COMPOSITION FOR POLISHING ALLOY MATERIAL AND METHOD FOR PRODUCING ALLOY MATERIAL USING SAME

CMP compositions and methods for selective removal of silicon nitride

Small particle compositions and associated methods

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

Contact release capsule useful for chemical mechanical planarization slurry

Polishing composition, polishing method using same, and method for producing substrate

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

Compositions of diamond particles having organic compounds attached thereto

ABRASIVE PARTICULATE MATERIAL INCLUDING SUPERABRASIVE MATERIAL HAVING A COATING OF METAL

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

Method and device for manufacturing elastic abrasive method for blasting the elastic abrasive including method for recycling the elastic abrasive and device for blasting the elastic abrasive including device for recycling the elastic abrasive

Abrasive composition and method for producing semiconductor substrate

Silica composite particles and method of preparing the same

Abrasive particle, polishing slurry, and method of manufacturing semiconductor device using the same

Polishing composition

Agglomerate abrasive grain comprising incorporated hollow microspheres

SiCN and SiN polishing slurries and polishing methods using the same

ABRASIVE PARTICLES HAVING A UNIQUE MORPHOLOGY

Polishing method

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

Abrasive, abrasive set, and method for abrading substrate

Polishing agent, polishing agent set, and substrate polishing method

Coated particles and related methods

Liquid cleaning and/or cleansing composition

ABRASIVE ARTICLE AND METHOD OF MAKING SAME

Polishing composition

Method for producing elastic grinding material, elastic grinding material, and blasting method using said elastic grinding material

Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of borophosphosilicate glass (BPSG) material in the presence of a CMP composition comprising anionic phosphate or phosphonate

Shaped abrasive particle and method of forming same

COMPOSITIONS, KITS, SYSTEMS AND METHODS FOR SHARPENING CUTTING BLADES

Composite shaped abrasive particles and method of forming same

Particulate materials and methods of forming same

Abrasive particles having a unique morphology

Abrasive particles having a unique morphology

Polishing composition

AGGREGATE ABRASIVE GRAINS FOR ABRADING OR CUTTING TOOLS PRODUCTION

GST CMP slurries

Methods of forming earth-boring tools

CMP composition containing zirconia particles and method of use

Abrasive products and methods for finishing surfaces

Abrasive products and methods for fine polishing of ophthalmic lenses

Contact release capsule useful for chemical mechanical planarization slurry

Abrasive article having a non-uniform distribution of openings

SYSTEMS AND METHODS FOR SHARPENING CUTTING BLADES

Composite shaped abrasive particles and method of forming same

Abrasive articles including abrasive particulate materials, coated abrasives using the abrasive particulate materials and methods of forming

Composition and method for polishing aluminum semiconductor substrates

Silica having metal ions absorbed thereon and fabricating method thereof

Coated abrasive aggregates and products containg same

Aggregate abrasives for abrading or cutting tools production

ABRASIVE AGGREGATE INCLUDING SILICON CARBIDE AND A METHOD OF MAKING SAME

ABRASIVE SEGMENT COMPRISING ABRASIVE AGGREGATES INCLUDING SILICON CARBIDE PARTICLES

Coated particles and related methods

Abrasive articles, method for their preparation and method of their use

Method of electrostatic deposition of particles, abrasive grain and articles

Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process

GROUP III NITRIDE CRYSTAL SUBSTRATE, EPILAYER-CONTAINING GROUP III NITRIDE CRYSTAL SUBSTRATE, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

COMPOSITE MICRON DIAMOND PARTICLE AND METHOD OF MAKING

Molten grains of alumina-zirconia

Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same

Coated Abrasive Products Containing Aggregates

Method for manufacturing encapsulated superhard material

RASPBERRY-TYPE METAL OXIDE NANOSTRUCTURES COATED WITH CEO2 NANOPARTICLES FOR CHEMICAL MECHANICAL PLANARIZATION (CMP)

Hydrophilic and hydrophobic silane surface modification of abrasive grains

Polishing slurry and polishing method

Machinable metal/diamond metal matrix composite compound structure and method of making same

Process for coating diamond with refractory metal carbide and metal

Methods of forming diamond particles having organic compounds attached thereto and compositions thereof

