104631 ⎘
Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
ETCHANT COMPOSITIONS FOR ETCHING SILICON GERMANIUM FILMS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES
#2Selective Etching of Silicon Dioxide and Silicon Nitride Containing Materials
#3COMPOSITIONS, RELATED SYSTEMS, AND RELATED METHODS OF REMOVING METAL OXIDES
#4METHOD FOR ETCHING FEATURES USING HF GAS
#5METHOD FOR PRODUCING AROMATIC COMPOUND HAVING FLUOROALKYL GROUP
#6ETCHING DEVICE AND WINDOW MANUFACTURING METHOD
#7ETCHING AGENT, ETCHING METHOD, AND METHOD FOR PRODUCING DEVICE
#8DEEP TRENCH ISOLATION ETCHING
#9ETCHING COMPOSITIONS
#10TREATMENT LIQUID AND TREATMENT METHOD
#11MANIFOLD ASSEMBLIES, REACTOR SYSTEMS INCLUDING MANIFOLD ASSEMBLIES, AND ASSOCIATED METHODS FOR SUPPLYING A GAS MIXTURE TO A REACTION CHAMBER
#12Method for Producing Aluminum-Resin Composite, and Surface Treatment Agent
#13ETCHANT COMPOSITION
#14COMPOSITION FOR THE SELECTIVE ETCHING OF SILICON
#15PROCESSING SOLUTION, PROCESSING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#16DRY ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND DRY ETCHING GAS COMPOSITION
#17SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#18ETCHING COMPOSITIONS, METHODS OF TREATING SUBSTRATES USING THE SAME, AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
#19Methods To Improve Etch Uniformity Across A Semiconductor Substrate When Etching With A Hydrofluoric Acid (HF) And Nitric Acid (HNO3) Solution
#20Gas Injected Chemistry for Single Wafer Processing
#21PHOTORESIST DEVELOPMENT WITH ORGANIC VAPOR
#22METHODS TO REMOVE AN EBC FROM A SUBSTRATE AND TO REPAIR A COATED COMPONENT
#23METHODS TO REMOVE AN EBC FROM A SUBSTRATE AND TO REPAIR A COATED COMPONENT
#24ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#25ETCH SELECTIVITY CONTROL IN ATOMIC LAYER ETCHING
#26MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#27PROCESSING METHOD AND PROCESSING SYSTEM
#28SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS
#29METHOD AND DEVICE FOR ETCHING SILICON OXIDE
#30ETCHANT COMPOSITION FOR ETCHING SILICON GERMANIUM FILM AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
#31THERMAL ATOMIC LAYER ETCHING PROCESSES
#32Etching Compositions
#33SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#34COMPOSITION, ITS USE AND A PROCESS FOR SELECTIVELY ETCHING SILICON-GERMANIUM MATERIAL
#35CHEMICAL ETCHING OF MOLYBDENUM FILMS
#36ETCHANT COMPOSITIONS AND RELATED METHODS
#37CYCLIC ETCH OF SILICON OXIDE AND SILICON NITRIDE
#38NITRIDE ETCHANT COMPOSITION AND METHOD
#39METHOD AND DEVICE FOR ETCHING SILICON OXIDE
#40MOLYBDENUM FILM ETCHANT COMPOSITION AND ETCHING METHOD USING SAME
#41TREATMENT LIQUID
#42Post-Dry Etching Photoresist And Metal Containing Residue Removal Formulation
#43ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#44ETCHING SOLUTION, ETCHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#45Etching Compositions
#46Pickle for polyamide
#47ETCHING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE FOR MEMORY ELEMENT USING SAME
#48ETCHING COMPOSITIONS
#49Etching Solution For Selectively Removing Silicon-Germanium Alloy From A Silicon-Germanium/ Silicon Stack During Manufacture Of A Semiconductor Device
#50ETCHANT COMPOSITION FOR ETCHING SILICON AND SILICON GERMANIUM, AND PREPARATION METHOD OF PATTERN USING THE SAME
#51ETCHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT
#52MICROPROCESSING TREATMENT AGENT AND MICROPROCESSING TREATMENT METHOD
#53ETCHING SOLUTION, METHOD OF MANUFACTURING SILICON DEVICE AND METHOD OF TREATING SUBSTRATE USING THE ETCHING SOLUTION
#54ETCHANT COMPOSITION FOR SILICON LAYER AND ETCHING METHOD USING THE SAME
#55METHOD FOR REACTIVE ION ETCHING
#56SEMICONDUCTOR ETCHING SOLUTION
#57COMPOSITION FOR THE SELECTIVE ETCHING OF SILICON
#58COMPOSITION FOR SURFACE TREATMENT AND SURFACE TREATMENT METHOD USING THE SAME
#59WET ETCHING SOLUTION COMPOSITION, WET ETCHING METHOD OF GLASS, AND PATTERNED GLASS BY THE WET ETCHING METHOD
