ClassID:

120068

C23C14/3407 - page 4 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering Cathode assembly for sputtering apparatus, e.g. Target

Recent Application in this class:
#901
20080171184
2008-07-17

Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film

#902
20080135405
2008-06-12

Metal Double-Layer Structure and Method For Manufacturing the Same and Regeneration Method of Sputtering Target Employing That Method

#903
20080128276
2008-06-05

Supply end block for rotary magnetron

#904
20080121521
2008-05-29

Plasma sputtering target assembly and manufacturing method therefor

#905
20080121516
2008-05-29

Method and apparatus for treating sputtering target to reduce burn-in time and sputtering targets made thereby

#906
20080116887
2008-05-22

Method and apparatus for automation of PTF measurement in sputter targets

#907
20080116066
2008-05-22

Sputtering target, sputtering target-backing plate assembly and deposition system

#908
20080105543
2008-05-08

Flat end-block for carrying a rotatable sputtering target

#909
20080105542
2008-05-08

SYSTEM AND METHOD OF MANUFACTURING SPUTTERING TARGETS

#910
20080081128
2008-04-03

Film-forming system, film-forming method, insulating film, dielectric film, piezoelectric film, ferroelectric film, piezoelectric element and liquid discharge system

#911
20080073411
2008-03-27

SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF

#912
20080067058
2008-03-20

MONOLITHIC TARGET FOR FLAT PANEL APPLICATION

#913
20080047831
2008-02-28

Segmented/modular magnet bars for sputtering target

#914
20080041720
2008-02-21

Novel manufacturing design and processing methods and apparatus for PVD targets

#915
20080038565
2008-02-14

Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film

#916
20080035470
2008-02-14

Device For Plasma-Treating And/Or Coating Work Pieces

#917
20080032108
2008-02-07

Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film

#918
20080029386
2008-02-07

Method and apparatus for trans-zone sputtering

#919
20080026198
2008-01-31

Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film

#920
20080017501
2008-01-24

COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN

#921
20080012460
2008-01-17

Magnetron for cylindrical targets

#922
20080011600
2008-01-17

Dual hexagonal shaped plasma source

#923
20080006528
2008-01-10

Method for forming sputter target assemblies having a controlled solder thickness

#924
20080003385
2008-01-03

PVD cylindrical target

#925
20080000770
2008-01-03

Vacuum elastomer bonding apparatus and method

#926
20080000768
2008-01-03

Electrically Coupled Target Panels

#927
20070295598
2007-12-27

Backing plate assembly

#928
20070295596
2007-12-27

PVD target

#929
20070289869
2007-12-20

Large Area Sputtering Target

#930
20070289864
2007-12-20

Large Area Sputtering Target

#931
20070278091
2007-12-06

Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same

#932
20070256928
2007-11-08

Silicon alloy coating of insulated wire

#933
20070251820
2007-11-01

Sputtering target as well as a joined type sputtering target assembly and a method of making such a joined type sputtering target assembly

#934
20070251814
2007-11-01

Target for a sputtering source

#935
20070240980
2007-10-18

Sputtering target and sputtering equipment

#936
20070205102
2007-09-06

SUPPORT PLATE FOR SPUTTER TARGETS

#937
20070205101
2007-09-06

Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers

#938
20070196563
2007-08-23

Three-dimensional pvd targets, and methods of forming three-dimensional pvd targets

#939
20070193719
2007-08-23

COOLABLE CARRIER PLATE FOR TARGETS IN VACUUM ATOMIZATION SYSTEMS

#940
20070173059
2007-07-26

Process kit components for titanium sputtering chamber

#941
20070170052
2007-07-26

Target for sputtering chamber

#942
20070163120
2007-07-19

Cooling plate and manufacturing method thereof, and sputtering target and manufacturing method thereof

#943
20070158186
2007-07-12

Cathode sputtering gas distribution apparatus

#944
20070151841
2007-07-05

Flexible magnetron including partial rolling support and centering pins

#945
20070144899
2007-06-28

Target arrangement for mounting / dismounting and method of manufacturing

#946
20070144891
2007-06-28

Sputter apparatus with a pipe cathode and method for operating this sputter apparatus

#947
20070141857
2007-06-21

Target designs and related methods for enhanced cooling and reduced deflection and deformation

#948
20070125646
2007-06-07

SPUTTERING TARGET FOR TITANIUM SPUTTERING CHAMBER

#949
20070125645
2007-06-07

Sputtering target with few surface defects, and surface processing method thereof

#950
20070107185
2007-05-17

Sputtering target assembly having low conductivity backing plate and method of making same

#951
20070102286
2007-05-10

Process kit and target for substrate processing chamber

#952
20070084719
2007-04-19

Inertial bonding method of forming a sputtering target assembly and assembly made therefrom

