ClassID:

120287

C23C16/52 - page 11 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating Controlling or regulating the coating process

Recent Application in this class:
#3001
20130095577
2013-04-18

System and method for measuring layer thickness and depositing semiconductor layers

#3002
20130094022
2013-04-18

Electrode for producing a plasma, plasma chamber having said electrode, and method for analyzing or processing a layer or the plasma in situ

#3003
20130092084
2013-04-18

Systems and methods for measuring, monitoring and controlling ozone concentration

#3004
20130089934
2013-04-11

Material Delivery System and Method

#3005
20130085618
2013-04-04

Method of and apparatus for multiple channel flow ratio controller system

#3006
20130078743
2013-03-28

Method and apparatus for depositing a layer on a semiconductor wafer by vapor deposition in a process chamber

#3007
20130072031
2013-03-21

Apparatus and methods for low K dielectric layers

#3008
20130065796
2013-03-14

Advanced Mixing System for Integrated Tool Having Site-Isolated Reactors

#3009
20130065399
2013-03-14

PLASMA PROCESSING METHOD

#3010
20130065391
2013-03-14

Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium

#3011
20130064977
2013-03-14

Method and apparatus for depositing atomic layers on a substrate

#3012
20130062321
2013-03-14

Apparatus for changing area ratio in a plasma processing system

#3013
20130059092
2013-03-07

METHOD AND APPARATUS FOR GAS DISTRIBUTION AND PLASMA APPLICATION IN A LINEAR DEPOSITION CHAMBER

#3014
20130056155
2013-03-07

Sensing of plasma process parameters

#3015
20130056101
2013-03-07

Methods for discretized processing and process sequence integration of regions of a substrate

#3016
20130052836
2013-02-28

Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus

#3017
20130052754
2013-02-28

VAPOR GROWTH METHOD AND VAPOR GROWTH APPARATUS

#3018
20130052333
2013-02-28

DEPOSITION SYSTEMS HAVING REACTION CHAMBERS CONFIGURED FOR IN-SITU METROLOGY AND RELATED METHODS

#3019
20130045548
2013-02-21

Apparatus and method for simultaneous deposition of a plurality of semiconductor layers in a plurality of process chambers

#3020
20130042811
2013-02-21

Combinatorial plasma enhanced deposition techniques

#3021
20130042808
2013-02-21

FILM CRACK DETECTION APPARATUS AND FILM FORMING APPARATUS

#3022
20130041858
2013-02-14

Coating color database creating method, search method using the database, their system, program, and recording medium

#3023
20130041241
2013-02-14

PECVD coating methods for capped syringes, cartridges and other articles

#3024
20130029496
2013-01-31

Methods and apparatus for a gas panel with constant gas flow

#3025
20130025536
2013-01-31

Apparatus for precursor delivery system for irradiation beam instruments

#3026
20130023129
2013-01-24

PRESSURE TRANSMITTER FOR A SEMICONDUCTOR PROCESSING ENVIRONMENT

#3027
20130023062
2013-01-24

THIN FILM MANUFACTURING APPARATUS, THIN FILM MANUFACTURING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#3028
20130020311
2013-01-24

Heating control system, deposition device provided therewith, and temperature control method

#3029
20130017317
2013-01-17

LOAD LOCK CONTROL METHOD AND APPARATUS

#3030
20130017139
2013-01-17

Methods and systems for monitoring and controlling silicon rod temperature

#3031
20130011804
2013-01-10

Vaporization Apparatus and Method for Controlling the Same

#3032
20130009123
2013-01-10

Variable resistance element, semiconductor device including variable resistance element, and methods for manufacturing variable resistance element and semiconductor device

