120068 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering Cathode assembly for sputtering apparatus, e.g. Target
Recording film for optical information recording medium, optical information recording medium, and sputtering target used to form said recording film
#602TARGET CENTER POSITIONAL CONSTRAINT FOR PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING SYSTEMS
#603TARGET COOLING FOR PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING SYSTEMS
#604Apparatus for cylindrical magnetron sputtering
#605Film-forming apparatus
#606Sputtering target and method for producing same
#607SPUTTERING TARGET AND METHOD FOR USING THE SPUTTERING TARGET
#608Diffusion-bonded sputter target assembly and method of manufacturing
#609Titanium target for sputtering
#610Tubular target having a protective device
#611ADAPTER OF SPUTTERING CHAMBER
#612Three dimensional metal deposition technique
#613Elastomer Bonded Rotary Sputtering Target
#614SPUTTERING TARGET, METHOD FOR USING THE SAME, AND METHOD FOR FORMING OXIDE FILM
#615Thin-film transistor and zinc oxide-based sputtering target for the same
#616Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube
#617OXIDE SINTERED BODY AND SPUTTERING TARGET
#618Method for Manufacturing Target Material for Copper Lead of TFT-LCD Array Substrate and Target Material
#619Photomask blank manufacturing method, photomask blank, photomask, and pattern transfer method
#620Sputtering target for magnetic recording film
#621Al-based alloy sputtering target and Cu-based alloy sputtering target
#622Monolithic aluminum alloy target and method of manufacturing
#623TARGET FOR SPUTTERING AND APPARATUS INCLUDING THE SAME
#624SPUTTERING TARGET AND SPUTTERING APPARATUS AND SPUTTERING METHOD USING THE SAME
#625Oxide sintered body and tablets obtained by processing same
#626Multi-block sputtering target with interface portions and associated methods and articles
#627SPUTTERING DEVICE WITH A TUBULAR TARGET
#628FE-PT-Based Ferromagnetic Sputtering Target and Method for Producing Same
#629Reactive sputter deposition of silicon films
#630Narrow source for physical vapor deposition processing
#631Method of Storing Metal Lanthanum Target, Vacuum-sealed Metal Lanthanum Target, and Thin Film Formed by Sputtering the Metal Lanthanum Target
#632Vapour deposition
#633Sintered oxide material, method for manufacturing same, sputtering target, oxide transparent electrically conductive film, method for manufacturing same, and solar cell
#634Hard film, plastic working die, plastic working method, and target for hard film
#635Substrate processing system having symmetric RF distribution and return paths
#636Substrate processing system with mechanically floating target assembly
#637Electrodes and their fabrication methods as well as applications
#638Oxide for semiconductor layer of thin-film transistor, sputtering target, and thin-film transistor
#639Dual hexagonal shaped plasma source
#640Coating substrates with an alloy by means of cathode sputtering
#641Method of making molybdenum containing targets comprising molybdenum, titanium, and tantalum or chromium
#642Soft magnetic alloy for magnetic recording medium, sputtering target material, and magnetic recording medium
#643Sputtering target-backing plate assembly and method for producing same
#644HIGH TARGET UTILIZATION MOVING MAGNET PLANAR MAGNETRON SCANNING METHOD
#645Zinc oxide sintered compact, sputtering target, and zinc oxide thin film
#646FERROMAGNETIC MATERIAL SPUTTERING TARGET
#647Fe-Pt-based sputtering target with dispersed C grains
#648Sintered Compact Sputtering Target
#649THERMAL DIFFUSION CONTROL FILM FOR USE IN MAGNETIC RECORDING MEDIUM, FOR HEAT-ASSISTED MAGNETIC RECORDING, MAGNETIC RECORDING MEDIUM, AND SPUTTERING TARGET
#650Sputtering Target Having Alarm Function
#651Oxide sintered body and production method therefor, target, and transparent conductive film and transparent conductive substrate obtained by using the same
#652Direct cooled rotary sputtering target
#653Titanium target for sputtering
