120017 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material; Coating on selected surface areas, e.g. using masks Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
USE OF VAPOR DEPOSITION COATED FLOW PATHS FOR IMPROVED CHROMATOGRAPHY OF METAL INTERACTING ANALYTES
#2NANOPARTICLE COATER
#3HIGH ASPECT RATIO GAP FILL USING CYCLIC DEPOSITION AND ETCH
#4PREPARATION METHOD OF ALUMINUM NITRIDE SUBSTRATE
#5PROTECTION OF SENSITIVE SURFACES IN SEMICONDUCTOR PROCESSING
#6DISPLAY PANEL, ELECTRONIC DEVICE, SPUTTERING DEVICE, AND MANUFACTURING METHOD OF DISPLAY PANEL USING THE SAME
#7METAL FOAM THERMAL INTERFACE MATERIALS
#8Method for producing a coating of a base body and functional element having a base body with a coating
#9DEPOSITION MASK AND DEPOSITION EQUIPMENT INCLUDING THE SAME
#10VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING LIGHT-EMITTING ELEMENT
#11APPARATUS AND METHOD FOR COATING THE INNER SURFACE OF A HOLLOW ARTICLE
#12METHOD OF PHYSICAL VAPOR DEPOSITION WITH INTERMIXING REDUCTION
#13REACTIVE-ION DEPOSITION PROCESSES FOR DIELECTRIC MATERIAL FORMATION
#14LC/MS ADDUCT MITIGATION BY VAPOR DEPOSITION COATED SURFACES
#15METALLIC FOAM BODY WITH CONTROLLED GRAIN SIZE ON ITS SURFACE, PROCESS FOR ITS PRODUCTION AND USE THEREOF
#16Semiconductor Device, Method and Machine of Manufacture
#17PVD DIRECTIONAL DEPOSITION FOR ENCAPSULATION
#18Metallic Nanohole Arrays on Nanowells with Controlled Depth and Methods of Making the Same
#19LC/MS adduct mitigation by vapor deposition coated surfaces
#20USE OF VAPOR DEPOSITION COATED FLOW PATHS FOR IMPROVED CHROMATOGRAPHY OF METAL INTERACTING ANALYTES
#21NOBLE METAL-TRANSITION METAL-BASED NANO-CATALYST THIN FILM AND PREPARATION METHOD THEREOF
#22COUNTER ELECTRODE MATERIAL FOR ELECTROCHROMIC DEVICES
#23Magnetic-field-assisted plasma coating system
#24PRECIOUS METAL LAMINATE AND METHODS OF MANUFACTURE
#25Method for producing a coating of a base body and functional element having a base body with a coating
#26EROSION RESISTANT METAL SILICATE COATINGS
#27Semiconductor device, method and machine of manufacture
#28Surface structure having function freezing delay and icing layer separation and manufacturing method thereof
#29NANOPARTICLE COATER
#30Fabrication of low defectivity electrochromic devices
#31Methods of forming metal chalcogenide pillars
#32Coating of nano-scaled cavities
#33LC/MS adduct mitigation by vapor deposition coated surfaces
#34Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
#35Production of nanostructured materials
#36Counter electrode material for electrochromic devices
#37Method of low-temperature plasma generation, method of an electrically conductive or ferromagnetic tube coating using pulsed plasma and corresponding devices
#38Methods, materials systems, and devices for inhibiting infiltration and penetration of molten salts into solid materials
#39Substrate comprising plasmonic continuous film with curved surface and manufacturing method thereof
#40METALLIC FOAM BODY WITH CONTROLLED GRAIN SIZE ON ITS SURFACE, PROCESS FOR ITS PRODUCTION AND USE THEREOF
#41Reactive sputtering with HIPIMS
#42Biasable flux optimizer / collimator for PVD sputter chamber
#43Porous aluminum macroscopic body and fabrication system and method therefor
#44Coating of nano-scaled cavities
#45USE OF VAPOR DEPOSITION COATED FLOW PATHS FOR IMPROVED ANALYTICAL ANALYSIS
#46PVD directional deposition for encapsulation
#47Systems and methods for optimal source material deposition along hole edges
#48Interposer, semiconductor package, and method of fabricating interposer
#49FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES
#50Semiconductor device, method and machine of manufacture
#51FILLING A CAVITY IN A SUBSTRATE USING SPUTTERING AND DEPOSITION
#52First wall conditioning in a fusion reactor vessel
#53FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES
#54Pre-conditioned chamber components
#55Process for making alkali metal vapor cells
#56Erosion resistant metal silicate coatings
#57Physical vapor deposition in-chamber electro-magnet
