120068 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering Cathode assembly for sputtering apparatus, e.g. Target
Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film
#902Metal Double-Layer Structure and Method For Manufacturing the Same and Regeneration Method of Sputtering Target Employing That Method
#903Supply end block for rotary magnetron
#904Plasma sputtering target assembly and manufacturing method therefor
#905Method and apparatus for treating sputtering target to reduce burn-in time and sputtering targets made thereby
#906Method and apparatus for automation of PTF measurement in sputter targets
#907Sputtering target, sputtering target-backing plate assembly and deposition system
#908Flat end-block for carrying a rotatable sputtering target
#909SYSTEM AND METHOD OF MANUFACTURING SPUTTERING TARGETS
#910Film-forming system, film-forming method, insulating film, dielectric film, piezoelectric film, ferroelectric film, piezoelectric element and liquid discharge system
#911SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF
#912MONOLITHIC TARGET FOR FLAT PANEL APPLICATION
#913Segmented/modular magnet bars for sputtering target
#914Novel manufacturing design and processing methods and apparatus for PVD targets
#915Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film
#916Device For Plasma-Treating And/Or Coating Work Pieces
#917Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film
#918Method and apparatus for trans-zone sputtering
#919Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film
#920COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN
#921Magnetron for cylindrical targets
#922Dual hexagonal shaped plasma source
#923Method for forming sputter target assemblies having a controlled solder thickness
#924PVD cylindrical target
#925Vacuum elastomer bonding apparatus and method
#926Electrically Coupled Target Panels
#927Backing plate assembly
#928PVD target
#929Large Area Sputtering Target
#930Large Area Sputtering Target
#931Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same
#932Silicon alloy coating of insulated wire
#933Sputtering target as well as a joined type sputtering target assembly and a method of making such a joined type sputtering target assembly
#934Target for a sputtering source
#935Sputtering target and sputtering equipment
#936SUPPORT PLATE FOR SPUTTER TARGETS
#937Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers
#938Three-dimensional pvd targets, and methods of forming three-dimensional pvd targets
#939COOLABLE CARRIER PLATE FOR TARGETS IN VACUUM ATOMIZATION SYSTEMS
#940Process kit components for titanium sputtering chamber
#941Target for sputtering chamber
#942Cooling plate and manufacturing method thereof, and sputtering target and manufacturing method thereof
#943Cathode sputtering gas distribution apparatus
#944Flexible magnetron including partial rolling support and centering pins
#945Target arrangement for mounting / dismounting and method of manufacturing
#946Sputter apparatus with a pipe cathode and method for operating this sputter apparatus
#947Target designs and related methods for enhanced cooling and reduced deflection and deformation
#948SPUTTERING TARGET FOR TITANIUM SPUTTERING CHAMBER
#949Sputtering target with few surface defects, and surface processing method thereof
#950Sputtering target assembly having low conductivity backing plate and method of making same
#951Process kit and target for substrate processing chamber
#952Inertial bonding method of forming a sputtering target assembly and assembly made therefrom
#953Method for the production of a substrate
#954Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths
#955Very long cylindrical sputtering target and method for manufacturing
#956PVD target with end of service life detection capability
#957PVD target with end of service life detection capability
#958METHOD OF USING A TARGET HAVING END OF SERVICE LIFE DETECTION CAPABILITY
#959Method of manufacturing a rotary sputtering target using a mold
#960Sputtering target with bonding layer of varying thickness under target material
#961Large-area magnetron sputtering chamber with individually controlled sputtering zones
#962Multiple zone sputtering target created through conductive and insulation bonding
#963Coating machine and method for operating a coating machine
#964Method of processing a substrate using a large-area magnetron sputtering chamber with individually controlled sputtering zones
#965Methods of treating deposition process components to form particle traps, and deposition process components having particle traps thereon
#966Monolithic sputter target backing plate with integrated cooling passages
#967Copper-containing pvd targets and methods for their manufacture
#968Tube cathode for use in sputter processes
#969Controllable target cooling
#970Variable thickness plate for forming variable wall thickness physical vapor deposition target
#971Centering mechanism for aligning sputtering target tiles
#972Sputtering target with slow-sputter layer under target material
#973Bonding of target tiles to backing plate with patterned bonding agent
#974Use of DC magnetron sputtering systems
#975Large area elastomer bonded sputtering target and method for manufacturing
#976Cooling plate