#654Target device, sputtering apparatus and method for manufacturing a target device
#655Pinned target design for RF capacitive coupled plasma
#656Sintered composite oxide, manufacturing method therefor, sputtering target, transparent conductive oxide film, and manufacturing method therefor
#657Oxide sintered body, target, transparent conductive film obtained by using the same, and transparent conductive substrate
#658Magnetron sputtering target and process for producing the same
#659MAGNETIC CORE FOR CYLINDRICAL MAGNETRON SPUTTERING TARGET
#660Method for Bonding Components of a Sputtering Target, a Bonded Assembly of Sputtering Target Components and the Use Thereof
#661SPRAY REJUVENATION OF SPUTTERING TARGETS
#662System and Method for Aligning Sputter Sources
#663Substrate carrier and applications thereof
#664Interchangeable magnet pack
#665SPUTTER TARGET STRUCTURE OF TRANSPARENT CONDUCTIVE LAYER
#666Non-continuous bonding of sputtering target to backing material
#667Sputtering target of ferromagnetic material with low generation of particles
#668DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER
#669Fabrication of low defectivity electrochromic devices
#670Tantalum sputtering target
#671Magnetic Material Sputtering Target Provided with Groove in Rear Face of Target
#672Method for forming sputter target assemblies having a controlled solder thickness
#673Methods of manufacturing large-area sputtering targets using interlocking joints
#674Large-area sputtering targets
#675Methods of manufacturing large-area sputtering targets
#676Methods of manufacturing high-strength large-area sputtering targets
#677Cooling ring for physical vapor deposition chamber target
#678Electronic device manufacturing method and sputtering method
#679Impermeable PVD Target Coating for Porous Target Materials
#680SPUTTERING SYSTEM
#681Sputtering target with reverse erosion profile surface and sputtering system and method using the same
#682Method for manufacturing acoustic wave device
#683Heterojunction photovoltaic device and fabrication method
#684Heterojunction photovoltaic device and fabrication method
#685SPUTTER GUN
#686DEPOSITION SYSTEM HAVING IMPROVED TARGET COOLING
#687Sputtering target and method for producing same
#688Non-adhesive sputtering structure including a sputtering target and backing plate
#689SPUTTER TARGET
#690SEPARATED TARGET APPARATUS FOR SPUTTERING AND SPUTTERING METHOD USING THE SAME
#691Multi-block sputtering target and associated methods and articles
#692Elastomer Bonded Item and Method for Debonding
#693Method of fabricating high-resolution features
#694SPUTTERING TARGET WITH REDUCED PARTICLE GENERATION AND METHOD OF PRODUCING SAID TARGET
#695SPUTTERING TARGETS, SPUTTER REACTORS, METHODS OF FORMING CAST INGOTS, AND METHODS OF FORMING METALLIC ARTICLES
#696MULTI-LAYERED STRUCTURE AND MANUFACTURING METHOD THEREOF
#697SYSTEMS AND METHODS FOR A TARGET AND BACKING PLATE ASSEMBLY
#698Rotary magnetron magnet bar and apparatus containing the same for high target utilization
#699FILM FORMING METHOD BY SPUTTERING APPARATUS AND SPUTTERING APPARATUS
#700Sputtering target-backing plate assembly, and its production method
#701SPUTTERING APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#702METHOD AND APPARATUS FOR FORMING A CYLINDRICAL TARGET ASSEMBLY
#703Sleep aid composition and method
#704Tube-shaped sputtering target
#705Film-Forming apparatus and Film-Forming method
#706PVD sputtering target with a protected backing plate
#707Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer
#708Method and apparatus for production of rotatable sputtering targets
#709Target cooling through gun drilled holes
#710Sputtering apparatus
#711Alkali Metal Deposition System
#712Encapsulated sputtering target
#713SILICON TARGET FOR SPUTTERING FILM FORMATION AND METHOD FOR FORMING SILICON-CONTAINING THIN FILM
#714PVD target with end of service life detection capability
#715Magnetron with non-equipotential cathode
#716MAGNETRON SPUTTERING APPARATUS
