104219 ⎘
Materials not provided for elsewhere; Anti-slip materials; Abrasives Composite particles, e.g. coated particles
Sub-classes:SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
#2POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND SUBSTRATE POLISHING METHOD USING THE SAME
#3POLISHING COMPOSITION AND POLISHING METHOD
#4CMP COMPOSITION INCLUDING CERIA POLYMER COMPOSITE PARTICLES
#5POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
#6POLISHING COMPOSITION
#7Diamond particles with multilayer hard coatings and polycrystalline diamond making therefrom
#8Garnet and Glass Composite and Uses
#9COMPOSITIONS AND METHODS FOR POLISHING SUBSTRATES
#10ABRASIVE PARTICLES AND POLISHING SLURRY COMPOSITION USING THE SAME
#11JANUS ABRASIVE PARTICLES AND SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING CONTAINING THE SAME
#12CMP COMPOSITION INCLUDING AMINOSILANE MODIFIED SILICA COATED CERIA PARTICLES
#13Slurry Composition for Chemical Mechanical Polishing
#14HIGHLY MODIFIED COLLOIDAL SILICA TUNGSTEN CMP COMPOSITION
#15Methods of Forming an Abrasive Slurry and Methods for Chemical-Mechanical Polishing
#16COMPOSITION FOR BIMETALLIC CMP
#17SLURRY COMPOSITION, METHOD FOR STORING SLURRY COMPOSITION, METHOD FOR PRODUCING CMP SLURRY, AND POLISHING METHOD
#18SILANE MODIFICATION OF CERIA NANOPARTICLES IN COLLOIDALLY STABLE SOLUTIONS
#19SILANE MODIFICATION OF CERIA NANOPARTICLES IN COLLOIDALLY STABLE SOLUTIONS
#20SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS
#21JANUS ABRASIVE PARTICLES AND SLURRY COMPOSITION COMPRISING THE SAME FOR CHEMICAL MECHANICAL POLISHING
#22Functionalized Carbon Particle CMP Slurry Dispersion
#23NEGATIVELY CHARGED SILICA PARTICLES, METHOD OF PRODUCING SUCH PARTICLES, COMPOSITIONS COMPRISING SUCH PARTICLES, AND A METHOD OF CHEMICAL-MECHANICAL POLISHING USING SUCH PARTICLES
#24WELDING METHOD USING COATED ABRASIVE PARTICLES
#25POLISHING COMPOSITION
#26Chemical Mechanical Planarization Using Amino-Polyorganosiloxane-Coated Abrasives
#27POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD OF MANUFACTURING SUBSTRATE USING SAME
#28COATING COMPOSITE, AND COATED ABRASIVE AND PREPARATION METHOD THEREOF
#29IRON GRADIENT IN POLYCRYSTALLINE DIAMOND COMPACTS; BLANKS, CUTTERS AND CUTTING TOOLS INCLUDING SAME; AND METHODS OF MANUFACTURE
#30SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLISHING METHOD USING THE SAME
#31POLISHING COMPOSITION, POLISHING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE
#32COMPOSITIONS AND METHODS FOR APPLYING ABRASIVE HARDFACING MATERIALS
#33SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING APPARATUS
#34METHOD FOR PREPARING CERIUM OXIDE NANOCOMPOSITE, CERIUM OXIDE NANOCOMPOSITE, AND CHEMICAL MECHANICAL POLISHING SOLUTION
#35METHOD FOR PREPARING ORGANIC-INORGANIC NANOCOMPOSITE PARTICLE DISPERSION LIQUID, ORGANIC-INORGANIC NANOCOMPOSITE PARTICLE DISPERSION LIQUID, AND CHEMICAL MECHANICAL POLISHING SOLUTION
#36ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLES
#37PDC CUTTER WITH UNIQUE MICROSTRUCTURE
#38DIAMOND ELECTROSTATIC SAND-PLANTING PROCESS
#39SHAPED ABRASIVE PARTICLES WITH SHARP TIPS
#40Methods of Forming an Abrasive Slurry and Methods for Chemical-Mechanical Polishing
#41ABRASIVE ARTICLES AND METHODS FOR FORMING SAME
#42LIQUID DISPERSION AND POWDER OF CERIUM BASED CORE-SHELL PARTICLES, PROCESS FOR PRODUCING THE SAME AND USES THEREOF IN POLISHING
#43Core Shell Silica Particles and Use for Malodor Reduction
#44POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
#45NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS
#46ABRASIVE ARTICLES AND METHODS OF FORMING SAME
#47TITANIUM DIOXIDE CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR POLISHING NICKEL SUBSTRATES
#48CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN AND METHOD OF POLISHING TUNGSTEN USING THE SAME
#49ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLES
#50POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
#51ABRASIVE PARTICLES INCLUDING COATING, ABRASIVE ARTICLE INCLUDING THE ABRASIVE PARTICLES, AND METHOD OF FORMING
#52ABRASIVE PARTICLES AND METHODS OF FORMING SAME
#53COMPOSITION FOR SEMICONDUCTOR PROCESSING AND POLISHING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME
