Patents-Review.com
ClassID:

120084 ⎘

C23C14/354 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering by application of a magnetic field, e.g. magnetron sputtering Introduction of auxiliary energy into the plasma

Sub-classes:
Recent Application in this class:
#1
20260135070
2026-05-14

PHYSICAL VAPOR DEPOSITION APPARATUS

 #2
20250347003
2025-11-13

DUPLEX NANOCOMPOSITE COATING FORMED IN A SINGLE PHYSICAL VAPOR DEPOSITION DEVICE

 #3
20240240306
2024-07-18

PVD SYSTEM AND COLLIMATOR

 #4
20240234089
2024-07-11

RESONANT ANTENNA FOR PHYSICAL VAPOR DEPOSITION APPLICATIONS

 #5
20240136151
2024-04-25

Resonant antenna for physical vapor deposition applications

 #6
20230175113
2023-06-08

PHYSICAL VAPOR DEPOSITION APPARATUS

 #7
20230060047
2023-02-23

PVD system and collimator

 #8
20230005724
2023-01-05

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

 #9
20220341029
2022-10-27

EM SOURCE FOR ENHANCED PLASMA CONTROL

 #10
20220341025
2022-10-27

Apparatus for reducing tungsten resistivity

 #11
20220195585
2022-06-23

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #12
20220098724
2022-03-31

Vacuum system and method to deposit a compound layer

 #13
20220081756
2022-03-17

Methods and apparatus for reducing tungsten resistivity

 #14
20220042168
2022-02-10

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #15
20220025511
2022-01-27

Apparatus and method for performing sputtering process

 #16
20210317569
2021-10-14

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films

 #17
20210115553
2021-04-22

Sputtering a layer on a substrate using a high-energy density plasma magnetron

 #18
20210115552
2021-04-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #19
20210102284
2021-04-08

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #20
20210017639
2021-01-21

EM source for enhanced plasma control

 #21
20200048760
2020-02-13

HIGH POWER IMPULSE MAGNETRON SPUTTERING PHYSICAL VAPOR DEPOSITION OF TUNGSTEN FILMS HAVING IMPROVED BOTTOM COVERAGE

 #22
20190368030
2019-12-05

APPARATUS FOR GENERATING HIGH-CURRENT ELECTRICAL DISCHARGES

 #23
20190271070
2019-09-05

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

 #24
20190256969
2019-08-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #25
20190249293
2019-08-15

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

 #26
20190043701
2019-02-07

INVERTED MAGNETRON FOR PROCESSING OF THIN FILM MATERIALS

 #27
20190017549
2019-01-17

ZnO coating method for rolling body, rolling body with ZnO coating, and bearing incorporating same

 #28
20180374689
2018-12-27

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

 #29
20180374688
2018-12-27

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #30
20180321174
2018-11-08

Method for preparing graphene modified composite planar pH sensor

 #31
20180195164
2018-07-12

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #32
20180051368
2018-02-22

High density, low stress amorphous carbon film, and process and equipment for its deposition

 #33
20170287578
2017-10-05

Nuclear fuel claddings, production method thereof and uses of same against oxidation/hydriding

 #34
20170178912
2017-06-22

Capacitive coupled plasma source for sputtering and resputtering

 #35
20170175253
2017-06-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #36
20170175248
2017-06-22

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

 #37
20170051398
2017-02-23

TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCING THE SAME

 #38
20170029937
2017-02-02

METHOD OF COATING HIGH ASPECT RATIO FEATURES

 #39
20170029936
2017-02-02

HIGH POWER PULSE IONIZED PHYSICAL VAPOR DEPOSITION

 #40
20160268127
2016-09-15

Oxide and Manufacturing Method Thereof

 #41
20160024644
2016-01-28

Production method for transparent conductive film

 #42
20150325418
2015-11-12

METHOD FOR PRODUCING A DIELECTRIC AND/OR BARRIER LAYER OR MULTILAYER ON A SUBSTRATE, AND DEVICE FOR IMPLEMENTING SAID METHOD

 #43
20150315698
2015-11-05

Apparatus for Generating High-Current Electrical Discharges

 #44
20150285957
2015-10-08

Hafnium or zirconium oxide coating

 #45
20150252467
2015-09-10

RF power compensation to control film stress, density, resistivity, and/or uniformity through target life

