120170 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material; Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides Nitrides
Methods of protecting metallic components against corrosion using chromium-containing thin films
#302Hard-film-coated drill
#303Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes
#304Conditioning treatment for ALD productivity
#305Tin oxide mandrels in patterning
#306Optical article having directional micro- or nanostructured thin film coating, and its process
#307Vanadium nitride film, and member coated with vanadium nitride film and method for manufacturing the same
#308Cutting tool
#309Cutting tool
#310Method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus
#311Cutting tool
#312Adjusting work function through adjusting deposition temperature
#313WARP MEASUREMENT DEVICE, VAPOR DEPOSITION APPARATUS, AND WARP MEASUREMENT METHOD
#314Metal triamine compound, method for preparing the same, and composition for depositing metal-containing thin film including the same
#315Coating and coated cutting tool comprising the coating
#316Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#317Method for producing an interconnection comprising a via extending through a substrate
#318Systems and methods for cobalt metalization
#319Ceramic showerheads with conductive electrodes
#320Nitride semiconductor substrate, laminate, substrate selection program, substrate data output program, off-angle coordinate map, and methods thereof
#321GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE
#322Method of forming vanadium nitride layer and structure including the vanadium nitride layer
#323Method for producing GaN crystal
#324Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#325Substrate processing apparatus having electrostatic chuck and substrate processing method
#326N-type GaN crystal, GaN wafer, and GaN crystal, GaN wafer and nitride semiconductor device production method
#327Method of growing titanium nitride on silicon substrate free from silicon nitride interface by using a titanium seed layer
#328RF power source operation in plasma enhanced processes
#329Coated cutting tool
#330Methods To Grow Low Resistivity Metal Containing Films
#331Layer of hard material on a metal substrate
#332FILM FORMING METHOD, FILM FORMING SYSTEM, AND FILM FORMING APPARATUS
#333Shutter disk having lamp, power, and/or gas modules arranged at the first side of the shutter disk of thin film deposition chamber
#334Smooth titanium nitride layers and methods of forming the same
#335Conformal and smooth titanium nitride layers and methods of forming the same
#336Hard material layer on metal substrate
#337THIN FILM DEPOSITION APPARATUS AND THIN FILM DEPOSITION METHOD
#338METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#339Method for forming thin film
#340PEALD nitride films
#341METHOD FOR PRODUCING GRAIN-ORIENTED ELECTRICAL SHEET AND CONTINUOUS FILM-FORMING DEVICE
#342Method for forming thin film
#343Method of manufacturing an implant and an implant with two coatings
#344Cutting tool
#345Coated cutting tool
#346Lanthanoid compound, lanthanoid-containing thin film and formation of lanthanoid-containing thin film using the lanthanoid compound
#347Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
#348Methods for forming a polycrystalline molybdenum film over a surface of a substrate and related structures including a polycrystalline molybdenum film
#349Deposition of rhenium-containing thin films
#350PEALD titanium nitride with direct microwave plasma
#351Self-aligned structures from sub-oxides
#352EQUIPMENT FOR MANUFACTURING GRAIN-ORIENTED ELECTROMAGNETIC STEEL SHEET
#353CYCLIC GERMANIUM SILYLAMIDO PRECURSORS FOR GE-CONTAINING FILM DEPOSITIONS AND METHODS OF USING THE SAME
#354Modifying ferroelectric properties of hafnium oxide with hafnium nitride layers
#355Energy storage devices having coated passive components
#356RESOLVING SPONTANEOUS ARCING DURING THICK FILM DEPOSITION OF HIGH TEMPERATURE AMORPHOUS CARBON DEPOSITION
#357Cemented carbide, coated tool, and cutting tool
#358Cemented carbide, coated tool using same, and cutting tool
#359GROUP 13 ELEMENT NITRIDE LAYER, FREE-STANDING SUBSTRATE, FUNCTIONAL ELEMENT, AND METHOD OF PRODUCING GROUP 13 ELEMENT NITRIDE LAYER
#360SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#361METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#362Metal component and method for producing same
#363METHODS AND APPARATUS FOR DEPOSITING YTTRIUM-CONTAINING FILMS
#364Coating of fluid-permeable materials
#365Manufacturing of coated items
#366Method of applying a flow field plate coating
#367Surface-coated cutting tool and method for manufacturing same
#368Boron-containing compounds, compositions, and methods for the deposition of a boron containing films
#369Methods for forming graded wurtzite III-nitride alloy layers
#370Surface-coated cutting tool in which hard coating layer exhibits exceptional adhesion resistance and anomalous damage resistance
#371Method for forming a protective coating film for halide plasma resistance
#372Selective deposition on non-metallic surfaces
#373High voltage, low pressure plasma enhanced atomic layer deposition
#374Optical dielectric planar waveguide process