#54SULFONIC ACID-MODIFIED COLLOIDAL SILICA
#55ABRASIVE DISC WITH VITRIFIED AGGLOMERATE ISLANDS
#56Unique PDC microstructure and the method of making it
#57Abrasive articles and methods for forming same
#58Core shell silica particles and use for malodor reduction
#59COMPOSITION FOR SEMICONDUCTOR PROCESS, METHOD FOR PREPARING THE SAME AND METHOD FOR PREPARING SEMICONDUCTOR DEVICE USING THE SAME
#60SHAPED ABRASIVE PARTICLES
#61METHOD AND APPARATUS FOR PRODUCING ENDLESS ABRASIVE ARTICLES AND A PRODUCED ABRASIVE ARTICLE
#62METHODS FOR POLISHING SEMICONDUCTOR SUBSTRATES
#63Magnetizable abrasive particle and method of making the same
#64CUBIC BORON NITRIDE SINTERED BODY AND COATED CUBIC BORON NITRIDE SINTERED BODY
#65Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment
#66Composite binding agent grinding wheel and preparation method thereof
#67SLURRY COMPOSITION FOR POLISHING ORGANIC FILM
#68BONDED ABRASIVE AND METHODS OF FORMING SAME
#69High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishing
#70Abrasive articles and methods for forming same
#71BONDED ABRASIVE ARTICLE AND METHOD OF MAKING THE SAME
#72ABRASIVE MEDIA BLENDS AND RELATED METHODS
#73Composition for chemical-mechanical polishing and chemical-mechanical polishing method
#74Abrasive particle including coating, abrasive article including the abrasive particles, and method of forming
#75Iron gradient in polycrystalline diamond compacts; blanks, cutters and cutting tools including same; and methods of manufacture
#76CMP COMPOSITIONS FOR POLISHING DIELECTRIC MATERIALS
#77COATED SUPER-ABRASIVE GRAINS, ABRASIVE GRAINS, AND WHEEL
#78ABRASIVE ARTICLES AND METHODS FOR FORMING SAME
#79SUPER-ABRASIVE GRAIN AND SUPER-ABRASIVE GRINDING WHEEL
#80Core Shell Silica Particles and Uses Thereof As an Anti-Bacterial Agent
#81POLISHING COMPOSITION, METHOD FOR MANUFACTURING POLISHING COMPOSITION, AND POLISHING METHOD
#82WELDING METHOD USING COATED ABRASIVE PARTICLES, COATED ABRASIVE PARTICLES, COATING SYSTEM AND SEALING SYSTEM
#83Partially shaped abrasive particles, methods of manufacture and articles containing the same
#84ABRASIVE ARTICLE AND METHOD FOR FORMING
#85POLISHING SLURRY COMPOSITION
#86ABRASIVE ARTICLES WITH VARYING SHAPED ABRASIVE PARTICLES
#87FIXED ABRASIVE ARTICLES AND METHODS OF FORMING SAME
#88ELONGATE ABRASIVE ARTICLE WITH ORIENTATIONALLY ALIGNED FORMED ABRASIVE PARTICLES
#89Intermediate raw material, and polishing composition and composition for surface treatment using the same
#90ELASTOMER-DERIVED CERAMIC STRUCTURES AND USES THEREOF
#91ABRASIVE WHEEL MAKER AND METHOD FOR FORMING AN ABRASIVE WHEEL
#92Abrasive article with microparticle-coated abrasive grains
#93SUPPORTED ABRASIVE PARTICLES, ABRASIVE ARTICLES, AND METHODS OF MAKING THE SAME
#94Method of producing anionically modified colloidal silica
#95VITRIFIED GRINDING STONE HAVING OPEN AND HOMOGENEOUS STRUCTURE
#96Abradable coating hBN filler material and method of manufacture
#97Chemical-mechanical polishing particle and polishing slurry composition comprising same
#98Shaped Ceramic Abrasive Grain, Method for Producing a Shaped Ceramic Abrasive Grain, and Abrasive Article
#99Method of treating a surface, surface-modified abrasive particles, and resin-bond abrasive articles
#100ABRASIVE ARTICLES AND METHODS OF FORMING SAME
#101Abrasive articles and methods of forming same
#102Polishing slurry composition enabling implementation of multi-selectivity
#103POLISHING SYSTEMS AND METHOD OF MAKING AND USING SAME
#104Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing
#105FIXED ABRASIVE ARTICLE
#106Abrasive article including shaped abrasive particles
#107ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLES
#108Agglomerate abrasive grain
#109CARBON ABRASIVE AND POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#110STRUCTURED ABRASIVES CONTAINING POLISHING MATERIALS FOR USE IN THE HOME
#111Abrasive particles and methods of forming same
#112Polishing composition, manufacturing method of polishing composition, polishing method, and manufacturing method of semiconductor substrate
#113Semiconductor substrate polishing methods
#114Calcium carbonate coated materials and methods of making and using same