#3033
20130008311
2013-01-10

Exhaust gas treatment system

#3034
20130004682
2013-01-03

Method and device for plasma-treating workpieces

#3035
20120325146
2012-12-27

Plasma Processing Apparatus

#3036
20120322175
2012-12-20

Methods and Systems For Controlling SiIicon Rod Temperature

#3037
20120322173
2012-12-20

Method and system for isolated and discretized process sequence integration

#3038
20120322168
2012-12-20

CHEMICAL VAPOR DEPOSITION APPARATUS

#3039
20120321786
2012-12-20

System for multi-region processing

#3040
20120315396
2012-12-13

APPARATUS AND METHOD FOR COMBINATORIAL PLASMA DISTRIBUTION THROUGH A MULTI-ZONED SHOWERHEAD

#3041
20120315394
2012-12-13

Film forming apparatus, film forming method, method for optimizing rotational speed, and storage medium

#3042
20120309206
2012-12-06

Stoichiometry Control Of Transition Metal Oxides In Thin Films

#3043
20120307233
2012-12-06

Heated wafer carrier profiling

#3044
20120305196
2012-12-06

High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules

#3045
20120305188
2012-12-06

Plasma processing apparatus and gas supply method therefor

#3046
20120305026
2012-12-06

Substrate Processing Apparatus and Substrate Processing Method

#3047
20120304926
2012-12-06

Heated wafer carrier profiling

#3048
20120303313
2012-11-29

Temperature measurement apparatus, method of measuring temperature profile, recording medium and heat treatment apparatus

#3049
20120301616
2012-11-29

Apparatus and method for combinatorial gas distribution through a multi-zoned showerhead

#3050
20120298207
2012-11-29

Vapor delivery device, methods of manufacture and methods of use thereof

#3051
20120298040
2012-11-29

Vapor delivery device, methods of manufacture and methods of use thereof

#3052
20120293813
2012-11-22

Methods For Monitoring Growth Of Semiconductor Layers

#3053
20120289078
2012-11-15

Wire holder and terminal connector for hot wire chemical vapor deposition chamber

#3054
20120289059
2012-11-15

Chemical vaporizer for material deposition systems and associated methods

#3055
20120288643
2012-11-15

Multi-Zone Chuck

#3056
20120288615
2012-11-15

APPARATUS AND METHOD FOR TREATING SUBSTRATE

#3057
20120286234
2012-11-15

Directionally recrystallized graphene growth substrates

#3058
20120282714
2012-11-08

Susceptor with backside area of constant emissivity

#3059
20120275870
2012-11-01

Surface-coated cutting tool and manufacturing method thereof

#3060
20120273005
2012-11-01

Optical endpoint detection system

#3061
20120269969
2012-10-25

Film deposition method and apparatus

#3062
20120269968
2012-10-25

Atomic layer deposition apparatus and process

#3063
20120266817
2012-10-25

Substrate processing apparatus capable of cleaning inside thereof and cleaning control apparatus for controlling cleaning process of substrate processing apparatus

#3064
20120259272
2012-10-11

Plasma treatment and plasma enhanced chemical vapor deposition onto temperature sensitive biological materials

#3065
20120252210
2012-10-04

METHOD FOR MODIFYING METAL CAP LAYERS IN SEMICONDUCTOR DEVICES

#3066
20120251704
2012-10-04

Conditioning method, computer readable storage medium and substrate processing apparatus

#3067
20120236278
2012-09-20

Image processing-based lithography system and method of coating target object

#3068
20120231975
2012-09-13

Advanced mixing system for integrated tool having site-isolated reactors

#3069
20120231181
2012-09-13

INSULATION COVERAGE OF CVD ELECTRODE

#3070
20120227665
2012-09-13

APPARATUS FOR MONITORING AND CONTROLLING SUBSTRATE TEMPERATURE

#3071
20120225566
2012-09-06

Substrate processing apparatus and a method of manufacturing a semiconductor device

#3072
20120221167
2012-08-30

Temperature control method of chemical vapor deposition device

#3073
20120221138
2012-08-30

Metal organic chemical vapor deposition device and temperature control method therefor

#3074
20120220109
2012-08-30

Plasma CVD device and method of manufacturing silicon thin film

#3075
20120216747
2012-08-30

CHEMICAL VAPOR DEPOSITION DEVICE AND TEMPERATURE CONTROL METHOD OF CHEMICAL VAPOR DEPOSITION DEVICE

#3076
20120214300
2012-08-23

Method of forming metal-containing film

#3077
20120207662
2012-08-16

System for producing polycrystalline silicon, apparatus for producing polycrystalline silicon, and process for producing polycrystalline silicon

