR WAFER RECLAMATION

Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate

Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device

POST-CONTACT OPENING ETCHANTS FOR POST-CONTACT ETCH CLEANS AND METHODS FOR FABRICATING THE SAME

Defect Etching of Germanium

ALPHA HYDROXY CARBOXYLIC ACID ETCHANTS FOR SILICON MICROSTRUCTURES

Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices

ETCHANT FOR SILICON WAFER SURFACE SHAPE CONTROL AND METHOD FOR MANUFACTURING SILICON WAFERS USING THE SAME

DIFLUORIDE COMPOSITION, METHOD OF PREPARATION, AND USE FOR FROSTING GLASS

Titanium nitride-stripping liquid, and method for stripping titanium nitride coating film

Semiconductor wet etchant and method of forming interconnection structure using the same

Compositions for use in semiconductor devices

Composition for etching a metal hard mask material in semiconductor processing

Etching solution, method of surface modification of semiconductor substrate and method of forming shallow trench isolation

Etching solution for multiple layer of copper and molybdenum and etching method using the same

Compositions for Dissolution of Low-K Dielectric Films, and Methods of Use

Solution used in the fabrication of a porous semiconductor material, and a method of fabricating said material

Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon

SURFACE CLEANING METHOD OF SEMICONDUCTOR WAFER HEAT TREATMENT BOAT

Method and etchant for removing glass-coating from metal wires

Etching composition and method for manufacturing a capacitor using the same

Stripper for coating layer

Composition for etching silicon oxide and method of forming a contact hole using the same

Selective High Dielectric Constant Material Etchant

Methods for characterizing defects on silicon surfaces and etching composition and treatment process therefor

Signal line for a display device, etchant, thin film transistor panel, and method for manufacturing the same

Wet etching solution

Method for selective etching

Methods for etching doped oxides in the manufacture of microfeature devices

Fluoride tile etchants having improved safety

Dry non-plasma treatment system and method of using

Highly selective doped oxide etchant

Composition for etching a metal hard mask material in semiconductor processing

Manufacturing method of semiconductor device using etching solution

Highly selective doped oxide etchant

Post-parting etch to smooth silicon sliders

Method for making solar cell

Functional paste

Etch compositions and methods of processing a substrate

Wet Treatment of Hafnium Containing Materials

Use of fluorinated additives in the etching or polishing of integrated circuits

PAA-based etchant, methods of using same, and resultant structures

Method for etching non-conductive substrate surfaces

Stripper

Filterable surfactant composition

Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors

Methods for etching doped oxides in the manufacture of microfeature devices

Etch compositions and methods of processing a substrate

Solution for wet treatment of hafnium containing materials, use of the solution and a wet treatment process

Etchant, method for fabricating interconnection line using the etchant, and method for fabricating thin film transistor substrate using the etchant

Polishing slurry and method of reclaiming wafers

Polymer remover

Cleaning solution and method of forming a metal pattern for a semiconductor device using the same

Etchant and method of use

Etching solution for D-defect evaluation in silicon wafer and evaluation method using the same

Semiconductor substrate treating method, semiconductor component and electronic appliance

Difluoride composition, method of preparation, and use for frosting glass

Etching pastes for titanium oxide surfaces

Etching composition and use thereof with feedback control of HF in BEOL clean

Etching solution and method for removing low-k dielectric layer

Etchants containing filterable surfactant

Material and process for etched structure filling and planarizing

Method for texturing surfaces of silicon wafers

Selective hafnium oxide etchant

Etchant composition and the use thereof

Etching gas, etching method and etching gas evaluation method

Method of forming trench isolation within a semiconductor substrate

Ruthenium silicide wet etch

Etching solution, etched article and method for etched article

Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate

Method of manufacturing a semiconductor device

Compositions for cleaning organic and plasma etched residues for semiconductor devices

Ionic liquids of heterocyclic amines

Fluorinated surfactants for aqueous acid etch solutions

PAA-based etchant, methods of using same, and resultant structures

Tungsten metal removing solution and method for removing tungsten metal by use thereof

Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates

Etching composition, method of preparing the same, method of etching an oxide film, and method of manufacturing a semiconductor device

ETCHANT COMPOSITION FOR SEM IMAGE ENHANCEMENT OF P-N JUNCTION CONTRAST

Etching solution, etching method and method for manufacturing semiconductor device

Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum

Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate

Silicon addition for silicon nitride etching selectivity

Titanium nitride hard mask and etch residue removal