#115Plate-like alumina particle and a manufacturing method for the same
#116ABRASIVE ARTICLES INCLUDING AGGREGATES OF SILICON CARBIDE IN A VITRIFIED BOND
#117SiC-bound hard material particles, porous component formed with SiC-bound diamond particles, method of producing same and use thereof
#118Alumina sintered body, abrasive grain, and grinding wheel
#119SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS
#120Abrasive article
#121Abrasive article including shaped abrasive particles
#122Slurry and polishing method
#123POLISHING COMPOSITION
#124Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
#125Shaped abrasive particles, methods of making, and abrasive articles including the same
#126Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives
#127Shaped abrasive particle including dopant material and method of forming same
#128POLISHING PAD AND COMPOSITION FOR MANUFACTURING THE SAME
#129Anticaking agent for hygroscopic fertilizer
#130Abrasive articles including conformable coatings and polishing system therefrom
#131Composition and method for metal CMP
#132ABRASIVE MATERIAL AND METHOD FOR MANUFACTURING SAME
#133Abrasive article including shaped abrasive particles
#134Coated abrasive article maker apparatus
#135Surface modified abrasive particles, abrasive articles and methods of forming thereof
#136Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process
#137Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
#138Liquid suspension of cerium oxide particles
#139Abrasive article and method of making the same
#140SINTERED POLYCRYSTALLINE CUBIC BORON NITRIDE MATERIAL
#141Polishing composition and method utilizing abrasive particles treated with an aminosilane
#142Particulate materials and methods of forming same
#143POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE, METHOD FOR MANUFACTURING THE POLISHING AGENT, AND METHOD FOR POLISHING SYNTHETIC QUARTZ GLASS SUBSTRATE
#144Abrasive article and method for forming
#145Abrasive articles and methods for forming same
#146ABRASIVE ARTICLES AND METHODS FOR FORMING SAME
#147SMALL PARTICLE COMPOSITIONS AND ASSOCIATED METHODS
#148Shaped abrasive particle and method of forming same
#149Increased particle loading by surface modification with polyethersilane
#150Composite particles, method of refining and use thereof
#151Use of magnetics with magnetizable abrasive particles, methods, apparatuses and systems using magnetics to make abrasive articles
#152Core shell silica particles and uses thereof as an anti-bacterial agent
#153RESIN BONDED-ABRASIVE ARTICLE HAVING MULTIPLE COLORS
#154Method and apparatus for producing endless abrasive articles and a produced abrasive article
#155MODIFIED COLLOIDAL SILICA AND METHOD FOR PRODUCING THE SAME, AND POLISHING AGENT USING THE SAME
#156Modified colloidal silica and method for producing the same, and polishing agent using the same
#157ELECTROFUSED ALUMINA GRAINS, PRODUCTION METHOD FOR ELECTROFUSED ALUMINA GRAINS, GRINDING STONE, AND COATED ABRASIVE
#158Polishing composition
#159Method of making magnetizable abrasive particles
#160STRUCTURED ABRASIVE ARTICLE INCLUDING FEATURES WITH IMPROVED STRUCTURAL INTEGRITY
#161Magnetizable abrasive particle and method of making the same
#162Magnetizable abrasive particles and abrasive articles including them
#163Functional abrasive particles, abrasive articles, and methods of making the same
#164Ceria composite particle dispersion, method for producing same, and polishing abrasive grain dispersion comprising ceria composite particle dispersion
#165CONGLOMERATE ABRASIVE PARTICLES, ABRASIVE ARTICLES INCLUDING THE SAME, AND METHODS OF MAKING THE SAME
#166SHAPED ABRASIVE PARTICLES WITH SHARP TIPS
#167Method for producing cationically modified silica, cationically modified silica dispersion, method for producing polishing composition using cationically modified silica, and polishing composition using cationically modified silica
#168Polishing composition, method for producing polishing composition, and polishing method
#169Abrasive articles and methods for forming same
#170SURFACE-MODIFIED COLLOIDAL CERIA ABRASIVE PARTICLES, PREPARATION METHOD THEREFOR, AND POLISHING SLURRY COMPOSITION CONTAINING SAME
#171TUNGSTEN BULK POLISHING METHOD WITH IMPROVED TOPOGRAPHY
