108220 ⎘
Special methods for preparing compositions containing mixtures of detergents ; Methods for using cleaning compositions; Special cleaning or washing methods characterised by the objects to be cleaned "Hard" surfaces Electronic devices, e.g. PCBs or semiconductors
Treatment solution and method of applying a passivating layer
#902Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
#903Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution
#904Cleaning liquid and cleaning method using the same
#905Compositions for cleaning ion implanted photoresist in front end of line applications
#906Cleaning composition for semiconductor substrates
#907Process for removing contaminant from a surface and composition useful therefor description
#908Two step process for post ash cleaning for Cu/low-k dual damascene structure with metal hard mask
#909TWO STEP PROCESS FOR POST ASH CLEANING FOR CU/LOW-K DUAL DAMASCENE STRUCTURE WITH METAL HARD MASK
#910Substrate cleaning processes through the use of solvents and systems
#911CLEANING WAFER INCLUDING DETERGENT LAYER FOR EXPOSURE APPARATUS OF IMMERSION LITHOGRAPHY SYSTEM, COMPOSITION OF DETERGENT LAYER, METHOD OF USING CLEANING WAFER AND APPLICATION SYSTEM
#912AZEOTROPIC SOLVENT COMPOSITION AND MIXED SOLVENT COMPOSITION
#913COMPOSITION FOR CLEANING SUBSTRATES AND METHOD OF FORMING GATE USING THE COMPOSITION
#914Method for cleaning silicon wafer
#915Cleaning liquid and cleaning method for electronic material
#916Clean chemistry composition, method of manufacturing same, and system making use of same
#917Two step cleaning process to remove resist, etch residue, and copper oxide from substrates having copper and low-K dielectric material
#918Method for forming a photoresist pattern
#919Solvent For Cleaning Semiconductor Manufacturing Apparatus
#920Cleaner Composition
#921FORMULATIONS FOR CLEANING MEMORY DEVICE STRUCTURES
#922IMPROVED ACIDIC CHEMISTRY FOR POST-CMP CLEANING
#923Methods of cleaning a semiconductor device and methods of manufacturing a semiconductor device using the same
#924Cleaning solutions and methods of cleaning boards using the same
#925Silicon wafer etching compositions
#926Stripper Containing an Acetal or Ketal for Removing Post-Etched Photo-Resist, Etch Polymer and Residue
#927Fluorinated sulfonamide surfactants for aqueous cleaning solutions
#928NON-HERMETIC ENCAPSULANT REMOVAL FOR MODULE REWORK
#929Copper passivating post-chemical mechanical polishing cleaning composition and method of use
#930Integrated circuit system with clean surfaces
#931Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device
#932SUBSTRATE WATER-REMOVING AGENT, AND WATER-REMOVING METHOD AND DRYING METHOD EMPLOYING SAME
#933Azeotropic compositions comprising fluorinated compounds for cleaning applications
#934Propyl Bromide Compositions
#935SUPERCRITICAL FLUID CLEANING OF SEMICONDUCTOR SUBSTRATES
#936Composition for removing a polymeric contaminant and method of removing a polymeric contaminant using the same
#937Cleaning compositions for microelectronic substrates
#938Alkaline chemistry for post-CMP cleaning comprising tetra alkyl ammonium hydroxide
#939CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#940Cleanser for Slit Coater, Slit Coater for Manufacturing Display Device and Manufacturing Method for Display Device
#941Solvent for cleaning
#942Method to passivate conductive surfaces during semiconductor processing
#943AMMONIUM HYDROXIDE TREATMENTS FOR SEMICONDUCTOR SUBSTRATES
#944Chemical-liquid mixing method and chemical-liquid mixing apparatus
#945Cleaning methods for silicon electrode assembly surface contamination removal
#946Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same
#947Resist, barc and gap fill material stripping chemical and method
#948Cleaning formulation for removing residues on surfaces
#949Semiconductor process residue removal composition and process
#950COMPOSITIONS FOR CLEANING A PROBE CARD AND METHODS OF CLEANING A PROBE CARD USING THE SAME
#951Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process
#952Compositions containing fluorine substituted olefins and methods and systems using same
#953Method for removing contaminants from silicon wafer surface
#954Composition for Removing Photoresist and Method for Removing Photoresist
#955Solvent composition
#956Method of wet cleaning a surface, especially of a material of the silicon-germanium type
#957Cleaning porous low-k material in the formation of an interconnect structure
