120276 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Sub-classes:METHODS AND SYSTEMS FOR LINE PURGING
#2PIEZOELECTRIC LAMINATED STRUCTURE AND MANUFACTURING METHOD THEREFOR
#3Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features
#4METHODS AND SYSTEMS FOR PLASMA COLOURATION AND PIGMENT FIXATION
#5Process for Depositing Scandium Nitride by Atomic Layer Deposition Techniques
#6FILM FORMING METHOD AND FILM FORMING APPARATUS
#7PRECURSOR FOR FORMING LANTHANIDE METAL-CONTAINING THIN FILM, METHOD FOR FORMING LANTHANIDE METAL-CONTAINING THIN FILM USING SAME, AND SEMICONDUCTOR DEVICE COMPRISING LANTHANIDE METAL-CONTAINING THIN FILM
#8PREPARATION METHOD AND USE OF AMINE-FUNCTIONALIZED ADSORPTION MATERIAL WITH HIGHLY DISPERSED ACTIVE SITES
#9DOPED SILICON OR BORON LAYER FORMATION
#10SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#11JANUS TRANSITION METAL DICHALCOGENIDE MATERIAL, METHOD FOR FABRICATING THEREOF, AND SENSOR
#12CARBON GAPFILL LAYER FORMATION
#13SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
#14HYBRID ATOMIC LAYER DEPOSITION
#15Ion Beam-Induced Epitaxial Crystallization on an Integrated Processing Architecture
#16BORON DOPED SILICON OXIDE PROTECTIVE LAYER AND METHOD FOR MAKING THE SAME
#17THIN FILM DEPOSITION APPARATUS
#18ELECTROSTATIC CHUCK FOCUSED PLASMA CLEAN BETWEEN BIAS ELECTRODE AND REMOVABLE ELECTRODE
#19PLASMA COATING WITH PARTICLES
#20END EFFECTOR AND METHOD OF LASER REMOVAL OF COATING FOR APPLYING ELECTRICAL ENERGY
#21END EFFECTOR WITH SELECTIVELY REMOVED COATING FOR APPLYING ELECTRICAL ENERGY AND RELATED METHODS
#22MULTI-LAYER PLASMA RESISTANT COATING BY ATOMIC LAYER DEPOSITION
#23DEPOSITION APPARATUS
#24Silicon Compounds And Methods For Depositing Films Using Same
#25METHOD FOR CONTROLLING PARTICLE GROWTH IN A PLASMA CHAMBER
#26PLASMA ENHANCED NUCLEATION LAYER FORMATION
#27UNIFORM IN SITU CLEANING AND DEPOSITION
#28INTEGRATED SHOWERHEAD
#29OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS
#30LOW K INNER SPACER FORMATION BY SELECTIVE PECVD PROCESS IN GATE-ALL-AROUND (GAA) NANOSHEET DEVICE
#31BILAYER PLASMA OXIDATION PROCESSES
#32UV ENERGY SOURCES FOR PROCESSING CHAMBERS, AND RELATED APPARATUS AND METHODS
#33DOPED TUNGSTEN CARBIDE LOW-K ETCH HARD MASK
#34METHOD OF FORMING LOW-K MATERIAL LAYER, STRUCTURE INCLUDING THE LAYER, AND SYSTEM FOR FORMING SAME
#35DEPOSITION APPARATUS AND METHOD OF DRIVING THE SAME
#36FILM FORMATION METHOD AND FILM FORMATION APPARATUS
#37METHODS FOR EXTENDING MWBC IN SEMICONDUCTOR PROCESSING CHAMBERS
#38HIGH MODULUS CARBON DOPED SILICON OXIDE FILM FOR MOLD STACK SCALING SOLUTIONS IN ADVANCED MEMORY APPLICATIONS
#39METHOD OF PRODUCING A FABRIC HAVING HYDRO- AND OLEOPHOBIC CHARACTERISTICS
#40FILM FORMING METHOD AND FILM FORMING APPARATUS
#41REMOTE CAPACITIVELY COUPLED PLASMA DEPOSITION OF AMORPHOUS SILICON
#42Biomimetic Physical Antimicrobial Polymer Foils
#43METHOD OF MANUFACTURING GAS BARRIER FILM
#44METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICES PRODUCED BY SUCH METHODS
#45SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
#46APPARATUS FOR MANUFACTURING DISPLAY APPARATUS
#47PROCESS AND DEVICE FOR LARGE-SCALE PRODUCTION OF GRAPHENE
#48IN-SITU METAL DEPOSITION FOR REDUCED CHARGING DURING DIELECTRIC ETCH
#49SUPERCONDUCTING DEVICE WITH MULTIPLE WIRING
#50METHOD OF PRODUCING ANTI-SCALING AND ANTI-GALLING COATING ON AN INTERNAL SURFACE OF A TUBULAR MEMBER
