120276 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Film formation device
#1802Plasma processing chamber with dual axial gas injection and exhaust
#1803Method of depositing a film, recording medium, and film deposition apparatus
#1804Energy storage device assembly
#1805Method and use of a binder for providing a metallic coat covering a surface
#1806Film deposition method
#1807Vapor Deposition Reactor Using Plasma and Method for Forming Thin Film Using the Same
#1808Amorphous carbon film, process for forming amorphous carbon film, electrically conductive member and fuel cell bipolar plate having amorphous carbon film
#1809HEATING EVAPORATION DEPOSITION APPARATUS AND EVAPORATION DEPOSITION METHOD USING THE SAME
#1810Method of manufacturing semiconductor device using the same
#1811Method of fabricating surface body having superhydrophobicity and hydrophilicity
#1812SLIDING MEMBER AND MANUFACTURING METHOD THEREOF
#1813PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
#1814EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANK MANUFACTURING SYSTEM AND METHOD OF OPERATION THEREFOR
#1815Directing plasma distribution in plasma-enhanced chemical vapor deposition
#1816Systems and methods for remote plasma atomic layer deposition
#1817Methods for processing a substrate using multiple substrate support positions
#1818Trilayer coated pharmaceutical packaging
#1819Plasma Treatment Of Substrates
#1820INSTALLATION AND METHOD FOR THE FUNCTIONALIZATION OF PARTICULATE AND POWDERED PRODUCTS
#1821Drill having a coating
#1822SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING SYSTEM
#1823Method of manufacturing an electrode for vapor deposition
#1824Vapor deposition apparatus, deposition method, and method of manufacturing organic light-emitting display apparatus by using the same
#1825Plasma processing apparatus
#1826PLASMA EVALUATION METHOD, PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#1827AUTOMATED ALGORITHM FOR TUNING OF FEEDFORWARD CONTROL PARAMETERS IN PLASMA PROCESSING SYSTEM
#1828Methods for plasma processing
#1829SUBSTRATE PROCESSING APPARATUS AND METHOD OF DEPOSITING A FILM
#1830Method and apparatus for purging and plasma suppression in a process chamber
#1831Methods for plasma processing
#1832Common deposition platform, processing station, and method of operation thereof
#1833CASCADED PLASMA REACTOR
#1834Lid assembly for a processing system to facilitate sequential deposition techniques
#1835CVD apparatus and method for forming CVD film
#1836Low friction coatings with improved abrasion and wear properties and methods of making
#1837Apparatus And Methods For Symmetrical Gas Distribution With High Purge Efficiency
#1838Magnetic Field Assisted Deposition
#1839Plasma CVD apparatus and vacuum treatment apparatus
#1840Methods and apparatus for combinatorial PECVD or PEALD
#1841Combinatorial processing using a remote plasma source
#1842Erosion Resistant Wellbore Screen and Associated Methods of Manufacture
#1843Thermionic converter and manufacturing method of electrode of thermionic converter
#1844APPARATUS AND METHOD FOR DEPOSITION
#1845Controlling the uniformity of PECVD deposition
#1846Small plasma chamber systems and methods
#1847Plasma process method
#1848Method of manufacturing multilayer body, method of processing substrate, and multilayer body
#1849Plasma deposition apparatus and plasma deposition method
#1850Vapor deposition apparatus
#1851Device comprising an encapsulation unit
#1852Plasma processing apparatus
#1853Tungsten growth modulation by controlling surface composition
#1854Plasma processing method and plasma processing apparatus
#1855Deposition reactor with plasma source
#1856Plasma deposition on a partially formed battery through a mesh screen
#1857Controlling temperature in substrate processing systems
#1858Deposition apparatus and method of depositing thin film using the same
#1859POLYCRYSTALLINE DIAMOND COMPACT COATED WITH HIGH ABRASION RESISTANCE DIAMOND LAYERS
#1860Substrate processing apparatus and method of manufacturing semiconductor device
#1861DEPOSITION OF THIN FILMS ON ENERGY SENSITIVE SURFACES
#1862Semiconductor processing with DC assisted RF power for improved control