#958DYNAMIC MULTI-PURPOSE COMPOSITION FOR THE REMOVAL OF PHOTORESISTS AND METHOD FOR ITS USE
#959CLEANING SOLUTION AND METHOD FOR SELECTIVELY REMOVING LAYER IN A SILICIDATION PROCESS
#960Photoresist stripping solution and a method of stripping photoresists using the same
#961METHOD OF CLEANING POST-CMP WAFER
#962Cleaning Agent for Substrate and Cleaning Method
#963Microelectronic cleaning compositions containing ammonia-free fluoride salts for selective photoresist stripping and plasma ash residue cleaning
#964Cleaning solution for substrate for use in semiconductor device and cleaning method using the same
#965Cleaning solutions including preservative compounds for post CMP cleaning processes
#966Method and composition for selectively stripping silver from a substrate
#967Novel chemical composition to reduce defects
#968Remover solution composition and use thereof
#969Cleaning solution for substrate for use in semiconductor device and cleaning method using the same
#970Alkaline solutions for post CMP cleaning processes
#971Ionic Additives to Solvent-Based Strippers
#972Novel rinse solution to remove cross-contamination
#973Substrate cleaning method, substrate cleaning system and program storage medium
#974Cleaning compositions and methods of use thereof
#975Azeotropic compositions comprising fluorinated compounds for cleaning applications
#976Azeotropic compositions comprising fluorinated compounds for cleaning applications
#977Cleaning composition for removing impurities and method of removing impurities using the same
#978POLISHING MEDIUM FOR CHEMICAL-MECHANICAL POLISHING, AND POLISHING METHOD
#979Post-CMP treating liquid and manufacturing method of semiconductor device using the same
#980Polishing composition and rinse composition
#981POLISHING COMPOSITION AND RINSE COMPOSITION
#982Method of removing residue left after plasma process
#983Ammonium hydroxide treatments for semiconductor substrates
#984Cleaning solution and cleaning method of a semiconductor device
#985Cleaning formulations
#986Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution
#987Surfactant
#988Method for forming a photoresist pattern
#989Cleaning solution for silicon surface and methods of fabricating semiconductor device using the same
#990CLEANING COMPOSITION FOR SEMICONDUCTOR DEVICE-MANUFACTURING APPARATUS AND CLEANING METHOD
#991pH buffered aqueous cleaning composition and method for removing photoresist residue
#992Aqueous solution for removing post-etch residue
#993Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions
#994Aqueous liquid crystal display cleaning agent compounds and their fabrication methods
#995Formulation for removal of photoresist, etch residue and BARC
#996Supercritical fluid-based cleaning compositions and methods
#997Method of etching semiconductor device
#998Use of fluorinated additives in the etching or polishing of integrated circuits
#999SUBSTRATE SURFACE CLEANING LIQUID MEDIUM AND CLEANING METHOD
#1000Methods for chemically treating a substrate using foam technology
#1001Semiconductor substrate surface protection method
#1002Alkylsilanes as solvents for low vapor pressure precursors
#1003Manufacturing and cleansing of thin film transistor panels
#1004In situ fluoride ion-generating compositions and uses thereof
#1005Substrate cleaning method and substrate cleaning apparatus
#1006Dynamic multi-purpose composition for the removal of photoresists and methods for its use
#1007METHOD OF SELECTIVELY DEPOSITING A THIN FILM MATERIAL AT A SEMICONDUCTOR INTERFACE
#1008Solvent compositions comprising unsaturated fluorinated hydrocarbons
#1009Cleaner for semiconductor devices
#1010Solvent compositions comprising unsaturated fluorinated hydrocarbons
#1011Blowing agents for forming foam comprising unsaturated fluorocarbons
#1012Methods for making foams using blowing agents comprising unsaturated fluorocarbons
#1013Composition and method for selectively removing native oxide from silicon-containing surfaces
#1014Dynamic multi-purpose composition for the removal of photoresists and method for its use
#1015Stripping and cleaning of organic-containing materials from electronic device substrate surfaces
#1016Novel cleaning process for masks and mask blanks
#1017Method and system for using a two-phases substrate cleaning compound
#1018Aqueous cleaning composition for removing residues and method using same
#1019Aqueous cleaning composition and method for using same
