ClassID:

120032

C23C14/0676 - page 2 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material Oxynitrides

Recent Application in this class:
#301
20070163873
2007-07-19

Target material and its use in a sputter process

#302
20070099092
2007-05-03

Halftone phase shift mask blank, and method of manufacture

#303
20070087230
2007-04-19

Method and apparatus for integrated-circuit battery devices

#304
20070087224
2007-04-19

Hard film and hard film-coated tool

#305
20070036986
2007-02-15

Coated article with low-E coating including zirconium silicon oxynitride and methods of making same

#306
20060269788
2006-11-30

Hard-coated member

#307
20060121290
2006-06-08

Coated article with low-E coating including zirconium silicon oxynitride and methods of making same

#308
20060088718
2006-04-27

Electro-optical device, method of manufacturing the same, and electronic apparatus

#309
20060063074
2006-03-23

Thin-film battery having ultra-thin electrolyte

#310
20060027450
2006-02-09

Arrangement and method for the production of gas-impermeable layers

#311
20060021214
2006-02-02

Methods for making device enclosures and devices with an integrated battery

#312
20060019157
2006-01-26

Thin-film battery devices and apparatus for making the same

#313
20060008749
2006-01-12

Method for manufacturing of a mask blank for EUV photolithography and mask blank

#314
20050260505
2005-11-24

Preparation of photomask blank and photomask

#315
20050258030
2005-11-24

Effects of methods of manufacturing sputtering targets on characteristics of coatings

#316
20050250017
2005-11-10

Method for manufacturing mask blank, method for manufacturing transfer mask, sputtering target for manufacturing mask blank

#317
20050249898
2005-11-10

Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film

#318
20050191522
2005-09-01

Article coated with zirconium compound film, method for preparing the article and sputtering target for use in coating with the film

#319
20050186485
2005-08-25

Preparation of halftone phase shift mask blank

#320
20050178655
2005-08-18

Article coated with zirconium compound film, method for preparing the article and sputtering target for use in coating with the film

#321
20050170162
2005-08-04

Hard laminated film, method of manufacturing the same and film-forming device

#322
20050142463
2005-06-30

Photomask blank, photomask, methods of manufacturing the same and methods of forming micropattern

#323
20050045223
2005-03-03

Integrated capacitor-like battery and associated method

#324
20050037240
2005-02-17

Protective coat and method for manufacturing thereof

#325
20050037239
2005-02-17

Hard material layer

#326
19211710
2025-09-02

Method for forming a chromium nitride/oxide film

#327
19185035
2025-08-05

Low pressure closed chamber method for forming chromium nitride thin film

#328
18723483
2025-02-04

Cutting tool

#329
16114525
2019-12-03

Film-forming method, production method for product with ceramic film, and product with ceramic film