#51SILANOLS AND SILANEDIOLS
#52SELECTIVE DEPOSITION ON METAL-CONTAINING MASK USING PROMOTER
#53COMPOSITIONS COMPRISING SILACYCLOALKANES AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM
#54AMORPHOUS CARBON FILM AND DEPOSITION METHOD THEREOF
#55TREATING SILICON NITRIDE BASED DIELECTRIC FILMS
#56EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS INCLUDING EXHAUST COMPONENT
#57METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY CHEMICAL VAPOR POLYMERIZATION
#58METHODS FOR DEPOSITING GAP FILLING FLUIDS AND RELATED SYSTEMS AND DEVICES
#59SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#60PRECURSOR FOR FORMING SILICON-CONTAINING THIN FILM WITH HIGH HARDNESS AND LOW DIELECTRIC CONSTANT AND MANUFACTURING METHOD FOR SILICON-CONTAINING THIN FILM USING THEREOF
#61VACUUMING STSTEM, SEMICONDUCTOR PROCESS DEVICE AND VACUUMING METHOD THEREOF
#62CONTACT LENS PACKAGE AND METHOD AND PACKAGING MACHINE FOR PRODUCING SAME
#63SUBSTRATE TREATMENT APPARATUS AND METHOD OF CLEANING INSIDE OF CHAMBER
#64Compositions and Methods Using Same for Deposition of Silicon-Containing Film
#65DETECTION CHIP AND MODIFICATION METHOD THEREFOR
#66ROBUST ONO FILMS AND METHODS OF MAKING THEREOF
#67PHOTO-EMITTING PLASMA FOR ACTIVATION IN PROCESSING CHAMBERS, AND RELATED APPARATUS AND METHODS
#68HARDWARE DESIGN WITH INDEPENDENT CONTROL TO IMPROVE WIW UNIFORMITY
#69SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#70METHOD OF FILLING GAPS ON SUBSTRATE SURFACE USING PLASMA
#71METHODS OF FORMING STRUCTURES INCLUDING VANADIUM BORIDE AND VANADIUM PHOSPHIDE LAYERS
#72PLASMA COATING METHOD AND PLASMA COATING SYSTEM
#73LOW-TEMPERATURE MOLYBDENUM CAPPING PROCESSES
#74POLYCRYSTALLINE CERAMIC SUBSTRATE AND METHOD OF MANUFACTURE
#75SEMICONDUCTOR MANUFACTURING FACILITY AND SHOWER HEAD COATING METHOD USING THE SAME
#76POLYMERIC SURFACE HAVING REDUCED BIOMOLECULE ADHESION TO THERMOPLASTIC ARTICLES AND METHODS OF PLASMA TREATMENT
#77SHOWER HEAD STRUCTURE AND PLASMA PROCESSING APPARATUS USING THE SAME
#78SYSTEM AND METHOD FOR ELECTRICALLY CONDUCTIVE MEMBRANE SEPARATION
#79CYCLIC PEALD/PECVD THIN FILM ENCAPSULATION BARRIER
#80METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#81METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#82PLASMA PROCESSING APPARATUS
#83OPTICAL WAVEGUIDE SENSOR FOR DETECTING RADIOACTIVE ISOTOPES AND METHOD OF FABRICATING THE SAME
#84GAS TRANSPORT SYSTEM
#85CARBON RICH LAYER FOR SCALE CONTROL
#86DECORATIVE ANTIQUE COPPER COATING WITH HTL COMPATIBILITY AND NOVEL INTER-LAYER ADHESION MECHANISM
#87DROOPING COVER PLATE, AND PECVD DEVICE HAVING DROOPING COVER PLATE
#88DECORATIVE PVD COATED ITEMS AND RADOMES AND METHODS OF MAKING SAME
#89INCORPORATING SEMICONDUCTORS ON A POLYCRYSTALLINE DIAMOND SUBSTRATE
#90SYSTEM AND METHOD FOR FABRICATING HIGH-ASPECT-RATIO GRATINGS
#91HIGH PRESSURE PLASMA INHIBITION
#92METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND INCREASED DENSITY
#93SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE
#94ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
#95VAPOR DEPOSITION SYSTEMS AND METHODS, AND NANOMATERIALS FORMED BY VAPOR DEPOSITION
#96APPARATUS WITH HEATED FILTER AND OPERATION METHOD OF THE SAME
#97EXTERNAL MAGNETIC FIELD-COUPLED PLASMA ATOMIC LAYER DEPOSITION DEVICE AND ATOMIC LAYER DEPOSITION METHOD
#98DEPOSITION CHAMBER SYSTEM DIFFUSER WITH INCREASED POWER EFFICIENCY
