120086 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering by application of a magnetic field, e.g. magnetron sputtering; Introduction of auxiliary energy into the plasma Microwaves, e.g. electron cyclotron resonance enhanced sputtering
FILM FORMING APPARATUS AND FILM FORMING METHOD
#2METHOD FOR DEPOSITION OF DENSE CHROMIUM ON A SUBSTRATE
#3Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources
#4Sputtering device with microwave heating mechanism
#5Method for improving service life of magnetron
#6Modular microwave source with local lorentz force
#7Method for vapor depositing a substrate
#8Carbon layer covered mask in 3D applications
#9PLASMA SPRAY SYSTEMS AND METHODS
#10Modular microwave source with local Lorentz force
#11Device for producing an amorphous carbon layer by electron cyclotron resonance plasma
#12RF power compensation to control film stress, density, resistivity, and/or uniformity through target life
#13Coaxial microwave applicator for plasma production
#14METHOD FOR PRODUCING FILM MEMBER
#15Plasma generation source including belt-type magnet and thin film deposition system using this
#16High density microwave plasma generation apparatus, and magnetron sputtering deposition system using the same
#17Method of making durable articles
#18Sputter device
#19Quality multi-spectral zinc sulfide
#20Bistable resistance value acquisition device, manufacturing method thereof, metal oxide thin film, and manufacturing method thereof
#21Bistable resistance value acquisition device, manufacturing method thereof, metal oxide thin film, and manufacturing method thereof
#22Microwave-assisted rotatable PVD
#23Microwave rotatable sputtering deposition
#24Sputter deposition method for forming integrated circuit
#25Bistable resistance value acquisition device, manufacturing method thereof, metal oxide thin film, and manufacturing method thereof
#26PLASMA DEPOSITION APPARATUS AND METHOD