#3078
20120204983
2012-08-16

Processing device

#3079
20120199573
2012-08-09

Substrate mounting mechanism, and substrate processing apparatus

#3080
20120196440
2012-08-02

Method of depositing material

#3081
20120189810
2012-07-26

Secondary containment panels and process for making and installing same

#3082
20120186604
2012-07-26

SEMICONDUCTOR MANUFACTURING APPARATUS AND CLEANING METHOD THEREOF

#3083
20120183915
2012-07-19

Use of infrared camera for real-time temperature monitoring and control

#3084
20120180727
2012-07-19

Film forming apparatus

#3085
20120180719
2012-07-19

Film forming apparatus

#3086
20120171389
2012-07-05

Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces

#3087
20120171365
2012-07-05

FILM FORMING APPARATUS, FILM FORMING METHOD AND STORAGE MEDIUM

#3088
20120168144
2012-07-05

Thermal diffusion chamber control device and method

#3089
20120164847
2012-06-28

Thin film forming method, thin film forming apparatus, and program

#3090
20120164328
2012-06-28

FILM FORMATION METHOD AND STORAGE MEDIUM

#3091
20120156886
2012-06-21

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#3092
20120156396
2012-06-21

CVD REACTOR

#3093
20120156363
2012-06-21

Gas injection system for chemical vapor deposition using sequenced valves

#3094
20120145239
2012-06-14

PHOTOELECTRIC CONVERTER AND METHOD FOR PRODUCING SAME

#3095
20120138952
2012-06-07

High pressure chemical vapor deposition apparatuses, methods, and compositions produced therewith

#3096
20120135144
2012-05-31

Coating device and coating method

#3097
20120129296
2012-05-24

Method for forming an organic material layer on a substrate

#3098
20120126355
2012-05-24

Method of manufacturing semiconductor device, semiconductor device and substrate processing apparatus

#3099
20120118225
2012-05-17

EPITAXIAL GROWTH TEMPERATURE CONTROL IN LED MANUFACTURE

#3100
20120114860
2012-05-10

METHOD OF INHIBITING FORMATION OF DEPOSITS IN A MANUFACTURING SYSTEM

#3101
20120114837
2012-05-10

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

#3102
20120114836
2012-05-10

TPIR apparatus for monitoring tungsten hexafluoride processing to detect gas phase nucleation, and method and system utilizing same

#3103
20120111427
2012-05-10

Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus

#3104
20120107501
2012-05-03

COATING DEVICE AND COATING METHOD

#3105
20120100724
2012-04-26

Combinatorial plasma enhanced deposition techniques

#3106
20120100723
2012-04-26

Combinatorial plasma enhanced deposition techniques

#3107
20120100722
2012-04-26

Substrate processing apparatus and semiconductor device manufacturing method

#3108
20120100312
2012-04-26

Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes

#3109
20120098107
2012-04-26

Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species

#3110
20120094503
2012-04-19

Combinatorial plasma enhanced deposition techniques

#3111
20120094483
2012-04-19

Method for forming a film including Zr, Hf or the like, and method for manufacturing a semiconductor device using the same

#3112
20120094474
2012-04-19

Method for equipping an epitaxy reactor

#3113
20120094034
2012-04-19

Combinatorial plasma enhanced deposition techniques

#3114
20120094010
2012-04-19

Substrate processing apparatus capable of switching control mode of heater

#3115
20120091588
2012-04-19

Barrier layer, film forming method, and processing system

#3116
20120077338
2012-03-29

Combinatorial plasma enhanced deposition techniques

#3117
20120075460
2012-03-29

Substrate position detection apparatus, film deposition apparatus equipped with the same, and substrate position detection method

#3118
20120074096
2012-03-29

Methods for discretized processing and process sequence integration of regions of a substrate

