Patents-Review.com
ClassID:

108220 ⎘

C11D11/0047 - CPC Classification

Classification description:

Special methods for preparing compositions containing mixtures of detergents ; Methods for using cleaning compositions; Special cleaning or washing methods characterised by the objects to be cleaned "Hard" surfaces Electronic devices, e.g. PCBs or semiconductors

Recent Application in this class:
#1
20240234672
2024-07-11

MANUFACTURING METHOD OF SECONDARY BATTERY

 #2
20240218297
2024-07-04

SEMICONDUCTOR CLEANING COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR USING THE SAME

 #3
20240218294
2024-07-04

CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR

 #4
20240150681
2024-05-09

CLEANING AGENT COMPOSITION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICES AND METHOD FOR CLEANING SUBSTRATE FOR SEMICONDUCTOR DEVICES USING THE SAME

 #5
20240150680
2024-05-09

COMPOSITION FOR SEMICONDUCTOR PROCESSING AND PROCESSING METHOD

 #6
20240150677
2024-05-09

COMPOSITION FOR SEMICONDUCTOR PROCESSING AND PROCESSING METHOD

 #7
20240136492
2024-04-25

MANUFACTURING METHOD OF SECONDARY BATTERY

 #8
20240132806
2024-04-25

METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND PEELING AND DISSOLVING COMPOSITION

 #9
20240124810
2024-04-18

SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #10
20240124799
2024-04-18

CLEANING LIQUID AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

 #11
20240117280
2024-04-11

METAL RESIDUE REMOVING LIQUID, METAL RESIDUE REMOVING METHOD, AND METAL WIRING MANUFACTURING METHOD

 #12
20240117277
2024-04-11

COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #13
20240101936
2024-03-28

AQUEOUS CLEANING LIQUID AND METHOD OF CLEANING ELECTRONIC DEVICE

 #14
20240101929
2024-03-28

Surface Treatment Compositions and Methods

 #15
20240100575
2024-03-28

CIRCUIT BOARD CLEANING SYSTEM

 #16
20240074572
2024-03-07

CLEANING KITS FOR WEARABLE DEVICES

 #17
20240067901
2024-02-29

CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT

 #18
20240052266
2024-02-15

AQUEOUS ALKALINE CLEANER SOLUTION FOR GLASS FILLER REMOVAL AND METHOD

 #19
20240034958
2024-02-01

COMPOSITIONS AND METHODS OF USE THEREOF

 #20
20240026254
2024-01-25

CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE

 #21
20240026246
2024-01-25

Post Chemical Mechanical Planarization (CMP) Cleaning

 #22
20240018442
2024-01-18

CLEANING LIQUID FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD FOR SEMICONDUCTOR SUBSTRATE

 #23
20240010952
2024-01-11

Cleaning Compositions

 #24
20240002757
2024-01-04

SELF-ASSEMBLED MONOLAYER REMOVING LIQUID, AND SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS USING THE SAME

 #25
20230383218
2023-11-30

CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CLEANING METAL-CONTAINING FILM BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME

 #26
20230365903
2023-11-16

Semiconductor Device Cleaning Solution, Method of Use, and Method of Manufacture

 #27
20230365902
2023-11-16

COMPOSITION AND SUBSTRATE WASHING METHOD

 #28
20230365893
2023-11-16

COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD

 #29
20230364732
2023-11-16

POLISHING AND CLEANING METHOD, CLEANER AND POLISHING CLEANING SET

 #30
20230340370
2023-10-26

Composition, Its Use And A Process For Removing Post-Etch Residues

 #31
20230339843
2023-10-26

Composition for removing polymer

 #32
20230323248
2023-10-12

POST CMP CLEANING COMPOSITION

 #33
20230317647
2023-10-05

NON-DMSO STRIPPER FOR ADVANCE PACKAGE METAL PLATING PROCESS

 #34
20230317514
2023-10-05

SEMICONDUCTOR DEVICE WITH COMPOSITE BARRIER STRUCTURE AND METHOD FOR FABRICATING THE SAME

 #35
20230313080
2023-10-05

SURFACE TREATMENT COMPOSITION

 #36
20230313070
2023-10-05

COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #37
20230313069
2023-10-05

SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #38
20230295537
2023-09-21

MICROELECTRONIC DEVICE CLEANING COMPOSITION

 #39
20230287304
2023-09-14

Treatment liquid and substrate treatment method

 #40
20230274930
2023-08-31

Composition Comprising a Siloxane and an Alkane for Avoiding Pattern Collapse When Treating Patterned Materials with Line-Space Dimensions of 50 NM or Below

 #41
20230265362
2023-08-24

RINSING SOLUTION, METHOD OF TREATING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #42
20230260779
2023-08-17

Methods for stripping and cleaning semiconductor structures

 #43
20230242696
2023-08-03

MAINTENANCE LIQUID AND MAINTENANCE METHOD

 #44
20230235254
2023-07-27

SUBSTRATE CLEANING SOLUTION, AND USING THE SAME, METHOD FOR MANUFACTURING CLEANED SUBSTRATE AND METHOD FOR MANUFACTURING DEVICE

 #45
20230235252
2023-07-27

Use of a Composition Consisting of Ammonia and an Alkanol for Avoiding Pattern Collapse When Treating Patterned Materials with Line-Space Dimensions of 50 NM or Below

 #46
20230212485
2023-07-06

TREATMENT LIQUID AND SUBSTRATE WASHING METHOD

 #47
20230203408
2023-06-29

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

 #48
20230194993
2023-06-22

Interconnectable tiling system

 #49
20230193169
2023-06-22

CLEANER FOR ELECTRONIC DEVICE COMPONENTS

 #50
20230193168
2023-06-22

METHOD OF REDUCING DEFECTS ON POLISHED WAFERS

 #51
20230191461
2023-06-22

Supercritical Fluid Cleaning for Components in Optical or Electron Beam Systems

 #52
20230183617
2023-06-15

CLEANING LIQUID USED FOR CLEANING METAL RESISTS, AND CLEANING METHOD USING CLEANING LIQUID

 #53
20230174905
2023-06-08

CLEANING COMPOSITIONS AND METHODS OF USE THEREOF

 #54
20230174892
2023-06-08

DETERGENT COMPOSITION AND CHEMICAL-MECHANICAL POLISHING COMPOSITION

 #55
20230167383
2023-06-01

ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFACTURING RESIST PATTERN AND METHOD FOR MANUFACTURING DEVICE

 #56
20230167381
2023-06-01

Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product

 #57
20230159866
2023-05-25

MICROELECTRONIC DEVICE CLEANING COMPOSITION

 #58
20230159864
2023-05-25

Treatment liquid and method for treating object to be treated

 #59
20230151308
2023-05-18

SEMICONDUCTOR SUBSTRATE CLEANING METHOD, PROCESSED SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND COMPOSITION FOR PEELING

 #60
20230151307
2023-05-18

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND RELEASE COMPOSITION

 #61
20230151306
2023-05-18

METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND STRIPPING COMPOSITION

 #62
20230147501
2023-05-11

Method for cleaning substrate and system for cleaning substrate

 #63
20230143521
2023-05-11

METHOD FOR PRODUCING TREATMENT LIQUID

 #64
20230131428
2023-04-27

SEMICONDUCTOR SUBSTRATE CLEANING METHOD, PROCESSED SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND COMPOSITION FOR PEELING

 #65
20230129238
2023-04-27

CLEANING AGENT COMPOSITION AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

 #66
20230125907
2023-04-27

METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND STRIPPING COMPOSITION

 #67
20230121726
2023-04-20

SEMICONDUCTOR TREATMENT LIQUID AND METHOD FOR MANUFACTURING SAME

 #68
20230109597
2023-04-06

CLEANING COMPOSITION

 #69
20230106132
2023-04-06

Cleaning Composition for Post Chemical Mechanical Planarization And Method Of Using The Same