#1020Method and apparatus for cleaning a semiconductor substrate
#1021Method and apparatus for cleaning a semiconductor substrate
#1022Method and apparatus for removing contamination from substrate
#1023Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
#1024Stripper
#1025Photoresist stripping solution
#1026Unsaturated dicarboxylic acid and ethylene urea containing formulation for cleaning semiconductor and cleaning method
#1027Ozonation for elimination of bacteria for wet processing systems
#1028Aqueous cleaning composition for semiconductor copper processing
#1029Novel organic remover for advanced reticle contamination cleaning
#1030Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors
#1031Composition for cleaning substrates and method of forming gate using the composition
#1032Silicon wafer cleaning method
#1033Cleaning liquid used in photolithography and a method for treating substrate therewith
#1034Method for the chemical treatment of copper surfaces for the removal of carbonaceous residues
#1035Cleaning agent composition, cleaning and production methods for semiconductor wafer, and semiconductor wafer
#1036Process solutions containing surfactants used as post-chemical mechanical planarization treatment
#1037Photoresist stripping solution and a method of stripping photoresists using the same
#1038Photoresist stripping solution and a method of stripping photoresists using the same
#1039Removal of residues for low-k dielectric materials in wafer processing
#1040Composition for removal of residue comprising cationic salts and methods using same
#1041Coating apparatus and method of fabricating liquid crystal display device using the same
#1042Compositions containing free radical quenchers
#1043Methods of Forming Corrosion-Inhibiting Cleaning Compositions for Metal Layers and Patterns on Semiconductor Substrates
#1044Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition
#1045Method and apparatus for cleaning a substrate using non-Newtonian fluids
#1046Cleaning process for semiconductor substrates
#1047Cleaning solution and cleaning method of a semiconductor device
#1048Cleaning solution for substrate for semiconductor device and cleaning method
#1049Cleaning method and solution for cleaning a wafer in a single wafer process
#1050Method and composition for preparing a semiconductor surface for deposition of a barrier material
#1051Cleaning method and solution for cleaning a wafer in a single wafer process
#1052Cleaning method and solution for cleaning a wafer in a single wafer process
#1053Methods of etching oxide, reducing roughness, and forming capacitor constructions
#1054Selective removal chemistries for semiconductor applications, methods of production and uses thereof
#1055Composition and method for treating a semiconductor substrate
#1056Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith
#1057Heat transfer and refrigerant compositions comprising 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene and a fluoroether
#1058Submicron particle removal
#1059Polymer remover
#1060Acidic chemistry for Post-CMP cleaning using a composition comprising mercaptopropionic acid
#1061Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxide
#1062Polymeric inhibitors for enhanced planarization
#1063Cleaning agent for removing solder flux and method for cleaning solder flux
#1064Neutralization of systemic poisoning in wafer processing
#1065Composition and method for removing copper-compatible resist
#1066Compositions based on fluorinated hydrocarbons and secondary butanol for defluxing electronic boards
#1067Oxidizing agent for chemical mechanical polishing slurry composition
#1068Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material
#1069Polishing medium for chemical-mechanical polishing, and polishing method
#1070Etching and cleaning BPSG material using supercritical processing
#1071Semiconductor cleaning using superacids
#1072Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
#1073System and method for cleaning semiconductor fabrication equipment parts
#1074Enhanced megasonic based clean using an alternative cleaning chemistry
#1075Process for production of etching or cleaning fluids
#1076Metallization method for a semiconductor device and post-CMP cleaning solution for the same
#1077Wafer cleaning solution for cobalt electroless application
#1078Microelectronic cleaning agent(s) and method(s) of fabricating semiconductor device(s) using the same
