120097 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Controlling or regulating the coating process; Controlling the film thickness or evaporation rate using measurement in the gas phase
EVAPORATION SOURCE FOR DEPOSITION OF EVAPORATED MATERIAL ON A SUBSTRATE, DEPOSITION APPARATUS, METHOD FOR MEASURING A VAPOR PRESSURE OF EVAPORATED MATERIAL, AND METHOD FOR DETERMINING AN EVAPORATION RATE OF AN EVAPORATED MATERIAL
#2SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#3Device and method for determining the concentration of a vapor
#4Evaporation apparatus and calibration method thereof
#5Evaporation Apparatus
#6VACUUM DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD
#7METHOD FOR CONTROLLING A GAS SUPPLY TO A PROCESS CHAMBER, CONTROLLER FOR CONTROLLING A GAS SUPPLY TO A PROCESS CHAMBER, AND APPARATUS
#8Vacuum deposition apparatus and vapor deposition method
#9Evaporation apparatus and evaporation method
#10Film thickness regulator and manufacturing method thereof, film thickness regulating method and evaporation apparatus
#11Monomer vaporizing device and method of controlling the same
#12Apparatus and method for measuring deposition rate
#13Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus
#14Deposition rate measuring apparatus
#15Sputtering device and sputtering method
#16Method for controlling exhaust flow in wafer processing module
#17Plasma emission monitor and process gas delivery system
#18Device for detecting evaporation source and method for applying the same
#19Systems and methods for processing vapor
#20Method of measuring vapor flux density
#21In-situ flux measurement devices, methods, and systems
#22Plasma sputtering process for producing particles
#23In-situ flux measurement devices, methods, and systems
#24DEPOSITING APPARATUS FOR FORMING THIN FILM
#25Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
#26Method and device for accurately measuring the incident flux of ambient particles in a high or ultra-high vacuum environment
#27DEPOSITION RATE CONTROL
#28DEPOSITION APPARATUS, DEPOSITION METHOD, AND STORAGE MEDIUM HAVING PROGRAM STORED THEREIN
#29Flux monitor
#30Reactive sputtering method and reactive sputtering apparatus
#31Method for controlling a reactive-high-power pulsed magnetron sputter process and corresponding device
#32Electron gun evaporation apparatus and film formation method using the electron gun evaporation apparatus
#33Method for controlling the volume of a molecular beam
#34EVAPORATING APPARATUS, APPARATUS FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR CONTROLLING EVAPORATING APPARATUS AND METHOD FOR USING EVAPORATING APPARATUS
#35EVAPORATING APPARATUS, APPARATUS FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR CONTROLLING EVAPORATING APPARATUS, METHOD FOR USING EVAPORATING APPARATUS AND METHOD FOR MANUFACTURING BLOWING PORT
#36Apparatus and method for measuring vapor flux density
#37Method and apparatus for forming protective layer
#38Sputtering method and sputtering apparatus
#39Real-time system for monitoring and controlling film uniformity and method of applying the same
#40In-situ flux measurement devices, methods, and systems
#41ORGANIC EVAPORATOR, COATING INSTALLATION, AND METHOD FOR USE THEREOF
#42Method and apparatus for forming a crystalline silicon thin film
#43Method for controlling the volume of a molecular beam
#44Silicon dot forming method and silicon dot forming apparatus
#45Film growth at low pressure mediated by liquid flux and induced by activated oxygen
#46End point detection for sputtering and resputtering
#47Film deposition device
#48Multi-component substances and apparatus for preparation thereof
#49Integrated circuit device and fabrication using metal-doped chalcogenide materials