 #70
20230101156
2023-03-30

Treatment liquid

 #71
20230100080
2023-03-30

Cleaning formulation for removing residues on surfaces

 #72
20230095013
2023-03-30

CLEANING AGENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

 #73
20230086417
2023-03-23

COMPOSITION FOR TREATING SEMICONDUCTOR SUBSTRATE

 #74
20230073016
2023-03-09

Method for inhibiting flash point of trans-1,2-dichloroethylene (T-1,2-DCE) and use of T-1,2-DCE

 #75
20230066300
2023-03-02

Cleaning formulation for removing residues on surfaces

 #76
20230065213
2023-03-02

CLEANING FLUID AND CLEANING METHOD

 #77
20230039844
2023-02-09

ADHESIVE REMOVER COMPOSITIONS

 #78
20230039366
2023-02-09

COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER

 #79
20230028942
2023-01-26

Rinsing Composition and Method for Treating Surface of Photoresist Material Using Same

 #80
20230027432
2023-01-26

SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #81
20220415643
2022-12-29

Substrate processing method and substrate processing system

 #82
20220403300
2022-12-22

CLEANING LIQUID AND CLEANING METHOD

 #83
20220395865
2022-12-15

COMPOSITIONS AND METHODS FOR REDUCING INTERACTION BETWEEN ABRASIVE PARTICLES AND A CLEANING BRUSH

 #84
20220380705
2022-12-01

Composition comprising three alkanolamines and a hydroxylamine for removing etch residues

 #85
20220351963
2022-11-03

CLEANING SOLUTION AND METHOD OF CLEANING WAFER

 #86
20220348848
2022-11-03

Compositions for the removal of silicone conformal coatings from a printed circuit board

 #87
20220325208
2022-10-13

CLEANING SOLUTION AND CLEANING METHOD

 #88
20220325205
2022-10-13

Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlorite Ions

 #89
20220315868
2022-10-06

CLEANING SOLUTION AND CLEANING METHOD

 #90
20220315865
2022-10-06

SURFACE TREATMENT COMPOSITION, METHOD FOR MANUFACTURING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE

 #91
20220315522
2022-10-06

Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers

 #92
20220308455
2022-09-29

Rinse and method of use thereof for removing edge protection layers and residual metal hardmask components

 #93
20220306972
2022-09-29

Compositions comprising 1,2-dichloro-1,2-difluoroethylene for use in cleaning and solvent applications

 #94
20220298456
2022-09-22

CLEANING LIQUID, METHOD OF CLEANING, AND METHOD OF MANUFACTURING SEMICONDUCTOR WAFER

 #95
20220298366
2022-09-22

PROCESS SOLUTION COMPOSITION FOR POLYMER TREATMENT

 #96
20220275313
2022-09-01

CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES

 #97
20220260919
2022-08-18

Treatment liquid, method for washing substrate, and method for removing resist

 #98
20220251480
2022-08-11

COMPOSITIONS FOR REMOVING ETCH RESIDUES, METHODS OF USING AND USE THEREOF

 #99
20220251472
2022-08-11

PROCESS LIQUID COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMING METHOD USING SAME

 #100
20220243150
2022-08-04

Cleaning Composition For Semiconductor Substrates

 #101
20220243149
2022-08-04

THINNER COMPOSITION AND METHOD OF PROCESSING SURFACES OF SEMICONDUCTOR SUBSTRATES

 #102
20220220421
2022-07-14

COMPOSITION AND PROCESS FOR ELECTIVELY ETCHING A HARD MASK AND/OR AN ETCH-STOP LAYER IN THE PRESENCE OF LAYERS OF LOW-K MATERIALS, COPPER, COBALT AND/OR TUNGSTEN

 #103
20220213415
2022-07-07

Substrate pattern filling composition and use of the same

 #104
20220206394
2022-06-30

Alkaline cleaning composition, cleaning method, and manufacturing method of semiconductor

