120170 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material; Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides Nitrides
Sub-classes:COATED CUTTING TOOL
#2IN-SITU SOLID CHEMICAL VAPOR DEPOSITION PRECURSOR DELIVERY
#3CONTROLLING ARCING WITH SEASON
#4Process for Depositing Scandium Nitride by Atomic Layer Deposition Techniques
#5METHOD OF FORMING A THIN FILM USING HYDROGEN TREATMENT
#6METHOD OF FORMING VANADIUM NITRIDE-CONTAINING LAYER AND STRUCTURE COMPRISING THE SAME
#7METHODS FOR DEPOSITING METAL NITRIDE LAYERS ON A SUBSTRATE BY CYCLICAL DEPOSITION PROCESSES INCLUDING CYCLIC COMPOUNDS
#8MOLYBDENUM PRECURSOR COMPOUND, METHOD FOR PRODUCING SAME, AND METHOD FOR DEPOSITING MOLYBDENUM-CONTAINING THIN FILM USING SAME
#9FORMING TOOLS COATED WITH KAPPA-ALUMINA
#10METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#11METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS
#12METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#13Heteroleptic Triazenide Metal Complexes
#14METHODS FOR USING NON-PLASMA MICROWAVE IN HYDROGEN AMBIENT TO MITIGATE MO NITRIDATION
#15OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS
#16METHOD FOR FORMING A SEMICONDUCTOR STRUCTURE, METHOD FOR DEPOSITING A DIPOLE LAYER ON A SUBSTRATE, AND ASSOCIATED METHODS FOR FORMING A GATE STRUCTURE FOR A SEMICONDUCTOR DEVICE
#17FILM FORMING METHOD AND FILM FORMING APPARATUS
#18METHOD FOR FORMING BARRIER LAYER
#19ATOMIC LAYER DEPOSITION OF SUPERCONDUCTING TRANSITION METAL NITRIDES FOR QUANTUM CIRCUITS AND DETECTORS
#20CLEANING METHOD AND FILM-FORMING APPARATUS
#21SURFACE COATED CUTTING TOOLS
#22METAL-ORGANIC CHEMICAL VAPOR DEPOSITION OF SEMI-INSULATING IRON-DOPED GROUP III-NITRIDE FILMS
#23FILM FORMING METHOD
#24FILM FORMING METHOD AND FILM FORMING APPARATUS
#25THIN FILM, METHOD OF FORMING THE SAME AND SEMICONDUCTOR DEVICE
#26METAL-CONTAINING FILM AND METHOD FOR PRODUCING METAL-CONTAINING FILM
#27METHODS AND SYSTEMS FOR FORMING HIGHLY CONFORMAL AND LOW RESISTIVITY VANADIUM NITRIDE THIN FILMS
#28MULTI-FUNCTIONAL SHUTTER DISK FOR THIN FILM DEPOSITION CHAMBER
#29PRECURSOR DELIVERY SYSTEM AND METHOD FOR CYCLIC DEPOSITION
#30n-TYPE GaN CRYSTAL, GaN WAFER, AND GaN CRYSTAL, GaN WAFER AND NITRIDE SEMICONDUCTOR DEVICE PRODUCTION METHOD
#31CONFORMAL AND SMOOTH TITANIUM NITRIDE LAYERS AND METHODS OF FORMING THE SAME
#32IN-SITU METAL DEPOSITION FOR REDUCED CHARGING DURING DIELECTRIC ETCH
#33REMOTE DOPING OF A SEMICONDUCTOR STRUCTURE, RELATED DEVICES, RELATED SYSTEMS, AND RELATED METHODS
#34METHOD OF MANUFACTURING METAL NITRIDE FILM
#35LATERAL GAP FILL
#36SEMICONDUCTOR DEVICE PROCESSING COMPOSITION, COMPOUND, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
#37VANADIUM CONTAINING LAYERS AND METHODS AND SYSTEMS FOR DEPOSITING SAID LAYERS
#38METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#39METHODS AND ASSEMBLIES FOR SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL
#40COMPOSITE FILM, PREPARATION METHOD THEREOF AND LIGHT-EMITTING DEVICE
#41SELECTIVE NON-PLASMA DEPOSITION OF MASK PROTECTION MATERIAL
#42SHIELDING COMPOUND, METHOD OF FORMING THIN FILM USING SHIELDING COMPOUND, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE
#43SURFACE-COATED CUTTING TOOL
#44TITANIUM ALUMINUM AND TANTALUM ALUMINUM THIN FILMS
#45DIFFUSION BARRIER INCLUDING METAL SILICIDE AND TITANIUM SILICON NITRIDE
#46METHODS FOR FORMING MOLYBDENUM SURFACES WITH INCREASED DIFFUSION BARRIER
#47PRECURSOR FOR FORMING METAL THIN FILM, MANUFACTURING METHOD USING THE SAME, AND METAL THIN FILM MANUFACTURED THEREBY