#3119
20120073672
2012-03-29

System for and method of fast pulse gas delivery

#3120
20120073501
2012-03-29

PROCESS CHAMBER FOR DIELECTRIC GAPFILL

#3121
20120070564
2012-03-22

Processing a wafer with a post application bake (PAB) procedure

#3122
20120061351
2012-03-15

Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method

#3123
20120058630
2012-03-08

Linear Cluster Deposition System

#3124
20120058627
2012-03-08

Compound semiconductor deposition method and apparatus

#3125
20120058576
2012-03-08

Deposition System

#3126
20120055402
2012-03-08

Processing apparatus

#3127
20120052242
2012-03-01

Substrate Structure Grown By Plasma Deposition

#3128
20120052216
2012-03-01

GAS DISTRIBUTION SHOWERHEAD WITH HIGH EMISSIVITY SURFACE

#3129
20120048829
2012-03-01

Methods for discretized processing and process sequence integration of regions of a substrate

#3130
20120045864
2012-02-23

MULTILAYER FILM FORMATION METHOD AND FILM DEPOSITION APPARATUS USED WITH THE METHOD

#3131
20120045631
2012-02-23

Index modified coating on polymer substrate

#3132
20120043298
2012-02-23

Methods for discretized processing and process sequence integration of regions of a substrate

#3133
20120040084
2012-02-16

Apparatus and methods for forming modified metal coatings

#3134
20120037075
2012-02-16

COATING APPRATUS HAVING CONCENTRATION SENSOR

#3135
20120034369
2012-02-09

VAPORIZING APPARATUS, SUBSTRATE PROCESSING APPARATUS, COATING AND DEVELOPING APPARATUS, AND SUBSTRATE PROCESSING METHOD

#3136
20120028461
2012-02-02

Methods for depositing metal in high aspect ratio features

#3137
20120028454
2012-02-02

Plasma activated conformal dielectric film deposition

#3138
20120028379
2012-02-02

Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber

#3139
20120027956
2012-02-02

MODIFICATION OF NITRIDE TOP LAYER

#3140
20120027916
2012-02-02

ARRANGEMENT AND METHOD FOR MEASUREMENT OF THE TEMPERATURE AND OF THE THICKNESS GROWTH OF SILICON RODS IN A SILICON DEPOSITION REACTOR

#3141
20120021553
2012-01-26

Methods for discretized processing and process sequence integration of regions of a substrate

#3142
20120009694
2012-01-12

APPARATUS AND METHOD FOR MONITORING PRECURSOR FLUX

#3143
20120003497
2012-01-05

Methods for coating articles

#3144
20120003388
2012-01-05

Methods and apparatus for thermal based substrate processing with variable temperature capability

#3145
20120003004
2012-01-05

Center-referenced photoconductor bearing plate and assembly for electro-photographic cartridge

#3146
20120000986
2012-01-05

CANISTER FOR DEPOSITION APPARATUS AND DEPOSITION APPARATUS USING SAME

#3147
20120000607
2012-01-05

MASS FLOW CONTROL SYSTEM, PLASMA PROCESSING APPARATUS, AND FLOW CONTROL METHOD

#3148
20110318937
2011-12-29

Method of manufacturing a semiconductor device, method of cleaning a process vessel, and substrate processing apparatus

#3149
20110312188
2011-12-22

Processing apparatus and film forming method

#3150
20110312107
2011-12-22

Method and device for measuring temperature during deposition of semiconductor

#3151
20110311726
2011-12-22

METHOD AND APPARATUS FOR PRECURSOR DELIVERY

#3152
20110308453
2011-12-22

CLOSED LOOP MOCVD DEPOSITION CONTROL

#3153
20110305831
2011-12-15

Method for chemical vapor deposition control

#3154
20110303145
2011-12-15

Apparatus for chemical vapor deposition control

#3155
20110293854
2011-12-01

ATOMIC LAYER GROWING APPARATUS AND THIN FILM FORMING METHOD

#3156
20110293831
2011-12-01

Linear batch chemical vapor deposition system

#3157
20110287172
2011-11-24

Substrate processing apparatus, control device thereof, and control method thereof