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

COATED SOLID PARTICLES

Abrasive molten grains

Abrasive grain agglomerates, process for the production thereof and the use thereof for producing abrasives

Forming conductive features of electronic devices

Polishing composition

DENTAL POLISHING DEVICES AND METHOD OF POLISHING DENTAL SURFACES

POLISHING METHOD, POLISHING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

Aggregate abrasive grains for abrading or cutting tools production

Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method

Polycrystalline compacts including in-situ nucleated grains, earth-boring tools including such compacts, and methods of forming such compacts and tools

POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE

Polishing composition and polishing method using the same

Liquid resin composition for abrasive articles

Diamond metal composite

POLISHING SLURRY, PROCESS FOR PRODUCING THE SAME, POLISHING METHOD AND PROCESS FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK

GLASS POWDERS, METHODS FOR PRODUCING GLASS POWDERS AND DEVICES FABRICATED FROM SAME

AEROSOL METHOD AND APPARATUS, PARTICULATE PRODUCTS, AND ELECTRONIC DEVICES MADE THEREFROM

Coated cBN

Compositions comprising silane modified metal oxides

Polymer particles having improved mechanical properties and applications of same

Abrasive article with improved packing density and mechanical properties and method of making

Liquid suspensions and powders of cerium oxide particles and polishing applications thereof

Abrasive particles having a unique morphology

Abrasive particles having a unique morphology

Abrasive grains having unique features

Polishing liquid composition

Abrasive compact with improved machinability

CMP method for metal-containing substrates

Slurry for polishing phase change material and method for patterning polishing phase change material using the same

Hydrophilic and hydrophobic silane surface modification of abrasive grains

Compositions for polishing aluminum/copper and titanium in damascene structures

Fixed abrasive articles utilizing coated abrasive particles

Particulate silica

COATED ABRASIVES

Method of producing polishing material comprising diamond clusters

Polishing process of a semiconductor substrate

Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same

Polishing slurry and polishing method

Abrasive grain based on melted spherical corundum

DISPERSION OF ZIRCONIUM DIOXIDE AND ZIRCONIUM MIXED OXIDE

Abrasive particles comprising nano-sized silicon carbide particles surface-coated with silica, and methods using same

Coated abrasive grains, method and for the production thereof as well as the use thereof for producing abrasives

Composite slurries of nano silicon carbide and alumina

POLISHING LIQUID AND POLISHING METHOD

Polishing composition and method utilizing abrasive particles treated with an aminosilane

Polishing composition and method utilizing abrasive particles treated with an aminosilane

Method for chemical mechanical planarization of chalcogenide materials

ABRASIVE TOOL INCLUDING AGGLOMERATE PARTICLES AND AN ELASTOMER, AND RELATED METHODS

COATED ABRASIVES

Free radical-forming activator attached to solid and used to enhance CMP formulations

Polymeric microgels for chemical mechanical planarization (CMP) processing

Porous abrasive articles with agglomerated abrasives and method for making the agglomerated abrasives

Metal-polishing liquid and polishing method

Agglomerate abrasive grains and methods of making the same

Coated nickel-containing powders

Coated abrasive products containing aggregates

Method of polishing hard crystal substrate

Compositions for polishing aluminum/copper and titanium in damascene structures

MEMBRANE ELECTRODE ASSEMBLIES FOR USE IN FUEL CELLS

CMP of copper/ruthenium/tantalum substrates

Spinous silica-based sol and method of producing the same

Slurry compositions and methods of polishing a layer using the slurry compositions

Abrasive Articles with Novel Structures and Methods for Grinding

Coated Abrasives

Palladium-containing particles, method and apparatus of manufacturing palladium-containing devices made therefrom

CHEMICAL MECHANICAL POLISHING SLURRY, CMP PROCESS AND ELECTRONIC DEVICE PROCESS

Mixed Rare Earth Oxide, Mixed Rare Earth Fluoride, Cerium-Based Abrasive Using the Materials and Production Processes Thereof

Aerosol method and apparatus, particulate products, and electronic devices made therefrom

Aerosol method and apparatus, particulate products, and electronic devices made therefrom