#953
20070084715
2007-04-19

Method for the production of a substrate

#954
20070080056
2007-04-12

Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths

#955
20070074969
2007-04-05

Very long cylindrical sputtering target and method for manufacturing

#956
20070068804
2007-03-29

PVD target with end of service life detection capability

#957
20070068803
2007-03-29

PVD target with end of service life detection capability

#958
20070068796
2007-03-29

METHOD OF USING A TARGET HAVING END OF SERVICE LIFE DETECTION CAPABILITY

#959
20070062809
2007-03-22

Method of manufacturing a rotary sputtering target using a mold

#960
20070062805
2007-03-22

Sputtering target with bonding layer of varying thickness under target material

#961
20070056850
2007-03-15

Large-area magnetron sputtering chamber with individually controlled sputtering zones

#962
20070056845
2007-03-15

Multiple zone sputtering target created through conductive and insulation bonding

#963
20070056844
2007-03-15

Coating machine and method for operating a coating machine

#964
20070056843
2007-03-15

Method of processing a substrate using a large-area magnetron sputtering chamber with individually controlled sputtering zones

#965
20070056688
2007-03-15

Methods of treating deposition process components to form particle traps, and deposition process components having particle traps thereon

#966
20070045108
2007-03-01

Monolithic sputter target backing plate with integrated cooling passages

#967
20070039817
2007-02-22

Copper-containing pvd targets and methods for their manufacture

#968
20070029192
2007-02-08

Tube cathode for use in sputter processes

#969
20070023275
2007-02-01

Controllable target cooling

#970
20070007131
2007-01-11

Variable thickness plate for forming variable wall thickness physical vapor deposition target

#971
20060289305
2006-12-28

Centering mechanism for aligning sputtering target tiles

#972
20060289304
2006-12-28

Sputtering target with slow-sputter layer under target material

#973
20060283703
2006-12-21

Bonding of target tiles to backing plate with patterned bonding agent

#974
20060278520
2006-12-14

Use of DC magnetron sputtering systems

#975
20060272941
2006-12-07

Large area elastomer bonded sputtering target and method for manufacturing

#976
20060272802
2006-12-07

Cooling plate

#977
20060266643
2006-11-30

Elastomer bonding of large area sputtering target

#978
20060266639
2006-11-30

Sputtering target tiles having structured edges separated by a gap

#979
20060266638
2006-11-30

Multiple target tiles with complementary beveled edges forming a slanted gap therebetween

#980
20060266121
2006-11-30

Systems and methods for non-contact measuring sputtering target thickness ultrasonics

#981
20060260936
2006-11-23

Target assemblies, targets, backing plates, and methods of target cooling

#982
20060240591
2006-10-26

System and method for processing nanowires with holographic optical tweezers

#983
20060226003
2006-10-12

Apparatus and methods for ionized deposition of a film or thin layer

#984
20060213762
2006-09-28

Cylindrical sputtering apparatus

#985
20060207876
2006-09-21

Sputtering target and method for preparation thereof

#986
20060188666
2006-08-24

Method of forming inorganic orientation film, inorganic orientation film, substrate for electronic devices, liquid crystal panel, and electronic equipment

#987
20060175198
2006-08-10

Method of manufacturing a sputter target

#988
20060163059
2006-07-27

Sputtering cathode, production method and corresponding cathode

#989
20060151321
2006-07-13

Cylindrical sputtering target, ceramic sintered body, and process for producing sintered body

#990
20060151320
2006-07-13

Tubular sputtering target

#991
20060137969
2006-06-29

Method of manufacturing alloy sputtering targets

#992
20060118413
2006-06-08

Target and manufacturing method thereof

#993
20060118412
2006-06-08

Magnetron sputter cathode

#994
20060112730
2006-06-01

Core insert for a glass molding machine, and an apparatus for making the same

#995
20060108217
2006-05-25

Cooled backing plate for a sputtering target, and sputtering target comprising a plurality of backing plates

#996
20060102465
2006-05-18

Contacting of an electrode with a substance in vacuum

#997
20060096748
2006-05-11

Cooling plate and manufacturing method thereof, and sputtering target and manufacturing method thereof

#998
20060090999
2006-05-04

Sputter coating system

#999
20060081465
2006-04-20

Assembly for sputtering aluminum-neodymium alloys

#1000
20060081464
2006-04-20

Backing plates for sputtering targets

#1001
20060076234
2006-04-13

Non-planar sputter targets having crystallographic orientations promoting uniform deposition

