120077 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering Introduction of auxiliary energy into the plasma
Sub-classes:METHODS TO IMPART COLOR AND DURABLE PROPERTIES TO SUBSTRATES
#2ARTICLES COATED WITH CRACK-RESISTANT FLUORO-ANNEALED FILMS AND METHODS OF MAKING
#3METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FOR PRODUCING AN OPTICAL ELEMENT, SECONDARY GAS AND PROJECTION EXPOSURE SYSTEM
#4Deposition apparatus and deposition method using the same
#5Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition
#6Method and apparatus for use in generating plasma
#7Method of manufacturing solid state battery cathodes for use in batteries
#8SPUTTER DEPOSITION APPARATUS AND METHOD
#9EM SOURCE FOR ENHANCED PLASMA CONTROL
#10ARTICLES COATED WITH CRACK-RESISTANT FLUORO-ANNEALED FILMS AND METHODS OF MAKING
#11Oxide superconducting wire
#12Deposition apparatus and deposition method using the same
#13TANTALUM PENTOXIDE BASED LOW-LOSS METASURFACE OPTICS FOR UV APPLICATIONS
#14EM source for enhanced plasma control
#15Sputtering apparatus
#16SUPERALLOY TURBINE PART AND ASSOCIATED METHOD FOR MANUFACTURING BY BOMBARDMENT WITH CHARGED PARTICLES
#17Apparatus and method for preparing multi-component alloy film
#18Physical vapor deposition with isotropic neutral and non-isotropic ion velocity distribution at the wafer surface
#19Processing of workpieces with reactive species generated using alkyl halide
#20Techniques for selective deposition using angled ions
#21Method for producing coated metallic substrates and coated metallic substrates
#22Methods to impart color and durable properties to substrates
#23FABRICATION OF SUPERHYDROPHOBIC AND ICEPHOBIC COATINGS BY NANOLAYERED COATING METHOD
#24Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition
#25Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers
#26Physical vapor deposition system with a source of isotropic ion velocity distribution at the wafer surface
#27Sputtering target and/or coil, and process for producing same
#28Piezoelectric film, production method thereof, piezoelectric element, and liquid discharge apparatus
#29Techniques for forming waveguides for use in laser systems or other systems and associated devices
#30Surface processing method for a high hardness and abrasion resistant zinc alloy surface of imitation plating hexvalent chromium
#31Apparatus and method for depositing a coating on a substrate at atmospheric pressure
#32CARBON FILM STRESS RELAXATION
#33Coaxial microwave applicator for plasma production
#34Bipolar collimator utilized in a physical vapor deposition chamber
#35Physical vapor deposition RF plasma shield deposit control
#36Methods and apparatus for stable substrate processing with multiple RF power supplies
#37Remote arc discharge plasma assisted processes
#38Coating method for depositing a layer system on a substrate and substrate having a layer system
#39Sputtering target and/or coil, and process for producing same
#40PLASMA BREAKERS AND METHODS THEREFOR
#41Physical vapor deposition chamber with capacitive tuning at wafer support
#42Laminate, method for producing same, and functional element using same
#43Tantalum coil for sputtering and method for processing the coil
#44Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer
#45Methods for depositing a layer on a substrate using surface energy modulation
#46Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition
#47PZT Depositing Using Vapor Deposition
#48Film formation method, film formation device, piezoelectric film, piezoelectric device, liquid discharge device and piezoelectric ultrasonic transducer
#49MICROSTRIP ANTENNA ASSISTED IPVD
#50Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surface
#51Film deposition method and film deposition apparatus of metal film
#52Film Deposition Method, Film Deposition Apparatus, and Storage Medium
#53Plasma vapor deposition
#54Method of multi-location ARC sensing with adaptive threshold comparison
#55Integration of a variable thickness copper seed layer in copper metallization
#56Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals
#57Plasma sputtering film deposition method and equipment
#58Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus
#59Silicon dot forming method and silicon dot forming apparatus
#60Silicon film forming apparatus
#61Method and apparatus for forming a crystalline silicon thin film
#62Minute high-performance rare earth magnet for micromini product and process for producing the same
#63Integration of multiple frequency band FBAR filters
#64[IONIZED PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREOF]
#65Methods and apparatus for generating high-density plasma
#66Sputtering targets, and related apparatuses and methods