#99FILM-FORMING METHOD AND FILM-FORMING APPARATUS
#100FILM-FORMING METHOD AND FILM-FORMING APPARATUS
#101INTEGRATED PLASMA CLEAN AND DIELECTRIC PASSIVATION DEPOSITION PROCESSES
#102SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#103METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#104IMPROVEMENTS IN CHEMICAL VAPOR DEPOSITION SYSTEMS
#105LAMINATE AND MANUFACTURING METHOD OF LAMINATE
#106GASBOX FOR SEMICONDUCTOR PROCESSING CHAMBER
#107METHOD FOR DEPOSITING A LAYER ONTO A SUBSTRATE AND SEMICONDUCTOR PROCESSING APPARATUS
#108LAMINATE MANUFACTURING APPARATUS AND SELF-ASSEMBLED MONOLAYER FORMATION METHOD
#109METHOD FOR PREPARING BORON NITRIDE THIN FILM AND BORON NITRIDE THIN FILM
#110DIAMOND FORMATION DEVICE AND DIAMOND-COATED SUBSTRATE
#111COMPOSITE COATING, PREPARATION METHOD, AND DEVICE
#112ULTRATHIN SILICON OXYNITRIDE INTERFACE MATERIAL, TUNNEL OXIDE PASSIVATED STRUCTURE AND PREPARATION METHODS AND APPLICATIONS THEREOF
#113DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
#114INTERCONNECT CAPPING WITH INTEGRATED PROCESS STEPS
#115METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM
#116SEED SUBSTRATE FOR EPITAXIAL GROWTH AND METHOD FOR PRODUCING SAME, AND SEMICONDUCTOR SUBSTRATE AND METHOD FOR PRODUCING SAME
#117Systems and Methods for Producing Carbon Solids
#118FOLDABLE SUBSTRATES AND METHODS OF MAKING
#119PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
#120THERMAL IMAGING FOR ANALYSIS OF DEVICE FABRICATION TOOLS
#121ALUMINA MEMBRANE, PREPARATION METHOD AND USE THEREOF
#122SUBSTRATE TREATING APPARATUS AND METHOD
#123COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM
#124METHOD AND SYSTEM FOR ADJUSTING THE GAP BETWEEN A WAFER AND A TOP PLATE IN A THIN-FILM DEPOSITION PROCESS
#125METHOD OF SIMULTANEOUS SILICIDATION ON SOURCE AND DRAIN OF NMOS AND PMOS TRANSISTORS
#126SELECTIVE DEPOSITION OF A MATERIAL COMPRISING SILICON AND NITROGEN
#127PLASMA ELECTROLYTIC POLISHED DIESEL ENGINE COMPONENTS
#128SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
#129PLASMA FILM FORMING APPARATUS AND PLASMA FILM FORMING METHOD
#130RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN RESPONSE TO SUBSTRATE BULK RESISTIVITY VARIATIONS
#131C-AXIS ORIENTED IZO MATERIAL FILM AND MANUFACTURING METHOD THEREFOR
#132SYSTEMS AND METHODS FOR DEPOSITING MATERIAL LAYERS ONTO SUBSTRATES
#133IN-SITU CORE PROTECTION IN MULTI-PATTERNING
#134SPIRAL GRAPHENE NANOCRYSTAL, GRAPHENE FILM, INTERCONNECTSTRUCTURE, ELECTRONIC DEVICE INCLUDING SAME, AND METHOD OF FABRICATING INTERCONNECT STRUCTURE
#135OXIDE FILM REACTION SURFACE CONTROL AGENT, METHOD OF FORMING OXIDE FILM USING OXIDE FILM REACTION SURFACE CONTROL AGENT, SEMICONDUCTOR SUBSTRATE INCLUDING OXIDE FILM, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE
#136RF CURRENT MEASUREMENT IN SEMICONDUCTOR PROCESSING TOOL
#137ULTRALIGHT ROBUST PLATE MATERIALS
#138Vertical Branched Graphene
#139PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF DIELECTRIC MATERIAL UPON OXIDIZABLE MATERIAL
#140DOPED SILICON-CONTAINING MATERIALS WITH INCREASED ELECTRICAL, MECHANICAL, AND ETCH CHARACTERISTICS
#141OPTICAL DIELECTRIC PLANAR WAVEGUIDE PROCESS
#142Solids vaporizer
#143TRIBOLOGICAL COMPOSITES
#144MULTIWALLED CARBON NANOTUBES BASED FLEXIBLE AND BINDER--FREE ANODE FOR LI-ION BATTERIES
#145INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM
#146SUBSTRATE COATED WITH AT LEAST ONE DIAMOND-LIKE CARBON LAYER PROTECTED BY A GERMANIUM OR GERMANIUM OXIDE TEMPORARY LAYER
#147APPARATUS AND METHODS FOR CONTROLLING SUBSTRATE TEMPERATURE DURING PROCESSING
#148ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM
#149SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
#150SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#151COMPOSITE FILM APPLIED TO FLEXIBLE SUBSTRATE, PREPARATION METHOD THEREFOR, AND PRODUCT THEREOF
#152Display Panel, Preparation Method and Display Apparatus
#153METHOD AND SYSTEM FOR PROCESSING SUBSTRATES
#154RADICAL-ACTIVATED CARBON FILM DEPOSITION
#155HEARING INSTRUMENT WITH IMPROVED CORROSION PROTECTION
#156SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#157SEMICONDUCTOR MANUFACTURING DEVICE
#158OXYGEN-DOPED AMORPHOUS CARBON FILM AND METHOD FOR DEPOSITING THE SAME
#159Apparatus and methods for semiconductor processing
#160Apparatus for preventing contamination of self-plasma chamber
#161FILM FORMATION METHOD AND FILM FORMATION DEVICE
#162PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#163Processing chamber with multiple plasma units
#164Fluorinated Aluminum Coated Component for a Substrate Processing Apparatus and Method of Producing
#165ULTRATHIN FREE-STANDING SOLID STATE MEMBRANE CHIPS AND METHODS OF MAKING
#166METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS
#167TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS
#168MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE COATING WITH INTERMITTENT RESTORATION PLASMA
#169SELECTIVE COBALT DEPOSITION ON COPPER SURFACES
#170METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE
#171SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
#172SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#173Fusion bonding of diamond using thermal SiO2
#174GROUP 6 AMIDINATE PADDLEWHEEL COMPOUNDS FOR DEPOSITION OF METAL CONTAINING THIN FILMS
#175Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#176EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS INCLUDING EXHAUST COMPONENT
#177SUBSTRATE PROCESSING METHOD
#178METAL THIN-FILM PRECURSOR COMPOSITION, METHOD OF FORMING THIN FILM USING METAL THIN-FILM PRECURSOR COMPOSITION, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD
#179ALUMINUM OXIDE CARBON HYBRID HARDMASKS AND METHODS FOR MAKING THE SAME
#180SEED SUBSTRATE FOR EPITAXIAL GROWTH USE AND METHOD FOR MANUFACTURING SAME, AND SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING SAME
#181DIELECTRIC FILM SURFACE RESTORATION WITH REDUCTIVE PLASMA
#182APPARATUS FOR PROVIDING A GAS MIXTURE TO A REACTION CHAMBER AND METHOD OF USING SAME
#183TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS
#184CYCLOHEXASILANE FOR ELECTRODES
#185SEMICONDUCTOR MANUFACTURING FACILITY AND METHOD OF OPERATING THE SAME
#186MULTI-LAYERED VENTILATION APPARATUS AND METHODS OF MANUFACTURING THEREOF
#187Innovative nanopore sequencing technology
#188COMPOSITIONS AND METHODS FOR DEPOSITING SILICON-CONTAINING FILMS
#189VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
#190METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
#191FLUORINE-DOPED SILICON-CONTAINING MATERIALS
#192SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
#193SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
#194Shower head structure and plasma processing apparatus using the same