 #105
20220187712
2022-06-16

COMPOSITION FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW COMPRISING A BORON-TYPE ADDITIVE

 #106
20220186152
2022-06-16

Detergent composition, substrate cleaning method, and cleaning method for support or substrate

 #107
20220186141
2022-06-16

Fluorinated surfactant composition

 #108
20220184571
2022-06-16

DILUTE CHEMICAL SOLUTION PRODUCTION DEVICE

 #109
20220177814
2022-06-09

CLEANING SOLUTION AND CLEANING METHOD

 #110
20220169956
2022-06-02

COMPOSITION COMPRISING AN AMMONIA-ACTIVATED SILOXANE FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW

 #111
20220154104
2022-05-19

CLEANING AGENT COMPOSITION AND CLEANING METHOD

 #112
20220145222
2022-05-12

Cleaning formulation for removing residues on surfaces

 #113
20220145218
2022-05-12

Cleaning agent composition and cleaning method

 #114
20220145216
2022-05-12

Composition for dissolving abrasive particles and cleaning method using the same

 #115
20220135916
2022-05-05

Cleaning composition and cleaning method for component of semiconductor manufacturing process chamber

 #116
20220135915
2022-05-05

Cleaning composition and cleaning method using the same

 #117
20220135914
2022-05-05

CLEANING AGENT COMPOSITION AND CLEANING METHOD

 #118
20220135913
2022-05-05

CLEANING AGENT COMPOSITION AND CLEANING METHOD

 #119
20220135903
2022-05-05

Cleaning liquid composition for semiconductor wafer and cleaning method using same

 #120
20220119739
2022-04-21

Decomposing/cleaning composition, method for cleaning adhesive polymer, and method for producing device wafer

 #121
20220106542
2022-04-07

Post CMP cleaning compositions

 #122
20220106541
2022-04-07

Microelectronic Device Cleaning Composition

 #123
20220098530
2022-03-31

EFFICIENT POST-CMP DEFECT REDUCTION USING CLEANERS CONTAINING OXIDIZING AGENTS

 #124
20220098523
2022-03-31

Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate

 #125
20220097376
2022-03-31

Cleaning solution and inkjet printer cleaning method

 #126
20220093412
2022-03-24

Etchant compositions

 #127
20220068634
2022-03-03

Method of cleaning a surface

 #128
20220064577
2022-03-03

Cleaning compositions and methods of use thereof

 #129
20220064575
2022-03-03

Cleaning compositions

 #130
20220059344
2022-02-24

Substrate cleaning solution, and using the same, method for manufacturing cleaned substrate and method for manufacturing device

 #131
20220056383
2022-02-24

SUBSTRATE CLEANING SOLUTION AND METHOD FOR MANUFACTURING DEVICE

 #132
20220056382
2022-02-24

Hydrochlorofluoroolefins and methods of using same

 #133
20220056373
2022-02-24

Cleaning liquid composition and cleaning method using same

 #134
20220056368
2022-02-24

Cleaning solvent compositions exhibiting azeotrope-like behavior and their use

 #135
20220041532
2022-02-10

HYDROFLUOROOLEFINS AND METHODS OF USING SAME

 #136
20220033745
2022-02-03

Method and Apparatus for Cleaning Printing Cylinders

 #137
20220033744
2022-02-03

Cleaning liquid composition

 #138
20220033741
2022-02-03

Compositions comprising 1,2-dichloro-1,2-difluoroethylene for use in cleaning and solvent applications

 #139
20220028681
2022-01-27

Cleaning Fluid, Method of Cleaning Semiconductor Wafer, and Method of Preparing Semiconductor Wafer

