Patents-Review.com
ClassID:

104221 ⎘

C09K3/1454 - CPC Classification

Classification description:

Materials not provided for elsewhere; Anti-slip materials; Abrasives Abrasive powders, suspensions and pastes for polishing

Sub-classes:
Recent Application in this class:
#1
20260103391
2026-04-16

METHOD FOR MANUFACTURING CERIA NANOPARTICLE FOR SEMICONDUCTOR CMP PROCESS USING SOLID-STATE METHOD

 #2
20250361432
2025-11-27

Slurry Composition for Chemical Mechanical Polishing

 #3
20250223479
2025-07-10

CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN AND METHOD FOR POLISHING TUNGSTEN USING THE SAME

 #4
20250154398
2025-05-15

METHOD FOR PRODUCING ABRASIVE GRAINS, COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, AND POLISHING METHOD

 #5
20250129279
2025-04-24

SLURRY, SCREENING METHOD, AND POLISHING METHOD

 #6
20250084294
2025-03-13

SLURRY AND POLISHING METHOD

 #7
20240425737
2024-12-26

SLURRY, SCREENING METHOD, AND POLISHING METHOD

 #8
20240327677
2024-10-03

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER

 #9
20240199917
2024-06-20

NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS

 #10
20240174892
2024-05-30

POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

 #11
20240043721
2024-02-08

Ruthenium CMP chemistry based on halogenation

 #12
20230287244
2023-09-14

Polishing liquid and method for manufacturing glass substrate

 #13
20230265313
2023-08-24

Polishing Compositions and Methods of Using Same

 #14
20230197455
2023-06-22

METHODS FOR POLISHING SEMICONDUCTOR SUBSTRATES

 #15
20230118455
2023-04-20

Ruthenium CMP chemistry based on halogenation

 #16
20230104949
2023-04-06

Slurry composition for chemical mechanical polishing

 #17
20230070776
2023-03-09

CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE

 #18
20230042029
2023-02-09

Composite binding agent grinding wheel and preparation method thereof

 #19
20230026568
2023-01-26

CHEMICAL MECHANICAL POLISHING SOLUTION

 #20
20220406612
2022-12-22

Methods for polishing dielectric layer in forming semiconductor device

 #21
20220267643
2022-08-25

COMPOSITIONS FOR TUNGSTEN ETCHING INHIBITION

 #22
20220199416
2022-06-23

Methods for polishing dielectric layer in forming semiconductor device

 #23
20220195246
2022-06-23

Chemical mechanical polishing slurry composition and method of polishing metal layer

 #24
20220145131
2022-05-12

Slurry composition for polishing silicon oxide film, and polishing method using same

 #25
20220145130
2022-05-12

Polishing compositions and methods of using same

 #26
20220127495
2022-04-28

POLISHING SLURRY COMPOSITION

 #27
20220112401
2022-04-14

CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAME

 #28
20220089910
2022-03-24

Calcium carbonate slurry

 #29
20220033681
2022-02-03

BLASTING ABRASIVES AND METHOD OF PRODUCING BLASTING ABRASIVES

 #30
20220033680
2022-02-03

Slurry and polishing method

 #31
20210402569
2021-12-30

Slurry scraping mechanism and applying and scraping device used in SG abrasive production process

 #32
20210348030
2021-11-11

Polishing liquid

 #33
20210348027
2021-11-11

MAGNETIC POLISHING SLURRY AND METHOD FOR POLISHING A WORKPIECE

 #34
20210324237
2021-10-21

Slurry, and polishing method

 #35
20210309884
2021-10-07

Slurry, screening method, and polishing method

 #36
20210301179
2021-09-30

Slurry and polishing method

 #37
20210269676
2021-09-02

Polishing slurry, method for polishing glass, and method for manufacturing glass

 #38
20210261825
2021-08-26

Chemical mechanical polishing composition, chemical mechanical polishing slurry and method for polishing substrate