Substantially spherical composite ceria/titania particles

Pre-coated particles for chemical mechanical polishing

Polishing slurry and polishing method

Polishing material comprising diamond clusters

Metal polishing slurry

Coated Abrasives

Aerosol method and apparatus, particulate products, and electronic devices made therefrom

Polycrystalline diamond carbide composites

Method for improving mechanical properties of polymer particles and its applications

POLISHING COMPOSITION

Coated abrasives

Method for coating abrasives

Chemical mechanical polishing particles and slurry and method of producing the same

Security features incorporating photoluminescent phosphor powders and methods for making security features

Preparation of particles by hydrolysis of a metal cation in the presence of a polymer

Coated silver-containing particles, method and apparatus of manufacture, and silver-containing devices made therefrom

Coated silver-containing particles, method and apparatus of manufacture, and silver-containing devices made therefrom

Small particle compositions and associated methods

Polishing composition for a semiconductor substrate

Agglomerate abrasive grains and methods of making the same

Cerium-based abrasive, abrasive slurry, and production of cerium-based abrasive

Diamond particle for sintering tool and manufacturing method thereof and sintering tool using the same

Self-contained conditioning abrasive article

Composite particle comprising an abrasive grit

Engineered non-polymeric organic particles for chemical mechanical planarization

Polishing composition and polishing method using same

Electroluminescent phosphor powders, methods for making phosphor powders and devices incorporating same

Sulfur-containing phosphor powders, methods for making phosphor powders and devices incorporating same

Abrasive articles with novel structures and methods for grinding

Alumina particles, production process thereof, composition comprising the particles and alumina slurry for polishing

Free radical-forming activator attached to solid and used to enhance CMP formulations

Carbon nanoparticles and composite particles and process of manufacture

Porous abrasive articles with agglomerated abrasives

Copper containing abrasive particles to modify reactivity and performance of copper CMP slurries

Abrasive with improved abrasive properties comprising a coating of complex oxide and silicate binding agent

Polishing composition for a semiconductor substrate

Hydrothermal synthesis of cerium-titanium oxide for use in CMP

CMP composition containing surface-modified abrasive particles

Particles for use as proppants or in gravel packs, methods for making and using the same

METHODS OF CONTROLLING THE PROPERTIES OF ABRASIVE PARTICLES FOR USE IN CHEMICAL-MECHANICAL POLISHING SLURRIES

Polymer-coated particles for chemical mechanical polishing

Method of manufacturing of polymer-coated particles for chemical mechanical polishing

Nickel powders, methods for producing powders and devices fabricated from same

Planarizing solutions including abrasive elements, and methods for manufacturing and using such planarizing solutions

Polishing composition

Cerium-based abrasive, abrasive slurry, and production of cerium-based abrasive

Flow machine with a ceramic abradable

Polishing compositions for controlling metal interconnect removal rate in semiconductor wafers

Cathodoluminescent phosphor powders, methods for making phosphor powders and devices incorporating same

Preparation of particles by hydrolysis of a metal cation in the presence of a polymer

Glass powders, methods for producing glass powders and devices fabricated from same

Alumina-yttria particles and methods of making the same

Method of forming a flexible abrasive sheet article

Aerosol method and apparatus, particulate products, and electronic devices made therefrom

Porous abrasive articles with agglomerated abrasives and method for making the agglomerated abrasives

Aerosol method and apparatus, coated particulate products, and electronic devices made therefrom

Electroluminescent phosphor powders, methods for making phosphor powders, and devices incorporating same

Coated nickel-containing powders, methods and apparatus for producing such powders and devices fabricated from same

Chemical-mechanical planarization slurries and powders and methods for using same

Planarizing solutions including abrasive elements, and methods for manufacturing and using such planarizing solutions

Aerosol method and apparatus, particulate products, and electronic devices made therefrom

COMPOSITIONS COMPRISING GLASS PARTICLES AND METHODS OF DEPOSITING THE SAME

Coated silver-containing particles, method and apparatus of manufacture, and silver-containing devices made therefrom

Polishing fluid and polishing method

Abrasive grain with an abrasive coating

Raised island abrasive, lapping apparatus and method of use

Method of centerless grinding

Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive

Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon

Abrasive materials for use in abrasive-jet systems and associated materials, apparatuses, systems, and methods