ClassID:

120097

C23C14/544 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Controlling or regulating the coating process; Controlling the film thickness or evaporation rate using measurement in the gas phase

Recent Application in this class:
#1
20210147975
2021-05-20

EVAPORATION SOURCE FOR DEPOSITION OF EVAPORATED MATERIAL ON A SUBSTRATE, DEPOSITION APPARATUS, METHOD FOR MEASURING A VAPOR PRESSURE OF EVAPORATED MATERIAL, AND METHOD FOR DETERMINING AN EVAPORATION RATE OF AN EVAPORATED MATERIAL

#2
20210010130
2021-01-14

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

#3
20200033295
2020-01-30

Device and method for determining the concentration of a vapor

#4
20190127843
2019-05-02

Evaporation apparatus and calibration method thereof

#5
20180363129
2018-12-20

Evaporation Apparatus

#6
20180135163
2018-05-17

VACUUM DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD

#7
20180135160
2018-05-17

METHOD FOR CONTROLLING A GAS SUPPLY TO A PROCESS CHAMBER, CONTROLLER FOR CONTROLLING A GAS SUPPLY TO A PROCESS CHAMBER, AND APPARATUS

#8
20170283938
2017-10-05

Vacuum deposition apparatus and vapor deposition method

#9
20170167011
2017-06-15

Evaporation apparatus and evaporation method

#10
20170037507
2017-02-09

Film thickness regulator and manufacturing method thereof, film thickness regulating method and evaporation apparatus

#11
20160376698
2016-12-29

Monomer vaporizing device and method of controlling the same

#12
20160245745
2016-08-25

Apparatus and method for measuring deposition rate

#13
20160244870
2016-08-25

Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus

#14
20160216143
2016-07-28

Deposition rate measuring apparatus

#15
20150200383
2015-07-16

Sputtering device and sputtering method

#16
20150191816
2015-07-09

Method for controlling exhaust flow in wafer processing module

#17
20140262751
2014-09-18

Plasma emission monitor and process gas delivery system

#18
20140238105
2014-08-28

Device for detecting evaporation source and method for applying the same

#19
20140178567
2014-06-26

Systems and methods for processing vapor

#20
20140104616
2014-04-17

Method of measuring vapor flux density

#21
20120306508
2012-12-06

In-situ flux measurement devices, methods, and systems

#22
20120305385
2012-12-06

Plasma sputtering process for producing particles

#23
20120304927
2012-12-06

In-situ flux measurement devices, methods, and systems

#24
20120260855
2012-10-18

DEPOSITING APPARATUS FOR FORMING THIN FILM

#25
20120009706
2012-01-12

Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method

#26
20110290991
2011-12-01

Method and device for accurately measuring the incident flux of ambient particles in a high or ultra-high vacuum environment

#27
20110212256
2011-09-01

DEPOSITION RATE CONTROL

#28
20110183069
2011-07-28

DEPOSITION APPARATUS, DEPOSITION METHOD, AND STORAGE MEDIUM HAVING PROGRAM STORED THEREIN

#29
20110165315
2011-07-07

Flux monitor

#30
20110155561
2011-06-30

Reactive sputtering method and reactive sputtering apparatus

#31
20100282598
2010-11-11

Method for controlling a reactive-high-power pulsed magnetron sputter process and corresponding device

#32
20100247807
2010-09-30

Electron gun evaporation apparatus and film formation method using the electron gun evaporation apparatus

#33
20100170434
2010-07-08

Method for controlling the volume of a molecular beam

#34
20100092665
2010-04-15

EVAPORATING APPARATUS, APPARATUS FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR CONTROLLING EVAPORATING APPARATUS AND METHOD FOR USING EVAPORATING APPARATUS

#35
20090304906
2009-12-10

EVAPORATING APPARATUS, APPARATUS FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR USING EVAPORATING APPARATUS AND METHOD FOR MANUFACTURING BLOWING PORT

#36
20090095616
2009-04-16

Apparatus and method for measuring vapor flux density

#37
20090017189
2009-01-15

Method and apparatus for forming protective layer

#38
20080230375
2008-09-25

Sputtering method and sputtering apparatus

#39
20080118631
2008-05-22

Real-time system for monitoring and controlling film uniformity and method of applying the same

#40
20080047487
2008-02-28

In-situ flux measurement devices, methods, and systems

#41
20070298159
2007-12-27

ORGANIC EVAPORATOR, COATING INSTALLATION, AND METHOD FOR USE THEREOF

#42
20070123004
2007-05-31

Method and apparatus for forming a crystalline silicon thin film

#43
20070095290
2007-05-03

Method for controlling the volume of a molecular beam

#44
20070056846
2007-03-15

Silicon dot forming method and silicon dot forming apparatus

#45
20070042127
2007-02-22

Film growth at low pressure mediated by liquid flux and induced by activated oxygen

#46
20050173239
2005-08-11

End point detection for sputtering and resputtering

#47
20050081790
2005-04-21

Film deposition device

#48
20050034668
2005-02-17

Multi-component substances and apparatus for preparation thereof

#49
20050026433
2005-02-03

Integrated circuit device and fabrication using metal-doped chalcogenide materials