#58Methods of forming metal silicide layers and metal silicide layers formed therefrom
#59Methods of forming metal chalcogenide pillars
#60Biasable flux optimizer / collimator for PVD sputter chamber
#61Plasma etching apparatus
#62Modulating the microstructure of metallic interconnect structures
#63Integration of ALD copper with high temperature PVD copper deposition for BEOL interconnect
#64Counter electrode material for electrochromic devices
#65COATED PISTON RING HAVING A PROTECTIVE LAYER
#66Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
#67Production of nanostructured materials
#68SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING
#69Mask assembly including first and second support sheets
#70Method for coating motor pistons
#71Fabrication of low defectivity electrochromic devices
#72Biasable flux optimizer / collimator for PVD sputter chamber
#73Fabrication of low defectivity electrochromic devices
#74Systems and methods for integrated resputtering in a physical vapor deposition chamber
#75Collimator for use in a physical vapor deposition chamber
#76Material deposition for high aspect ratio structures
#77Directed surface functionalization on selected surface areas of topographical features with nanometer resolution
#78FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES
#79Apparatus and methods for deposition of materials on interior surfaces of hollow components
#80Cu wiring forming method and semiconductor device manufacturing method
#81Nanoparticle deposition in porous and on planar substrates
#82Manufacturing method for gas cell, manufacturing method for magnetic field measurement apparatus, and gas cell
#83Cylinder liners with adhesive metallic layers and methods of forming the cylinder liners
#84METHOD OF REFURBISHING HIGH VALUE ARTICLES
#85Filling a cavity in a substrate using sputtering and deposition
#86Method of fabricating an interposer
#87Fabrication of low defectivity electrochromic devices
#88Ionized physical vapor deposition (IPVD) apparatus and method for an inductively coupled plasma sweeping source
#89Methods for forming carbon opal templates and their use in forming inverse opals
#90Systems and methods for gap filling improvement
#91METHOD OF SPUTTER DEPOSITION OF A FILM ON AN ESSENTIALLY PLANE EXTENDED SURFACE OF A SUBSTRATE
#92SPUTTERING SOURCE ARRANGEMENT, SPUTTERING SYSTEM AND METHOD OF MANUFACTURING METAL-COATED PLATE-SHAPED SUBSTRATES
#93METALLIC FOAM BODY WITH CONTROLLED GRAIN SIZE ON ITS SURFACE, PROCESS FOR ITS PRODUCTION AND USE THEREOF
#94Float bath coating system
#95Nanoparticle coater
#96Biasable flux optimizer / collimator for PVD sputter chamber
#97Metallic dielectric photonic crystals and methods of fabrication
#98Method and system for three-dimensional (3D) structure fill
#99Apparatus and method for coating inner wall of metal tube
#100Infiltration device and method
#101Depositing method of deposition material using laser beams as mask
#102Apparatus for forming a transition metal chalcogenide thin-film
#103Protecting an interior of a gas container with an ALD coating
#104Fabrication of low defectivity electrochromic devices
#105Method for depositing a diffusion barrier layer and a metal conductive layer
#106Substrate processing method and method of manufacturing semiconductor device
#107Method of refurbishing high value articles
#108Physical vapor deposition system and physical vapor depositing method using the same
#109Gamma radiation stand-off detection, tamper detection, and authentication via resonant meta-material structures
#110Plasma etching apparatus
#111Collimator for use in substrate processing chambers
#112Method for manufacturing copper layer
#113METHOD FOR FILLING VIAS AND SUBSTRATE-VIA FILLING VACUUM PROCESSING SYSTEM
#114Fabrication of low defectivity electrochromic devices
#115Material deposition for high aspect ratio structures
#116Subwavelength coatings and methods for making and using same
#117Method for making microstructure on substrate
#118Interconnect structure and manufacturing method thereof
#119Method of manufacturing semiconductor device