#195CHEMICAL VAPOR DEPOSITION DURING ADDITIVE MANUFACTURING
#196PECVD coated pharmaceutical packaging
#197ADHESION IMPROVEMENT BETWEEN LOW-K MATERIALS AND CAP LAYERS
#198Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#199METHOD FOR PLASMA-ASSISTED AND MULTI-STEP CONTINUOUS PREPARATION OF DIFFUSION LAYER/AMORPHOUS CARBON FILM COMPOSITE COATING AND USE THEREOF
#200MEASURING DEVICE AND METHOD FOR MEASURING PARAMETERS OF A PIEZOELECTRIC CRYSTAL ONTO WHICH A THIN FILM OF MATERIAL IS DEPOSITED AS WELL AS THIN-FILM DEPOSITION SYSTEMS WITH SUCH A DEVICE AND A METHOD FOR CONTROLLING SUCH SYSTEMS
#201MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM
#202Advanced temperature control for wafer carrier in plasma processing chamber
#203REAL-TIME CONTROL OF TEMPERATURE IN A PLASMA CHAMBER
#204Faceplate having a curved surface
#205METHOD FOR FORMING LAYER ON DIFFERENT-DENSITY PATTERN REGIONS
#206System and method for electrically conductive membrane separation
#207METHOD FOR PRODUCING A SOLAR CELL
#208Display panel, display apparatus, method of fabricating display panel, and counter substrate
#209HIGH SELECTIVITY, LOW STRESS, AND LOW HYDROGEN CARBON HARDMASKS IN LOW-PRESSURE CONDITIONS WITH WIDE GAP ELECTRODE SPACING
#210Vacuum deposition into trenches and vias and etch of trenches and via
#211SYSTEM AND METHOD FOR ELECTRICALLY CONDUCTIVE MEMBRANE SEPARATION
#212Al-Si Corrosion Protection Coatings
#213SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#214Dynamic multi zone flow control for a processing system
#215SEMICONDUCTOR ELECTRONIC DEVICES INCLUDING SIDEWALL BARRIER LAYERS AND METHODS OF FABRICATING THE SAME
#216APPARATUS FOR PROCESSING SUBSTRATE
#217Gas transport system
#218METHOD OF FORMING SiOCN LAYER
#219Device and method for substrate transport in vacuum processing systems
#220UNIFORM IN SITU CLEANING AND DEPOSITION
#221METHOD AND SYSTEM FOR FORMING PATTERNED STRUCTURES USING MULTIPLE PATTERNING PROCESS
#222MANUFACTURING METHOD OF DISPLAY DEVICE AND CVD DEVICE
#223SYRINGE WITH PECVD LUBRICATION
#224METHOD OF MAKING AN ELECTRODE HAVING MULTI-WALLED CARBON NANOTUBES
#225PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
#226High registration particles-transferring system
#227APPARATUS AND METHOD FOR FORMING THIN FILM
#228FILM FORMING APPARATUS WITH ANNULAR EXHAUST DUCT
#229Temperature control assembly for substrate processing apparatus and method of using same
#230Method for producing a graphene film
#231Gasbox for semiconductor processing chamber
#232APPARATUS FOR DEPOSITION OF GRAPHENE UPON A METAL SUBSTRATE AND METHOD FOR DOING SO
#233Method and apparatus for filling a gap
#234LAMINATE, LAMINATE WITH MEMBER FOR ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#235DEPOSITION METHOD AND PROCESSING APPARATUS
#236GAP FILL ENHANCEMENT WITH THERMAL ETCH
#237METHOD AND PACKAGE FOR REDUCING THE DEGRADATION OF A DRUG AND/OR EXCIPIENT, E.G. POLYSORBATE STABILIZER, IN A PHARMACEUTICAL PRODUCT
#238Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#239INTEGRATED SHOWERHEAD
#240DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
#241SEMICONDUCTOR FABRICATION FACILITY
#242SEMICONDUCTOR MANUFACTURING APPARATUS
#243SUBSTRATE PROCESSING APPARATUS
#244INTEGRATION OF VAPOR DEPOSITION PROCESS INTO PLASMA ETCH REACTOR
#245COATED SUBSTRATES AND METHODS FOR THE PREPARATION THEREOF
#246Concentration control using a bubbler
