120002 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material; Reactive sputtering or evaporation; Reactive sputtering by exposing the substrates to reactive gases intermittently
Sub-classes:FILM FORMING APPARATUS AND FILM FORMING METHOD
#2Coating with enhanced sliding properties
#3THIN FILM TRANSISTOR, ARRAY SUBSTRATE, AND DISPLAY APPARATUS, AND THEIR FABRICATION METHODS
#4Hard lubricating coating film and hard lubricating coating film-covered tool
#5Coating with enhanced sliding properties
#6Method for manufacturing acoustic wave device
#7METHOD OF CONTROLLING LITHIUM UNIFORMITY
#8METHOD OF CONTROLLING LITHIUM UNIFORMITY
#9Method of producing α crystal structure-based alumina films
#10Inorganic graded barrier film and methods for their manufacture
#11Multilayered coated cutting tool
#12Chromium nitride ion-plating coating and its production method, as well as piston ring used for internal combustion engine
#13Manufacturable reliable diffusion-barrier
#14Gas-timing method for depositing oxynitride films by reactive R.F. magnetron sputtering
#15REACTIVE SPUTTER DEPOSITION OF A TRANSPARENT CONDUCTIVE FILM
#16APPARATUS FOR REACTIVE SPUTTERING
#17METHOD FOR MANUFACTURING CONDUCTIVE COMPLEX OXIDE LAYER, AND METHOD FOR MANUFACTURING LAMINATED BODY HAVING FERROELECTRIC LAYER
#18Anode reactive dual magnetron sputtering
#19Method for preparing alumna coating film having alpha-type crystal structure as primary structure
#20Rapid cycle time gas burster