#120Systems and methods for integrated resputtering in a physical vapor deposition chamber
#121Systems and methods for gap filling improvement
#122Methods for preferential growth of cobalt within substrate features
#123Method and apparatus for producing diffusion aluminide coatings
#124Process for manufacturing an electrically conductive member for an electronic component comprising an end equipped with a cavity
#125Semiconductor devices and methods for fabricating the same
#126Nanofluidic sensor comprising spatially separated functional sensing components
#127Directed surface functionalization on selected surface areas of topographical features with nanometer resolution
#128Nanofluidic sensor comprising spatially separated functional sensing components
#129Directed surface functionalization on selected surface areas of topographical features with nanometer resolution
#130Systems and method of coating an interior surface of an object
#131Method and system for three-dimensional (3D) structure fill
#132PISTON RING AND METHOD FOR THE PRODUCTION THEREOF
#133Plating method, plating system and storage medium
#134Metallic dielectric photonic crystals and methods of fabrication
#135Fabrication of low defectivity electrochromic devices
#136Conductive transparent film and method for making same
#137Electronic component manufacturing method and electrode structure
#138Self-ionized and inductively-coupled plasma for sputtering and resputtering
#139Cylinder liners with adhesive metallic layers and methods of forming the cylinder liners
#140Graphic formation via material ablation
#141In-situ sputtering apparatus
#142Apparatus for sputtering and a method of fabricating a metallization structure
#143Method to prewet wafer surface
#144Method for manufacturing ion optical device
#145METHOD AND APPARATUS DEPOSITION PROCESS SYNCHRONIZATION
#146ANISOTROPIC SURFACE ENERGY MODULATION BY ION IMPLANTATION
#147Three dimensional metal deposition technique
#148Method of manufacturing semiconductor device
#149High surface area carbon opals and inverse opals obtained therefrom
#150Method for producing a solar cell
#151Integration of bottom-up metal film deposition
#152Continuous plasma and RF bias to regulate damage in a substrate processing system
#153Semiconductor device manufacturing method
#154Crystalline orientation and overhang control in collision based RF plasmas
#155Pressure masking systems and methods for using the same
#156Method for manufacturing a porous device with restrictive layer and structure thereof
#157Fabrication of low defectivity electrochromic devices
#158Methods of preventing plasma induced damage during substrate processing
#159Systems and processes for forming molds such as nickel molds
#160Substrate wiring method and semiconductor manufacturing device
#161Method of manufacturing semiconductor device
#162Barrel
#163Write pole and shield with different taper angles
#164METHOD FOR PRODUCING A PLAIN BEARING ELEMENT
#165FILM FORMING METHOD, RESPUTTERING METHOD, AND FILM FORMING APPARATUS
#166CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLASMA DEPOSITION AND RESPUTTERING UNIFORMITY
#167System for Fabricating a Pattern on Magnetic Recording Media
#168Manufacturing method for light emitting device
#169Methods of forming copper wiring and copper film, and film forming system
#170Method of forming copper wiring and method and system for forming copper film
#171GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS
#172Methods for depositing metal in high aspect ratio features
#173METHODS FOR FORMING BARRIER/SEED LAYERS FOR COPPER INTERCONNECT STRUCTURES
#174Product for removing pollutants from a fluid, and method for producing same
#175PLASMA PROCESSING APPARATUS AND PRINTED WIRING BOARD MANUFACTURING METHOD
#176Methods of forming layers on substrates
#177FILM FORMATION APPARATUS AND FILM FORMING METHOD
#178Conformal coating of highly structured surfaces
#179Integration of bottom-up metal film deposition
#180Methods for depositing metal in high aspect ratio features