#60Thermal atomic layer etching processes
#61Etching Solution For Titanium Nitride And Molybdenum Conductive Metal Lines
#62PHOTORESIST DEVELOPMENT WITH ORGANIC VAPOR
#63MICROMACHINING PROCESSING AGENT AND MICROMACHINING PROCESSING METHOD
#64ETCHANT COMPOSITION AND METHOD
#65Thermal atomic layer etching processes
#66Etch selectivity control in atomic layer etching
#67ETCHANT
#68ETCHANT COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME
#69SILICON NITRIDE ETCHING COMPOSITION AND METHOD
#70Method and device for etching silicon oxide
#71Etchant composition for etching silicon germanium film and method of manufacturing integrated circuit device by using the same
#72Anti-reflection and anti-glare glass laminates
#73COMPOSITION FOR THE SELECTIVE ETCHING OF SILICON
#74POLYSILICON FRACTURE OBJECT AND PRODUCTION METHOD THEREFOR
#75ETCHANTS FOR MAKING TEXTURED GLASS ARTICLES
#76METHOD FOR SUPPLYING COMPOSITION, COMPOSITION AND DRY ETCHING METHOD
#77MXene with excellent mechanical strength and fast and high-yield anhydrous synthesis method thereof
#78DRY ETCHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND DRY ETCHING GAS COMPOSITION
#79Method of treating a substrate surface, apparatus therefor, and treated glass articles
#80Treatment liquid
#81COMPOSITION FOR THE SELECTIVE ETCHING OF SILICON
#82NOVEL INHIBITED HYDROFLUORIC ACID COMPOSITION
#83Process to manufacture novel inhibited hydrofluoric acid composition
#84COMPOSITION FOR THE SELECTIVE ETCHING OF SILICON
#85Co/Cu selective wet etchant
#86ETCHANT COMPOSITION AND METHODS FOR MANUFACTURING METAL PATTERN AND ARRAY SUBSTRATE USING THE SAME
#87Etching composition
#88Etching composition
#89Semiconductor processing liquid and method for processing substrate
#90Preparation method and use method of material for deep purification of HF electronic gas
#91Etchant composition for semiconductor substrates
#92Method to control the etching rate of materials
#93Formulations for high selective silicon nitride etch
#94System and method for fabricating photonic device elements
#95Composition, its use and a process for selectively etching silicon-germanium material
#96Non-phosphoric acid-based silicon nitride film etching composition and etching method using the same
#97Substrate processing device and etching liquid
#98DRY ETCHING METHOD
#99Dry etching method and method for producing semiconductor device
#100Wet etching method
#101Etching composition for silicon nitride film
#102Thermal atomic layer etching processes
#103Thermal atomic layer etching processes
#104Dry etching method, and dry etching agent and storage container therefor
#105METHOD FOR ADDITIVE MANUFACTURING OF THREE-DIMENSIONAL OBJECTS
#106Method for improving etching rate of wet etching
#107Etching composition and application thereof
#108Aqueous solution for etching silicon oxide
#109Etchant compositions
#110Etching compositions
#111Textured glass articles and methods of making same
#112TEXTURED GLASS ARTICLES AND METHODS OF MAKING SAME
#113Nitride etchant composition and method
#114FLUORINATED AMINE OXIDE SURFACTANTS
#115Compositions and methods for selectively etching silicon nitride films
#116Process to manufacture novel inhibited hydrofluoric acid composition
#117Method and device for etching silicon oxide
#118Etching compositions
#119COBALT CHROME ETCHING PROCESS
#120Semiconductor processing liquid and method for processing substrate
#121Silicon nitride etching composition and method
#122SURFACTANTS FOR ELECTRONICS PRODUCTS
#123Etching compositions
#124Etching solution and method for manufacturing semiconductor element
#125Semiconductor smoothing apparatus and method
#126Etchant
#127Etching compositions
#128Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices
#129Formulations for high selective silicon nitride etch
#130Substrate processing method, substrate processing device and etching liquid