#1002
20060070876
2006-04-06

Physical vapor deposition target constructions

#1003
20060065524
2006-03-30

Non-bonded rotatable targets for sputtering

#1004
20060065517
2006-03-30

Target and method of diffusion bonding target to backing plate

#1005
20060062686
2006-03-23

PVD target support members and methods of making

#1006
20060054497
2006-03-16

Apparatus, method and system for monitoring chamber parameters associated with a deposition process

#1007
20060054493
2006-03-16

Method of producing a substrate with a surface treated by a vacuum treatment process, use of said method for the production of coated workpieces and plasma treatment chamber

#1008
20060032741
2006-02-16

Sputtering cathode adapter assembly and method

#1009
20060032740
2006-02-16

Slotted thin-film sputter deposition targets for ferromagnetic materials

#1010
20060011469
2006-01-19

Coating system for coating a mold

#1011
20060006064
2006-01-12

Target tiles in a staggered array

#1012
20060006058
2006-01-12

Staggered target tiles

#1013
20050284746
2005-12-29

Systems and methods for a target and backing plate assembly

#1014
20050279629
2005-12-22

Sputtering cathode for coating processes

#1015
20050274775
2005-12-15

Method of forming metal blanks for sputtering targets

#1016
20050269201
2005-12-08

Methods of forming PVD target/backing plate constructions

#1017
20050252767
2005-11-17

Sputtering device

#1018
20050236270
2005-10-27

Controlled cooling of sputter targets

#1019
20050224343
2005-10-13

Power coupling for high-power sputtering

#1020
20050224342
2005-10-13

Target support assembly

#1021
20050217992
2005-10-06

Magnetron sputtering source and chamber therefor

#1022
20050211549
2005-09-29

Method and system for target lifetime

#1023
20050170263
2005-08-04

Mask blank manufacturing method and sputtering target for manufacturing the same

#1024
20050167015
2005-08-04

Hollow cathode target and methods of making same

#1025
20050161322
2005-07-28

Replaceable target sidewall insert with texturing

#1026
20050147150
2005-07-07

Thermography test method and apparatus for bonding evaluation in sputtering targets

#1027
20050133365
2005-06-23

Mechanism for varying the spacing between sputter magnetron and target

#1028
20050133361
2005-06-23

Compensation of spacing between magnetron and sputter target

#1029
20050115045
2005-06-02

High purity ferromagnetic sputter target, assembly and method of manufacturing same

#1030
20050098428
2005-05-12

Silver selenide film stoichiometry and morphology control in sputter deposition

#1031
20050092604
2005-05-05

Method of manufacturing sputter targets with internal cooling channels

#1032
20050087268
2005-04-28

Copper film containing tungsten carbide for improving electrical conductivity, thermal stability and hardness properties and a manufacturing method for the copper film

#1033
20050082258
2005-04-21

Methods of treating non-sputtered regions of PVD target constructions to form particle traps

#1034
20050082166
2005-04-21

Cathode structure for vacuum sputtering machine

#1035
20050072668
2005-04-07

Sputter target having modified surface texture

#1036
20050067469
2005-03-31

Method for centering a sputter target onto a backing plate and the assembly thereof

#1037
20050051606
2005-03-10

Method of manufacturing an extended life sputter target assembly and product thereof

#1038
20050045470
2005-03-03

Sputtering target assembly and sputtering apparatus using the same

#1039
20050040030
2005-02-24

Method of treating sputtering target to reduce burn-in time and sputtering target thereof and apparatus thereof

#1040
20050034981
2005-02-17

Cathodic sputtering apparatus

#1041
20050023132
2005-02-03

Device for measuring the profile of a metal film sputter deposition target, and system and method employing same

#1042
20050016834
2005-01-27

Method of forming film by sputtering, optical member, and sputtering apparatus

#1043
20050016833
2005-01-27

Plasma sprayed indium tin oxide target for sputtering

#1044
20050011749
2005-01-20

Sputtering target assemblies using resistance welding

#1045
20050011746
2005-01-20

Target for sputtering and a method for manufacturing a magnetic recording medium using the target

#1046
18421782
2025-08-26

High-resistivity ruthenium oxide thin film fabrication and temperature sensor structure with high-resistivity ruthenium oxide thin film

#1047
17592339
2026-04-21

Sputtering targets, and related apparatuses and methods

#1048
16458276
2020-08-18

Wireless camera wafer for vacuum chamber diagnostics

#1049
15714069
2020-10-13

Cathode assemblies and sputtering systems

#1050
15591103
2020-11-17

Portable sputtering apparatus and method

#1051
15065704
2018-03-06

Apparatus for enhanced physical vapor deposition

#1052
14069075
2017-01-10

Single layer small grain size FePT:C film for heat assisted magnetic recording media

#1053
13708808
2017-05-09

Portable sputtering apparatus and method

#1054
12888963
2016-12-06

Cooling water jet pack for high power rotary cathodes