#1863VAPOR DEPOSITION APPARATUS
#1864Method and system for ion-assisted processing
#1865Enhanced etch and deposition profile control using plasma sheath engineering
#1866Apparatus for dielectric deposition process
#1867COAT AS WELL AS METHOD AND DEVICE FOR COATING
#1868Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
#1869PLASMA PROCESSING SYSTEM WITH MOVABLE CHAMBER HOUSING PARTS
#1870Remote plasma based deposition of SiOC class of films
#1871Plasma chamber having an upper electrode having controllable valves and a method of using the same
#1872Method for producing gas barrier film, gas barrier film, and electronic device
#1873Device and method for vacuum coating
#1874ATMOSPHERIC PRESSURE PLASMA TREATMENT APPARATUS AND ATMOSPHERIC PRESSURE PLASMA TREATMENT METHOD
#1875Cost-efficient high power PECVD deposition for solar cells
#1876Method Of Making A Golf Ball With A Superhydrophobic Surface
#1877METHOD FOR PRODUCING A PYROLYSIS COMPATIBLE COMPONENT FOR A COOKING APPLIANCE AND PYROLYSIS COMPATIBLE COMPONENT FOR A COOKING APPLIANCE
#1878Processing a sacrificial material during manufacture of a microfabricated product
#1879CVD APPARATUS AND CVD METHOD
#1880STATIC DEPOSITION PROFILE MODULATION FOR LINEAR PLASMA SOURCE
#1881Method to Determine the Thickness of a Thin Film During Plasma Deposition
#1882PLASMA CVD APPARATUS
#1883PLASMA CVD APPARATUS
#1884Plasma process, film deposition method and system using rotary chuck
#1885Metamaterial thin films
#1886SUCTION VALVE IN A PLASMA COATING APPARATUS
#1887Vacuum trap
#1888Method and system for modifying photoresist using electromagnetic radiation and ion implantation
#1889Method for producing metal complex quantum crystals
#1890Hollow cathode device and method for using the device to control the uniformity of a plasma process
#1891METHOD OF FORMING NITROGEN-FREE DIELECTRIC ANTI-REFLECTION LAYER
#1892Method for forming DLC film on spline shaft and hot cathode PIG plasma CVD device
#1893CONTROL OF DIFFERENTIAL PRESSURE IN PECVD SYSTEMS
#1894Tunable nanoporous films on polymer substrates, and method for their manufacture
#1895Coated article of martensitic steel and a method of forming a coated article of steel
#1896LUBRICITY VESSEL COATING, COATING PROCESS AND APPARATUS
#1897Current insulated bearing components and bearings
#1898Plasma processing apparatus
#1899System and method for tissue construction using an electric field applicator
#1900Plasma processing apparatus and plasma processing method
#1901Substrate processing device equipped with semicircle shaped antenna
#1902Coatings for electrowetting and electrofluidic devices
#1903METHODS AND APPARATUSES FOR CONTROLLING PLASMA PROPERTIES BY CONTROLLING CONDUCTANCE BETWEEN SUB-CHAMBERS OF A PLASMA PROCESSING CHAMBER
#1904Plasma Processing Devices With Corrosion Resistant Components
#1905COMBINATORIAL PROCESSING USING A REMOTE PLASMA SOURCE
#1906Semiconductor Processing System
#1907Plasma CVD apparatus
#1908Apparatus for growth of dilute-nitride materials using an isotope for enhancing the sensitivity of resonant nuclear reaction analysis
#1909Vapor deposition apparatus and method of manufacturing organic light-emitting display apparatus
#1910Substrate processing method and substrate processing apparatus
#1911PLASMA-ENHANCED DEPOSITION OF RUTHENIUM-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE RUTHENIUM PRECURSORS
#1912PLASMA-ENHANCED DEPOSITION OF MANGANESE-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE MANGANESE PRECURSORS
#1913PLASMA-ENHANCED DEPOSITION OF NICKEL-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE NICKEL PRECURSORS
#1914Method for diffusing metal particles within a composite layer
#1915VACUUM PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#1916PLASMA-ENHANCED DEPOSITION OF COPPER-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE COPPER PRECURSORS
#1917Activated silicon precursors for low temperature deposition
#1918Methods of attaching a polycrystalline diamond compact to a substrate
#1919Apparatus for changing area ratio in a plasma processing system
#1920METHOD AND APPARATUS FOR GAS DISTRIBUTION AND PLASMA APPLICATION IN A LINEAR DEPOSITION CHAMBER