 #140
20220025299
2022-01-27

Cleaning solution composition and cleaning method using the same

 #141
20220010242
2022-01-13

CLEANING AGENT COMPOSITION AND CLEANING METHOD

 #142
20220002641
2022-01-06

High-purity isopropyl alcohol and method for manufacturing same

 #143
20210403836
2021-12-30

Cleaning agent for semiconductor component, and use thereof

 #144
20210403829
2021-12-30

Semiconductor aqueous composition and use of the same

 #145
20210387937
2021-12-16

Systems and methods for purifying solvents

 #146
20210371776
2021-12-02

CLEANING SOLUTION FOR REMOVING CERIUM COMPOUND, CLEANING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER

 #147
20210371774
2021-12-02

Post-CMP cleaning composition for germanium-containing substrate

 #148
20210340468
2021-11-04

Azeotropic compositions comprising dimethyl carbonate and perfluoroalkene ethers

 #149
20210317391
2021-10-14

Kit for cleaning agent and method for preparing cleaning agent

 #150
20210317390
2021-10-14

Composition, method for cleaning adhesive polymer, method for producing device wafer, and method for regenerating support wafer

 #151
20210309942
2021-10-07

Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer

 #152
20210301221
2021-09-30

Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process

 #153
20210300860
2021-09-30

Composition for removing polymer

 #154
20210292685
2021-09-23

Cleaning compositions and methods of use thereof

 #155
20210284930
2021-09-16

Cleaning composition, cleaning method, and method for manufacturing semiconductor

 #156
20210261890
2021-08-26

LIQUID ELECTROPHOTOGRAPHIC PRINTER CLEANING METHODS AND CLEANING COMPOSITIONS

 #157
20210222092
2021-07-22

CHEMICAL LIQUID AND CHEMICAL LIQUID STORAGE BODY

 #158
20210214649
2021-07-15

Process solution composition for extreme ultraviolet lithography, and method for forming pattern by using same

 #159
20210207065
2021-07-08

NON-AZEOTROPIC CLEANING COMPOSITION

 #160
20210198602
2021-07-01

Use of compositions comprising a solvent mixture for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

 #161
20210189298
2021-06-24

Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN

 #162
20210179972
2021-06-17

Quaternary ammonium hydroxides of polyamines

 #163
20210171878
2021-06-10

Cleaning liquid, cleaning method, and method for producing semiconductor wafer

 #164
20210163859
2021-06-03

Semiconductor device cleaning solution, method of use, and method of manufacture

 #165
20210163856
2021-06-03

CLEANING LIQUID COMPOSITION

 #166
20210163850
2021-06-03

Method for producing ozone water

 #167
20210157242
2021-05-27

Photoresist-removing liquid and photoresist-removing method

 #168
20210155881
2021-05-27

Aqueous composition and cleaning method using same

 #169
20210155878
2021-05-27

Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers

 #170
20210147768
2021-05-20

Aqueous composition and cleaning method using same

 #171
20210147766
2021-05-20

Compositions comprising trans-1,2-dichloroethylene and an organic compound, and methods of using the same

 #172
20210132503
2021-05-06

CHEMICAL LIQUID, KIT, PATTERN FORMING METHOD, CHEMICAL LIQUID MANUFACTURING METHOD, AND CHEMICAL LIQUID STORAGE BODY

 #173
20210130751
2021-05-06

Composition for surface treatment, method for producing the same, and surface treatment method using the same

 #174
20210130750
2021-05-06

Cleaning agent and preparation method and use thereof

 #175
20210130749
2021-05-06

Semiconductor substrate cleaning agent

 #176
20210130739
2021-05-06

Cleaning agent composition for substrate for semiconductor device

 #177
20210130735
2021-05-06

Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate

 #178
20210129192
2021-05-06

METHOD FOR TREATING A SEMICONDUCTOR DEVICE

 #179
20210115362
2021-04-22

Photoresist remover compositions

 #180
20210088910
2021-03-25

Process liquid composition for extreme ultraviolet lithography and pattern forming method using same

 #181
20210087501
2021-03-25

Liquid composition for reducing damage of cobalt, alumina, interlayer insulating film and silicon nitride, and washing method using same

