108124 ⎘
Compositions of detergents based essentially on non-surface-active compounds; Organic compounds containing oxygen Aldehydes; Ketones; Acetals or ketals
KIT FOR CLEANING SWIMMING POOL WALLS MADE OF PLASTIC OR COMPOSITE PLASTIC MATERIAL
#2CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME
#3SEMICONDUCTOR CLEANING LIQUID AND METHOD FOR PRODUCING SEMICONDUCTOR CLEANING LIQUID
#4METHOD OF CLEANING A SURFACE
#5FLUORINE-FREE CLEANING AGENT, PREPARATION METHOD THEREFOR AND USE THEREOF
#6Surface Treatment Compositions and Methods
#7COMPOSITION FOR SEMICONDUCTOR PROCESSING AND PROCESSING METHOD
#8METHODS OF REMOVING ANTIMICROBIAL RESIDUES FROM SURFACES
#9AGENT FOR LIQUEFYING CRUDE OIL AND/OR FOR REMOVING OIL RESIDUES
#10Stabilized Heat Transfer Fluid Compositions
#11SEMICONDUCTOR TREATMENT LIQUID AND METHOD FOR MANUFACTURING SAME
#12Cleaning solution for temporary adhesive for substrates, substrate cleaning method, and cleaning method for support or substrate
#13USE OF 4,8,11-DODECATRIENAL TO IMPART A CLEAN AROMA IMPRESSION TO A COMPOSITION
#14Method of cleaning a surface
#15CHEMICAL LIQUID AND CHEMICAL LIQUID STORAGE BODY
#16Photoresist-removing liquid and photoresist-removing method
#17Composition and method for removing a coating from a surface
#18Nail polish removing composition
#19COMPOSITIONS AND USES OF CIS-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE
#20Cleaning solution
#21Cleaning agent composition
#22Ternary solvent composition and method for removing a coating from a surface
#23EXTERIOR CLEANING COMPOSITION FOR A VEHICLE
#24Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer
#25Composition, composition reservoir, and method for producing composition
#26Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer
#27Drying high aspect ratio features
#28Cleaning formulations for removing residues on semiconductor substrates
#29COMPOSITIONS AND USES OF CIS-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE AND CYCLOPENTANE
#30Polyimide-based resin film cleaning liquid, method for cleaning polyimide-based resin film, method for producing polyimide coating, method for producing filter, filter medium, or filter device, and method for producing chemical solution for lithography
#31Low VOC composition to remove food, beverage, pet and protein stains
#32Aqueous solutions containing a complexing agent in high concentration
#33Flavour and fragrance compositions comprising acetophenone derivatives
#34Cleaning, surfactant, and personal care compositions
#35Method for Separating Components in Natural Oil
#36Method and composition for removing radiation-curable, pigmented, artificial nail gel coatings
#37Low VOC composition to remove graffiti
#38MALODOR CONTROL COMPOSITIONS HAVING ACTIVATED ALKENES AND METHODS THEREOF
#39Method for separating components in natural oil
#40Liquid concentrate for cleaning composition, cleaning composition and cleaning method
#41Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#42Method for removing painted markings
#43Method and composition for removing radiation-curable, pigmented, artificial nail gel coatings
#44Universal synthetic golf club cleaner and protectant, method and product-by-process to clean, protect golf club faces and rejuvenate golf clubs grips
#45Cleaning solvent and cleaning method for metallic compound
#46Cleaning agent for substrate and cleaning method
#47Cleaning solvent and cleaning method for metallic compound
#48Dimethylsulfoxide formulation in mixture with additive for lowering the crystallization point of same, and applications of said mixture
#49COMPOSITIONS AND USES OF CIS-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE
#50CLEANING SYSTEM UTILIZING AN ORGANIC CLEANING SOLVENT AND A PRESSURIZED FLUID SOLVENT
#51COMPOSITIONS OF HYDROCHLOROFLUOROOLEFINS
#52Functional material and delivery gel composition and method for manufacturing
#53METHOD OF APPLYING A NON-VOC COATING
#54SPRAY-BASED DEGREASING FLUID
#55SPRAY-BASED DEGREASING FLUID
#56Liquid compostion for cleaning a nozzle surface, method of cleaning a nozzle surface using the liquid composition, and inkjet recording apparatus including the liquid composition
#57Compositions for processing of semiconductor substrates
#58Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#59Dimethyl sulfoxide formulation in mixture with additive for lowering the crystallization point of same, and applications of said mixture
#60Composition and method using same to remove urethane products from a substrate
#61MALODOR REDUCING COMPOSITION, FRAGRANCE COMPOSITION AND PRODUCT COMPRISING THE SAME
#62ANTIMICROBIAL FORMULATIONS COMPRISING A QUINONE AND A COPPER SALT
#63Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
#64DENSE FLUID COMPOSITIONS FOR REMOVAL OF HARDENED PHOTORESIST, POST-ETCH RESIDUE AND/OR BOTTOM ANTI-REFLECTIVE COATING
#65Upper engine cleaning adaptors used to connect a pressurized unit containing an upper engine cleaner to the vehicles plenum
#66Cleaning System Utilizing an Organic Cleaning Solvent and a Pressurized Fluid Solvent
#67Washing and cleaning agents containing acetals as organic solvents
#68IMPROVED ACIDIC CHEMISTRY FOR POST-CMP CLEANING
#69Stripper Containing an Acetal or Ketal for Removing Post-Etched Photo-Resist, Etch Polymer and Residue
#70Processing of semiconductor components with dense processing fluids
#71Cleaning Agent for Substrate and Cleaning Method
#72Stable ill-defined cubic nanosized particles in a ternary aqueous phase
#73Supercritical fluid-based cleaning compositions and methods
#74Compositions comprising 1,1,1,3,3-pentafluorobutane and use of these compositions
#75Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
#76Carpet treated for resistance to odors and contaminants and method
#77Method of removing contaminants from carpet with aqueous cleaning composition
#78Method of treating textiles for resistance to odors and contaminants
#79Moistened disposable wipe for controlling allergens
#80Stabilisation of trans-1,2-dichloroethylene
#81Removal of residues for low-k dielectric materials in wafer processing
#82Acidic chemistry for Post-CMP cleaning using a composition comprising mercaptopropionic acid
#83Methods of applying cleaning solvent with titanate adhesion promoter to polymeric substrates
#84Composition and method using same to remove urethane products from a substrate
#85Removing solution
#86Agents against microorganisms containing patchouli oil, patchouli alcohol and/or the derivatives thereof
#87Low VOC air intake system cleaner
#88Liquid composition for removal of odors and contaminants from textiles
#89Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same
#90Photo resist stripper composition
#91Method to increase flash points of flammable solvents
#92Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal
#93Novel catalytic activities of oxidoreductases for oxidation and or bleaching
#94Compositions containing fluorinated hydrocarbons and oxygenated solvents
#95Method and composition for removing waxy soils
#96Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#97Acidic chemistry for post-CMP cleaning
#98Composition for removal of odors and contaminants from textiles and method
#99Cleaning solution, method for cleaning semiconductor substrate using the same, and method for forming metal wiring
#100Alkaline chemistry for post-CMP cleaning
#101Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates
#102Cleaning agent composition for a positive or a negative photoresist
#103Process of treating a carpet with a composition comprising a zeolite
#104Stripping agent composition for a resist
#105Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#106Multi-purpose solvent cleaning agent comprising soy extract and parachlorobenzotrifluoride