 #39
20210261824
2021-08-26

Polishing agent, polishing method, and liquid additive for polishing

 #40
20210261822
2021-08-26

Barrier ruthenium chemical mechanical polishing slurry

 #41
20210261821
2021-08-26

Slurry and polishing method

 #42
20210261820
2021-08-26

Slurry, polishing solution production method, and polishing method

 #43
20210246346
2021-08-12

Slurry, method for producing polishing liquid, and polishing method

 #44
20210246334
2021-08-12

POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #45
20210206920
2021-07-08

Derivatized polyamino acids

 #46
20210130650
2021-05-06

Chemical mechanical polishing slurry composition and method of polishing metal layer

 #47
20210115335
2021-04-22

Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same

 #48
20210108106
2021-04-15

Polishing compositions and methods of use thereof

 #49
20210079265
2021-03-18

Polishing slurry, method for polishing glass, and method for manufacturing glass

 #50
20210071037
2021-03-11

Polishing liquid, polishing liquid set and polishing method

 #51
20210062089
2021-03-04

Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices

 #52
20210062057
2021-03-04

SLURRY SCREEDING MECHANISM AND COATING AND SCREEDING APPARATUS USED IN PRODUCTION PROCESS OF SG ABRASIVE

 #53
20210062043
2021-03-04

Composition and method for polysilicon CMP

 #54
20210054233
2021-02-25

Polishing liquid, polishing liquid set, and polishing method

 #55
20210024780
2021-01-28

Polishing composition, manufacturing method of polishing composition, polishing method, and manufacturing method of semiconductor substrate

 #56
20200399504
2020-12-24

Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate

 #57
20200392375
2020-12-17

Slurry composition and method of manufacturing integrated circuit device by using the same

 #58
20200255713
2020-08-13

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

 #59
20200239736
2020-07-30

Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates

 #60
20200239734
2020-07-30

Acid polishing composition and method of polishing a substrate having enhanced defect inhibition

 #61
20200194278
2020-06-18

Roughness reduction methods for materials using illuminated etch solutions

 #62
20200181453
2020-06-11

Method of polishing substrate and polishing composition set

 #63
20200172760
2020-06-04

Composition and method for metal CMP

 #64
20200152471
2020-05-14

Polishing method

 #65
20200048551
2020-02-13

Chemical mechanical planarization composition for polishing oxide materials and method of use thereof

 #66
20200048516
2020-02-13

Composition including a plurality of abrasive particles and method of using same

 #67
20200032108
2020-01-30

Chemical mechanical planarization of films comprising elemental silicon

 #68
20200032104
2020-01-30

Method for polishing glass substrate, method for manufacturing glass substrate, method for manufacturing magnetic-disk glass substrate, method for manufacturing magnetic disk, polishing liquid, and method for reducing cerium oxide

 #69
20200024482
2020-01-23

Polishing slurry, method of manufacturing the same, and method of manufacturing semiconductor device

 #70
20200002575
2020-01-02

Calcium carbonate slurry

 #71
20190367777
2019-12-05

Polishing composition

 #72
20190359868
2019-11-28

Composite particles, method of refining and use thereof

 #73
20190359855
2019-11-28

Altering shear thickening in fumed silica suspensions using nanoparticles

 #74
20190352537
2019-11-21

Polishing liquid and polishing method

 #75
20190300749
2019-10-03

Barrier ruthenium chemical mechanical polishing slurry

 #76
20190292406
2019-09-26

Polishing slurry and method of polishing substrate by using the polishing slurry

 #77
20190153263
2019-05-23

Abrasive, polishing composition, and polishing method

 #78
20190136089
2019-05-09

Polishing agent, polishing method, and liquid additive for polishing

 #79
20190119525
2019-04-25

Composition for conducting material removal operations and method for forming same

 #80
20190092974
2019-03-28

Polishing composition, method for producing polishing composition, polishing method, and method for producing semiconductor substrate