#131Non-aqueous tungsten compatible metal nitride selective etchants and cleaners
#132Dry etching method
#133Etching composition and method for fabricating semiconductor device by using the same
#134Inhibited hydrofluoric acid composition
#135Thermal atomic layer etching processes
#136Thermal atomic layer etching processes
#137Etching solution, additive, and etching method
#138Substrate processing method and film forming system
#139Dry etching gas composition and dry etching method
#140Etchant composition
#141Etching solution, and method of producing semiconductor element
#142Cobalt chrome etching process
#143Etching compositions
#144Etchant composition and methods for manufacturing metal pattern and array substrate using the same
#145Etching composition and method for manufacturing semiconductor device using the same
#146Plasma etching method
#147Selectively etching materials
#148Etching liquid composition and etching method
#149METHODS FOR REDUCING GLASS SHEET EDGE PARTICLES
#150Etching composition and method for fabricating semiconductor device by using the same
#151Silicon nitride layer etching composition
#152Polysiloxane-based compound, silicon nitride layer etching composition including the same
#153Selective etching of silicon wafer
#154Surface treatment method of material, material product and composite material
#155Methods of removing a ceramic coating from a substrate
#156Methods for producing integrated circuits with magnets and a wet etchant for the same
#157Etchant composition, and method for manufacturing metal pattern and array substrate using the same
#158Pre-treatment composition before etching SiGe and method of fabricating semiconductor device using the same
#159Thermal atomic layer etching processes
#160Thermal atomic layer etching processes
#161Colloidal silica growth inhibitor and associated method and system
#162Nanostructures fabricated by metal asisted chemical etching for antibactertial applications
#163Etching solution, etching method, and method for manufacturing an electronic component
#164Etching compositions
#165Wet etch chemistry for selective silicon etch
#166Method for roughening surface using wet treatment
#167Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/silicon stack during manufacture of a semiconductor device
#168Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor device
#169Substrate cleaning composition, substrate treating method, and substrate treating apparatus
#170Compositions and methods for etching silicon nitride-containing substrates
#171Low sparkle glass sheet and process of making it
#172Wet etching composition for substrate having SiN layer and Si layer and wet etching method using same
#173Chamber Cleaning and Semiconductor Etching Gases
#174LIQUID MIXTURE AND METHOD FOR ETCHING A SUBSTRATE USING THE LIQUID MIXTURE
#175Chamber Cleaning and Semiconductor Etching Gases
#176METHODS TO TEXTURE OPAQUE, COLORED AND TRANSLUCENT MATERIALS
#177Composition and process for selectively etching p-doped polysilicon relative to silicon nitride
#178Method for manufacturing an electronic component
#179Electronic component and method for manufacturing the same
#180Removing polysilicon
#181Liquid mixture and method for selectively wet etching silicon germanium
#182Etching gas composition for silicon compound, and etching method
#183Atomic layer etching processes using sequential, self-limiting thermal reactions comprising oxidation and fluorination
#184Method allowing the removal of oxides present on the surface of nodules of a metal powder before using same in an industrial method
#185Formulations to selectively etch silicon germanium relative to germanium
#186Wet etch chemistry for selective silicon etch
#187Method of manufacturing a semiconductor device
#188Etching composition and method for fabricating semiconductor device by using the same
#189Etchant composition and method of fabricating integrated circuit device using the same