#1079Aqueous based residue removers comprising fluoride
#1080Uniform passivation method for conductive features
#1081Compositions for processing of semiconductor substrates
#1082Remover solution
#1083Stripping and cleaning compositions for microelectronics
#1084Cleaning composition and method of cleaning therewith
#1085Technique on ozone water for use in cleaning semiconductor substrate
#1086Method of manufacturing a semiconductor device and an apparatus for use in such a method
#1087Polishing composition and rinsing composition
#1088Cleaning method, method for removing foreign particle, cleaning apparatus, and cleaning liquid
#1089Solvent compositions containing chlorofluoroolefins or fluoroolefins
#1090Silicon electrode assembly surface decontamination by acidic solution
#1091Cleaning methods for silicon electrode assembly surface contamination removal
#1092Removing solution
#1093Cleaning compound and method and system for using the cleaning compound
#1094Method for removing contamination from a substrate and for making a cleaning solution
#1095Lithographic rinse solution and method for forming patterned resist layer using the same
#1096Thinner composition, method of preparing the same and method of recovering the same
#1097Rinse liquid for lithography and method for forming resist pattern using same
#1098Compositions and methods for high-efficiency cleaning of semiconductor wafers
#1099Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same
#1100Remover composition
#1101Etching composition and use thereof with feedback control of HF in BEOL clean
#1102Compositions comprising tannic acid as corrosion inhibitor
#1103Compositions and processes for photoresist stripping and residue removal in wafer level packaging
#1104METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PREOXIDE-BASED PROCESS CHEMISTRY
#1105Method of fabricating semiconductor cleaners
#1106Photo resist stripper composition
#1107Non-corrosive cleaning composition for removing plasma etching residues
#1108Compositions and processes for photoresist stripping and residue removal in wafer level packaging
#1109Post etch cleaning composition for use with substrates having aluminum
#1110Cleaning solution and method for cleaning semiconductor device by using the same
#1111Semiconductor cleaning solution
#1112Composition for the removing of sidewall residues
#1113Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal
#1114Solutions for cleaning silicon semiconductors or silicon oxides
#1115Ammonium hydroxide treatments for semiconductor substrates
#1116Using ozone to process wafer like objects
#1117Composition and process for ashless removal of post-etch photoresist and/or bottom anti-reflective material on a substrate
#1118Method for cleaning semiconductor device having dual damascene structure
#1119Cleaning method and solution for cleaning a wafer in a single wafer process
#1120Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use
#1121Stripping composition for removing a photoresist and method of manufacturing TFT substrate for a liquid crystal display device using the same
#1122Cleaning submicron structures on a semiconductor wafer surface
#1123Cleaning composition and method
#1124Cleaning liquid and cleaning method
#1125Methods and compositions for selectively etching metal films and structures
#1126Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process
#1127Photoresist stripping solution and a method of stripping photoresists using the same
#1128Seminconductor surface treatment and mixture used therein
#1129Removal of particle contamination on a patterned silicon/silicon dioxide using dense fluid/chemical formulations
#1130Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
#1131Composition for stripping and cleaning and use thereof
#1132Method of manufacturing a semiconductor device using a cleaning composition
#1133Photoresist stripping solution and a method of stripping photoresists using the same
#1134Silicon wafer etching process and composition
#1135System and method for pre-gate cleaning of substrates
#1136Electronic parts cleaning solution
#1137Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
#1138Forming a passivating aluminum fluoride layer and removing same for use in semiconductor manufacture
#1139Cleaning composition for semiconductor components and process for manufacturing semiconductor device