 #81
20190085210
2019-03-21

Production method of polishing composition

 #82
20190085206
2019-03-21

Chemical mechanical polishing method for cobalt

 #83
20190010359
2019-01-10

Polishing slurry and polishing material

 #84
20180362807
2018-12-20

Organic film CMP slurry composition and polishing method using same

 #85
20180277384
2018-09-27

Slurry for polishing of integrated circuit packaging

 #86
20180258319
2018-09-13

Polishing liquid, polishing liquid set, and substrate polishing method

 #87
20180257199
2018-09-13

Sintered vitrified superfinishing grindstone

 #88
20180254193
2018-09-06

Polishing slurry for cobalt-containing substrate

 #89
20180243877
2018-08-30

DOUBLE-FACE POLISHING DEVICE AND METHOD CAPABLE OF CONTROLLING RIGIDITY OF POLISHING PAD THROUGH CLUSTER DYNAMIC MAGNETIC FIELD

 #90
20180127627
2018-05-10

Silica-based polishing particle and abrasive

 #91
20180030313
2018-02-01

METHOD FOR POLISHING SILICON WAFER AND SURFACE TREATMENT COMPOSITION

 #92
20180016468
2018-01-18

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

 #93
20170330763
2017-11-16

Semiconductor treatment composition and treatment method

 #94
20170313114
2017-11-02

System and Method for Scoring and Applying a Pigment Solution to a Substrate

 #95
20170283673
2017-10-05

Composite particles, method of refining and use thereof

 #96
20170260436
2017-09-14

Abrasives, polishing composition, and polishing method

 #97
20170152421
2017-06-01

Metal doped cerium oxide compositions

 #98
20170087683
2017-03-30

Polishing a ceramic component using a formulated slurry

 #99
20170081552
2017-03-23

Polishing composition, polishing method, and method for producing substrate

 #100
20170044403
2017-02-16

Polishing composition containing ceria abrasive

 #101
20170002233
2017-01-05

Abrasive particles, polishing slurry and method of fabricating abrasive particles

 #102
20160272860
2016-09-22

Cerium oxide abrasive, method for producing cerium oxide abrasive, and polishing method

 #103
20160272846
2016-09-22

Polishing composition, method for producing polishing composition and polishing composition preparation kit

 #104
20160257856
2016-09-08

Polishing composition containing ceria abrasive

 #105
20160244639
2016-08-25

Composition and method for polishing memory hard disks exhibiting reduced edge roll-off

 #106
20160200943
2016-07-14

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

 #107
20160118073
2016-04-28

Method for manufacturing glass substrate, method for manufacturing magnetic disk, and polishing liquid composition for glass substrate

 #108
20160075564
2016-03-17

Method of manufacturing cerium dioxide powder and cerium dioxide powder

 #109
20160027663
2016-01-28

Method for chemical mechanical polishing substrates containing ruthenium and copper