#717Method of making coated article having antibacterial and/or antifungal coating and resulting product
#718PLASMA PROCESSING CHAMBER HAVING ENHANCED DEPOSITION UNIFORMITY
#719Tube target
#720METHOD OF COATING AN RF DEVICE AND SPUTTERING APPARATUS USED IN THE SAME
#721Deposition ring and electrostatic chuck for physical vapor deposition chamber
#722MAGNETRON SPUTTERING CATHODE AND FILM FORMATION APPARATUS
#723ROTARY MAGNETRON
#724Method for manufacturing a sputtering target structure
#725PHYSICAL VAPOR DEPOSITION DEVICE FOR COATING WORKPIECE
#726PLUME STEERING
#727CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLASMA DEPOSITION AND RESPUTTERING UNIFORMITY
#728TARGET ASSEMBLY
#729PHOTOVOLTAIC DEVICE BARRIER LAYER
#730NON-BONDED ROTARY SEMICONDUCTING TARGETS AND METHODS OF THEIR SPUTTERING
#731Method of storing lanthanum oxide target, and vacuum-sealed lanthanum oxide target
#732ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT
#733HOLLOW TARGET ASSEMBLY
#734Magnet transportation system, sputtering apparatus including the same and sputtering method
#735Triangular Scanning Magnet in Sputtering Tool Moving Over Larger Triangular Target
#736Rotary target backing tube bonding assembly
#737Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same
#738Molybdenum-containing targets comprising three metal elements
#739Sputtering target assembly and method of making same
#740COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN
#741Forming memory using high power impulse magnetron sputtering
#742SPUTTERING TARGETS AND METHODS OF FORMING THE SAME
#743Ion beam sputter target and method of manufacture
#744Chamber for physical vapour deposition and door for a physical vapour deposition chamber
#745PHOTOVOLTAIC DEVICE CONDUCTING LAYER
#746TARGET BASE AND SPUTTERING APPARATUS USING SAME
#747Deposition method and method for manufacturing semiconductor device
#748Method of making coated article having anti-bacterial and/or anti-fungal coating and resulting product
#749Ring cathode for use in a magnetron sputtering device
#750Sputtering apparatus and sputtering method
#751Ferroelectric recording medium and method of manufacturing the same, information processing device, and method of processing information
#752Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atoms
#753Target utilization improvement for rotatable magnetrons
#754Cylindrical sputtering target, and method for manufacturing same
#755END-BLOCK AND SPUTTERING INSTALLATION
#756Power storage device
#757DIELECTRIC DEPOSITION USING A REMOTE PLASMA SOURCE
#758ROTATABLE TARGET, BACKING TUBE, SPUTTERING INSTALLATION AND METHOD FOR PRODUCING A ROTATABLE TARGET
#759Apparatus and method for improved darkspace gap design in RF sputtering chamber
#760Circular groove pressing mechanism and method for sputtering target manufacturing
#761Method and device for applying or embedding particles onto or into a layer applied by plasma coating
#762Fabrication of low defectivity electrochromic devices
#763Physical vapor deposition with heat diffuser
#764Physical vapor deposition with multi-point clamp
#765Thin-film forming sputtering system
#766METHOD OF BONDING ROTATABLE CERAMIC TARGETS TO A BACKING STRUCTURE
#767Target shaping
#768METHOD FOR PRODUCING AN ITO LAYER AND SPUTTERING SYSTEM
#769Cylindrical magnetron having a shunt
#770TARGET ASSEMBLY FOR A MAGNETRON SPUTTERING APPARATUS, A MAGNETRON SPUTTERING APPARATUS AND A METHOD OF USING THE MAGNETRON SPUTTERING APPARATUS
#771SPUTTERING APPARATUS WITH ROTATABLE SPUTTERING TARGET
#772SUPPORT DEVICE AND COATING DEVICE USING SAME
#773ROTARY SPUTTERING TARGET AND APPARATUS FOR MANUFACTURE
#774Method for Storing Target Comprising Rare Earth Metal or Oxide Thereof
#775Supporting device for a magnetron assembly with a rotatable target
#776Sputtering apparatus
#777Sputtering target with few surface defects, and surface processing method thereof
#778IN-LINE SYSTEM FOR MANUFACTURING SOLAR CELL
#779Coating apparatus
#780PVD TARGET WITH END OF SERVICE LIFE DETECTION CAPABILITY
#781Sputtering apparatus
#782Photoelectric conversion device