 #182
20210071120
2021-03-11

Photoresist remover compositions

 #183
20210071111
2021-03-11

Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate

 #184
20210062115
2021-03-04

Treatment liquid for semiconductor wafers, which contains hypochlorite ions

 #185
20210047594
2021-02-18

Cleaning solution for removing dry etching residue and method for manufacturing semiconductor substrate using same

 #186
20210047593
2021-02-18

Aqueous composition and cleaning method using same

 #187
20210047592
2021-02-18

Maintenance liquid and maintenance method

 #188
20210043440
2021-02-11

Method of producing heated ozone water, heated ozone water, and semiconductor wafer-cleaning liquid

 #189
20210024858
2021-01-28

Washing method, manufacturing method, and washing device for polycrystalline silicon

 #190
20210002591
2021-01-07

Composition having suppressed alumina damage and production method for semiconductor substrate using same

 #191
20200399565
2020-12-24

Non-aqueous tungsten compatible metal nitride selective etchants and cleaners

 #192
20200377829
2020-12-03

Cleaning formulation for removing residues on surfaces

 #193
20200369990
2020-11-26

Composition comprising an oxygenated solvent and a siloxane solvent for the removal of silicone deposits

 #194
20200362274
2020-11-19

PARTICLE REMOVAL FROM ELECTROCHROMIC FILMS USING NON-AQUEOUS FLUIDS

 #195
20200353431
2020-11-12

FUNCTIONAL WATER PRODUCING APPARATUS AND FUNCTIONAL WATER PRODUCING METHOD

 #196
20200347514
2020-11-05

Laminate of aluminum nitride single-crystal substrate

 #197
20200340253
2020-10-29

Interconnectable tiling system

 #198
20200339919
2020-10-29

Stripping compositions for removing photoresists from semiconductor substrates

 #199
20200335326
2020-10-22

Cleaning chemical composition for the removal of an amorphous passivation layer at the surface of crystalline materials

 #200
20200328075
2020-10-15

Cleaning solution and method of cleaning wafer

 #201
20200326631
2020-10-15

Cleaning liquid, and method of cleaning substrate provided with metal resist

 #202
20200326630
2020-10-15

Cleaning liquid, and method of cleaning substrate provided with metal resist

 #203
20200301284
2020-09-24

Photoresist stripper composition

 #204
20200294808
2020-09-17

Surface treatment composition, method of producing surface treatment composition, method of treating surface, and method of producing semiconductor substrate

 #205
20200291281
2020-09-17

COMPOSITIONS CONTAINING FLUORINE SUBSTITUTED OLEFINS AND METHODS AND SYSTEMS USING SAME

 #206
20200231900
2020-07-23

Cleaning liquid, cleaning method, and method for producing semiconductor wafer

 #207
20200227288
2020-07-16

Substrate processing device and substrate processing method

 #208
20200199500
2020-06-25

Compositions and methods for post-CMP cleaning of cobalt substrates

 #209
20200165547
2020-05-28

Treatment liquid, kit, and method for washing substrate

 #210
20200152471
2020-05-14

Polishing method

 #211
20200148979
2020-05-14

Post CMP cleaning composition

 #212
20200144064
2020-05-07

Method for fabricating semiconductor device

 #213
20200140792
2020-05-07

Composition for forming a coating film for removing foreign matters

 #214
20200135503
2020-04-30

Substrate treating method, substrate treating liquid and substrate treating apparatus

 #215
20200115661
2020-04-16

Composition for rinsing or cleaning a surface with ceria particles adhered

 #216
20200115660
2020-04-16

Substrate cleaning compositions, substrate cleaning method and substrate treating apparatus

 #217
20200071642
2020-03-05

Post CMP cleaning compositions for ceria particles

 #218
20200071640
2020-03-05

Thinner composition

 #219
20200055097
2020-02-20

Method for treating a semiconductor device

 #220
20200048584
2020-02-13

Cleaning formulation for removing residues on surfaces

 #221
20200040285
2020-02-06

Conductive aqueous solution production device and conductive aqueous solution production method