#48PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#49PROCESSING SOLUTION, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#50METHOD FOR FORMING A RARE-EARTH-CONTAINING LAYER, APPARATUS, AND STRUCTURE
#51ARC REDUCTION AND RF CONTROL FOR ELECTROSTATIC CHUCKS IN SEMICONDUCTOR PROCESSING
#52SELECTIVE DEPOSITION
#53METHODS FOR DEPOSITING A MOLYBDENUM NITRIDE FILM ON A SURFACE OF A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS AND RELATED SEMICONDUCTOR DEVICE STRUCTURES INCLUDING A MOLYBDENUM NITRIDE FILM
#54MULTI-REGION DIFFUSION BARRIER CONTAINING TITANIUM, SILICON AND NITROGEN
#55TIN OXIDE MANDRELS IN PATTERNING
#56METHODS FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
#57NITROGEN-BASED OXYGEN-FREE DIPOLES, RELATED DEVICES, RELATED SYSTEMS, AND RELATED METHODS
#58METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#59SUBSTRATE PROCESSING APPARATUS
#60REDUCING LINE BENDING DURING METAL FILL PROCESS
#61TITANIUM NITRIDE GAPFILL PROCESSES FOR SEMICONDUCTOR DEVICES
#62INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCESSES
#63SUBSTRATE PROCESSING METHOD
#64SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#65FILM QUALITY IMPROVER, METHOD OF FORMING THIN FILM USING FILM QUALITY IMPROVER, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD
#66INTERFACE TUNING FOR EROSION AND CORROSION RESISTANT COATINGS FOR SEMICONDUCTOR COMPONENTS
#67METHOD OF FORMING INSULATING FILM BY USING ATOMIC LAYER DEPOSITION
#68MODERATE TEMPERATURE CVD ALPHA ALUMINA COATING
#69METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM
#70METHOD AND APPARATUS FOR PRODUCING NITROGEN COMPOUND
#71FORMATION OF MEMORY DEVICE CHANNEL HOLES USING DOPED FILM LAYER
#72TUNGSTEN METAL/TUNGSTEN NITRIDE ENHANCED PLATINUM-BASED ORR CATALYST AND METHOD FOR MAKING THE SAME
#73SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
#74METHOD OF FORMING CHROMIUM NITRIDE LAYER AND STRUCTURE INCLUDING THE CHROMIUM NITRIDE LAYER
#75METHOD FOR FORMING CARBON-CONTAINING FILM, AND METHOD FOR FORMING HARD MASK USING THE CARBON-CONTAINING FILM
#76CAPACITOR AND SEMICONDUCTOR DEVICE INCLUDING THE SAME
#77THIN FILM DEPOSITION WITH IMPROVED CONTROL OF PRECURSOR
#78NITRIDE-BASED WAFER CHEMICAL VAPOR DEPOSITION DEVICE AND DEPOSITION METHOD OF THE SAME
#79BOTTOM-UP METAL NITRIDE FORMATION
#80LOW-TEMPERATURE DEPOSITION PROCESSES TO FORM MOLYBDENUM-BASED MATERIALS WITH IMPROVED RESISTIVITY
#81OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS
#82CONTAINER FOR VOLATILE RAW MATERIALS, AND SOLID GASIFICATION AND SUPPLY SYSTEM
#83FILM FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND PROCESSING SYSTEM
#84Adjusting Work Function Through Adjusting Deposition Temperature
#85COMPOSITE SUBSTRATE AND PREPARATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE STRUCTURE
#86COATED CUTTING TOOL
#87METHODS FOR FORMING IMPURITY FREE METAL ALLOY FILMS
#88n-TYPE GaN CRYSTAL, GaN WAFER, AND GaN CRYSTAL, GaN WAFER AND NITRIDE SEMICONDUCTOR DEVICE PRODUCTION METHOD
#89DEPOSITION OF METAL FILMS
#90METHOD OF MANUFACTURING GROUP III-NITRIDE SEMICONDUCTOR
#91METHOD OF DEPOSITING A TUNGSTEN CONTAINING LAYER
#92ELECTRON-ENHANCED ATOMIC LAYER DEPOSITION (EE-ALD) METHODS AND DEVICES PREPARED BY SAME
#93COATED CUTTING TOOL
#94CUTTING TOOL
#95Cutting tool
#96COATED CUTTING TOOL
#97CUTTING TOOL
#98Cutting tool
#99PRECOAT METHOD FOR SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
