C23C14/3428 - CPC Classification Index

ClassID:

120071 ⎘

C23C14/3428 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering; Cathode assembly for sputtering apparatus, e.g. Target using liquid targets

Recent Application in this class:

20230183854

2023-06-15

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

20210381099

2021-12-09

Liquid sputter target

20210238732

2021-08-05

Advanced sputter targets for ion generation

20200157675

2020-05-21

Advanced sputter targets for ion generation

20190190002

2019-06-20

Method of forming a metallic lithium coating

20170268122

2017-09-21

Molten target sputtering (MTS) deposition for enhanced kinetic energy and flux of ionized atoms

20130029033

2013-01-31

Method for manufacturing acoustic wave device

20120199471

2012-08-09

Film-Forming apparatus and Film-Forming method

20090092741

2009-04-09

METHOD FOR FORMING FILM AND FILM FORMING SYSTEM

#10

20090014316

2009-01-15

Sputter-enhanced evaporative deposition apparatus and method

#11

20050173240

2005-08-11

Method and device for manufacturing semiconductor or insulator-metallic laminar composite cluster