#3158
20110281773
2011-11-17

Advanced mixing method for integrated tool having site-isolated reactors

#3159
20110277688
2011-11-17

Dynamic support system for quartz process chamber

#3160
20110275200
2011-11-10

METHODS OF DYNAMICALLY CONTROLLING FILM MICROSTRUCTURE FORMED IN A MICROCRYSTALLINE LAYER

#3161
20110271753
2011-11-10

SUBSTRATE PROCESSING APPARATUS AND METHOD OF CONFIRMING OPERATION OF LIQUID FLOWRATE CONTROL DEVICE

#3162
20110265951
2011-11-03

TWIN CHAMBER PROCESSING SYSTEM

#3163
20110265895
2011-11-03

Gas supply apparatus for semiconductor manufacturing apparatus

#3164
20110265710
2011-11-03

FILM FORMING APPARATUS AND METHOD

#3165
20110264250
2011-10-27

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM STORING PROGRAM

#3166
20110263123
2011-10-27

PLACING TABLE STRUCTURE

#3167
20110263105
2011-10-27

Amorphous silicon film formation method and amorphous silicon film formation apparatus

#3168
20110260210
2011-10-27

GAN-BASED LEDS ON SILICON SUBSTRATES WITH MONOLITHICALLY INTEGRATED ZENER DIODES

#3169
20110256724
2011-10-20

GAS AND LIQUID INJECTION METHODS AND APPARATUS

#3170
20110256692
2011-10-20

MULTIPLE PRECURSOR CONCENTRIC DELIVERY SHOWERHEAD

#3171
20110256645
2011-10-20

Multiple precursor showerhead with by-pass ports

#3172
20110256315
2011-10-20

Showerhead assembly with gas injection distribution devices

#3173
20110256041
2011-10-20

Fluid filtration for substrate processing chamber

#3174
20110253044
2011-10-20

SHOWERHEAD ASSEMBLY WITH METROLOGY PORT PURGE

#3175
20110252899
2011-10-20

Vessel inspection apparatus and methods

#3176
20110244128
2011-10-06

FLOW PLATE UTILIZATION IN FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION

#3177
20110240211
2011-10-06

METHOD FOR PRODUCING FUNCTIONAL FILM

#3178
20110236594
2011-09-29

In-situ deposition of film stacks

#3179
20110232567
2011-09-29

METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD

#3180
20110229638
2011-09-22

SYSTEM AND METHOD FOR POLYCRYSTALLINE SILICON DEPOSITION

#3181
20110220148
2011-09-15

Method for performing preventative maintenance in a substrate processing system

#3182
20110220022
2011-09-15

Thin film deposition apparatus

#3183
20110219592
2011-09-15

Method for manufacturing piezoelectric actuator

#3184
20110217533
2011-09-08

GAS BARRIER FILM, FILM DEPOSITION METHOD, AND FILM DEPOSITION DEVICE

#3185
20110214811
2011-09-08

Automatic matching method, computer-readable storage medium, automatic matching unit, and plasma processing apparatus

#3186
20110212628
2011-09-01

SEQUENTIAL PULSE DEPOSITION

#3187
20110212626
2011-09-01

Substrate processing apparatus and semiconductor device producing method

#3188
20110212546
2011-09-01

UV absorption based monitor and control of chloride gas stream

#3189
20110206843
2011-08-25

Processing methods and apparatus with temperature distribution control

#3190
20110190924
2011-08-04

CONTROL DEVICE FOR CONTROLLING SUBSTRATE PROCESSING APPARATUS AND METHOD THEREFOR

#3191
20110189380
2011-08-04

Device and method for fabricating display device

#3192
20110186984
2011-08-04

Substrate processing apparatus and method of manufacturing semiconductor device

#3193
20110183446
2011-07-28

Method of manufacturing a semiconductor device

#3194
20110183083
2011-07-28

Process and installation for depositing films onto a substrate

#3195
20110174800
2011-07-21

Method of detecting abnormal placement of substrate, substrate processing method, computer-readable storage medium, and substrate processing apparatus