#100METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#101SUBSTRATE PROCESSING METHOD
#102MULTI-PULSE DEPOSITION PROCESSES
#103METHODS FOR MAKING CUTTING TOOL INSERTS USING PROTECTIVE COATINGS
#104MULTI-FUNCTIONAL SHUTTER DISK FOR THIN FILM DEPOSITION CHAMBER
#105METHOD OF FORMING VANADIUM NITRIDE-CONTAINING LAYER AND STRUCTURE COMPRISING THE SAME
#106METAL THIN-FILM PRECURSOR COMPOSITION, METHOD OF FORMING THIN FILM USING METAL THIN-FILM PRECURSOR COMPOSITION, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD
#107BENZYL COMPOUND PASSIVATION FOR SELECTIVE DEPOSITION AND SELECTIVE ETCH PROTECTION
#108CUTTING TOOL
#109SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#110COATED CUTTING TOOL
#111TRANSITION METAL NITRIDE DEPOSITION METHOD
#112SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS
#113Semiconductor Device, Method and Machine of Manufacture
#114REACTION CHAMBER COMPONENT, DEPOSITION APPARATUS PROVIDED WITH SUCH COMPONENT AND METHOD OF PROTECTING SUCH COMPONENT
#115Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
#116IN-SITU SOLID CHEMICAL VAPOR DEPOSITION PRECURSOR DELIVERY
#117METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS
#118Cutting tool with a TiAlN coating having rake and relief surfaces with different residual stresses
#119COATED CUTTING TOOL
#120INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND RESISTIVITY REDUCTION
#121METHODS FOR FORMING A TRANSITION METAL NIOBIUM NITRIDE FILM ON A SUBSTRATE BY ATOMIC LAYER DEPOSITION AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
#122COATED CUTTING TOOL
#123METHOD FOR PRODUCING X-RAY PHASE GRATINGS AND X-RAY GRATINGS PRODUCED BY THE METHOD
#124THIN FILM DEPOSITION WITH IMPROVED CONTROL OF PRECURSOR
#125SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
#126GROUP III NITRIDE SINGLE CRYSTAL SUBSTRATE
#127Cyclic Film Deposition Using Reductant Gas
#128SMOOTH TITANIUM NITRIDE LAYERS AND METHODS OF FORMING THE SAME
#129SELECTIVE DEPOSITION OF METAL OXIDES USING SILANES AS AN INHIBITOR
#130Methods for forming a semiconductor device structure and related semiconductor device structures
#131HEAT-RESISTANT COAT MEMBER PACKAGED BODY, AND METHOD FOR PACKAGING HEAT-RESISTANT COAT MEMBER
#132METHOD OF FORMING INTERCONNECT STRUCTURE
#133FILM FORMING METHOD AND APPARATUS
#134METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM AND SUBSTRATE PROCESSING APPARATUS
#135LOW RESISTANCE GATE OXIDE METALLIZATION LINER
#136COATED CUTTING TOOL AND METHOD FOR MAKING COATING LAYER
#137METAL OXIDE DIFFUSION BARRIERS
#138GROWTH INHIBITOR FOR FORMING THIN FILM, METHOD OF FORMING THIN FILM USING GROWTH INHIBITOR, AND SEMICONDUCTOR SUBSTRATE FABRICATED BY METHOD
#139COATED ITEMS AND MANUFACTURING THEREOF
#140TITANIUM COMPLEX, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING TITANIUM-CONTAINING THIN FILM
#141PEALD TITANIUM NITRIDE WITH DIRECT MICROWAVE PLASMA
#142IGNITION CONTROL METHOD, FILM FORMING METHOD, AND FILM FORMING APPARATUS
#143Coated tool and cutting tool
#144PEALD nitride films
#145Stress reducing method
#146SYSTEMS AND METHODS FOR CLEANING AND TREATING A SURFACE OF A SUBSTRATE
#147Conformal and smooth titanium nitride layers and methods of forming the same
#148SHOWER PLATE AND FILM DEPOSITION APPARATUS
#149METHOD AND DEVICE FOR FORMING TUNGSTEN FILM, AND DEVICE FOR FORMING INTERMEDIATE FILM BEFORE FORMING TUNGSTEN FILM
#150Ceramic showerheads with conductive electrodes
