ClassID:

120077

C23C14/3471 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering Introduction of auxiliary energy into the plasma

Sub-classes:
Recent Application in this class:
#1
20250146118
2025-05-08

METHODS TO IMPART COLOR AND DURABLE PROPERTIES TO SUBSTRATES

#2
20250109483
2025-04-03

ARTICLES COATED WITH CRACK-RESISTANT FLUORO-ANNEALED FILMS AND METHODS OF MAKING

#3
20230257866
2023-08-17

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FOR PRODUCING AN OPTICAL ELEMENT, SECONDARY GAS AND PROJECTION EXPOSURE SYSTEM

#4
20230253190
2023-08-10

Deposition apparatus and deposition method using the same

#5
20230094699
2023-03-30

Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition

#6
20230028207
2023-01-26

Method and apparatus for use in generating plasma

#7
20220411913
2022-12-29

Method of manufacturing solid state battery cathodes for use in batteries

#8
20220389564
2022-12-08

SPUTTER DEPOSITION APPARATUS AND METHOD

#9
20220341029
2022-10-27

EM SOURCE FOR ENHANCED PLASMA CONTROL

#10
20220154325
2022-05-19

ARTICLES COATED WITH CRACK-RESISTANT FLUORO-ANNEALED FILMS AND METHODS OF MAKING

#11
20220148762
2022-05-12

Oxide superconducting wire

#12
20210375595
2021-12-02

Deposition apparatus and deposition method using the same

#13
20210262077
2021-08-26

TANTALUM PENTOXIDE BASED LOW-LOSS METASURFACE OPTICS FOR UV APPLICATIONS

#14
20210017639
2021-01-21

EM source for enhanced plasma control

#15
20200255935
2020-08-13

Sputtering apparatus

#16
20200191002
2020-06-18

SUPERALLOY TURBINE PART AND ASSOCIATED METHOD FOR MANUFACTURING BY BOMBARDMENT WITH CHARGED PARTICLES

#17
20190390323
2019-12-26

Apparatus and method for preparing multi-component alloy film

#18
20190338411
2019-11-07

Physical vapor deposition with isotropic neutral and non-isotropic ion velocity distribution at the wafer surface

#19
20190318937
2019-10-17

Processing of workpieces with reactive species generated using alkyl halide

#20
20190256966
2019-08-22

Techniques for selective deposition using angled ions

#21
20190255563
2019-08-22

Method for producing coated metallic substrates and coated metallic substrates

#22
20190161847
2019-05-30

Methods to impart color and durable properties to substrates

#23
20190127841
2019-05-02

FABRICATION OF SUPERHYDROPHOBIC AND ICEPHOBIC COATINGS BY NANOLAYERED COATING METHOD

#24
20180308670
2018-10-25

Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition

#25
20180294162
2018-10-11

Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers

#26
20180119272
2018-05-03

Physical vapor deposition system with a source of isotropic ion velocity distribution at the wafer surface

#27
20180010241
2018-01-11

Sputtering target and/or coil, and process for producing same

#28
20170157931
2017-06-08

Piezoelectric film, production method thereof, piezoelectric element, and liquid discharge apparatus

#29
20170068058
2017-03-09

Techniques for forming waveguides for use in laser systems or other systems and associated devices

#30
20160024661
2016-01-28

Surface processing method for a high hardness and abrasion resistant zinc alloy surface of imitation plating hexvalent chromium

#31
20150259802
2015-09-17

Apparatus and method for depositing a coating on a substrate at atmospheric pressure

#32
20150200094
2015-07-16

CARBON FILM STRESS RELAXATION

#33
20150173167
2015-06-18

Coaxial microwave applicator for plasma production

#34
20150114823
2015-04-30

Bipolar collimator utilized in a physical vapor deposition chamber

#35
20140251789
2014-09-11

Physical vapor deposition RF plasma shield deposit control

#36
20140251788
2014-09-11

Methods and apparatus for stable substrate processing with multiple RF power supplies

#37
20140076718
2014-03-20

Remote arc discharge plasma assisted processes

#38
20130302596
2013-11-14

Coating method for depositing a layer system on a substrate and substrate having a layer system

#39
20130112556
2013-05-09

Sputtering target and/or coil, and process for producing same

#40
20130014898
2013-01-17

PLASMA BREAKERS AND METHODS THEREFOR

#41
20130008778
2013-01-10

Physical vapor deposition chamber with capacitive tuning at wafer support

#42
20120325310
2012-12-27

Laminate, method for producing same, and functional element using same

#43
20120318668
2012-12-20

Tantalum coil for sputtering and method for processing the coil

#44
20120193225
2012-08-02

Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer

#45
20110209982
2011-09-01

Methods for depositing a layer on a substrate using surface energy modulation

#46
20100314244
2010-12-16

Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition

#47
20100206713
2010-08-19

PZT Depositing Using Vapor Deposition

#48
20100123368
2010-05-20

Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer

#49
20100078315
2010-04-01

MICROSTRIP ANTENNA ASSISTED IPVD

#50
20090229969
2009-09-17

Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surface

#51
20090227104
2009-09-10

Film deposition method and film deposition apparatus of metal film

#52
20090087583
2009-04-02

Film Deposition Method, Film Deposition Apparatus, and Storage Medium

#53
20090065349
2009-03-12

Plasma vapor deposition

#54
20090045046
2009-02-19

Method of multi-location ARC sensing with adaptive threshold comparison

#55
20080081474
2008-04-03

Integration of a variable thickness copper seed layer in copper metallization

#56
20080067064
2008-03-20

Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals

#57
20080038919
2008-02-14

Plasma sputtering film deposition method and equipment

#58
20070218623
2007-09-20

Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus

#59
20070056846
2007-03-15

Silicon dot forming method and silicon dot forming apparatus

#60
20070007128
2007-01-11

Silicon film forming apparatus

#61
20070004111
2007-01-04

Method and apparatus for forming a crystalline silicon thin film

#62
20060278517
2006-12-14

Minute high-performance rare earth magnet for micromini product and process for producing the same

#63
20050221022
2005-10-06

Integration of multiple frequency band FBAR filters

#64
20050006232
2005-01-13

[IONIZED PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREOF]

#65
20050006220
2005-01-13

Methods and apparatus for generating high-density plasma

#66
17592339
2026-04-21

Sputtering targets, and related apparatuses and methods