ClassID:

120275

C23C16/488 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation Protection of windows for introduction of radiation into the coating chamber

Recent Application in this class:
#1
20260047378
2026-02-12

RADIATION SHIELD

#2
20250297365
2025-09-25

ILLUMINATION DEVICE FOR FILM GROWTH PROCESS AND FILM GROWTH PROCESS EQUIPMENT

#3
20250034708
2025-01-30

MULTI-SUBSTRATE PROCESSING SYSTEM

#4
20240401201
2024-12-05

WINDOW FOR CHEMICAL VAPOR DEPOSITION SYSTEMS AND RELATED METHODS

#5
20220375772
2022-11-24

RADIATION SHIELD

#6
20220282378
2022-09-08

SHIELDING MECHANISM AND SUBSTRATE-PROCESSING DEVICE WITH THE SAME

#7
20220056583
2022-02-24

Window for chemical vapor deposition systems and related methods

#8
20200273729
2020-08-27

Radiation shield

#9
20200176212
2020-06-04

Window member for an x-ray device

#10
20190237613
2019-08-01

FILM COATING APPARATUS

#11
20190051544
2019-02-14

Radiation shield

#12
20160258057
2016-09-08

Clean resistant windows for ultraviolet thermal processing

#13
20150267300
2015-09-24

Thermal processing chamber

#14
20150259800
2015-09-17

PREPARING METHOD OF GRAPHENE BY USING NEAR-INFRARED AND APPARATUS THEREFOR

#15
20100330773
2010-12-30

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

#16
20100275845
2010-11-04

ULTRAVIOLET-RESISTANT MATERIALS AND DEVICES AND SYSTEMS INCLUDING SAME

#17
20100018460
2010-01-28

Method for forming silicon-containing materials during a photoexcitation deposition process

#18
20070101939
2007-05-10

Deposition systems and susceptor assemblies for depositing a film on a substrate

#19
20060286820
2006-12-21

Method for treating substrates and films with photoexcitation

#20
20060286776
2006-12-21

Method for forming silicon-containing materials during a photoexcitation deposition process

#21
20060286775
2006-12-21

Method for forming silicon-containing materials during a photoexcitation deposition process

#22
20060286774
2006-12-21

METHOD FOR FORMING SILICON-CONTAINING MATERIALS DURING A PHOTOEXCITATION DEPOSITION PROCESS

#23
20060216416
2006-09-28

Methods for controlling formation of deposits in a deposition system and deposition methods including the same