#181Organic optoelectronic component having a radiation-emitting layer containing an organic material
#182Methods for forming interconnect structures
#183Method of depositing a uniform barrier layer and metal seed layer with reduced overhang over a plurality of recessed semiconductor features
#184Sputtering apparatus and sputtering method
#185Apparatus and method utilizing a double glow discharge plasma for sputter cleaning
#186Manufacturing method for light emitting device
#187Fabrication of low defectivity electrochromic devices
#188Methods for depositing a layer on a substrate using surface energy modulation
#189Integration of bottom-up metal film deposition
#190Plasma Processing Method and Plasma Processing Apparatus
#191Thin film forming method
#192Semiconductor device and method for manufacturing same
#193Method for repairing cracks in structures
#194Method of burying metal and apparatus of depositing metal in concave portion
#195STRAND-LIKE MATERIAL COMPOSITE WITH CNT YARNS AND METHOD FOR THE MANUFACTURE THEREOF
#196CHALCOGENIDE FILM AND METHOD OF MANUFACTURING SAME
#197Endoprosthese
#198Method and apparatus for an improved filled via
#199Method of depositing a uniform metal seed layer over a plurality of recessed semiconductor features
#200Electrochromic devices
#201Fabrication of low defectivity electrochromic devices
#202Electron beam vapor deposition apparatus and method of coating
#203THIN FILM FORMING APPARATUS
#204DEPOSITION OF CHALCOGENIDE MATERIALS VIA VAPORIZATION PROCESS
#205Method of plasma vapour deposition
#206Film forming method, plasma film forming apparatus and storage medium
#207Method for forming patterns by vacuum coating
#208SPUTTERING APPARATUS AND FILM FORMING METHOD
#209Electromagnet array in a sputter reactor
#210GAP FILL IMPROVEMENT METHODS FOR PHASE-CHANGE MATERIALS
#211PVD CU SEED OVERHANG RE-SPUTTERING WITH ENHANCED CU IONIZATION
#212METHOD FOR FORMING CHALCOGENIDE FILM AND METHOD FOR MANUFACTURING RECORDING ELEMENT
#213METHOD FOR CHANGING PHYSICAL VAPOR DEPOSITION FILM FORM
#214Conformal films on semiconductor substrates
#215Processing tubular surfaces using double glow discharge
#216IONIZED PHYSICAL VAPOR DEPOSITION (iPVD) PROCESS
#217Sheet Plasma Film-Forming Apparatus
#218Articles with Two Crystalline Materials and Method of Making Same
#219APPARATUS AND METHOD FOR UNIFORM DEPOSITION
#220Method of depositing a metal seed layer over recessed feature surfaces in a semiconductor substrate
#221Apparatus for sputtering and a method of fabricating a metallization structure
#222System and method of forming a low profile conformal shield
#223SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING
#224Film deposition method and film deposition apparatus of metal film
#225Semiconductor device, its manufacturing method, and sputtering target material for use in the method
#226MULTI-CATHODE IONIZED PHYSICAL VAPOR DEPOSITION SYSTEM
#227MULTI-CATHODE IONIZED PHYSICAL VAPOR DEPOSITION SYSTEM
#228Sequential tantalum-nitride deposition
#229Seed Film Forming Method, Plasma-Assisted Film Forming System and Storage Medium
#230MULTI-CATHODE IONIZED PHYSICAL VAPOR DEPOSITION SYSTEM
#231METHOD OF SPUTTERING A HIGH-K DIELECTRIC MATERIAL
#232Reactive sputtering with HIPIMs
#233COPPER METALLIZATION UTILIZING REFLOW ON NOBLE METAL LINERS
#234Plating apparatus and plating method
#235Forming Seed Layer in Nano-Trench Structure Using Net Deposition and Net Etch
#236METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#237Endoprosthesis coating
#238Application of HIPIMS to through silicon via metallization in three-dimensional wafer packaging
#239Semiconductor device, its manufacturing method, and sputtering target material for use in the method
#240Film Deposition Method, Film Deposition Apparatus, and Storage Medium
#241Thin film application device and method for coating small aperture vacuum vessels
#242Protective coating applied to metallic reactor components to reduce corrosion products into the nuclear reactor environment
#243Conformal magnetron sputter deposition