#783Molybdenum containing targets
#784Method for packaging target material and method for mounting target
#785MAGNETRON SPUTTER
#786CYLINDRICAL SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME
#787System and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith
#788Hard film, plastic working die, plastic working method, and target for hard film
#789Rotary Target Assembly and Rotary Target
#790Cathode unit and sputtering apparatus provided with the same
#791Monolithic aluminum alloy target and method of manufacturing
#792SPUTTERING APPARATUS AND SPUTTERING METHOD
#793SPUTTERING APPARATUS AND RECORDING MEDIUM FOR RECORDING CONTROL PROGRAM THEREOF
#794Sputtering target apparatus
#795Use of DC magnetron sputtering systems
#796SEAMLESS MOLD MANUFACTURING METHOD
#797Sputtering apparatus including cathode with rotatable targets, and related methods
#798Chalcogenide-based photovoltaic devices and methods of manufacturing the same
#799Sputtering target temperature control utilizing layers having predetermined emissivity coefficients
#800Cylindrical sputtering target
#801COOLING PLATE AND MANUFACTURING METHOD THEREFOR
#802HIGH UTILIZATION ROTATABLE TARGET USING CERAMIC TITANIUM OXIDE RING
#803CERAMIC SPUTTERING TARGET ASSEMBLY AND A METHOD FOR PRODUCING THE SAME
#804MAGNETRON SPUTTERING TARGET AND MAGNETRON SPUTTERING SYSTEM
#805Hot tile sputtering system
#806Sputtering target for PVD chamber
#807Electrochromic devices
#808SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF
#809Rotary cathode for magnetron sputtering apparatus
#810Fabrication of low defectivity electrochromic devices
#811DEPOSITION APPARATUS WITH HIGH TEMPERATURE ROTATABLE TARGET AND METHOD OF OPERATING THEREOF
#812Film forming apparatus and film forming method
#813Method and arrangement for redundant anode sputtering having a dual anode arrangement
#814Film forming apparatus and film forming method
#815Method of Producing Sintered Compact, Sintered Compact, Sputtering Target Formed from the same, and Sputtering Target-Backing Plate Assembly
#816Sputter target and backing plate assembly
#817CHARGED PARTICLE BEAM PVD DEVICE, SHIELDING DEVICE, COATING CHAMBER FOR COATING SUBSTRATES, AND METHOD OF COATING
#818Apparatus and method for making sputtered films with reduced stress asymmetry
#819SPUTTERING APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
#820Film forming method by sputtering and sputtering apparatus thereof
#821Oxide sintered body and production method therefor, target, and transparent conductive film and transparent conductive substrate obtained by using the same
#822SPUTTERING TARGET
#823Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer
#824Encapsulated sputtering target
#825Connecting wire and method for manufacturing same
#826ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION
#827ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT
#828ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHODS OF PRODUCING AND RESTORING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION
#829CONTROL OF EROSION PROFILE ON A DIELECTRIC RF SPUTTER TARGET
#830Method for assembling at least two plates and use of the method for preparing an ion beam sputtering assembly
#831SPUTTERING APPARATUS AND METHOD OF THIN FILM FORMATION
#832Magnetron sputtering electrode, and sputtering apparatus provided with magnetron sputtering electrode
#833Sputtering target assembly and method of making same
#834Sputtering target including magnetic field uniformity enhancing sputtering target backing tube
#835Systems and methods for a target and backing plate assembly
#836Powder-Fiber Adhesive
#837SPUTTER CATHODE APPARATUS ALLOWING THICK MAGNETIC TARGETS
#838Trim magnets to adjust erosion rate of cylindrical sputter targets
#839SPUTTER TARGET ASSEMBLY HAVING A LOW-TEMPERATURE HIGH-STRENGTH BOND
#840Sputtering deposition apparatus and backing plate for use in sputtering deposition apparatus
#841MAGNETIC FIELD GENERATION CONTROL UNIT AND MAGNETRON SPUTTERING APPARATUS AND METHOD USING THE SAME
