120096 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Controlling or regulating the coating process; Controlling the film thickness or evaporation rate using measurement on the vapor source
APPLYING A TRANSPARENT CONDUCTIVE FILM TO FLUORINE-DOPED TIN OXIDE
#2SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY TANGIBLE MEDIUM
#3Thermal evaporation sources for wide-area deposition
#4METHOD FOR CONTROLLING A FLUX DISTRIBUTION OF EVAPORATED SOURCE MATERIAL, DETECTOR FOR MEASURING ELECTROMAGNETIC RADIATION REFLECTED ON A SOURCE SURFACE AND SYSTEM FOR THERMAL EVAPORATION WITH ELECTROMAGNETIC RADIATION
#5DEVICE AND METHOD FOR EVAPORATING AN ORGANIC POWDER
#6METHOD FOR CONTROLLING AN EVAPORATION RATE OF SOURCE MATERIAL, DETECTOR FOR MEASURING ELECTROMAGNETIC RADIATION REFLECTED ON A SOURCE SURFACE AND SYSTEM FOR THERMAL EVAPORATION WITH ELECTROMAGNETIC RADIATION
#7Method for monitoring process conditions of, and method for controlling, a plasma PVD process
#8Irradiation-resistant and anti-wear hydrogen-free carbon film on polymer surface and preparation method and use thereof
#9Apparatus for and method of manufacturing semiconductor device
#10PROCESS FOR MAKING MULTILAYER STRUCTURE WITH BARRIER PROPERTIES
#11SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY TANGIBLE MEDIUM
#12EVAPORATOR BOAT CONTROL SYSTEM, PVD MACHINE AND METHOD OF OPERATING THE PVD MACHINE
#13PVD coatings with a HEA ceramic matrix with controlled precipitate structure
#14COATING APPARATUS AND METHOD FOR USE THEREOF
#15Enhanced cathodic ARC source for ARC plasma deposition
#16EVAPORATION SOURCE FOR DEPOSITION OF EVAPORATED MATERIAL ON A SUBSTRATE, DEPOSITION APPARATUS, METHOD FOR MEASURING A VAPOR PRESSURE OF EVAPORATED MATERIAL, AND METHOD FOR DETERMINING AN EVAPORATION RATE OF AN EVAPORATED MATERIAL
#17Processing tool having a monitoring device
#18Apparatus for and method of manufacturing semiconductor device
#19Thermal evaporation sources for wide-area deposition
#20Electron beam evaporator, coating apparatus and coating method
#21Device and method for determining the concentration of a vapor
#22MATERIAL DEPOSITION ARRANGEMENT, VACUUM DEPOSITION SYSTEM AND METHOD THEREFOR
#23Evaporation device and evaporation method
#24EVAPORATOR, EVAPORATION COATING APPARATUS AND EVAPORATION COATING METHOD
#25Nanoscale surface with nanoscale features formed using diffusion at a liner-semiconductor interface
#26Vaporization system and vaporization system program
#27Evaporator, deposition arrangement, deposition apparatus and methods of operation thereof
#28Processing tool having a monitoring device
#29EVAPORATION SOURCE
#30Film thickness test apparatus and method and vapor deposition device
#31Storage device, vaporizer and substrate processing apparatus
#32Heating device for evaporation, evaporation device and evaporation method
#33EBPVD columnated vapor stream
#34Thermal evaporation sources for wide-area deposition
#35Monomer vaporizing device and method of controlling the same
#36A CRUCIBLE DEVICE USED IN COATING SYSTEM
#37METHOD FOR MONITORING SE VAPOR IN VACUUM REACTOR APPARATUS
#38Cathode assembly, physical vapor deposition system, and method for physical vapor deposition
#39Vacuum vapor deposition method
#40Method for supplying deposition material, method for producing substrate, control device and deposition device
#41CRUCIBLE FOR VAPOR DEPOSITION, VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD
#42Measurement device and method for vapour deposition applications
#43Deposition amount measuring apparatus, depositing apparatus including the same, and method for manufacturing light emitting display
#44Atomic flux measurement device
#45Vaporization Apparatus and Method for Controlling the Same
#46EVAPORATION SYSTEM WITH MEASUREMENT UNIT
#47METHOD FOR DETERMINING PROCESS-SPECIFIC DATA OF A VACUUM DEPOSITION PROCESS
#48Film forming apparatus
#49Crucible having a monitor system and a cover with a slot which receives light for illuminating coating material
#50DEPOSITION RATE CONTROL
#51VACUUM VAPOR DEPOSITION APPARATUS
#52VACUUM VAPOR DEPOSITION APPARATUS
#53EVAPORATOR, COATING INSTALLATION, AND METHOD FOR USE THEREOF
#54VACUUM VAPOR DEPOSITION APPARATUS
#55VACUUM VAPOR DESPOSITION APPARATUS
#56Thermal evaporation sources for wide-area deposition
#57APPARATUS FOR AND METHOD OF APPLYING LUBRICANT COATINGS TO MAGNETIC DISKS VIA A VAPOR FLOW PATH INCLUDING A SELECTIVELY OPENED AND CLOSED SHUTTER
#58METHOD OF AND APPARATUS FOR MONITORING MASS FLOW RATE OF LUBRICANT VAPOR FORMING LUBRICANT COATINGS OF MAGNETIC DISKS
#59EVAPORATION APPARATUS AND METHOD OF MAKING AN ORGANIC LAYER
#60Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination
#61Method of manufacturing radiographic image conversion panel
#62Film formation method with deposition source position control
#63Vacuum vapor deposition apparatus
#64Method and apparatus for vacuum deposition
#65Source for thermal physical vapor deposition of organic electroluminescent layers
#66Apparatus, method and system for monitoring chamber parameters associated with a deposition process
#67Source for thermal physical vapor deposition of organic electroluminescent layers
#68Fabricating an electrode for use in organic electronic devices
#69Device for measuring the profile of a metal film sputter deposition target, and system and method employing same