Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetron

Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece with a lighter-than-copper carrier gas

Physical vapor deposition plasma reactor with VHF source power applied through the workpiece

Multi-place coating apparatus and process for plasma coating

Method for filtering particles from a fluid

Method of depositing material on a substrate for a device

Apparatus for fabricating display device

Method and device for plasma treating workpieces

Magnetron sputtering apparatus and method for depositing a coating using same

Method for magnetron sputter deposition

Method for forming a barrier layer in an integrated circuit in a plasma with source and bias power frequencies applied through the workpiece

Apparatus for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece

Apparatus and method for coating an article

Methods and apparatus for forming barrier layers in high aspect ratio vias

Method and device for the incorporating a compound in the pores of a porous material and uses thereof

Method for the surface activation on the metalization of electronic devices

Plasma immersion ion implantation reactor having multiple ion shower grids

Apparatus for depositing a thin film on a substrate

Enhanced step coverage of thin films on patterned substrates by oblique angle PVD

Isotropic glass-like conformal coatings and methods for applying same to non-planar substrate surfaces at microscopic levels

Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer

Coating process for patterned substrate surfaces

Methods and apparatus for forming barrier layers in high aspect ratio vias

Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process

Multi-step process for forming a metal barrier in a sputter reactor

Apparatus for directing plasma flow to coat internal passageways

Controlled multi-step magnetron sputtering process

Self-ionized and inductively-coupled plasma for sputtering and resputtering

Apparatus and method for high rate uniform coating, including non-line of sight

Method and apparatus for forming a barrier layer on a substrate

Method and device for plasma treating workpieces

Method and device for the plasma treatment of workpieces

Coating device comprising a conveying device

Ionized physical vapor deposition (iPVD) process

Method of depositing a tantalum nitride/tantalum diffusion barrier layer system

Component comprising submicron hollow spaces

Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma

[PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREFOR]

Shields usable with an inductively coupled plasma reactor

Method and apparatus for forming a barrier layer on a substrate

Hydrogen-permeable membrane and process for production thereof

Isotropic glass-like conformal coatings and methods for applying same to non-planar substrate surfaces at microscopic levels

End point detection for sputtering and resputtering

Getter metal alloy coating and device and method for the production thereof

Method of forming a metal silicide layer on non-planar-topography polysilicon

Integration of barrier layer and seed layer

Apparatus and process for physical vapor deposition

Multi-cathode ionized physical vapor deposition system

Method of depositing a metal seed layer on semiconductor substrates

Multi-step magnetron sputtering process

Method and apparatus for ionization film formation

Method of depositing a diffusion barrier layer and a metal conductive layer

[IONIZED PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREOF]

Self-ionized and inductively-coupled plasma for sputtering and resputtering

Conformal films on semiconductor substrates