#172Tungsten buff polishing compositions with improved topography
#173Plate-like alumina particle and a manufacturing method for the same
#174ABRASIVE GRAINS, MANUFACTURING METHOD THEREFOR, POLISHING SLURRY CONTAINING SAID ABRASIVE GRAINS, AND POLISHING METHOD USING SAID POLISHING SLURRY
#175Halogen and polyhalide mediated phenolic polymerization
#176Chemical mechanical polishing slurry composition and method for manufacturing semiconductor using the same
#177Silica-based composite fine particle dispersion and method for manufacturing same
#178Composition for conducting material removal operations and method for forming same
#179Polishing composition
#180Composite Particles, Method of Refining and Use Thereof
#181Method for producing cationically modified silica and cationically modified silica dispersion
#182Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate
#183Polishing composition
#184Polishing composition
#185Chemical mechanical polishing composition and method
#186POLISHING COMPOSITION, PRODUCTION METHOD OF POLISHING COMPOSITION, POLISHING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR SUBSTRATE
#187Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them
#188Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them
#189NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS
#190Polishing slurry composition
#191Polishing composition, polishing method, and method for manufacturing semiconductor substrate
#192Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
#193Polishing slurries for polishing semiconductor wafers
#194Cast steel projection material
#195ABRASIVE PARTICLES AND METHOD OF FORMING SAME
#196Abrasive article having a non-uniform distribution of openings
#197Surface modified abrasive particles, abrasive articles and methods of forming thereof
#198COATED ABRASIVES HAVING A SUPERSIZE LAYER INCLUDING AN ACTIVE FILLER
#199Abrasive articles and methods of forming the same
#200Coated abrasive article
#201Systems and methods for making abrasive articles
#202Friction material
#203Cerium-based abrasive material and process for producing same
#204Polishing composition
#205Slurry for polishing of integrated circuit packaging
#206Polishing method
#207Polishing composition and polishing method using same
#208Grinding material and production method of grinding material
#209Abrasive articles including aggregates of silicon carbide in a vitrified bond
#210Systems and methods for making abrasive articles
#211Sintered platelet-like randomly shaped abrasive particles and method of making same
#212Composition For Glass And Ceramic Polishing
#213Silica-based composite fine-particle dispersion, method for producing same, and polishing slurry including silica-based composite fine-particle dispersion
#214Fixed abrasive articles and methods of forming same
#215Chemical mechanical planarization slurry and method for forming same
#216Polishing agent, stock solution for polishing agent, and polishing method
#217Abrasive particles having a unique morphology
#218Modified colloidal silica and method for producing the same, and polishing agent using the same
#219Method for preparing an aluminum oxide polishing solution
#220Shaped abrasive particle including dopant material and method of forming same
#221Abrasive particles and methods of forming same
#222CMP slurry composition for polishing copper and polishing method using the same
#223Polishing composition and polishing method
#224NANOPARTICLE BASED CERIUM OXIDE SLURRIES
#225Composite particles, method of refining and use thereof
#226Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures
#227Silicon wafer polishing composition
#228Polishing composition
#229Abrasive material
#230Lubricated mechanical polishing
#231Method of polishing group III-V materials
#232Chemical-mechanical polishing composition comprising organic/inorganic composite particles
#233Methods of making diamond tables, cutting elements, and earth-boring tools
#234Abrasive particle-dispersion layer composite and polishing slurry composition including the same
#235Polishing composition
#236Abrasive particle-dispersion layer composite and polishing slurry composition including the same