 #222
20200032177
2020-01-30

Post etch residue cleaning compositions and methods of using the same

 #223
20200024554
2020-01-23

Cleaning composition with corrosion inhibitor

 #224
20200024547
2020-01-23

Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate

 #225
20200020522
2020-01-16

Method of manufacturing semiconductor device and method of cleaning substrate

 #226
20200017801
2020-01-16

Cleaning solution composition

 #227
20200016898
2020-01-16

Ink and cleaning liquid set, inkjet printing device, inkjet printing method, and method of cleaning nozzle surface of inkjet discharging head

 #228
20200002652
2020-01-02

Cleaning agent composition for semiconductor device substrate, method of cleaning semiconductor device substrate, method of manufacturing semiconductor device substrate, and semiconductor device substrate

 #229
20190382698
2019-12-19

Composition for performing cleaning after chemical/ mechanical polishing

 #230
20190382697
2019-12-19

Rinse agent composition for silicon wafers

 #231
20190345419
2019-11-14

Cleaning liquid composition

 #232
20190317409
2019-10-17

Photoresist stripper

 #233
20190308418
2019-10-10

Maintenance liquid and maintenance method

 #234
20190278184
2019-09-12

Photoresist stripper

 #235
20190276778
2019-09-12

COMPOSITION FOR SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PROCESS

 #236
20190273002
2019-09-05

Drying process for high aspect ratio features

 #237
20190263614
2019-08-29

Material and hardware to automatically clean flexible electronic web rolls

 #238
20190263613
2019-08-29

Material and hardware to automatically clean flexible electronic web rolls

 #239
20190262872
2019-08-29

Material and hardware to automatically clean flexible electronic web rolls

 #240
20190262871
2019-08-29

Material and hardware to automatically clean flexible electronic web rolls

 #241
20190256807
2019-08-22

Cleaning formulation for removing residues on surfaces

 #242
20190256805
2019-08-22

Cleaning solution and method for cleaning substrate

 #243
20190250515
2019-08-15

Rinse composition, a method for forming resist patterns and a method for making semiconductor devices

 #244
20190249122
2019-08-15

RINSING AGENT COMPOSITION FOR SILICON WAFERS

 #245
20190241845
2019-08-08

Cleaning formulation for removing residues on surfaces

 #246
20190241844
2019-08-08

Cleaning composition, cleaning apparatus, and method of fabricating semiconductor device using the same

 #247
20190241843
2019-08-08

Compositions comprising trans-1,2-dichloroethylene and an organic compound, and methods of using the same

 #248
20190241842
2019-08-08

Composition for surface treatment and surface treatment method using the same

 #249
20190233771
2019-08-01

Stripping compositions for removing photoresists from semiconductor substrates

 #250
20190219925
2019-07-18

Solvents for use in the electronics industry

 #251
20190211286
2019-07-11

Sulfoxide/glycol ether based solvents for use in the electronics industry

 #252
20190203160
2019-07-04

CLEANING COMPOSITION AND CLEANING METHOD OF ELECTRONIC COMPONENT USING THE SAME

 #253
20190203027
2019-07-04

Composition for surface treatment

 #254
20190198315
2019-06-27

Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer

 #255
20190198314
2019-06-27

Method for removing organic cured film on substrate, and acidic cleaning liquid

 #256
20190196337
2019-06-27

Photoresist stripper

 #257
20190185793
2019-06-20

Aqueous cleaning solution and method of protecting features on a substrate during etch residue removal

 #258
20190177671
2019-06-13

Tungsten post-CMP cleaning composition

 #259
20190177670
2019-06-13

TREATMENT LIQUID AND METHOD FOR TREATING LAMINATE

 #260
20190177669
2019-06-13

Treatment liquid, method for washing substrate, and method for manufacturing semiconductor device

 #261
20190177668
2019-06-13

Hydrogencarbonate Water and Cleaning Method Using Same

 #262
20190177656
2019-06-13

Composition for surface treatment, and method for surface treatment using the same

