120281 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes Coaxial electrodes
ELECTRODE ASSEMBLY AND PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION EQUIPMENT
#2ATOMIC LAYER DEPOSITION AND VAPOR DEPOSITION REACTOR WITH IN-CHAMBER MICROPLASMA SOURCE
#3Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films
#4Method for RF power distribution in a multi-zone electrode array
#5ELECTRONIC COMPONENT AND MANUFACTURING METHOD THEREOF
#6Semiconductor processing with DC assisted RF power for improved control
#7Apparatus and method for intraluminal polymer deposition
#8Method and device for manufacturing a barrier layer on a flexible substrate
#9Semiconductor processing with DC assisted RF power for improved control
#10Method and apparatus for treating containers
#11Plasma processing apparatus and semiconductor device manufacturing method
#12Activated gas injector, film deposition apparatus, and film deposition method
#13PLASMA PROCESSING APPARATUS
#14Layer forming method using plasma discharge
#15Plasma processing apparatus and method thereof
#16Plasma treatment apparatus and method for plasma treatment
#17Plasma processing apparatus and method thereof
#18Plasma treatment apparatus and method for plasma treatment
#19Film forming ring and method of manufacturing semiconductor device
#20Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus
#21Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus