SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

SUBSTRATE PROCESSING APPARATUS

Inverted Cylindrical Magnetron (ICM) System and Methods of Use

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

MONOLITHIC PHYSICAL VAPOR DEPOSITION TARGET DESIGN

SPUTTERING APPARATUS AND SPUTTERING METHOD

APPARATUS FOR COOLING A SPUTTERING TARGET

SPUTTERING APPARATUS

COUNTER ELECTRODE FOR ELECTROCHROMIC DEVICES

COOKING UTENSIL

SPUTTERING APPARATUS AND DEPOSITION METHOD OF TUNGSTEN FILM

FILM FORMATION APPARATUS AND FILM FORMATION METHOD OF GALLIUM NITRIDE FILM

SPUTTERING APPARATUS AND EVALUATION METHOD OF SPUTTERING TARGET

Tubular Sputter Cathode

CATHODIC ARC SOURCE

DYNAMIC VACUUM SEAL SYSTEM FOR PHYSICAL VAPOR DEPOSITION SPUTTER APPLICATIONS

Magnetron Sputtering Apparatus and Control Method for Timely Detecting Target Shorting by Monitoring Electrical Resistance Between PVD Target Cathode and Electrical Ground in Real Time

PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING

COATING PLANT AND METHOD FOR TARGET REPLACEMENT

SPUTTERING TARGET AND METHOD FOR MANUFACTURING A SPUTTERING TARGET

AL-RICH ALTIN COATING LAYERS BY PVD FROM METALLIC TARGETS AND METHOD THEREOF

COATING MODULE WITH IMPROVED CATHODE ARRANGEMENT

ION BEAM SPUTTERING APPARATUS AND METHOD

METHODS AND SYSTEMS FOR PRODUCING CONFORMAL THIN FILMS

SPUTTERING APPARATUS AND DISPLAY DEVICE USING THE SAME

DYNAMIC VACUUM SEAL SYSTEM FOR PHYSICAL VAPOR DEPOSITION SPUTTER APPLICATIONS

FILM FORMATION APPARATUS AND FILM FORMATION METHOD OF GALLIUM NITRIDE FILM

COATED SUBSTRATE

Low Temperature Deposition of Hydrogen-Free Diamond-Like Carbon Films

ROTARY CATHODE END BLOCK

DEPOSITION SYSTEM AND METHOD

PVD TARGET STRUCTURE AND METHOD FOR PREPARING THE SAME

COMPONENT FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS INCLUDING COMPONENT

SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PLATE, AND METHOD OF MANUFACTURING SPUTTERING TARGET

PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAME

METHOD FOR SURFACE COATING ACCORDING TO THE SPUTTERING PRINCIPLE

FILM FORMATION APPARATUS AND FILM FORMATION METHOD OF GALLIUM NITRIDE FILM

METHOD OF PHYSICAL VAPOR DEPOSITION WITH INTERMIXING REDUCTION

FILM FORMING APPARATUS AND FILM FORMING METHOD

ACTIVELY COOLED ANODE FOR SPUTTERING PROCESSES

PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING

Method for Solvent Free Perovskite Deposition

SEMICONDUCTOR PROCESSING EQUIPMENT PART AND METHOD FOR MAKING THE SAME

TARGET FOR MRAM

PHYSICAL VAPOR DEPOSITION (PVD) SYSTEM AND METHOD OF PROCESSING TARGET

RAZOR BLADE AND MANUFACTURING METHOD THEREOF

FILM-FORMING APPARATUS, AND METHOD FOR CLEANING FILM-FORMING APPARATUS

IGZO SPUTTERING TARGET

SPUTTERING TARGET

CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION IN CRYO ELECTRON MICROSCOPY APPLICATIONS

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

COATING EQUIPMENT AND COATING METHOD THEREOF

DLC FILM DEPOSITION APPARATUS, SEMICONDUCTOR MANUFACTURING SYSTEM INCLUDING THE DLC FILM DEPOSITION APPARATUS, AND SEMICONDUCOR MANUFACTURING METHOD USING THE DLC FILM DEPOSITION APPARATUS

METHODS FOR ENCAPSULATING SILVER MIRRORS ON OPTICAL STRUCTURES

COUNTER ELECTRODE FOR ELECTROCHROMIC DEVICES

COMPOSITE FILM MANUFACTURING METHOD AND ORGANIC/INORGANIC HYBRID FILM MANUFACTURING METHOD

DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

SPUTTERING TARGET

VISIBLE LIGHT-SENSITIVE PHOTOCATALYST COMPOSITION AND A VISIBLE LIGHT-SENSITIVE PHOTOCATALYST FILM COMPRISING THE SAME

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING

LAYERED BODY HAVING FUNCTION AS TRANSPARENT ELECTROCONDUCTIVE FILM AND METHOD FOR PRODUCING SAME, AND OXIDE SPUTTERING TARGET FOR SAID LAYERED BODY PRODUCTION

CR-SI FILM

Multilayer film structure and method for producing same

SPUTTERING APPARATUS AND RELATED SYSTEMS AND METHODS FOR SPUTTERING SUBSTRATES

METHOD FOR MANUFACTURING A TARGET MATERIAL

DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

Sputtering target

SPUTTERING TARGET AND METHOD FOR FORMING CESIUM TUNGSTEN OXIDE FILM

Deposition Of Piezoelectric Films

Sputtering target and sputtering apparatus including the same

PVD DIRECTIONAL DEPOSITION FOR ENCAPSULATION

METAL MATERIAL AND METHOD FOR PRODUCING THE SAME

HOLLOW CATHODE SYSTEM FOR GENERATING A PLASMA AND METHOD FOR OPERATING SUCH A HOLLOW CATHODE SYSTEM

Polymer composite material and preparation method thereof

FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPARATUS

Device for reducing misalignment between sputtering target and shield

Deposition apparatus, deposition target structure, and method

Transport device and method

SPUTTERING TARGET

AL-RICH ALTIN COATING LAYERS PRODUCED BY PVD FROM METALLIC TARGETS

IN SITU AND TUNABLE DEPOSITION OF A FILM

MANUFACTURING METHOD OF GALLIUM NITRIDE FILM

PVD target design and semiconductor devices formed using the same

Electromagnet pulsing effect on PVD step coverage

Free-standing lithium phosphorus oxynitride think films and methods of their manufacture

SPUTTERING TARGET MATERIAL AND OXIDE SEMICONDUCTOR

Physical vapor deposition apparatus and method thereof

Hydrophilic metal thin film and sputtering method for depositing the same

Diamond-like carbon materials and methods of making diamond-like carbon materials

MICRO-ELECTROMECHANICAL SYSTEM (MEMS) BASED INERTIAL SENSOR AND METHOD OF FABRICATION THEREOF

Slit diaphragm

Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target

Deposition apparatus and deposition method using the same

Preparation method of niobium diselenide film with ultra-low friction and low electrical noise under sliding electrical contact in vacuum

SPUTTERING APPARATUS AND CVD MASK COATING METHOD USING THE SAME

Cathode unit for magnetron sputtering apparatus and magnetron sputtering apparatus

COUNTER ELECTRODE MATERIAL FOR ELECTROCHROMIC DEVICES

Pt-OXIDE SPUTTERING TARGET AND PERPENDICULAR MAGNETIC RECORDING MEDIUM

REACTIVE SPUTTER DEPOSITION OF DIELECTRIC FILMS

Laminate and method for producing laminate

Film forming apparatus and method for reducing arcing

HIGH-ENTROPY CARBIDE CERAMIC MATERIAL, CARBIDE CERAMIC COATING AND PREPARATION METHODS AND USE THEREOF

FILM FORMING METHOD AND FILM FORMING APPARATUS

Magnet system, sputtering device and method

Sputter trap having a thin high purity coating layer and method of making the same

LAMINATED FILM, STRUCTURE INCLUDING LAMINATED FILM, SEMICONDUCTOR ELEMENT, ELECTRONIC DEVICE, AND METHOD FOR PRODUCING LAMINATED FILM

PISTON CRANK AGITATION MECHANISM FOR PHYSICAL VAPOR DEPOSITION CONFORMAL COATINGS ON POWDER

Cathode unit for magnetron sputtering apparatus and magnetron sputtering apparatus

Tilted PVD source with rotating pedestal

APPARATUS AND PROCESS WITH A DC-PULSED CATHODE ARRAY

Deposition apparatus, deposition target structure, and method

Deposition system and method

SPUTTERING DEVICE

Irradiation-resistant and anti-wear hydrogen-free carbon film on polymer surface and preparation method and use thereof

IN SITU AND TUNABLE DEPOSITION OF A FILM

Sputtering apparatus, film formation method, and method for manufacturing product

Coating with Solar Control Properties for a Glass Substrate

Razor blade and manufacturing method thereof

Sputtering target

Counter electrode for electrochromic devices

Target for MRAM

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

GAS RING FOR A PVD SOURCE

Oxide semiconductor sputtering target and method of fabricating thin-film transistor using same

MODULAR SPUTTERING TARGET WITH PRECIOUS METAL INSERT AND SKIRT

Multifocal magnetron design for physical vapor deposition processing on a single cathode

SPUTTER DEPOSITION APPARATUS AND METHOD

Film forming apparatus and method for reducing arcing

SPUTTER DEPOSITION APPARATUS AND METHOD

NICKEL ALLOY SPUTTERING TARGET

Methods and apparatus for processing a substrate

Physical vapor deposition apparatus and method thereof

Physical vapor deposition (PVD) system and method of processing target

OXIDE SINTERED BODY

Sputtering target assembly to prevent overetch of backing plate and methods of using the same

EM SOURCE FOR ENHANCED PLASMA CONTROL

Method for preparing bismuth oxide nanowire films by heating in upside down position

Counter electrode for electrochromic devices

Component for plasma processing apparatus and plasma processing apparatus including component

Internally divisible process chamber using a shutter disk assembly

Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target

CATHODIC ARC SOURCE

Sputtering target and method of producing sputtering target

FILM DEPOSITION APPARATUS, SPUTTERING TARGET, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

Sputtering target for magnetic recording medium

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

Movement systems for sputter coating of non-flat substrates

COMMON VACUUM SHUTTER AND PASTING MECHANISM FOR A MULTISTATION CLUSTER PLATFORM

SPUTTERING TARGETS AND DEVICES INCLUDING MO, NB, AND TA, AND METHODS

High efficiency rotatable sputter target

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE USING IMPROVED SHIELD CONFIGURATIONS

Methods for encapsulating silver mirrors on optical structures

COUNTER ELECTRODE FOR ELECTROCHROMIC DEVICES

SPUTTERING TARGET

MAGNETRON PLASMA APPARATUS

Film forming apparatus and film forming method

Target structure of physical vapor deposition

Niobium sputtering target

Deposition ring for thin substrate handling via edge clamping

Isolator ring clamp and physical vapor deposition chamber incorporating same

COATED-SUBSTRATE SENSING AND CRAZING MITIGATION

Sputtering apparatus

Profiled sputtering target and method of making the same

Internally divisible process chamber using a shutter disk assembly

Coated tool with coating comprising boride-containing diffusion barrier layer

Magnetron sputtering apparatus and magnetron sputtering method

Deposition system with a multi-cathode

Target, film forming apparatus, and method of manufacturing film formation object

Vacuum system and method to deposit a compound layer

Systems and methods for an improved magnetron electromagnetic assembly

Fabrication of low defectivity electrochromic devices

Sputtering equipment and operation method thereof

Sputtering Target and Method for Producing Same

ta-C based coatings with improved hardness

TUNGSTEN OXIDE SPUTTERING TARGET

Cr—Si sintered body

Backing plate, sputtering target, and production methods therefor

Sputtering Target, Method for Producing Laminated Film, Laminated Film and Magnetic Recording Medium