 #263
20190168265
2019-06-06

Compositions and methods for reducing interaction between abrasive particles and a cleaning brush

 #264
20190161711
2019-05-30

Semiconductor device cleaning solution, method of use, and method of manufacture

 #265
20190157070
2019-05-23

Method of manufacturing semiconductor device and method of cleaning substrate

 #266
20190144781
2019-05-16

Composition for post chemical-mechanical-polishing cleaning

 #267
20190136161
2019-05-09

Treatment liquid and method for washing substrate

 #268
20190119610
2019-04-25

Compositions and methods for preventing collapse of high aspect ratio structures during drying

 #269
20190119609
2019-04-25

Compositions containing trans-1,2-dichloroethylene and a hydrofluoroether, and methods of using the same

 #270
20190093056
2019-03-28

Composition for surface treatment, method for producing composition for surface treatment, surface treatment method, and method for producing semiconductor substrate

 #271
20190093051
2019-03-28

Surface treatment composition, preparation method thereof, surface treatment method using the same

 #272
20190085271
2019-03-21

Composition for surface treatment and method for surface treatment using the same

 #273
20190085270
2019-03-21

Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate

 #274
20190080902
2019-03-14

Substrate cleaning composition, substrate treating method, and substrate treating apparatus

 #275
20190079409
2019-03-14

Treatment liquid, method for washing substrate, and method for removing resist

 #276
20190071623
2019-03-07

Treatment liquid, method for washing substrate, and method for removing resist

 #277
20190070640
2019-03-07

Method for treating a semiconductor device

 #278
20190062674
2019-02-28

Cleaning compositions

 #279
20190062159
2019-02-28

Composition, composition reservoir, and method for producing composition

 #280
20190048293
2019-02-14

CLEANING SOLUTION AND CLEANING METHOD FOR A SEMICONDUCTOR SUBSTRATE OR DEVICE

 #281
20190048292
2019-02-14

Processing Composition of Improved Metal Interconnect Protection and The Use Thereof

 #282
20190046900
2019-02-14

DEOXYGENATION APPARATUS AND SUBSTRATE PROCESSING APPARATUS

 #283
20190035649
2019-01-31

Substrate processing method and substrate processing device

 #284
20190032199
2019-01-31

Method for removing a metal deposit arranged on a surface in a chamber

 #285
20190016999
2019-01-17

Cleaning composition

 #286
20190016998
2019-01-17

Cleaning composition for liquid crystal alignment layer and manufacturing method of liquid crystal alignment layer using the same

 #287
20190010430
2019-01-10

Substrate treating apparatus and substrate treating method

 #288
20190002802
2019-01-03

Composition for post chemical-mechanical-polishing cleaning

 #289
20180371371
2018-12-27

Composition for post chemical-mechanical-polishing cleaning

 #290
20180370882
2018-12-27

Solvent composition, cleaning method, coating film-forming composition, and method of forming a coating film

 #291
20180346851
2018-12-06

Cleaning composition and method for fabricating electronic device using the same

 #292
20180346781
2018-12-06

COMPOSITIONS CONTAINING CHLOROFLUOROOLEFINS OR FLUOROOLEFINS

 #293
20180346677
2018-12-06

Azeotrope-like composition comprising Z-1,1,1,4,4,4-hexafluoro-2-butene

 #294
20180315594
2018-11-01

Method of cleaning and drying semiconductor substrate

 #295
20180312784
2018-11-01

Systems and methods for particulate removal using polymeric microstructures

 #296
20180311764
2018-11-01

Spot heater and device for cleaning wafer using the same

 #297
20180298310
2018-10-18

Cleaning Agent for Removal of Soldering Flux

 #298
20180291309
2018-10-11

Post chemical mechanical polishing formulations and method of use

 #299
20180277357
2018-09-27

Surface treatment methods and compositions therefor

 #300
20180272386
2018-09-27

Cleaning compositions for removing residues on semiconductor substrates