#1921Microcrystalline silicon film, manufacturing method thereof, semiconductor device, and manufacturing method thereof
#1922Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus
#1923Combinatorial plasma enhanced deposition techniques
#1924Plasma booster for plasma treatment installation
#1925Thin Film Deposition Method
#1926Inorganic nanocoating primed organic film
#1927High multiplex arrays and systems
#1928Variable resistance element, semiconductor device including variable resistance element, and methods for manufacturing variable resistance element and semiconductor device
#1929Projected plasma source
#1930INTER-LOW-PERMITTIVITY LAYER INSULATING FILM, AND METHOD FOR FORMING INTER-LOW-PERMITTIVITY LAYER INSULATING FILM
#1931Apparatus for depositing a polymer coating containing nanomaterial on a substrate
#1932Group 11 mono-metallic precursor compounds and use thereof in metal deposition
#1933SLIDING DEVICE AND SLIDING SYSTEM USING THE SAME
#1934High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
#1935Method for forming thin film using radicals generated by plasma
#1936Coated electronic devices and associated methods
#1937Machine and method for atmospheric plasma treatment of continuous substrates
#1938RF coupled plasma abatement system comprising an integrated power oscillator
#1939Atomic layer deposition of metal phosphates and lithium silicates
#1940Thin Film Deposition via a Spatially-Coordinated and Time-Synchronized Process
#1941PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD FOR CONTROLLING THE SAME
#1942Method and device for polarizing a DBD electrode
#1943Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus
#1944Magnetic field assisted deposition
#1945Methods for the production of aligned carbon nanotubes and nanostructured material containing the same
#1946Electrode having gas discharge function and plasma processing apparatus
#1947Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
#1948CONFORMABLE BARRIER SHEET, METHODS, AND DEVICE
#1949System, method and apparatus for controlling ion energy distribution of a projected plasma
#1950Sleep aid composition and method
#1951Apparatus and method for atomic layer deposition
#1952Plasma CVD apparatus
#1953Mask
#1954Formation of Photoconductive and Photovoltaic Films
#1955PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS
#1956Deposition of hydrogenated thin film
#1957Method and apparatus to help promote contact of gas with vaporized material
#1958Intelligent call transfer between call centers
#1959Product having functional layer and method for fabricating the same
#1960Method for preparing an oriented-porosity dielectric material on a substrate by means of electromagnetic and photonic treatment
#1961PLASMA PROCESSING APPARATUS
#1962Carbon film forming method, magnetic-recording-medium manufacturing method, and carbon film forming apparatus
#1963Plasma processing apparatus and plasma processing method
#1964Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus
#1965PLASMA PROCESSING CHAMBER HAVING ENHANCED DEPOSITION UNIFORMITY
#1966VIEW PORT DEVICE FOR PLASMA PROCESS AND PROCESS OBSERVATION DEVICE OF PLASMA APPARATUS
#1967Use of nitrogen-containing ligands in atomic layer deposition methods
#1968Combinatorial plasma enhanced deposition techniques
#1969Combinatorial plasma enhanced deposition techniques
#1970Shower plate having different aperture dimensions and/or distributions
#1971Combinatorial plasma enhanced deposition techniques
#1972Combinatorial plasma enhanced deposition techniques
#1973Deposition apparatus and methods to reduce deposition asymmetry
#1974Method and system for modifying photoresist using electromagnetic radiation and ion implantation
#1975Combinatorial plasma enhanced deposition techniques
#1976DEPOSITION APPARATUS, APPARATUS FOR SUCCESSIVE DEPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#1977Galvanic package for fruits and vegetables and preservation method
#1978Wafer chucking system for advanced plasma ion energy processing systems
#1979Plasma processing chamber with dual axial gas injection and exhaust
#1980Formation method of coating
#1981CHEMICAL VAPOR DEPOSITION DEVICE
#1982Wheels Having Oxide Coating And Method of Making The Same