#3196
20110174219
2011-07-21

Control for and method of pulsed gas delivery

#3197
20110168094
2011-07-14

Plasma film forming apparatus

#3198
20110165333
2011-07-07

Plasma arc coating system and method

#3199
20110159632
2011-06-30

METHOD FOR MANUFACTURING A SOLID-STATE IMAGE CAPTURING ELEMENT

#3200
20110159188
2011-06-30

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM

#3201
20110159186
2011-06-30

FILM FORMING APPARATUS AND FILM FORMING METHOD

#3202
20110159183
2011-06-30

CHEMICAL VAPOR DEPOSITION APPARATUS AND A CONTROL METHOD THEREOF

#3203
20110158826
2011-06-30

Feed device for a precursor

#3204
20110155058
2011-06-30

SUBSTRATE PROCESSING APPARATUS HAVING A RADIANT CAVITY

#3205
20110151111
2011-06-23

Apparatus and method for vapor deposition of dielectric wire coating

#3206
20110146571
2011-06-23

Temperature controlled showerhead for high temperature operations

#3207
20110143019
2011-06-16

Apparatus for Deposition on Two Sides of the Web

#3208
20110143016
2011-06-16

Temperature control method for chemical vapor deposition apparatus

#3209
20110139070
2011-06-16

Substrate processing apparatus and method of manufacturing semiconductor device

#3210
20110135821
2011-06-09

Methods of and apparatus for controlling pressure in multiple zones of a process tool

#3211
20110129619
2011-06-02

Film formation method and apparatus

#3212
20110124201
2011-05-26

Chemical vaporizer for material deposition systems and associated methods

#3213
20110117681
2011-05-19

THIN FILM IMAGING METHOD AND APPARATUS

#3214
20110117680
2011-05-19

INLINE DETECTION OF SUBSTRATE POSITIONING DURING PROCESSING

#3215
20110117288
2011-05-19

Substrate processing method

#3216
20110114994
2011-05-19

Hybrid layers for use in coatings on electronic devices or other articles

#3217
20110108128
2011-05-12

VACUUM TREATMENT APPARATUS AND GAS SUPPLY METHOD

#3218
20110104879
2011-05-05

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

#3219
20110104876
2011-05-05

Atmospheric pressure chemical vapor deposition method for producing an-N-semiconductive metal sulfide thin layer

#3220
20110097492
2011-04-28

FLUID DISTRIBUTION MANIFOLD OPERATING STATE MANAGEMENT SYSTEM

#3221
20110090613
2011-04-21

Apparatus and method for substrate clamping in a plasma chamber

#3222
20110086457
2011-04-14

Thin film laminated body manufacturing apparatus and method

#3223
20110079178
2011-04-07

THICKNESS MEASURING DEVICE, COATING INSTALLATION, METHOD OF MEASURING THE THICKNESS OF A LAYER, AND USE OF A THICKNESS MEASURING DEVICE

#3224
20110070666
2011-03-24

DEPOSITION METHOD

#3225
20110070380
2011-03-24

Systems and methods for thin-film deposition of metal oxides using excited nitrogen—oxygen species

#3226
20110070360
2011-03-24

Source gas supply unit, and deposition apparatus and method using the same

#3227
20110065289
2011-03-17

Method of manufacturing semiconductor device and substrate processing apparatus

#3228
20110065284
2011-03-17

Method and system for isolated and discretized process sequence integration

#3229
20110064932
2011-03-17

GAS BARRIER COATING AND GAS BARRIER FILM

#3230
20110059245
2011-03-10

Coating apparatus including a chamber, sensor, removal unit and control device for application of liquid to a substrate