#1140Rinsing composition, and method for rinsing and manufacturing silicon wafer
#1141Composition and method for removing copper-compatible resist
#1142Compositions and processes for photoresist stripping and residue removal in wafer level packaging
#1143Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates
#1144Method of cleaning a semiconductor substrate
#1145Photoresist stripper
#1146Alkali cleaner
#1147Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processing
#1148Passivation for cleaning a material
#1149Process for removing organic materials during formation of a metal interconnect
#1150Microelectronic cleaning compositions containing oxidizers and organic solvents
#1151Cleaning solution of silicon germanium layer and cleaning method using the same
#1152Cleaning solution and manufacturing method for semiconductor device
#1153Cleaning solution and method of cleaning semiconductor devices using the same
#1154Cleaning solution for photoresist, method for forming a photoresist pattern using the same, and semiconductor device
#1155Method and composition of post-CMP wetting of thin films
#1156Fluorinated ether compound and method for its production
#1157Cleaning method and solution for cleaning a wafer in a single wafer process
#1158Methods of forming integrated circuit devices having polished tungsten metal layers therein
#1159Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers
#1160Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition
#1161Aqueous stripping and cleaning composition
#1162Methods using a peroxide-generating compound to remove group VIII metal-containing residue
#1163Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#1164Methods of cleaning surfaces of copper-containing materials, and methods of forming openings to copper-containing substrates
#1165Alkaline post-chemical mechanical planarization cleaning compositions
#1166CMP cleaning composition with microbial inhibitor
#1167Fluorinated sulfonamide surfactants for aqueous cleaning solutions
#1168Acidic chemistry for post-CMP cleaning
#1169Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
#1170Solvents and methods using same for removing silicon-containing residues from a substrate
#1171Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions
#1172Method for cleaning substrates using supercritical fluids
#1173Cleaning solution, method for cleaning semiconductor substrate using the same, and method for forming metal wiring
#1174Process and apparatus for removing residues from semiconductor substrates
#1175Alkaline chemistry for post-CMP cleaning
#1176Material supply system in semiconductor device manufacturing plant
#1177Thinner composition and method of removing photoresist using the same
#1178Cleaning composition, method for cleaning semiconductor substrate, and process for manufacturing semiconductor device
#1179Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture
#1180Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates
#1181Microelectronic cleaning and arc remover compositions
#1182Cleaning composition and method of cleaning a semiconductor device using the same
#1183ER cleaning composition and method
#1184Manufacturing method for compound semiconductor device
#1185Composition and method for treating a semiconductor substrate
#1186Aqueous cleaning solution for integrated circuit device and method of cleaning using the cleaning solution
#1187Method for cleaning chamber of deposition apparatus for organic EL device production
#1188Photoresist cleaning solutions and methods for pattern formation using the same
#1189Solvent compositions
#1190Composition for cleaning semiconductor device
#1191Cleaning solutions and etchants and methods for using same
#1192Cleaning solution and method of cleaning a semiconductor device using the same
#1193Method of wet cleaning a surface, especially of a material of the silicon-germanium type
#1194Method for cleaning semiconductor wafers
#1195Stripper for cured negative-tone isoprene-based photoresist and bisbenzocyclobutene coatings
#1196Method for cleaning a ceramic member for use in a system for producing semiconductors, a cleaning agent and a combination of cleaning agents
#1197Dry film remove pre-filter system
#1198Chemical mechanical polishing slurries and cleaners containing salicylic acid as a corrosion inhibitor
#1199Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates
#1200Composition and method for removing photoresist materials from electronic components