#1983Mixing Energized and Non-Energized Gases for Silicon Nitride Deposition
#1984Methods for coating articles
#1985Power supplying means having shielding means for feeding line and substrate processing apparatus including the same
#1986Focus ring and manufacturing method therefor
#1987SUSCEPTOR FOR PLASMA PROCESSING CHAMBER
#1988Atomic layer deposition apparatus and thin film forming method
#1989APPARATUS AND METHOD FOR TREATING AN OBJECT
#1990GAN-BASED LEDS ON SILICON SUBSTRATES WITH MONOLITHICALLY INTEGRATED ZENER DIODES
#1991System, method and apparatus for controlling ion energy distribution
#1992Method for patterning a substrate using ion assisted selective depostion
#1993Vessel inspection apparatus and methods
#1994Atomic layer deposition methods
#1995In-situ deposition of film stacks
#1996PLASMA FILM-COATING APPARATUS
#1997Sealing structure and fuel cell having the sealing structure
#1998GAS DISTRIBUTING MEANS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
#1999Automatic matching method, computer-readable storage medium, automatic matching unit, and plasma processing apparatus
#2000SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#2001Multi-region processing system
#2002IN-SITU ACCEPTOR ACTIVATION WITH NITROGEN AND/OR OXYGEN PLASMA TREATMENT
#2003Titanium Nitride Film Deposition by Vapor Deposition Using Cyclopentadienyl Alkylamino Titanium Precursors
#2004Surface preparation for thin film growth by enhanced nucleation
#2005Plasma film forming apparatus
#2006REMOTE FLUORINATION OF FIBROUS FILTER WEBS
#2007FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM
#2008Small plasma chamber systems and methods
#2009Method for growth of dilute-nitride materials using an isotope for enhancing the sensitivity of resonant nuclear reation analysis
#2010Vapor deposition system
#2011Method for producing an electronic component and electronic component
#2012Method for producing an electronic component and electronic component
#2013LID ASSEMBLY FOR A PROCESSING SYSTEM TO FACILITATE SEQUENTIAL DEPOSITION TECHNIQUES
#2014Plasma processing apparatus and plasma processing method
#2015THIN-FILM SOLAR CELL MANUFACTURING APPARATUS
#2016Showerhead assembly for plasma processing chamber
#2017Method of depositing metallic film by plasma CVD and storage medium
#2018Fluorine compounds for doping conductive oxide thin films
#2019Film deposition method
#2020DEVICE FOR THERMOHYDRAULIC APPLICATIONS WITH IMPROVED WATER SOFTENING PROPERTIES, LOWER RELEASE OF HEAVY METALS, AND RELATIVE METHOD OF MANUFACTURING
#2021Method and apparatus to help promote contact of gas with vaporized material
#2022Device comprising an encapsulation unit
#2023SUBSTRATE TREATMENT APPARATUS
#2024Method of Manufacturing Solar Cell Device and Solar Cell Device
#2025APPARATUS AND PROCESS FOR CARBON NANOTUBE GROWTH
#2026Plasma system
#2027DEPOSITION APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
#2028Methods for plasma processing
#2029Apparatus for Plasma Processing
#2030Plasma generating units for processing a substrate
#2031Process for depositing a thin layer and product obtained thereby
#2032Plasma booster for plasma treatment installation
#2033SUBSTRATE PROCESSING APPARATUS AND PRODUCING METHOD OF DEVICE
#2034Film deposition apparatus and film deposition method
#2035Vehicular brake rotors
#2036Continuous film forming apparatus
#2037Substrate processing apparatus
#2038Vessel, coating, inspection and processing apparatus
#2039TOP PLATE AND PLASMA PROCESS APPARATUS EMPLOYING THE SAME
#2040Method and apparatus for in-line processing and immediately sequential or simultaneous processing of flat and flexible substrates through viscous shear in thin cross section gaps for the manufacture of micro-electronic circuits or displays
#2041System and method for applying abrasion-resistant coatings
#2042Plasma process apparatus and plasma process method
#2043Thin film deposition via charged particle-depleted plasma achieved by magnetic confinement
#2044Placing bed structure, treating apparatus using the structure, and method for using the apparatus
#2045SUBSTRATE PROCESSING APPARATUS AND PRODUCING METHOD OF DEVICE
#2046METHOD FOR PRODUCING POLYCRYSTALLINE SILICON GERMANIUM SUITABLE FOR MICROMACHINING