#151METHOD OF MANUFACTURING A REDISTRIBUTION LAYER, REDISTRIBUTION LAYER, INTEGRATED CIRCUIT AND METHODS FOR ELECTRICALLY TESTING AND PROTECTING THE INTEGRATED CIRCUIT
#152In-situ deposition thickness monitoring
#153METHODS OF PROTECTING METALLIC COMPONENTS AGAINST CORROSION USING CHROMIUM-CONTAINING THIN FILMS
#154CHEMICAL VACUUM DEPOSITION OF A THIN TUNGSTEN AND/OR MOLYBDENUM SULFIDE FILM METHOD
#155METHODS FOR IMPROVING THIN FILM QUALITY
#156PRECURSOR FOR FORMING THIN FILM, METHOD OF PREPARING THE SAME, AND METHOD OF MANUFACTURING THIN FILM INCLUDING THE SAME
#157Methods of forming low resistivity titanium nitride thin film in horizontal vias and related devices
#158SELECTIVE FILM FORMATION METHOD
#159Methods and precursors for selective deposition of metal films
#160Optical dielectric planar waveguide process
#161TISIN COATING METHOD
#162COATING SYSTEM HAVING SYNTHETIC OXIDE LAYERS
#163Arene molybdenum (0) precursors for deposition of molybdenum films
#164Conditioning treatment for ALD productivity
#165FILM FORMING METHOD AND FILM FORMING APPARATUS
#166Film forming method and film forming apparatus
#167METHODS AND APPARATUS FOR TUNGSTEN GAP FILL
#168Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#169CYCLOHEPTATRIENE MOLYBDENUM (0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS
#170Method for applying a functional compound on sulfur particles
#171Fluorine-containing conductive films
#172SURFACE COATED CUTTING TOOLS
#173Substrate Processing Apparatus, Substrate Processing Method, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium
#174METHOD OF MANUFACTURING AN IMPLANT AND AN IMPLANT WITH TWO COATINGS
#175Method for structuring an anti-counterfeit marking in an at least partially transparent object and at least partially transparent object comprising an anti-counterfeit marking
#176COATED TOOL
#177Ruthenium-Containing Films Deposited On Ruthenium-Titanium Nitride Films And Methods Of Forming The Same
#178FILM FORMING METHOD, FILM FORMING DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#179AMMONIA ABATEMENT FOR IMPROVED ROUGHING PUMP PERFORMANCE
#180METHOD FOR FORMING TITANIUM NITRIDE FILM AND APPARATUS FOR FORMING TITANIUM NITRIDE FILM
#181Homoleptic lanthanide deposition precursors
#182METHOD FOR MANUFACTURING GROUP III NITRIDE SUBSTRATE, AND GROUP III NITRIDE SUBSTRATE
#183Structure and manufacturing method of surface acoustic wave filter with back electrode of piezoelectric layer
#184METHOD FOR THE SURFACE TREATMENT OF A JEWEL, IN PARTICULAR FOR THE WATCHMAKING INDUSTRY
#185BACKSIDE REACTIVE INHIBITION GAS
#186Transition metal nitride deposition method
#187Manufacturing Method of Nitride Semiconductor Photoelectrode
#188Energy storage devices having coated passive particles
#189Compound, thin-film forming raw material, and method of producing thin-film
#190STABLE BIS(ALKYL-ARENE) TRANSITION METAL COMPLEXES AND METHODS OF FILM DEPOSITION USING THE SAME
#191COATING FOR A TRIBOLOGICAL SURFACE OF A COMPONENT
#192Pulsing plasma treatment for film densification
#193Coated cutting tool
#194DEPOSITION OF METAL FILMS
#195TITANIUM NITRIDE FILM FORMING METHOD AND TITANIUM NITRIDE FILM FORMING APPARATUS
#196Providing multifunctional shutter disk above the workpiece in the multifunctional chamber during degassing or pre-cleaning of the workpiece, and storing the multifunctional shutter disc during deposition process in the same multifunctional chamber
#197Reducing line bending during metal fill process
#198METHODS FOR CONTROLLING CONTACT RESISTANCE IN COBALT-TITANIUM STRUCTURES
