C23C14/546 - CPC Classification Index

ClassID:

120099 ⎘

C23C14/546 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Controlling or regulating the coating process; Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators

Recent Application in this class:

20240102147

2024-03-28

APPLYING A TRANSPARENT CONDUCTIVE FILM TO FLUORINE-DOPED TIN OXIDE

20230018891

2023-01-19

Sensor assembly and methods of vapor monitoring in process chambers

20200325580

2020-10-15

Monitoring thin film deposition

20200080194

2020-03-12

Crystal oscillation probe structure and evaporation device

20190390324

2019-12-26

Apparatus and methods for depositing variable interference filters

20190382884

2019-12-19

EVAPORATION DEVICE AND EVAPORATION METHOD

20190127843

2019-05-02

Evaporation apparatus and calibration method thereof

20180267086

2018-09-20

Process monitoring using crystal with reactance sensor

20180231957

2018-08-16

Crystal oscillator and the use thereof in semiconductor fabrication

#10

20180187302

2018-07-05

MEASUREMENT ASSEMBLY FOR MEASURING A DEPOSITION RATE AND METHOD THEREFORE

#11

20180037996

2018-02-08

Film thickness monitoring system and method using the same

#12

20170241776

2017-08-24

Apparatus and method for layer thickness measurement for a vapor deposition method

#13

20170191156

2017-07-06

Detection device for detecting thickness of vacuum-evaporated film and vacuum evaporation apparatus

#14

20160292338

2016-10-06

Fabrication of critical layers of integrated computational elements

#15

20160273097

2016-09-22

METHOD FOR MONITORING SE VAPOR IN VACUUM REACTOR APPARATUS

#16

20160223716

2016-08-04

Optical article coated with an antireflection coating comprising a sub-layer partially formed under ion assistance and its manufacturing process

#17

20160216143

2016-07-28

Deposition rate measuring apparatus

#18

20160215397

2016-07-28

Monitoring thin film deposition

#19

20160060745

2016-03-03

Reactor device with removable deposition monitor

#20

20150194355

2015-07-09

Crystal oscillator and the use thereof in semiconductor fabrication

#21

20150176129

2015-06-25

Film formation method using oscillators for measurement and calibration during calibration step performed during film formation

#22

20140326962

2014-11-06

Deposition apparatus and method for manufacturing organic light emitting display apparatus by using the same

#23

20140127833

2014-05-08

Deposition amount measuring apparatus, depositing apparatus including the same, and method for manufacturing light emitting display

#24

20140007692

2014-01-09

Surface acoustic wave monitor for deposition and analysis of ultra-thin films

#25

20120114840

2012-05-10

VACUUM VAPOR DEPOSITION SYSTEM

#26

20120114839

2012-05-10

VACUUM VAPOR DEPOSITION SYSTEM

#27

20120114838

2012-05-10

FILM FORMATION APPARATUS

#28

20120114837

2012-05-10

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

#29

20120114833

2012-05-10

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

#30

20120090542

2012-04-19

REACTOR DEVICE WITH REMOVABLE DEPOSITION MONITOR

#31

20120083118

2012-04-05

Methods of evaporating metal onto a semiconductor wafer in a test wafer holder

#32

20120083050

2012-04-05

Detecting a deposition condition

#33

20110079178

2011-04-07

THICKNESS MEASURING DEVICE, COATING INSTALLATION, METHOD OF MEASURING THE THICKNESS OF A LAYER, AND USE OF A THICKNESS MEASURING DEVICE

#34

20110027459

2011-02-03

Methods and devices for monitoring and controlling thin film processing

#35

20100316788

2010-12-16

DEPOSITION RATE MONITOR DEVICE, EVAPORATOR, COATING INSTALLATION, METHOD FOR APPLYING VAPOR TO A SUBSTRATE AND METHOD OF OPERATING A DEPOSITION RATE MONITOR DEVICE

#36