120263 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber; Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially vertically the substrate being rotated
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
#2Methods Of Operating A Spatial Deposition Tool
#3METHODS OF OPERATING A SPATIAL DEPOSITION TOOL
#4Plasma-Enhanced Chemical Vapor Deposition Coating System
#5COATING METHOD
#6FILM-FORMING APPARATUS, FILM-FORMING METHOD, GALLIUM OXIDE FILM AND LAMINATE
#7SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
#8FILM-FORMING APPARATUS, FILM-FORMING METHOD, GALLIUM OXIDE FILM AND LAMINATE
#9VOLTAGE BREAKDOWN UNIFORMITY IN PIEZOELECTRIC STRUCTURE FOR PIEZOELECTRIC DEVICES
#10AN ATOMIC LAYER DEPOSITION APPARATUS AND A METHOD
#11METHODS FOR MANUFACTURING A SEMICONDUCTOR WAFER USING A PREHEAT RING IN A WAFER REACTOR
#12SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS
#13SUBSTRATE PROCESSING APPARATUS, SUBSTRATE HOLDER, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#14Dynamic electrical and fluid delivery system with indexing motion for batch processing chambers
#15SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#16SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
#17METHODS FOR FORMING FILMS ON SUBSTRATES
#18Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
#19Voltage breakdown uniformity in piezoelectric structure for piezoelectric devices
#20Plasma-enhanced chemical vapor deposition coating system
#21Systems and methods for a preheat ring in a semiconductor wafer reactor
#22Method of forming a film on a substrate by chemical vapor deposition
#23Dynamic electrical and fluid delivery system with indexing motion for batch processing chambers
#24Substrate processing apparatus and method of manufacturing semiconductor device
#25Coating apparatus and coating method
#26Substrate holding mechanism and substrate processing apparatus
#27SUSCEPTOR AND CHEMICAL VAPOR DEPOSITION APPARATUS
#28Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#29PROCEDURE FOR COATING COMPONENT SURFACES UNDER VACUUM AND THE VACUUM COATING SYSTEM USED FOR THIS PURPOSE
#30Film forming method and film forming apparatus
#31Substrate processing apparatus and substrate processing method
#32Methods for forming films on substrates
#33Fixture for coating of double-ended tools
#34System and method of low temperature thin film deposition and in-situ annealing
#35Rotation angle detection apparatus and rotation angle detection method, and substrate processing apparatus and substrate processing method using same
#36Methods Of Operating A Spatial Deposition Tool
#37SUSCEPTOR AND CHEMICAL VAPOR DEPOSITION APPARATUS
#38Methods Of Operating A Spatial Deposition Tool
#39VERTICAL SUBSTRATE HOLDER
#40CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF FORMING FILM
#41In-line coater for vacuum deposition of thin film coatings
#42Wafer boat cooldown device
#43Swirled flow chemical vapor deposition
#44Plasma polymerization coating apparatus
#45Swirled flow chemical vapor deposition
#46Periphery purge shutter and flow control systems and methods
#47Electric discharge generator and power supply device of electric discharge generator
#48System and method for deposition of integrated computational elements (ICE) using a translation stage
#49Variable gap hard stop design
#50Film forming apparatus, susceptor, and film forming method
#51Vacuum Processing Apparatus
#52Method of growing carbon nanotube using reactor
#53Method and apparatus for depositing atomic layers on a substrate
#54Apparatus for dual speed spin chuck
#55Substrate processing apparatus including auxiliary gas supply port
#56Deposition apparatus
#57Reactor and method for growing carbon nanotube using the same
#58CHEMICAL VAPOR DEPOSITION APPARATUS
#59Substrate processing apparatus
#60Vertical heat treatment apparatus
#61Coating device
#62CVD APPARATUS
#63COATING APPARATUS
#64CVD APPARATUS
#65Stable wafer-carrier system
#66Carbon component and method for manufacturing the same
#67Coating holder and coating device having same
#68Conveyor assembly and method for conveying a substrate carrier
#69SEMICONDUCTOR MANUFACTURING APPARATUS
#70VAPOR DEPOSITION APPARATUS
#71Susceptor for vapor phase epitaxial growth device
#72Epitaxial barrel susceptor having improved thickness uniformity
#73SUSCEPTOR FOR EPITAXIAL LAYER FORMING APPARATUS, EPITAXIAL LAYER FORMING APPARATUS, EPITAXIAL WAFER, AND METHOD OF MANUFACTURING EPITAXIAL WAFER
#74METHOD AND APPARATUS FOR MAKING DIAMOND-LIKE CARBON FILMS
#75Method and apparatus for making diamond-like carbon films
#76Semiconductor manufacturing device and method
#77Susceptor
#78Modified susceptor for barrel reactor
#79Coating apparatuses and jigs thereof
#80Barrel type susceptor
#81Platform assembly and method
#82Susceptor with epitaxial growth control devices and epitaxial reactor using the same
#83System and method for vapor deposition of substrates with circular substrate frame that rotates in a planetary motion and curved lens support arms
#84Wafer chuck with aerodynamic design for turbulence reduction
#85Wafer chuck with aerodynamic design for turbulence reduction