#199METHOD FOR FORMING METAL NITRIDE THIN FILM
#200Impurity removal in doped ALD tantalum nitride
#201YTTRIUM/LANTHANIDE METAL PRECURSOR COMPOUND, COMPOSITION FOR FORMING FILM INCLUDING THE SAME, AND METHOD OF FORMING YTTRIUM/LANTHANIDE METAL CONTAINING FILM USING THE SAME
#202ORGANOMETALLIC ADDUCT COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
#203LOW TEMPERATURE DEPOSITION PROCESS
#204NEW GROUP V AND VI TRANSITION METAL PRECURSORS FOR THIN FILM DEPOSITION
#205Adjusting work function through adjusting deposition temperature
#206Stimulus responsive polymer films and formulations
#207Methods for depositing coatings on aerospace components
#208METHOD OF TREATING A COATED CUTTING TOOL
#209SUBSTANTIALLY CARBON-FREE MOLYBDENUM-CONTAINING AND TUNGSTEN-CONTAINING FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
#210Cutting tools
#211METHOD FOR FORMING THIN FILM
#212Semiconductor device, method and machine of manufacture
#213PROTECTIVE MULTILAYER COATING FOR PROCESSING CHAMBER COMPONENTS
#214METHOD FOR FORMING THIN FILM
#215Coated cutting tool
#216METHODS FOR FORMING IMPURITY FREE METAL ALLOY FILMS
#217PRECURSOR DELIVERY SYSTEM AND METHOD FOR HIGH SPEED CYCLIC DEPOSITION
#218Method for producing a group III compound crystal by hydride vapor phase epitaxy on a seed substrate formed on a group III nitride base substrate
#219SUBSTRATE SURFACE MODIFIER FOR ATOMIC LAYER DEPOSITION AND METHOD FOR MODIFYING SURFACE OF SUBSTRATE USING THE SAME
#220METHODS OF FILLING RECESSES ON SUBSTRATE SURFACE, STRUCTURES FORMED USING THE METHODS, AND SYSTEMS FOR FORMING SAME
#221PRECURSOR DELIVERY SYSTEM AND METHOD FOR CYCLIC DEPOSITION
#222Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
#223Cycloheptatriene molybdenum (0) precursors for deposition of molybdenum films
#224Arene molybdenum (0) precursors for deposition of molybdenum films
#225Conformal and smooth titanium nitride layers and methods of forming the same
#226Coated cutting tool
#227Atomic layer deposition of metal films
#228Substrate processing method and substrate processing apparatus
#229Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
#230DEPOSITION APPARATUS AND DEPOSITION METHOD
#231ALD OF METAL-CONTAINING FILMS USING CYCLOPENTADIENYL COMPOUNDS
#232FURNACE WITH METAL FURNACE TUBE
#233Scrubber, ALD process system including the scrubber and method for fabricating semiconductor device using the scrubber
#234Conformal and smooth titanium nitride layers and methods of forming the same
#235Film forming method, method for manufacturing semiconductor device, film forming device, and system for manufacturing semiconductor device
#236Method for selectively manufacturing material layer and target pattern
#237Insert and cutting tool including the same
#238Method of processing substrate
#239Conformal damage-free encapsulation of chalcogenide materials
#240Apparatus and method for etching metal nitrides
#241Method of reducing titanium nitride etching during tungsten film formation
#242Vaporizable source material container and solid vaporization/supply system using the same
#243Substrate processing apparatus, method of manufacturing semiconductor device and substrate processing method
#244Bottom-up metal nitride formation
#245Substrate processing method, substrate processing apparatus using the same, and semiconductor device manufacturing method
#246Method for preparing modified polypropylene film
#247Fabricating method of semi-polar gallium nitride
