Patents-Review.com
ClassID:

120070 ⎘

C23C14/3421 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering; Cathode assembly for sputtering apparatus, e.g. Target using heated targets

Recent Application in this class:
#1
20240093355
2024-03-21

Glassy Carbon Shutter Disk For Physical Vapor Deposition (PVD) Chamber

 #2
20230257866
2023-08-17

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FOR PRODUCING AN OPTICAL ELEMENT, SECONDARY GAS AND PROJECTION EXPOSURE SYSTEM

 #3
20220090255
2022-03-24

METHOD FOR FORMING ALUMINUM FILM

 #4
20210292888
2021-09-23

Heated shield for physical vapor deposition chamber

 #5
20210172057
2021-06-10

Joined Body of Target Material and Backing Plate, and Method for Producing Joined Body of Target Material and Backing Plate

 #6
20210156022
2021-05-27

Method for vapor depositing a substrate

 #7
20200308693
2020-10-01

Temperature control roller, transporting arrangement and vacuum arrangement

 #8
20200176588
2020-06-04

Sputtering target for insulating oxide film, method for forming insulating oxide film, and method for producing field-effect transistor

 #9
20200058412
2020-02-20

First wall conditioning in a fusion reactor vessel

 #10
20190390319
2019-12-26

Method for forming aluminum film

 #11
20190329492
2019-10-31

Gas phase integrated multimaterial printhead for additive manufacturing

 #12
20190242009
2019-08-08

Mn—Zn—O sputtering target and production method therefor

 #13
20190112702
2019-04-18

Copper manganese sputtering target

 #14
20190051327
2019-02-14

Mechanically balanced and magnetically unbalanced device

 #15
20180347032
2018-12-06

Film formation apparatus, film formation method, and manufacturing method of solar battery

 #16
20180312961
2018-11-01

Sputtering target and method for producing sputtering target

 #17
20180200954
2018-07-19

Gas phase integrated multimaterial printhead for additive manufacturing

 #18
20160032446
2016-02-04

Film forming apparatus and film forming method

 #19
20150259802
2015-09-17

Apparatus and method for depositing a coating on a substrate at atmospheric pressure

 #20
20140197025
2014-07-17

Hot tile sputtering system

 #21
20130029033
2013-01-31

Method for manufacturing acoustic wave device

 #22
20110192716
2011-08-11

METHOD FOR PRODUCING AN ITO LAYER AND SPUTTERING SYSTEM

 #23
20100282598
2010-11-11

Method for controlling a reactive-high-power pulsed magnetron sputter process and corresponding device

 #24
20100252418
2010-10-07

Hot tile sputtering system

 #25
20090014316
2009-01-15

Sputter-enhanced evaporative deposition apparatus and method

 #26
20060289295
2006-12-28

SHAPE MEMORY DEVICE HAVING TWO-WAY CYCLICAL SHAPE MEMORY EFFECT DUE TO COMPOSITIONAL GRADIENT AND METHOD OF MANUFACTURE

 #27
20060196765
2006-09-07

Metallization target optimization method providing enhanced metallization layer uniformity

 #28
16826840
2020-10-13

Gas phase integrated multimaterial printhead for additive manufacturing