#190Process to recover hydrogen fluoride from hydrogen fluoride-polymer compositions
#191Catalyst-assisted chemical etching with a vapor-phase etchant
#192Substrate processing method and substrate processing device
#193Dry etching gas and dry etching method
#194Method for strengthening edge of article, glass, and display apparatus
#195Method of manufacturing semiconductor device and resist glass
#196Etching solution capable of suppressing particle appearance
#197Formulation and method for inhibiting carbon-based deposits
#198ETCHING METHOD, METHOD OF MANUFACTURING ARTICLE, AND ETCHING SOLUTION
#199Compositions and methods for selectively etching titanium nitride
#200Removing polysilicon
#201ETCH CUTTING SOLUTION FOR USE ON GLASS SUBSTRATES
#202Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility
#203Nanostructures fabricated by metal assisted chemical etching for antibacterial applications
#204Etching method and etchant
#205Method of Manufacturing Glass Substrate
#206Removal of inorganic coatings from glass substrates
#207Etching adhesive tape, method of manufacturing the same and etching method
#208ACID REPLENISHING SYSTEM AND METHOD FOR ACID TANK
#209Electronic component and method for manufacturing the same
#210Method for manufacturing a micromechanical timepiece part and said micromechanical timepiece part
#211METHOD OF MANUFACTURE OF MICRO COMPONENTS, AND COMPONENTS FORMED BY SUCH A PROCESS
#212System and method for regenerating phosphoric acid solution, and apparatus and method for treating substrate
#213Chamber cleaning and semiconductor etching gases
#214Etching solution
#215Textured silicon substrate and method
#216Selectively removing titanium nitride hard mask and etch residue removal
#217METHOD FOR STRUCTURING A TRANSPARENT CONDUCTIVE MATRIX COMPRISING NANO MATERIALS
#218High-purity fluorinated hydrocarbon, use as a plasma etching gas, and plasma etching method
#219Additive for preparing suede on polycrystalline silicon chip and use method thereof
#220LOW SPARKLE GLASS SHEET
#221Metal etchant compositions and methods of fabricating a semiconductor device using the same
#222Aqueous formulations for removing metal hard mask and post-etch residue with Cu/W compatibility
#223Compositions and methods for semiconductor processing and devices formed therefrom
#224ETCHANT COMPOSITIONS FOR NITRIDE LAYERS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
#225Reverse osmosis for purifying mixtures of hydrofluoric acid and nitric acid
#226Method for treating a surface and device implemented
#227Etching liquid, kit of same, etching method using same, method for producing semiconductor substrate product, and method for manufacturing semiconductor element
#228Etching method, method of manufacturing article, and etching solution
#229Compositions and methods for the selective removal of silicon nitride
#230Compositions and methods for selectively etching titanium nitride
#231High-purity 2-fluorobutane
#232Substrate delivery device and strong acid or strong base etching adequate for wet process
#233Low-[HF] room temperature wet chemical growth (RTWCG) chemical formulation
#234HIGH SELECTIVITY GAS PHASE SILICON NITRIDE REMOVAL
#235Selective etching of silicon wafer
#236Silicon etching liquid, silicon etching method, and microelectromechanical element
#237Crystalline magnetic layer to amorphous substrate bonding
#238Dry non-plasma treatment system
#239Etchant and method of manufacturing display device by using the same
#240Methods to texture opaque, colored and translucent materials
#241Etching method and etching composition
#242Treating solution for electronic parts, and process for producing electronic parts
#243GLASS-REINFORCING COMPOSITION AND METHOD OF MANUFACTURING TOUCHSCREEN GLASS USING THE SAME
#244Etchant composition and method of forming metal wire and thin film transistor array panel using the same
