C09K3/1472 - CPC Classification Index

#1

20240123572

2024-04-18

PROCESSING METHOD AND SYSTEM OF SUSPENSION ABRASIVE JETS

#2

20240050792

2024-02-15

Azeotropic or azeotropic-like composition comprising hydrogen fluoride and 1,1,2-trifluoroethane, 1-chloro-2,2-difluoroethane, or 1,2-dichloro-1-fluoroethane

#3

20220403130

2022-12-22

Foam Abrasive and Method for Producing Same

#4

20220356065

2022-11-10

SURFACE MODIFIED SILANIZED COLLOIDAL SILICA PARTICLES

#5

20220259048

2022-08-18

NANODIAMOND DISPERSION COMPOSITION

#6

20220023693

2022-01-27

Azeotropic or azeotropic-like composition comprising hydrogen fluoride and 1,1,2-trifluoroethane, 1-chloro-2,2-difluoroethane, or 1,2-dichloro-1-fluoroethane

#7

20200087554

2020-03-19

Ceria-based composite fine particle dispersion, production method therefor, and polishing abrasive grain dispersion including ceria-based composite fine particle dispersion

#8

20200087539

2020-03-19

Liquid suspension of cerium oxide particles

#9

20180362807

2018-12-20

Organic film CMP slurry composition and polishing method using same

#10

20180320024

2018-11-08

Abrasive, abrasive set, and method for polishing substrate

#11

20180298257

2018-10-18

Chemical-mechanical processing slurry and methods for processing a nickel substrate surface

#12

20170348820

2017-12-07

Chemical-mechanical processing slurry and methods for processing a nickel substrate surface

#13

20170239780

2017-08-24

Lubricated mechanical polishing

#14

20170218241

2017-08-03

Composition containing 2,3,3,3-tetrafluoropropene and 1,2-difluoroethylene

#15

20170183539

2017-06-29

Abrasive particle-dispersion layer composite and polishing slurry composition including the same

#16

20170015868

2017-01-19

Polishing composition and method for polishing magnetic disk substrate

#17

20160325398

2016-11-10

Polishing abrasive particle, production method therefore, polishing method, polishing device, and slurry

#18

20160319159

2016-11-03

Abrasive, abrasive set, and method for polishing substrate

#19

20160312069

2016-10-27

Liquid suspension of cerium oxide particles

#20

20160068730

2016-03-10

METHOD FOR PRODUCTION OF PHOTOVOLTAIC WAFERS AND ABRASIVE SLURRY

#21

20150267084

2015-09-24

Slurry for chemical-mechanical polishing of metals and use thereof

#22

20150135602

2015-05-21

Abrasive agent manufacturing method

#23

20150052822

2015-02-26

Lapping slurry having a cationic surfactant

#24

20150031205

2015-01-29

Polishing method

#25

20150030650

2015-01-29

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

#26

20150017607

2015-01-15

Stabilized, water-jet slurry apparatus and method

#27

20150000208

2015-01-01

Slurry and method for producing slurry

#28

20140370707

2014-12-18

Polishing liquid for metal and polishing method

#29

20140363973

2014-12-11

CMP polishing liquid and polishing method

#30

20130228160

2013-09-05

METHOD FOR PRODUCTION OF PHOTOVOLTAIC WAFERS AND ABRASIVE SLURRY

#31

20130112914

2013-05-09

Slurry Composition For Polishing And Method Of Manufacturing Phase Change Memory Device Using The Same

#32

20130092651

2013-04-18

Slurry for chemical-mechanical polishing of copper and use thereof

#33

20130078811

2013-03-28

Slurry for chemical-mechanical polishing of metals and use thereof

#34

20130059439

2013-03-07

CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONIC COMPONENT

#35

20120299158

2012-11-29

CMP POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND ELECTRONIC COMPONENT

#36

20120164924

2012-06-28

COMPOSITIONS AND METHODS FOR REMOVING SCRATCHES FROM PLASTIC SURFACES

#37

20120145950

2012-06-14

Ultrapure colloidal silica for use in chemical mechanical polishing applications

#38

20120094491

2012-04-19

CMP polishing liquid and polishing method

#39

20110225897

2011-09-22

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

#40

20110124541

2011-05-26

Fluorinated Nano Diamond and Dispersion Thereof, and Process for Production of the Same

#41

20110005143

2011-01-13

POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE

#42

20100330809

2010-12-30

POLISHING LIQUID FOR METALS

#43

20100311630

2010-12-09

Surface treatment composition, surface treatment method, and method for manufacturing semiconductor device

#44

20100248480

2010-09-30

CHEMICAL MECHANICAL POLISHING COMPOSITIONS FOR COPPER AND ASSOCIATED MATERIALS AND METHOD OF USING SAME

#45

20100072418

2010-03-25

Polishing slurry

#46

20090307986

2009-12-17

Polishing composition and making method thereof for polishing a substrate

#47

20090283718

2009-11-19

Method for preparing fluorinated nanodiamond liquid dispersion

#48

20090215269

2009-08-27

INTEGRATED CHEMICAL MECHANICAL POLISHING COMPOSITION AND PROCESS FOR SINGLE PLATEN PROCESSING

#49

20090098806

2009-04-16

Compositions and methods for removing scratches from plastic surfaces

#50

20080139089

2008-06-12

Method of polishing hard crystal substrate

#51

20080102735

2008-05-01

Concentrated abrasive slurry compositions, methods of production, and methods of use thereof

#52

20070254964

2007-11-01

Ultrapure colloidal silica for use in chemical mechanical polishing applications

#53

20070200089

2007-08-30

Polishing liquid for metals

#54

20070087667

2007-04-19

Polishing slurries

#55

20070075292

2007-04-05

Ultrapure colloidal silica for use in chemical mechanical polishing applications

#56

20070075291

2007-04-05

CMP slurry, preparation method thereof and method of polishing substrate using the same

#57

20060236615

2006-10-26

Compositions and methods for removing scratches from plastic surfaces

#58

20060124593

2006-06-15

Colloidal silica based chemical mechanical polishing slurry

#59

20050127027

2005-06-16

CMP for corrosion-free CoFe elements for magnetic heads

#60

20050037034

2005-02-17

Method, apparatus, and composition for treating acne

#61

20050023246

2005-02-03

Methods and devices for modifying a substrate surface