#248System and method for vapor deposition coating of extrusion dies using impedance disks
#249Surface-coated TiN-based cermet cutting tool in which hard coating layer exhibits excellent chipping resistance
#250Methods for forming impurity free metal alloy films
#251Coated fuel pellets, methods of making and using same
#252Thermally conductive and protective coating for electronic device
#253Optical dielectric planar waveguide process
#254Cutting tool
#255Deposition system with multi-cathode and method of manufacture thereof
#256Cutting tool
#257METAL ORGANIC CHEMICAL VAPOR DEPOSTION (MOCVD) TUNNEL JUNCTION GROWTH IN III-NITRIDE DEVICES
#258Plasma-enhanced chemical vapor deposition method of forming lithium-based film by using the same
#259Method for forming structures including transition metal layers
#260Coated cutting tool
#261Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium
#262Method for producing nitride semiconductor photoelectrode
#263Methods for refurbishing aerospace components
#264Atomic layer deposition of rhenium containing thin films
#265NUCLEAR COMPONENT WITH METASTABLE CR COATING, DLI-MOCVD METHOD FOR PRODUCING SAME, AND USES FOR CONTROLLING OXIDATION/HYDRIDATION
#266Cleaning apparatus for component for semiconductor production apparatus, cleaning method for component of semiconductor production apparatus, and cleaning system for component of semiconductor production apparatus
#267Surface-coated cutting tool
#268Impurity removal in doped ALD tantalum nitride
#269Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium
#270Surface coated cutting tool having hard coating layer exhibiting excellent chipping resistance
#271Fuel cell components protected with nitride materials
#272Tungsten metal/tungsten nitride enhanced platinum-based ORR catalyst and method for making the same
#273Titanium aluminum and tantalum aluminum thin films
#274Method for nucleation of conductive nitride films
#275Methods for forming a semiconductor device structure and related semiconductor device structures
#276ORGANOMETALLIC COMPOUND AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT USING THE SAME
#277Barrier film
#278Barrier film
#279Cutting tool
#280SYSTEM AND METHODS FOR DIRECT LIQUID INJECTION OF VANADIUM PRECURSORS
#281Cutting tool
#282Cutting tool
#283Cutting tool
#284Coated cutting tool
#285METHODS OF FORMING ELECTRONIC APPARATUS WITH TITANIUM NITRIDE CONDUCTIVE STRUCTURES, AND RELATED ELECTRONIC APPARATUS AND SYSTEMS
#286Laser-assisted metal-organic chemical vapor deposition devices and methods of use thereof
#287Coated cutting tool, and method and system for manufacturing the same by chemical vapor deposition
#288Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
#289Method of forming vanadium nitride-containing layer
#290Method of forming chromium nitride layer and structure including the chromium nitride layer
#291Process for the generation of metal- or semimetal-containing films
#292SUBSTRATE PROCESSING APPARATUS
#293SUBSTRATE PROCESSING APPARATUS
#294Selective deposition of titanium films
#295Vapor phase epitaxial growth device
#296Substrate processing system, substrate processing method, and controller
#297PRECURSOR SOLUTION FOR THIN FILM DEPOSITION AND THIN FILM FORMING METHOD USING SAME
#298Molybdenum compound and method of manufacturing integrated circuit device using the same
#299Coated cutting tool
#300Methods of protecting metallic components against corrosion using chromium-containing thin films