#842Sputtering composite target, method for manufacuturing transparent conductive film using the same and transparent conductive film-provided base material
#843Sputtering method and apparatus
#844SUBSTRATE PROCESSING MODULE EXCHANGE UNIT, VACUUM COATING INSTALLATION, METHOD OF EXCHANGING A SUBSTRATE PROCESSING MODULE FOR A VACUUM COATING INSTALLATION, AND USE OF A SUBSTRATE PROCESSING MODULE EXCHANGE UNIT
#845Sputtering target/backing plate bonded body
#846Rotatable sputter target comprising an end-block with a liquid coolant supply system
#847Cylindrical magnetron
#848Platinum-modified cathodic arc coating
#849TARGET FOR EFFICIENT USE OF PRECIOUS DEPOSITION MATERIAL
#850MAGNETRON SPUTTERING TARGET STRUCTURE AND APPARATUS HAVING THE SAME
#851Non-planar sputter targets having crystallographic orientations promoting uniform deposition
#852Magnet Structure and Cathode Electrode Unit for Magnetron Sputtering System, and Magnetron Sputtering System
#853Oxide target for laser vapor deposition and method of manufacturing the same
#854MULTIPLE GROOVED VACUUM COUPLING
#855METHOD OF MANUFACTURING A ROTATABLE SPUTTER TARGET
#856MODIFIED SPUTTERING TARGET AND DEPOSITION COMPONENTS, METHODS OF PRODUCTION AND USES THEREOF
#857CONCENTRIC HOLLOW CATHODE MAGNETRON SPUTTER SOURCE
#858Reactive Multilayer Joining With Improved Metallization Techniques
#859Method for forming conductive film, thin-film transistor, panel with thin-film transistor, and method for manufacturing thin-film transistor
#860SPUTTERING APPARATUS
#861Thin film electrolyte for thin film batteries
#862Method for sputter targets for electrolyte films
#863Target arrangement
#864Magnetic shunts in tubular targets
#865Cooled backing plate for a sputtering target, and sputtering target comprising a plurality of backing plates
#866Magnetron sputtering cathode mechanism
#867Sputter targets with expansion grooves for reduced separation
#868SPUTTER COATING DEVICE AND COATING METHOD
#869CHALCOGENIDE TARGET AND METHOD
#870Oxide sintered body, target, transparent conductive film obtained by using the same, and transparent conductive substrate
#871Sputtering target with grooves and intersecting channels
#872TARGET STRUCTURE AND TARGET HOLDING APPARATUS
#873SPUTTERING APPARATUS
#874Plasma vapor deposition
#875Method of arc ion plating and target for use therein
#876PROCESS FOR FORMING A FERROELECTRIC FILM, FERROELECTRIC FILM, FERROELECTRIC DEVICE, AND LIQUID DISCHARGE APPARATUS
#877Process for forming a ferroelectric film, ferroelectric film, ferroelectric device, and liquid discharge apparatus
#878Pot-shaped copper sputtering target and manufacturing method thereof
#879Target designs and related methods for coupled target assemblies, methods of production and uses thereof
#880SPUTTERING TARGET STRUCTURE
#881Method for connecting magnetic substance target to backing plate, and magnetic substance target
#882Reactive Multilayer Joining To Control Thermal Stress
#883Sputtering target having increased life and sputtering uniformity
#884BONDING METHOD FOR CYLINDRICAL TARGET
#885SWINGING MAGNETS TO IMPROVE TARGET UTILIZATION
#886High rate sputtering apparatus and method
#887MAGNETRON SPUTTERING TARGET
#888Component, an apparatus and a method for the manufacture of a layer system
#889Sputter target and backing plate assembly
#890Deposition system with improved material utilization
#891Bonded sputtering target and methods of manufacture
#892Vent groove modified sputter target assembly and apparatus containing same
#893Silver selenide film stoichiometry and morphology control in sputter deposition
#894Sputtering apparatus, method for producing a transparent electroconductive film
#895End Effector For Handling Sputter Targets
#896Single, Right-Angled End-Block
#897Target/Backing Plate Constructions, and Methods of Forming Them
#898Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced cooling
#899Magnetron Sputtering Source, Sputter-Coating Installation, and Method for Coating a Substrate
#900Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film