#247METHOD OF MANUFACTURING GAS BARRIER FILM
#248PREPARING METHOD OF TWO-DIMENSIONAL MATERIALS WITH CONTROLLED NUMBER OF LAYERS
#249SELECTIVE DEPOSITION USING GRAPHENE AS AN INHIBITOR
#250Tetrahedral amorphous hydrogenated carbon and amorphous siloxane diamond-like nanocomposite
#251Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device
#252ULTRAVIOLET LIGHT-RESISTANT ARTICLES AND METHODS FOR MAKING THE SAME
#253PLASMA PROCESSING GAS, PLASMA PROCESSING METHOD, AND PLASMA PROCESSING APPARATUS
#254FAR-INFRARED RAY TRANSMISSION MEMBER AND METHOD FOR MANUFACTURING FAR-INFRARED RAY TRANSMISSION MEMBER
#255REMOVAL OF TIN OXIDE IN CHAMBER CLEANING
#256INERT GAS IMPLANTATION FOR HARD MASK SELECTIVITY IMPROVEMENT
#257HIGH DIELECTRIC FILMS AND SEMICONDUCTOR OR CAPACITOR DEVICES COMPRISING SAME
#258SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD
#259SUBSTRATE PROCESSING APPARATUS
#260PECVD process
#261METHOD OF MANUFACTURING A REDISTRIBUTION LAYER, REDISTRIBUTION LAYER, INTEGRATED CIRCUIT AND METHODS FOR ELECTRICALLY TESTING AND PROTECTING THE INTEGRATED CIRCUIT
#262SUPPORT RING WITH PLASMA SPRAY COATING
#263DEPOSITION OF SILICON NITRIDE WITH ENHANCED SELECTIVITY
#264CHEMICAL VACUUM DEPOSITION OF A THIN TUNGSTEN AND/OR MOLYBDENUM SULFIDE FILM METHOD
#265COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS
#266SCALED LINER LAYER FOR ISOLATION STRUCTURE
#267HEAT TREATMENT APPARATUS, CONTROL METHOD, AND STORAGE MEDIUM
#268DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
#269Directional deposition for semiconductor fabrication
#270PRE-COATING METHOD AND PROCESSING APPARATUS
#271ELECTROSTATIC CHUCK WITH DETACHABLE SHAFT
#272STRUCTURE AND METHOD TO ACHIEVE POSITIVE TONE DRY DEVELOP BY A HERMETIC OVERLAYER
#273Optical dielectric planar waveguide process
#274HYDROGEN MANAGEMENT IN PLASMA DEPOSITED FILMS
#275Apparatus and methods for semiconductor processing
#276TECHNIQUES AND APPARATUS FOR SELECTIVE SHAPING OF MASK FEATURES USING ANGLED BEAMS
#277FILM FORMING METHOD AND FILM FORMING SYSTEM
#278METHOD AND APPARATUS FOR FORMING FILMS ON PARTICLES OF POWDER
#279Silicon Compounds And Methods For Depositing Films Using Same
#280Faceplate having a curved surface
#281Deposition chamber system diffuser with increased power efficiency
#282METHOD FOR CONTROLLING WET ETCH RATE (WER) SELECTIVITY
#283Selective silicon deposition
#284Device for large-scale production of graphene
#285SEMICONDUCTOR CONTINUOUS ARRAY LAYER
#286METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
#287MIST GENERATOR, THIN FILM MANUFACTURING DEVICE, AND THIN FILM MANUFACTURING METHOD
#288METAL SURFACE LAYER TREATING METHOD, METAL ASSEMBLY AND ELECTRONIC DEVICE
#289COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME
#290SEMICONDUCTOR MANUFACTURING APPARATUS
#291Method of Deposition
#292Method for producing a nanoscale channel structure
#293SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS
#294ANTIMICROBIAL NANOLAMINATES USING VAPOR DEPOSITED METHODS
#295METHOD OF MANUFACTURING AN IMPLANT AND AN IMPLANT WITH TWO COATINGS
#296Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#297Method and system for adjusting the gap between a wafer and a top plate in a thin-film deposition process
#298SILICON CARBONITRIDE GAPFILL WITH TUNABLE CARBON CONTENT
#299SEMICONDUCTOR APPARATUS FOR DEPOSITION PROCESS
#300CLAMPED DUAL-CHANNEL SHOWERHEAD