#244Disk structure, manufacturing method thereof and optical tweezers device using the same
#245Method for directing plasma flow to coat internal passageways
#246Apparatus and method for applying coatings onto the interior surfaces of components and related structures produced therefrom
#247REDUCING RESISTIVITY IN METAL INTERCONNECTS USING INTERFACE CONTROL
#248Method for the formation of surfaces on the inside of medical devices
#249Thermal interface material and method for fabricating the same
#250Oxidized barrier layer
#251Semifinished product made of a composite material and method for producing a semifinished product from a composite material
#252Plasma Sputtering Film Deposition Method and Equipment
#253RESPUTTERED COPPER SEED LAYER
#254Offset magnet compensation for non-uniform plasma
#255Apparatus and method for RF plasma enhanced magnetron sputter deposition
#256Magnetron sputtering apparatus and method of manufacturing semiconductor device
#257Method of depositing a sculptured copper seed layer
#258Component comprising submicron hollow spaces
#259Method and Apparatus For Heat Exchange Using Hollow Foams And Interconnected Networks And Method of Making The Same
#260Deposition process for graded cobalt barrier layers
#261Self-ionized and inductively-coupled plasma for sputtering and resputtering
#262Manufacturing method of light-emitting device
#263Method for enlarging a nano-structure
#264Plasma sputtering film deposition method and equipment
#265Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
#266Moulded Body with Evaporation-Sputtered Layers
#267Method of producing metal-oxide film
#268Apparatus for integration of barrier layer and seed layer
#269Multi-component doping of copper seed layer
#270INTERCONNECT METALLIZATION PROCESS WITH 100% OR GREATER STEP COVERAGE
#271Differentially oriented patterned magnetic media
#272Method of forming a film
#273Manufacturing method for an integrated semiconductor contact structure having an improved aluminum fill
#274Metal / metal nitride barrier layer for semiconductor device applications
#275Barrier deposition using ionized physical vapor deposition (iPVD)
#276Depositing rhuthenium films using ionized physical vapor deposition (IPVD)
#277Temperature-controlled metallic dry-fill process
#278Physical vapor deposition plasma reactor with arcing suppression
#279Method for depositing a diffusion barrier layer and a metal conductive layer
#280Method and apparatus for improving symmetry of a layer deposited on a semiconductor substrate
#281Controlled multi-step magnetron sputtering process
#282Device for a coating process, a retort, and a process for internal coating
#283Method for forming a tungsten interconnect structure with enhanced sidewall coverage of the barrier layer
#284Method and apparatus for a metallic dry-filling process
#285Method and apparatus for a metallic dry-filling process
#286Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography
#287Integrated process for sputter deposition of a conductive barrier layer, especially an alloy of ruthenium and tantalum, underlying copper or copper alloy seed layer
#288Process for producing metal foams having uniform cell structure
#289Aluminum sputtering while biasing wafer
#290Method of depositing a metal seed layer on semiconductor substrates
#291System and method for forming thin film metal layers in vias
#292Method for magnetron sputter deposition
#293Process for physical vapor deposition of a chalcogenide material layer and chamber for physical vapor deposition of a chalcogenide material layer of a phase change memory device
#294Method of forming an interconnect structure
#295Method of forming a trench structure
#296Ionized physical vapor deposition (iPVD) process
#297Method of performing physical vapor deposition with RF plasma source power applied to the target using a magnetron
#298Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece
#299Method for plasma-enhanced physical vapor deposition of copper with RF source power applied to the target
#300Physical vapor deposition plasma reactor with RF source power applied to the target