120078 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering; Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
Sputtering system and method
#2Methods of forming molybdenum sputtering targets
#3Methods of depositing thin films using molybdenum sputtering targets
#4Remote arc discharge plasma assisted processes
#5Methods of forming molybdenum sputtering targets
#6ELECTRON BEAM ENHANCED LARGE AREA DEPOSITION SYSTEM
#7Film forming method, fabrication process of semiconductor device, computer-readable recording medium and sputtering apparatus
#8Dual anode AC supply for continuous deposition of a cathode material
#9Molybdenum sputtering targets
#10Electron beam enhanced large area deposition system
#11Apparatus for enhanced physical vapor deposition