 #46
20140305793
2014-10-16

Anti-static wrapper for electronic component wrapping, coated with nano film and manufacturing method thereof

 #47
20140251789
2014-09-11

Physical vapor deposition RF plasma shield deposit control

 #48
20140193637
2014-07-10

Tool with chromium-containing functional layer

 #49
20140127519
2014-05-08

HIGH POWER IMPULSE MAGNETRON SPUTTERING METHOD PROVIDING ENHANCED IONIZATION OF THE SPUTTERED PARTICLES AND APPARATUS FOR ITS IMPLEMENTATION

 #50
20140124364
2014-05-08

Plasma generation source including belt-type magnet and thin film deposition system using this

 #51
20140076718
2014-03-20

Remote arc discharge plasma assisted processes

 #52
20140014497
2014-01-16

Film deposition assisted by angular selective etch on a surface

 #53
20130146451
2013-06-13

Magnetic Confinement and Directionally Driven Ionized Sputtered Films For Combinatorial Processing

 #54
20120175251
2012-07-12

Sputtering apparatus

 #55
20120097524
2012-04-26

RF impedance matching network with secondary frequency and sub-harmonic variant

 #56
20120028461
2012-02-02

Methods for depositing metal in high aspect ratio features

 #57
20120021201
2012-01-26

ANTI-STATIC WRAPPER FOR ELECTRONIC COMPONENT WRAPPING, COATED WITH NANO FILM AND MANUFACTURING METHOD THEREOF

 #58
20110256417
2011-10-20

Oxidation resistant nanocrystalline MCrAl(Y) coatings and methods of forming such coatings

 #59
20110226617
2011-09-22

DIELECTRIC DEPOSITION USING A REMOTE PLASMA SOURCE

 #60
20110180390
2011-07-28

REDUNDANT ANODE SPUTTERING METHOD

 #61
20110180388
2011-07-28

Plasma Processing Method and Plasma Processing Apparatus

 #62
20110005920
2011-01-13

Low Temperature Deposition of Amorphous Thin Films

 #63
20100326815
2010-12-30

High Power Pulse Ionized Physical Vapor Deposition

 #64
20100314244
2010-12-16

Ionized Physical Vapor Deposition for Microstructure Controlled Thin Film Deposition

 #65
20100279124
2010-11-04

Hafnium or zirconium oxide Coating

 #66
20100264016
2010-10-21

Very low pressure high power impulse triggered magnetron sputtering

 #67
20100230281
2010-09-16

THIN FILM FORMING APPARATUS

 #68
20090321249
2009-12-31

Method of Hard Coating a Blade

 #69
20090214787
2009-08-27

Erosion Resistant Coatings

 #70
20090130336
2009-05-21

Coating apparatus

 #71
20090045047
2009-02-19

Conformal magnetron sputter deposition

 #72
20080308410
2008-12-18

Redundant anode sputtering method and assembly

 #73
20070235321
2007-10-11

Depositing rhuthenium films using ionized physical vapor deposition (IPVD)

 #74
20070181421
2007-08-09

Sputtering system providing large area sputtering and plasma-assisted reactive gas dissociation

 #75
20070181417
2007-08-09

Method of ionized physical vapor deposition sputter coating high aspect-ratio structures

 #76
20060213764
2006-09-28

Ionized physical vapor deposition (iPVD) process

 #77
20060090999
2006-05-04

Sputter coating system

 #78
20060073690
2006-04-06

Apparatus and method for metal plasma vapor deposition and re-sputter with source and bias power frequencies applied through the workpiece

 #79
20060066248
2006-03-30

APPARATUS FOR GENERATING HIGH CURRENT ELECTRICAL DISCHARGES

 #80
20060057304
2006-03-16

Biased pulse DC reactive sputtering of oxide films

 #81
20060057283
2006-03-16

Biased pulse DC reactive sputtering of oxide films

 #82
20060054496
2006-03-16

Biased pulse DC reactive sputtering of oxide films

 #83
20050252763
2005-11-17

High deposition rate sputtering

 #84
20050178654
2005-08-18

High deposition rate sputtering

 #85
20050048802
2005-03-03

Biased pulse DC reactive sputtering of oxide films

 #86
20050011748
2005-01-20

Method for producing a nonostructured functional coating and a coating that can be produced according to said method

 #87
20050006220
2005-01-13

Methods and apparatus for generating high-density plasma