#375Laminate of aluminum nitride single-crystal substrate
#376Methods for forming a semiconductor device structure and related semiconductor device structures
#377Atomic layer deposition of rhenium containing thin films
#378Surface-coated cutting tool and method for manufacturing same
#379Surface-coated cutting tool and method for manufacturing same
#380Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#381Titanium aluminum and tantalum aluminum thin films
#382Methods and precursors for selective deposition of metal films
#383CVD coated cutting tool
#384COATING FOR JOINT IMPLANTS
#385Heat treatment apparatus and film deposition method
#386Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
#387Group III nitride single crystal substrate
#388Coated cutting tool
#389Titanium-containing film forming compositions for vapor deposition of titanium-containing films
#390PRECURSOR SOLUTION FOR THIN FILM DEPOSITION AND THIN FILM FORMING METHOD USING SAME
#391Selective deposition of aluminum and nitrogen containing material
#392DEPOSITION OF OXIDES AND NITRIDES
#393Coated cutting tool
#394Substrate processing method and substrate processing apparatus
#395Coated tool and cutting tool
#396Methods for depositing coatings on aerospace components
#397Homoleptic lanthanide deposition precursors
#398Nanostructured metallic layer on carbide for improved coating adhesion
#399Fluorine-containing conductive films
#400Nuclear component with metastable Cr coating, DLI-MOCVD method for producing same, and uses for controlling oxidation/hydridation
#401Coated cutting tool
#402Ceramic showerheads with conductive electrodes
#403METHOD FOR PREPARING MULTILAYER STRUCTURE
#404Vanadium nitride film, and member coated with vanadium nitride film and method for manufacturing the same
#405Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#406Process for passivating dielectric films
#407FABRICATION OF CORRELATED ELECTRON MATERIAL DEVICES WITH REDUCED INTERFACIAL LAYER IMPEDANCE
#408Vapor phase growth apparatus comprising n reactors, a primary gas supply path, a main secondary gas supply path, (n−1) auxiliary secondary gas supply paths, a first control circuit, and a second control circuit
#409Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
#410Substrate processing apparatus, method of manufacturing semiconductor device, method of loading substrate and non-transitory computer-readable recording medium
#411Methods and apparatus for controlling contact resistance in cobalt-titanium structures
#412Substrate processing methods
#413Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device, and Non-Transitory Computer-readable Recording Medium
#414Nitride semiconductor template, method for manufacturing nitride semiconductor template, and method for manufacturing nitride semiconductor free-standing substrate
#415VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD
#416Coated cutting tool
#417Semiconductor device, method and machine of manufacture
#418MANUFACTURING METHOD AND INSPECTION METHOD OF GROUP-III NITRIDE LAMINATE, AND GROUP-III NITRIDE LAMINATE
#419Aluminum-containing layers and methods of forming the same
#420Metal and metal-derived films
#421Vapor-liquid reaction device, reaction tube, film forming apparatus
#422Film forming method and film forming system
#423Conformal damage-free encapsulation of chalcogenide materials
#424Grain-oriented electromagnetic steel sheet and method of producing grain-oriented electromagnetic steel sheet
#425Surface-coated cutting tool and method for manufacturing the same
#426Surface-coated cutting tool and method for manufacturing the same
#427Film-Forming Method and Film-Forming Apparatus
#428Gas processing apparatus and gas processing method
#429Surface coated member and method for manufacturing same
#430Buffer layer for Gallium Nitride-on-Silicon epitaxy
#431Method of forming titanium nitride films with (200) crystallographic texture
#432HARD COATING, CUTTING TOOL, AND METHOD FOR PRODUCING HARD COATING
#433Method of manufacturing group III nitride semiconductor substrate, group III nitride semiconductor substrate, and bulk crystal
#434ALD of metal-containing films using cyclopentadienyl compounds
#435Thermally conductive and protective coating for electronic device
#436Methods of forming resistive memory elements
#437Protection of aluminum process chamber components
#438OPTICAL PART, METHOD FOR PRODUCING OPTICAL PART, AND IMAGE DISPLAY APPARATUS
#439Coating system having synthetic oxide layers
#440Coated cutting tool
#441Grain-oriented electrical steel sheet and production method for grain-oriented electrical steel sheet
#442Substrate processing apparatus
#443Semiconductor film forming method using hydrazine-based compound gas
#444Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same
#445Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same
#446Surface-coated cutting tool having hard coating layer exhibiting excellent chipping resistance and wear resistance
#447Thin film formation method
#448Coated cutting tool
#449CUTTING INSERT AND CUTTING TOOL
#450Barrier for copper metallization and methods of forming
#451Method and corresponding reactor for preparing metal nitrides with adjustable metal contents
#452VIRTUAL EXERCISER DEVICE
#453Forming iron nitride hard magnetic materials using chemical vapor deposition or liquid phase epitaxy
#454Organometallic precursors, methods of forming a layer using the same and methods of manufacturing semiconductor devices using the same
#455Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-transitory Computer-readable Recording Medium
#456Layer deposition method and layer deposition apparatus
#457Semiconductor wafer
#458Method of forming tungsten film and controller
#459SEED WAFER FOR GaN THICKENING USING GAS- OR LIQUID-PHASE EPITAXY
#460Apparatus for manufacturing group III nitride single crystal, method for manufacturing group III nitride single crystal using the apparatus, and aluminum nitride single crystal
#461Methods of protecting metallic components against corrosion using chromium-containing thin films
#462Methods for depositing coatings on aerospace components
#463Nitride semiconductor substrate, manufacturing method therefor, and semiconductor device
#464Compound semiconductor substrate comprising a SiC layer
#465Process for treating a surface of a timepiece component, and timepiece component obtained from such a process
#466Optical dielectric planar waveguide process
#467FILM FORMATION APPARATUS
#468Coated cutting tool
#469Oriented electromagnetic steel sheet and method for manufacturing oriented electromagnetic steel sheet
#470Semiconductor device and method of forming the same
#471Memory device and method of fabricating the same
#472Metal organic chemical vapor depostion (MOCVD) tunnel junction growth in III-nitride devices
#473Tin oxide mandrels in patterning
#474Group III nitride stacked body, and semiconductor device having the stacked body
#475Tungsten film forming method, film forming system and film forming apparatus
#476SUBSTRATE PROCESSING APPARATUS
#477Pre-coating method and film forming method
#478Apparatus and Method of Treating a Lithium-Ion-Battery Part
#479Surface-coated cutting tool and method for manufacturing the same
#480Group 5 metal compound, method for preparing the same, precursor composition for depositing layer containing the same, and method for depositing layer using the same
#481Cemented carbide and coated cemented carbide
#482Semiconductor device and method for manufacturing the same
#483Method for manufacturing semiconductor device
#484Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium
#485Hard coating, hard-coated tool, and their production methods
#486Vanadium compound
#487Modulating the microstructure of metallic interconnect structures
#488Advanced coating method and materials to prevent HDP-CVD chamber arcing
#489Film forming method
#490Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
#491Titanium-containing film forming compositions for vapor deposition of titanium-containing films
#492Titanium-containing film forming compositions for vapor deposition of titanium-containing films
#493Coated cutting tool
#494Production Method and Production Device for Nitrogen Compound
#495Lanthanum compound and methods of forming thin film and integrated circuit device using the lanthanum compound
#496Surface-coated cutting tool and method of producing the same
#497MULTILAYER WIRING FILM AND THIN FILM TRANSISTOR ELEMENT
#498Method for producing light-emitting UV column structures and the structures produced using this method
#499Drilling tip, drilling tool, and method of manufacturing drilling tip
#500Nitride crystal substrate
#501Integration of ALD copper with high temperature PVD copper deposition for BEOL interconnect
#502Coated cutting tool with h-AlN and Ti1-xAlxCyNz layers
#503Method of forming film
#504Pulley for an elevator with a friction reducing coating and method for manufacturing same
#505Method for manufacturing semiconductor device, non-transitory computer-readable recording medium, and substrate processing apparatus
#506Method for producing aluminum nitride single crystal substrate
#507Method for forming coating film having high heat resistance, high hardness and abrasion resistance, coating film having high heat resistance, high hardness and abrasion resistance, and cutting tool comprising same
#508Diffusion barriers
#509Method for producing silicon nitride film and silicon nitride film
#510Method of producing III nitride semiconductor light-emitting device
#511Metal and metal-derived films
#512Tantalum compound
#513Surface-coated cutting tool and method of producing the same
#514SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#515Film-forming method and film-forming apparatus
#516Titanium aluminum and tantalum aluminum thin films
#517Epitaxial substrate
#518Method of depositing film by PEALD using negative bias
#519Methods for forming a semiconductor device structure and related semiconductor device structures
#520EPITAXIAL SUBSTRATE FOR SEMICONDUCTOR ELEMENTS, SEMICONDUCTOR ELEMENT, AND MANUFACTURING METHOD FOR EPITAXIAL SUBSTRATES FOR SEMICONDUCTOR ELEMENTS
#521Energy release using tunable reactive materials
#522Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#523Methods and apparatus for depositing yttrium-containing films
#524Coated tool
#525Method for producing GaN crystal
#526Cutting tool
#527Energy storage devices having coated passive components
#528Semiconductor method having annealing of epitaxially grown layers to form semiconductor structure with low dislocation density
#529Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
#530Process for the generation of thin inorganic films
#531Substrate processing apparatus, substrate holder and mounting tool
#532CVD composite refractory coatings and applications thereof
#533In-situ formation of non-volatile lanthanide thin film precursors and use in ALD and CVD
#534COATED EXTRUSION TOOL
#535Method for manufacturing semiconductor device
#536Multi-region diffusion barrier containing titanium, silicon and nitrogen
#537Method of manufacturing semiconductor device, method of loading substrate and non-transitory computer-readable recording medium
#538Precursor composition containing group IV organic compound and method for forming thin film using same
#539TiSiN coating method
#540Aerosol Assisted CVD For Industrial Coatings
#541Surface-coated cutting tool and method of manufacturing the same
#542Manufacturing method for group III nitride semiconductor substrate and group III nitride semiconductor substrate
#543SURFACE-COATED CUTTING TOOL AND METHOD OF PRODUCING THE SAME
#544Surface-coated cutting tool
#545Surface-coated cutting tool and manufacturing method of the same
#546Surface-coated cutting tool with hard coating layer that exhibits excellent chipping resistance and manufacturing method thereof
#547Film forming method and film forming apparatus
#548Semiconductor light-emitting device and method of manufacturing semiconductor light-emitting device
#549Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#550Selective deposition with atomic layer etch reset
#551Coated cutting tool
#552Hard titanium aluminum nitride coating, hard-coated tool, and their production methods
#553Article having coating including compound of aluminum, boron and nitrogen
#554Coated cutting tool
#555Coating method of separator for fuel cell and separator for fuel cell
#556Methods for manufacturing semiconductor devices
#557Method of fabricating a magnetic stack arrangement of a laminated magnetic inductor
#558CERAMIC COATING FOR CORROSION RESISTANCE OF NUCLEAR FUEL CLADDING
#559Gallium nitride crystal, its manufacturing method, and crystal growth apparatus
#560Metal complexes containing amidoimine ligands
#561Semiconductor structure of interconnect and fabrication method thereof
#562Method of forming a layer and a method of fabricating a variable resistance memory device using the same
#563Compound semiconductor substrate with SiC layer
#564Method for manufacturing nitride semiconductor substrate
#565Substrate processing method that includes step of introducing ballast gas to exhaust line while supplying processing gas
#566Plasma resistant coating of porous body by atomic layer deposition
#567Plasma resistant coating of porous body by atomic layer deposition
#568Cutting plate and manufacturing method
#569Etching method
#570Growth Method of Aluminum Nitride
#571Surface-coated cutting tool in which hard coating layer exhibits excellent chipping resistance
#572Modulating the microstructure of metallic interconnect structures
#573Epitaxial substrate for semiconductor elements, semiconductor element, and manufacturing method for epitaxial substrates for semiconductor elements
#574Epitaxial substrate for semiconductor elements, semiconductor element, and manufacturing method for epitaxial substrates for semiconductor elements
#575Epitaxial substrate for semiconductor elements, semiconductor element, and manufacturing method for epitaxial substrates for semiconductor elements
#576METHOD FOR PRODUCING SEMICONDUCTOR EPITAXIAL WAFER AND SEMICONDUCTOR EPITAXIAL WAFER
#577Wear resistant vapor deposited coating, method of coating deposition and applications therefor
#578Cobalt manganese vapor phase deposition
#579Coated cutting tool
#580Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium
#581Method of manufacturing lithography template
#582Tool with TiAIN coating
#583Method of manufacturing semiconductor device
#584Precursors of manganese and manganese-based compounds for copper diffusion barrier layers and methods of use
#585CHEMICAL VAPOR DEPOSITION APPARATUS AND CHEMICAL VAPOR DEPOSITION METHOD
#586Method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and supply system
#587Surface-coated cutting tool and method of producing the same
#588Method of producing III nitride semiconductor light-emitting device
#589Substrate processing apparatus
#590TRANSPARENT AND ELECTRICALLY CONDUCTIVE COATINGS CONTAINING NON-STOICHIOMETRIC METALLIC NITRIDES
#591Atomic layer deposition of rhenium containing thin films
#592Synthesis of metal nitride thin films materials using hydrazine derivatives
#593Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
#594Semiconductor random access memory and manufacturing method thereof
#595Memory device and method of fabricating the same
#596Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
#597Methods of forming resistive memory elements
#598THICKNESS UNIFORMITY CONTROL FOR EPITAXIALLY-GROWN STRUCTURES IN A CHEMICAL VAPOR DEPOSITION SYSTEM
#599COBALT COMPOUNDS, METHOD OF MAKING AND METHOD OF USE THEREOF
#600TiN-based film and TiN-based film forming method