#237Metal doped cerium oxide compositions
#238Ceramic grains and method for their production
#239Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
#240Composite abrasive with hard core and soft shell, manufacturing method and application method
#241Abrasive particles, abrasive articles, and methods of making and using the same
#242METHOD AND APPARATUS FOR PRODUCING ALUMINA MONOHYDRATE AND SOL GEL ABRASIVE GRAIN
#243Polishing composition, polishing method, and method for producing substrate
#244Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures
#245Polishing composition and method utilizing abrasive particles treated with an aminosilane
#246Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid
#247ABRASIVE GRAIN ON THE BASIS OF ELECTROFUSED ALUMINUM OXIDE WITH A SURFACE COATING COMPRISING TITANIUM OXIDE AND/OR CARBON
#248ABRASIVE ARTICLES
#249Shaped abrasive particle and method of forming same
#250Abrasive article including shaped abrasive particles
#251Core shell silica particles and uses thereof as an anti-bacterial agent
#252Core shell silica particles and use for malodor reduction
#253Metal oxide-polymer composite particles for chemical mechanical planarization
#254Liquid suspension of cerium oxide particles
#255Coated abrasive article maker apparatus
#256Method for producing multilayer abrasive particles
#257Conglomerate abrasive particles, abrasive articles including the same, and methods of making the same
#258Polishing composition
#259Compositions comprising silane modified metal oxides
#260POLISHING COMPOSITION
#261RASPBERRY-TYPE METAL OXIDE NANOSTRUCTURES COATED WITH CEO2 NANOPARTICLES FOR CHEMICAL MECHANICAL PLANARIZATION (CMP)
#262Slurry, polishing solution set, polishing solution, and substrate polishing method
#263Structured abrasive articles and methods of using the same
#264Cerium oxide abrasive, method for producing cerium oxide abrasive, and polishing method
#265Abrasive particles having a unique morphology
#266Polishing composition, method for producing polishing composition and polishing composition preparation kit
#267Abrasive material, method for producing same, and abrasive slurry containing same
#268Polishing composition and method for producing same
#269Polishing composition and method for producing same
#270Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
#271Aggregates of diamond with vitrified bond
#272Abrasive particles, method of making abrasive particles, and abrasive articles
#273Method for producing polished object and polishing composition kit
#274Polishing composition
#275Abrasive articles and methods for forming same
#276Abrasive articles and methods for forming same
#277Coated abrasives having a supersize layer including an active filler
#278ABRASIVE ARTICLE AND METHOD FOR MAKING SAME
#279Shaped abrasive particles and method of forming same
#280Composite shaped abrasive particles and method of forming same
#281Abrasive coated substrate and method for manufacturing thereof
#282Abrasive grains on basis of eutectic alumina zirconia
#283Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material
#284Chemical-mechanical polishing compositions comprising polyethylene imine
#285Polishing of hard substrates with soft-core composite particles
#286Abrasive, abrasive set, and method for abrading substrate
#287GLASS COATED CBN PARTICLES AND METHOD OF MAKING THEM
#288Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers
#289POLISHING COMPOSITION
#290Polishing composition
#291Abrasive article including shaped abrasive particles
#292Polishing slurry preventing agglomeration of charged colloids without loss of surface activity
#293Particulate materials and methods of forming same
#294Shaped abrasive particles, methods of making, and abrasive articles including the same
#295Shaped abrasive particle including dopant material and method of forming same
#296Polishing composition and method for producing substrate
#297Polishing composition, method for manufacturing polishing composition, and method for manufacturing polishing composition liquid concentrate
#298Abrasive article
#299Polishing composition and method utilizing abrasive particles treated with an aminosilane
#300Abrasive particles and production method thereof