Patents-Review.com
ClassID:

120085 ⎘

C23C14/355 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering by application of a magnetic field, e.g. magnetron sputtering; Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Recent Application in this class:
#1
20250019819
2025-01-16

ELECTRON-BEAM-ASSISTED SPUTTERING DEVICE AND METHOD THEREFOR

 #2
20220406582
2022-12-22

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #3
20210134571
2021-05-06

IMPROVEMENTS IN AND RELATING TO COATING PROCESSES

 #4
20210071295
2021-03-11

Electromagnetic module for physical vapor deposition

 #5
20200165716
2020-05-28

FILM FORMING METHOD AND FILM FORMING APPARATUS

 #6
20190180991
2019-06-13

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #7
20190136369
2019-05-09

Electromagnetic module for physical vapor deposition

 #8
20190032198
2019-01-31

Treatment method using a beam of singly- or multiply-charged gas ions in order to produce colored metals

 #9
20180030591
2018-02-01

Rotary cathode unit for magnetron sputtering apparatus

 #10
20170167012
2017-06-15

OFF-AXIS MAGNETRON SPUTTERING WITH REAL-TIME REFLECTION HIGH ENERGY ELECTRON DIFFRACTION ANALYSIS

 #11
20170074400
2017-03-16

Ti—Si—C—N piston ring coatings

 #12
20170047205
2017-02-16

Apparatus and a method for deposition of material to form a coating

 #13
20140248100
2014-09-04

Drill having a coating

 #14
20140076718
2014-03-20

Remote arc discharge plasma assisted processes

 #15
20140076716
2014-03-20

Low pressure arc plasma immersion coating vapor deposition and ion treatment

 #16
20140076715
2014-03-20

Low pressure arc plasma immersion coating vapor deposition and ion treatment

 #17
20120114871
2012-05-10

Method for producing an ionized vapor deposition coating

 #18
20110220491
2011-09-15

Electron-assisted deposition

 #19
20100170787
2010-07-08

Filtered cathodic arc deposition method and apparatus

 #20
20100170781
2010-07-08

Filtered cathodic arc deposition method and apparatus

 #21
20090214787
2009-08-27

Erosion Resistant Coatings

 #22
20080116058
2008-05-22

Filtered cathodic arc deposition method and apparatus

 #23
20070295597
2007-12-27

Sputter deposition method for forming integrated circuit

 #24
20070205096
2007-09-06

Magnetron based wafer processing

 #25
20070102284
2007-05-10

Small scanned magentron

 #26
20070087185
2007-04-19

Erosion resistant coatings

 #27
20070017804
2007-01-25

Device for improving plasma activity PVD-reactors

 #28
20060251917
2006-11-09

Method for magnetron sputter deposition

 #29
20060225998
2006-10-12

Direct ion beam deposition method and system

 #30
20050126903
2005-06-16

Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source

 #31
20050029090
2005-02-10

Method and apparatus for ionization film formation

 #32
15065704
2018-03-06

Apparatus for enhanced physical vapor deposition