ClassID:

120286

C23C16/517 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups  - 

Recent Application in this class:
#1
20250115991
2025-04-10

PROCESS AND DEVICE FOR DIAMOND SYNTHESIS BY CVD

#2
20250006489
2025-01-02

METHODS AND ASSEMBLIES FOR DEPOSITING MATERIAL IN A GAP

#3
20240234091
2024-07-11

DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF

#4
20240182499
2024-06-06

ALKOXYSILACYCLIC OR ACYLOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME

#5
20240136153
2024-04-25

DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF

#6
20230243036
2023-08-03

METHODS AND SYSTEMS FOR DEPOSITING A LAYER

#7
20230167554
2023-06-01

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#8
20230162996
2023-05-25

ETCHING APPARATUS

#9
20220380902
2022-12-01

DLC PREPARATION APPARATUS AND PREPARATION METHOD

#10
20220246428
2022-08-04

PROCESSING TOOL CAPABLE FOR FORMING CARBON LAYERS ON SUBSTRATES

#11
20220235460
2022-07-28

Methods for forming a layer comprising a condensing and a curing step

#12
20220216037
2022-07-07

Depositing a carbon hardmask by high power pulsed low frequency RF

#13
20220119954
2022-04-21

SUBSTRATE PROCESSING TOOL CAPABLE OF MODULATING ONE OR MORE PLASMA TEMPORALLY AND/OR SPATIALLY

#14
20210384040
2021-12-09

Methods for depositing dielectric material

#15
20210189567
2021-06-24

Coating apparatus and coating method

#16
20210172060
2021-06-10

Process and device for diamond synthesis by CVD

#17
20200354386
2020-11-12

Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using same

#18
20200199747
2020-06-25

Substrate processing system with tandem source activation for CVD

#19
20200090946
2020-03-19

Methods for depositing dielectric material

#20
20190393053
2019-12-26

ETCHING APPARATUS

#21
20190189454
2019-06-20

Method for manufacturing semiconductor device

#22
20190131108
2019-05-02

Plasma processing apparatus

#23
20190093229
2019-03-28

Apparatus and method for depositing a coating on a substrate at atmospheric pressure

#24
20190051520
2019-02-14

Method for forming metal oxide layer, and plasma-enhanced chemical vapor deposition device

#25
20180308669
2018-10-25

Electrode assembly

#26
20180218905
2018-08-02

APPLYING EQUALIZED PLASMA COUPLING DESIGN FOR MURA FREE SUSCEPTOR

#27
20180135165
2018-05-17

A METHOD AND A DEVICE FOR COATING AN ENDOPROSTHESIS HAVING A BASE BODY

#28
20180127274
2018-05-10

Treating Particles

#29
20170327947
2017-11-16

Tandem source activation for CVD of films

#30
20170186587
2017-06-29

Plasma processing apparatus

#31
20170073836
2017-03-16

DIAMOND PRODUCING METHOD AND DC PLASMA ENHANCED CVD APPARATUS

#32
20170018732
2017-01-19

Hybrid layers for use in coatings on electronic devices or other articles

#33
20160293386
2016-10-06

Energetic negative ion impact ionization plasma

#34
20160177448
2016-06-23

Plasma processing apparatus with shower plate having protrusion for suppressing film formation in gas holes of shower plate

#35
20150368797
2015-12-24

Tandem source activation for CVD of films

#36
20150259802
2015-09-17

Apparatus and method for depositing a coating on a substrate at atmospheric pressure

#37
20150221479
2015-08-06

RPS assisted RF plasma source for semiconductor processing

#38
20150170902
2015-06-18

Plasma-assisted chemical gas separation method having increased plasma density and device for implementing the method

#39
20150135993
2015-05-21

Treating particles

#40
20150099072
2015-04-09

Method for forming Ti-containing film by PEALD using TDMAT or TDEAT

#41
20140220261
2014-08-07

Microwave plasma reactors

#42
20140208968
2014-07-31

Structure including thin primer film and method of producing said structure

#43
20140144379
2014-05-29

Systems and methods for plasma doping microfeature workpieces

#44
20140054574
2014-02-27

Hybrid layers for use in coatings on electronic devices or other articles

#45
20140041574
2014-02-13

Diamond producing method and DC plasma enhanced CVD apparatus

#46
20130189838
2013-07-25

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#47
20130034970
2013-02-07

PLASMA PROCESSING METHOD

#48
20130001196
2013-01-03

Projected plasma source

#49
20120222618
2012-09-06

DUAL PLASMA SOURCE, LAMP HEATED PLASMA CHAMBER

#50
20120208371
2012-08-16

Method and apparatus for multizone plasma generation

#51
20120132368
2012-05-31

PLASMA TREATMENT APPARATUS

#52
20120032338
2012-02-09

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

#53
20120000772
2012-01-05

Deposition apparatus and methods to reduce deposition asymmetry

#54
20110114994
2011-05-19

Hybrid layers for use in coatings on electronic devices or other articles

#55
20110064890
2011-03-17

Film deposition method

#56
20110045208
2011-02-24

DIAMOND-LIKE CARBON FILM FORMING APPARATUS AND METHOD OF FORMING DIAMOND-LIKE CARBON FILM

#57
20110005454
2011-01-13

Plasma Reactor, and Method for the Production of Monocrystalline Diamond Layers

#58
20100330299
2010-12-30

Plasma deposition of a thin film

#59
20090288603
2009-11-26

PLASMA AND ELECTRON BEAM ETCHING DEVICE AND METHOD

#60
20090252893
2009-10-08

Plasma discharge treatment apparatus, and method of manufacturing gas barrier film

#61
20090081433
2009-03-26

THIN-FILM MULTILAYER STRUCTURE, COMPONENT COMPRISING SAID STRUCTURE AND ITS METHOD OF DEPOSITION

#62
20080113108
2008-05-15

SYSTEM AND METHOD FOR CONTROL OF ELECTROMAGNETIC RADIATION IN PECVD DISCHARGE PROCESSES

#63
20080067064
2008-03-20

Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals

#64
20080038933
2008-02-14

Plasma and electron beam etching device and method

#65
20070227668
2007-10-04

Plasma processing apparatus

#66
20070048453
2007-03-01

Systems and methods for plasma doping microfeature workpieces

#67
20060278163
2006-12-14

High throughput deposition apparatus with magnetic support

#68
20050263071
2005-12-01

Apparatus and system for manufacturing a semiconductor

#69
20050214478
2005-09-29

Chemical vapor deposition plasma process using plural ion shower grids

#70
20050214477
2005-09-29

Chemical vapor deposition plasma process using an ion shower grid

#71
20050126486
2005-06-16

Apparatus and method for applying diamond-like carbon coatings

#72
20050118427
2005-06-02

Method for depositing inorganic/organic films

#73
20050089647
2005-04-28

Method of manufacturing water-repelling film

#74
20050000443
2005-01-06

Apparatus for processing a substrate using plasma