#245ETCHING LIQUID FOR SEMICONDUCTOR SUBSTRATE, ETCHING METHOD USING THE SAME, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE
#246Etching method of semiconductor substrate, and method of producing semiconductor device
#247ETCHING LIQUID, ETCHING METHOD USING THE SAME, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE
#248Compositions for etching polysilicon
#249Composition for titanium nitride hard mask and etch residue removal
#250Methods, process and fabrication technology for high-efficiency low-cost crystalline silicon solar cells
#251Etchant and method for manufacturing display device using the same
#252Method for sludge control in wet acid etching
#253COMPOSITIONS FOR USE IN SEMICONDUCTOR DEVICES
#254Method for manufacturing microstructure
#255Inertial sensor and method of manufacturing the same
#256Compositions and methods for selectively etching titanium nitride
#257Etchant composition and method of manufacturing metal wiring and thin film transistor substrate using the etchant
#258FORMULATION FOR ACIDIC WET CHEMICAL ETCHING OF SILICON WAFERS
#259Dry non-plasma treatment system and method of using
#260Media and methods for etching glass
#261Compositions and methods for the selective removal of silicon nitride
#262Plasma etching gas and plasma etching method
#263DRY ETCHING AGENT
#264Etchant composition and etching method
#265Process to attach thermal stencils to a glass substrate and permanently etch a mark therein
#266Wet etchants including at least one fluorosurfactant etch blocker
#267Compositions for use in semiconductor devices
#268Etching polysilicon
#269Compositions to facilitate room temperature growth of an oxide layer on a substrate
#270Glass etching media and methods
#271Method for the wet-chemical etching back of a solar cell emitter
#272METHOD OF PRODUCING A SEMICONDUCTOR SUBSTRATE PRODUCT AND ETCHING LIQUID
#273Method of producing a semiconductor substrate product and etching liquid
#274Compositions and methods for texturing polycrystalline silicon wafers
#275Method for producing transistor
#276Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates
#277Etchant for controlled etching of Ge and Ge-rich silicon germanium alloys
#278Texture-etchant composition for crystalline silicon wafer and method for texture-etching (1)
#279RECONDITIONING GLASS-FORMING MOLDS
#280ETCHANT COMPOSITION AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR USING THE SAME
#281Etching composition and method of manufacturing a display substrate using the system
#282Dry etching agent and dry etching method
#283Method, apparatus and composition for wet etching
#284Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#285Etching composition, method of forming a metal pattern using the etching composition, and method of manufacturing a display substrate
#286Etchant for metal layer including copper or a copper alloy, method of manufacturing a display substrate using the same and display substrate
#287Tool for manufacturing semiconductor structures and method of use
#288ETCHANTS AND METHODS OF FABRICATING METAL WIRING AND THIN FILM TRANSISTOR SUBSTRATE USING THE SAME
#289Methods for etching doped oxides in the manufacture of microfeature devices
#290Polycrystalline texturing composition and method
#291ETCHING SOLUTION COMPOSITION FOR TRANSPARENT CONDUCTIVE FILM
#292Echtant and method for manufacturing display device using the same
#293Wet etchants including at least one etch blocker
#294INK JET PRINTABLE ETCHING INKS AND ASSOCIATED PROCESS
#295ETCHING COMPOSITION
#296Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
#297ETCHING COMPOSITION, IN PARTICULAR FOR SILICON MATERIALS, METHOD FOR CHARACTERIZING DEFECTS ON SURFACES OF SUCH MATERIALS AND PROCESS OF TREATING SUCH SURFACES WITH THE ETCHING COMPOSTION
#298ETCHANT FOR CONTROLLED ETCHING OF GE AND GE-RICH SILICON GERMANIUM ALLOYS
#299Two component etching
#300Composition for wet etching of silicon dioxide