#977Elastomer bonding of large area sputtering target
#978Sputtering target tiles having structured edges separated by a gap
#979Multiple target tiles with complementary beveled edges forming a slanted gap therebetween
#980Systems and methods for non-contact measuring sputtering target thickness ultrasonics
#981Target assemblies, targets, backing plates, and methods of target cooling
#982System and method for processing nanowires with holographic optical tweezers
#983Apparatus and methods for ionized deposition of a film or thin layer
#984Cylindrical sputtering apparatus
#985Sputtering target and method for preparation thereof
#986Method of forming inorganic orientation film, inorganic orientation film, substrate for electronic devices, liquid crystal panel, and electronic equipment
#987Method of manufacturing a sputter target
#988Sputtering cathode, production method and corresponding cathode
#989Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body
#990Tubular sputtering target
#991Method of manufacturing alloy sputtering targets
#992Target and manufacturing method thereof
#993Magnetron sputter cathode
#994Core insert for a glass molding machine, and an apparatus for making the same
#995Cooled backing plate for a sputtering target, and sputtering target comprising a plurality of backing plates
#996Contacting of an electrode with a substance in vacuum
#997Cooling plate and manufacturing method thereof, and sputtering target and manufacturing method thereof
#998Sputter coating system
#999Assembly for sputtering aluminum-neodymium alloys
#1000Backing plates for sputtering targets
#1001Non-planar sputter targets having crystallographic orientations promoting uniform deposition
#1002Physical vapor deposition target constructions
#1003Non-bonded rotatable targets for sputtering
#1004Target and method of diffusion bonding target to backing plate
#1005PVD target support members and methods of making
#1006Apparatus, method and system for monitoring chamber parameters associated with a deposition process
#1007Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber
#1008Sputtering cathode adapter assembly and method
#1009Slotted thin-film sputter deposition targets for ferromagnetic materials
#1010Coating system for coating a mold
#1011Target tiles in a staggered array
#1012Staggered target tiles
#1013Systems and methods for a target and backing plate assembly
#1014Sputtering cathode for coating processes
#1015Method of forming metal blanks for sputtering targets
#1016Methods of forming PVD target/backing plate constructions
#1017Sputtering device
#1018Controlled cooling of sputter targets
#1019Power coupling for high-power sputtering
#1020Target support assembly
#1021Magnetron sputtering source and chamber therefor
#1022Method and system for target lifetime
#1023Mask blank manufacturing method and sputtering target for manufacturing the same
#1024Hollow cathode target and methods of making same
#1025Replaceable target sidewall insert with texturing
#1026Thermography test method and apparatus for bonding evaluation in sputtering targets
#1027Mechanism for varying the spacing between sputter magnetron and target
#1028Compensation of spacing between magnetron and sputter target
#1029High purity ferromagnetic sputter target, assembly and method of manufacturing same
#1030Silver selenide film stoichiometry and morphology control in sputter deposition
#1031Method of manufacturing sputter targets with internal cooling channels
#1032Copper film containing tungsten carbide for improving electrical conductivity, thermal stability and hardness properties and a manufacturing method for the copper film
#1033Methods of treating non-sputtered regions of PVD target constructions to form particle traps
#1034Cathode structure for vacuum sputtering machine
#1035Sputter target having modified surface texture
#1036Method for centering a sputter target onto a backing plate and the assembly thereof
#1037Method of manufacturing an extended life sputter target assembly and product thereof
#1038Sputtering target assembly and sputtering apparatus using the same
#1039Method of treating sputtering target to reduce burn-in time and sputtering target thereof and apparatus thereof
#1040Cathodic sputtering apparatus
#1041Device for measuring the profile of a metal film sputter deposition target, and system and method employing same
#1042Method of forming film by sputtering, optical member, and sputtering apparatus
#1043Plasma sprayed indium tin oxide target for sputtering
#1044Sputtering target assemblies using resistance welding
#1045Target for sputtering and a method for manufacturing a magnetic recording medium using the target
#1046High-resistivity ruthenium oxide thin film fabrication and temperature sensor structure with high-resistivity ruthenium oxide thin film
#1047Sputtering targets, and related apparatuses and methods
#1048Wireless camera wafer for vacuum chamber diagnostics
#1049Cathode assemblies and sputtering systems
#1050Portable sputtering apparatus and method
#1051Apparatus for enhanced physical vapor deposition
#1052Single layer small grain size FePT:C film for heat assisted magnetic recording media
#1053Portable sputtering apparatus and method
#1054Cooling water jet pack for high power rotary cathodes