Sputtering target assembly to prevent overetch of backing plate and methods of using the same

ARGON-HELIUM BASED COATING

In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistive element, and sputtering target

Deposition apparatus and deposition method using the same

Cover member, electronic device comprising same, and cover member manufacturing method

OXIDE SINTERED BODY, SPUTTERING TARGET AND OXIDE SEMICONDUCTOR FILM

ANTIMICROBIAL CU-BASED TOPCOAT

Magnesium oxide sputtering target

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

DEPOSITION APPARATUS AND DEPOSITION METHOD

Thin film of metal oxide, organic electroluminescent device including thin film, photovoltaic cell including thin film, and manufacturing method of thin film

CRYSTAL STRUCTURE COMPOUND, OXIDE SINTERED BODY, SPUTTERING TARGET, CRYSTALLINE OXIDE THIN FILM, AMORPHOUS OXIDE THIN FILM, THIN FILM TRANSISTOR AND ELECTRONIC EQUIPMENT

CONTINUOUS FLOW SYSTEM AND METHOD FOR COATING SUBSTRATES

Multi-cathode processing chamber with dual rotatable shields

Vacuum processing apparatus

METHOD OF MAKING COATED ARTICLE HAVING ANTIBACTERIAL AND/OR ANTIFUNGAL COATING AND RESULTING PRODUCT

MULTILAYER FILM, AND AG ALLOY SPUTTERING TARGET

Sputtering apparatus and sputtering method

Sputtering apparatus

Convertible magnetics for rotary cathode

Physical vapor deposition processing systems target cooling

Oxide semiconductor thin film, thin film transistor, method producing the same, and sputtering target

Cathode unit and film forming apparatus

Arc source system for a cathode

Method for preparing package of sputtering target, and method for transporting same

DC magnetron sputtering

Contact-type power supply apparatus and contact unit

PVD target design and semiconductor devices formed using the same

Physical Vapor Deposition Apparatus And Methods With Gradient Thickness Target

SPUTTERING APPARATUS

Sputtering apparatus and method of forming film

RECORDING LAYER, OPTICAL DATA RECORDING MEDIUM, AND SPUTTERING TARGET

Method and device for homogeneously coating 3D substrates

MAGNETRON SPUTTERING APPARATUS AND CATHODE DEVICE THEREOF

Vacuum processing apparatus

TARGET CONVEYING VEHICLE

Multicathode deposition system and methods

SPUTTERING TARGET, METHOD FOR PRODUCING LAMINATED FILM, LAMINATED FILM AND MAGNETIC RECORDING MEDIUM

Reactive sputter deposition of dielectric films

Hexagonal 6H barium germanium oxide, method for producing same, sintered body, and target

Ion beam sputtering apparatus and method

Chalcogenide sputtering target and method of making the same

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

Molybdenum containing targets

Electromagnetic module for physical vapor deposition

Sputtering target

Counter electrode material for electrochromic devices

Heat-Transfer Roller for Sputtering and Method of Making the Same

Method of low-temperature plasma generation, method of an electrically conductive or ferromagnetic tube coating using pulsed plasma and corresponding devices

Coating for chamber particle reduction

SEMICONDUCTOR FILM COMPRISING AN OXIDE CONTAINING IN ATOMS, Sn ATOMS AND Zn ATOMS

Target structure and film forming apparatus

EM source for enhanced plasma control

Sputtering target material

Wireless camera wafer for vacuum chamber diagnostics

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

Process for producing sputtering target and sputtering target

Oxide sintered body and transparent conductive oxide film

Film forming apparatus

Multi-block sputtering target and associated methods and articles

Cathode device and sputtering apparatus

Semiconductor memory device and semiconductor memory manufacturing apparatus

Film formation device for cutting tool provided with coating film, and film formation method for cutting tool provided with coating film