 #110
20160002500
2016-01-07

Polishing composition

 #111
20160002050
2016-01-07

Nano-diamond dispersion solution and method for preparing same

 #112
20150376461
2015-12-31

Colloidal silica chemical-mechanical polishing concentrate

 #113
20150376460
2015-12-31

Methods for fabricating a chemical-mechanical polishing composition

 #114
20150376459
2015-12-31

Colloidal silica chemical-mechanical polishing composition

 #115
20150376458
2015-12-31

Colloidal silica chemical-mechanical polishing composition

 #116
20150184028
2015-07-02

Polishing slurry and substrate polishing method using the same

 #117
20150132958
2015-05-14

Contact release capsule useful for chemical mechanical planarization slurry

 #118
20150079789
2015-03-19

Abrasive composition and method for producing semiconductor substrate

 #119
20150021292
2015-01-22

Polishing agent for synthetic quartz glass substrate

 #120
20140295738
2014-10-02

Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the same

 #121
20140263174
2014-09-18

System and method for scoring and applying a pigment solution to a substrate

 #122
20140069021
2014-03-13

Bonded abrasive article and method of forming

 #123
20130280910
2013-10-24

Contact release capsule useful for chemical mechanical planarization slurry

 #124
20120304545
2012-12-06

Nano-diamond dispersion solution and method for preparing same

 #125
20120132045
2012-05-31

SUSPENSION OF ABRASIVE GRAINS

 #126
20110314745
2011-12-29

Method of producing nodular silica sol

 #127
20110244770
2011-10-06

ABRASIVE SLURRY FORMULATIONS CONTAINING NANO AND MICRO SPHERES ADDITIVES OR SELF-ASSEMBLED MONOLAYERS

 #128
20110107680
2011-05-12

Method for preparing cerium carbonate

 #129
20110100346
2011-05-05

Abrasive grain powder

 #130
20110083374
2011-04-14

Bonded abrasive article and method of forming

 #131
20100243950
2010-09-30

POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE

 #132
20100187470
2010-07-29

FINE CERIUM OXIDE POWDER AND PREPARING METHOD THE SAME AND CMP SLURRY COMPRISING THE SAME

 #133
20100146864
2010-06-17

Nodular Silica Sol and Method of Producing the Same

 #134
20100062687
2010-03-11

Cerium oxide powder for abrasive and CMP slurry comprising the same

 #135
20100037531
2010-02-18

Abrasive composition and article formed therefrom

 #136
20090239380
2009-09-24

Polishing liquid for metal and polishing method using the same

 #137
20090194504
2009-08-06

METHOD FOR PRODUCING ABRASIVE COMPOSITION

 #138
20090113809
2009-05-07

FINE PARTICLES OF OXIDE CRYSTAL AND SLURRY FOR POLISHING WHICH CONTAINS THE FINE PARTICLES

 #139
20090101168
2009-04-23

Durable modification of the wetting properties of a surface

 #140
20090064597
2009-03-12

Polishing slurry and polishing material using same

 #141
20090019781
2009-01-22

Mixture article for cleaning superficially-adhered substances

 #142
20080307712
2008-12-18

Ceria based glass polishing composition and a process for the manufacture thereof

 #143
20080257862
2008-10-23

Method of chemical mechanical polishing of a copper structure using a slurry having a multifunctional activator

 #144
20080200098
2008-08-21

Polishing slurry for aluminum and aluminum alloys

 #145
20080145306
2008-06-19

Method For Producing Spherical Mixed Oxide Powders In A Hot Wall Reactor

 #146
20070148978
2007-06-28

Slurry compositions, methods of polishing polysilicon layers using the slurry compositions and methods of manufacturing semiconductor devices using the slurry compositions

 #147
20070010098
2007-01-11

Use of CMP for aluminum mirror and solar cell fabrication

 #148
20060289826
2006-12-28

Polishing slurry and polishing method

 #149
20060258267
2006-11-16

Polishing composition and polishing method using same

 #150
20060241006
2006-10-26

Method of washing a polished object

 #151
20060165988
2006-07-27

Carbon nanoparticles and composite particles and process of manufacture

 #152
20060163206
2006-07-27

Novel polishing slurries and abrasive-free solutions having a multifunctional activator

 #153
20060118760
2006-06-08

Slurry composition and methods for chemical mechanical polishing

 #154
20060116054
2006-06-01

Polishing body

 #155
20060075686
2006-04-13

Polishing body

 #156
20050204639
2005-09-22

Polishing composition and polishing method

 #157
20050112892
2005-05-26

Chemical mechanical abrasive slurry and method of using the same

 #158
16166085
2020-03-24

Chemical mechanical polishing composition and method for tungsten

 #159
15297716
2017-10-10

Aqueous compositions of low abrasive silica particles

 #160
15297706
2017-10-31

Aqueous compositions of stabilized aminosilane group containing silica particles