#2047PROCESS AND APPARATUS FOR ATMOSPHERIC PRESSURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION COATING OF A SUBSTRATE
#2048Enhanced etch and deposition profile control using plasma sheath engineering
#2049REMOTE FLUORINATION OF FIBROUS FILTER WEBS
#2050Method of coating a surface of an article against aquatic bio fouling
#2051FILM FORMATION METHOD AND APPARATUS UTILIZING PLASMA CVD
#2052Method of producing gas barrier layer, gas barrier film for solar batteries and gas barrier film for displays
#2053PLASMA FILM FORMING APPARATUS
#2054Surface coating method for hydrophobic and superhydrophobic treatment in atmospheric pressure plasma
#2055Method for continuous atmospheric pressure plasma treatment of workpieces
#2056Method for forming thin film using radicals generated by plasma
#2057VOLTAGE VARIABLE TYPE THINFILM DEPOSITION METHOD AND APPARATUS THEREOF
#2058Machine for the plasma treatment of containers, comprising offset depressurization/pressurization circuits
#2059Biodegradable resin container with a vacuum-evaporated film and method of forming a vacuum-evaporated film
#2060Method for stable hydrophilicity enhancement of a substrate by atmospheric pressure plasma disposition
#2061Thin film forming apparatus and thin film forming method
#2062Thin film deposition via a spatially-coordinated and time-synchronized process
#2063Hybrid chemical vapor deposition process combining hot-wire cvd and plasma-enhanced cvd
#2064Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus for forming thin film containing at least two different elements
#2065Method for manufacturing thin film transistor
#2066Substrate temperature control by using liquid controlled multizone substrate support
#2067METHOD FOR TREATING PLASMA UNDER CONTINUOUS ATMOSPHERIC PRESSURE OF WORK PIECES, IN PARTICULAR, MATERIAL PLATES OR STRIPS
#2068Ultra-high multiplex analytical systems and methods
#2069Method for forming a semiconductor film including a film forming gas and decomposing gas while emitting a laser sheet
#2070SYSTEM AND METHOD FOR APPLYING A CONFORMAL BARRIER COATING
#2071Localized linear microwave source array pumping to control localized partial pressure in flat and 3 dimensional PECVD coatings
#2072METHOD OF MAKING INORGANIC OR INORGANIC/ORGANIC HYBRID FILMS
#2073Vapor deposition reactor using plasma and method for forming thin film using the same
#2074Electrode for generating plasma and plasma generator
#2075Activated gas injector, film deposition apparatus, and film deposition method
#2076Surface preparation for thin film growth by enhanced nucleation
#2077Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
#2078Method of forming non-conformal layers
#2079METHOD OF FORMING A GAS BARRIER LAYER, A GAS BARRIER LAYER FORMED BY THE METHOD, AND A GAS BARRIER FILM
#2080Method for making a graded barrier coating
#2081Atomic layer deposition methods
#2082Combinatorial plasma enhanced deposition techniques
#2083SELECTIVE COBALT DEPOSITION ON COPPER SURFACES
#2084METHOD FOR MANUFACTURING ULTRA-HYDROPHILIC THIN FILM COATED METAL PRODUCT, AND ULTRA-HYDROPHILIC THIN FILM COATED METAL PRODUCT
#2085Substrate processing apparatus
#2086Hollow cathode device and method for using the device to control the uniformity of a plasma process
#2087SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#2088Methods and apparatus for changing area ratio in a plasma processing system
#2089Plasma processing apparatus
#2090Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component
#2091Substrate processing method and substrate processing apparatus
#2092Multi-Pass Vacuum Coating Systems
#2093Method for preparing an oriented-porosity dielectric material on a substrate by means of electromagnetic and/or photonic treatment
#2094Method and apparatus to help promote contact of gas with vaporized material
#2095Quick-change precursor manifold for large-area CVD and PECVD
#2096Formation of photoconductive and photovoltaic films
#2097SYSTEM AND METHOD FOR MAKING A GRADED BARRIER COATING
#2098SYSTEM AND METHOD FOR PLASMA ENHANCED THIN FILM DEPOSITION
#2099Plasma enhanced chemical vapor deposition apparatus
#2100Multi-region processing system and heads