Razor blade and manufacturing method thereof

OXIDE SEMICONDUCTOR THIN FILM

Target structure of physical vapor deposition

Potassium sodium niobate sputtering target

Organic-inorganic hybrid membrane

CUTTING TOOL FOR SPUTTERING TARGET, PROCESSING METHOD OF SPUTTERING TARGET, AND MANUFACTURING METHOD OF SPUTTERING TARGET PRODUCT

System and method to control PVD deposition uniformity

Method for solvent-free perovskite deposition

Oxide sintered body, sputtering target and oxide semiconductor film

SHIELD KIT FOR PROCESS CHAMBER

DEPOSITION APPARATUS, METHOD OF COATING A FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE HAVING A COATING

HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAME

OXIDE SEMICONDUCTOR THIN FILM, THIN FILM TRANSISTOR, AND SPUTTERING TARGET

Sputtering target with backside cooling grooves

Termination unit

SEMICONDUCTOR COMPOUND, SEMICONDUCTOR DEVICE AND LAMINATE HAVING LAYER OF SEMICONDUCTOR COMPOUND, AND TARGET

Laminate and method for producing laminate

Sputtering system and method

Physical vapor deposition system and processes

Physical vapor deposition system and processes

Physical vapor deposition system and processes

Counter electrode for electrochromic devices

Physical vapor deposition processing systems target cooling

Sputtering target-backing plate assembly

Physical vapor deposition apparatus

Method of making thin films

Sputtering apparatus

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus

Physical Vapor Deposition Target Assembly

Sputter trap having multimodal particle size distribution

SPUTTERING TARGET, OXIDE SEMICONDUCTOR THIN FILM, THIN FILM TRANSISTOR, AND ELECTRONIC DEVICE

Interchangeable magnet pack

APPARATUS AND SYSTEM FOR VACUUM DEPOSITION ON A SUBSTRATE AND METHOD FOR VACUUM DEPOSITION ON A SUBSTRATE

Fabrication method for a multi-layer substrate

Methods and apparatus for patterning substrates using asymmetric physical vapor deposition

PVD directional deposition for encapsulation

Apparatus and methods for depositing durable optical coatings

Sputtering apparatus including cathode with rotatable targets, and related methods

PHYSICAL VAPOR DEPOSITION WITH A DUAL-SHUTTER

HIGH-POWER RESONANCE PULSE AC HEDP SPUTTERING SOURCE AND METHOD FOR MATERIAL PROCESSING

READ-ONLY OPTICAL INFORMATION RECORDING MEDIUM AND SPUTTERING TARGET FOR FORMING REFLECTION FILM OF SAID OPTICAL INFORMATION RECORDING MEDIUM

Sputtering target packaging structure and method of packaging sputtering target

Apparatus for physical vapor deposition and method for forming a layer

Feeding structure, upper electrode assembly, and physical vapor deposition chamber and device

Counter electrode for electrochromic devices

OXIDE SINTERED MATERIAL AND METHOD OF MANUFACTURING THE SAME, SPUTTERING TARGET, OXIDE SEMICONDUCTOR FILM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES

Physical vapor deposition apparatus and method thereof

Target assembly for safe and economic evaporation of brittle materials

Sputtering apparatus and method of forming film

Oxide sintered material and method for manufacturing the same, sputtering target, and method for manufacturing semiconductor device

LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, SEMICONDUCTOR ELEMENT, WIRING FILM, WIRING SUBSTRATE, AND TARGET

Coating material sputtered in presence of argon-helium based coating

Sputtering Target, Method for Producing Laminated Film, Laminated Film and Magnetic Recording Medium

FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES

Sputter trap having a thin high purity coating layer and method of making the same

Film forming apparatus and film forming method

Apparatus for fabricating a semiconductor device with target sputtering and target sputtering method for fabricating the semiconductor device