#3231
20110052914
2011-03-03

Method for producing polycrystalline silicon

#3232
20110052794
2011-03-03

VAPOR-PHASE GROWTH APPARATUS AND THIN-FILM VAPOR-PHASE GROWTH METHOD

#3233
20110048320
2011-03-03

Thin film deposition apparatus

#3234
20110033956
2011-02-10

Method of manufacturing semiconductor device

#3235
20110033638
2011-02-10

METHOD AND APPARATUS FOR DEPOSITION ON LARGE AREA SUBSTRATES HAVING REDUCED GAS USAGE

#3236
20110031593
2011-02-10

Method of manufacturing semiconductor device, substrate processing apparatus, and semiconductor device

#3237
20110027459
2011-02-03

Methods and devices for monitoring and controlling thin film processing

#3238
20110022215
2011-01-27

APPARATUS TO DETECT FAULT CONDITIONS OF A PLASMA PROCESSING REACTOR

#3239
20110017135
2011-01-27

TOMIC LAYER FILM FORMING APPARATUS

#3240
20110014795
2011-01-20

Method of forming stress-tuned dielectric film having Si-N bonds by modified PEALD

#3241
20110014789
2011-01-20

Manufacturing apparatus and method for semiconductor device

#3242
20110008540
2011-01-13

CANISTER FOR DEPOSITION APPARATUS, AND DEPOSITION APPARATUS AND METHOD USING THE SAME

#3243
20100310758
2010-12-09

Method for producing at least one microcomponent with a single mask

#3244
20100304010
2010-12-02

Powder feed rate sensor

#3245
20100300357
2010-12-02

Substrate processing apparatus

#3246
20100298738
2010-11-25

Vessel, coating, inspection and processing apparatus

#3247
20100285629
2010-11-11

Method for plasma deposition and plasma CVD system

#3248
20100285205
2010-11-11

COATING METHOD

#3249
20100279512
2010-11-04

PLASMA PROCESSING APPARATUS AND METHOD FOR PLASMA-PROCESSING SEMICONDUCTOR SUBSTRATE

#3250
20100278999
2010-11-04

Plasma process apparatus and plasma process method

#3251
20100274523
2010-10-28

Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing

#3252
20100272895
2010-10-28

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, STORAGE MEDIUM, AND GAS SUPPLY APPARATUS

#3253
20100272892
2010-10-28

FILM FORMATION REACTIVE APPARATUS AND METHOD FOR PRODUCING FILM-FORMED SUBSTRATE

#3254
20100272887
2010-10-28

THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD

#3255
20100267235
2010-10-21

Methods for depositing ultra thin low resistivity tungsten film for small critical dimension contacts and interconnects

#3256
20100267230
2010-10-21

METHOD FOR FORMING TUNGSTEN CONTACTS AND INTERCONNECTS WITH SMALL CRITICAL DIMENSIONS

#3257
20100264117
2010-10-21

PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD

#3258
20100260936
2010-10-14

Substrate processing apparatus, substrate processing method, and computer-readable storage medium

#3259
20100248396
2010-09-30

HEAT TREATMENT APPARATUS AND CONTROL METHOD THEREFOR

#3260
20100238422
2010-09-23

Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity

#3261
20100230834
2010-09-16

Bubbling supply system for stable precursor supply

#3262
20100229794
2010-09-16

VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR

#3263
20100227057
2010-09-09

CVD apparatus having a rotating heater

#3264
20100227046
2010-09-09

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM

#3265
20100215853
2010-08-26

METHOD FOR CONTROLLING PROCESS GAS CONCENTRATION

#3266
20100210115
2010-08-19

SUBSTRATE MOUNTING MECHANISM, SUBSTRATE PROCESSING APPARATUS, METHOD FOR SUPPRESSING FILM DEPOSITION ON SUBSTRATE MOUNTING MECHANISM, AND STORAGE MEDIUM

#3267
20100209625
2010-08-19

VOLTAGE VARIABLE TYPE THINFILM DEPOSITION METHOD AND APPARATUS THEREOF

#3268
20100209624
2010-08-19

FILM-FORMING APPARATUS AND FILM-FORMING METHOD

#3269
20100203244
2010-08-12

High accuracy vapor generation and delivery for thin film deposition

#3270
20100200545
2010-08-12

Non-contact substrate processing

#3271
20100198386
2010-08-05

Method of optimizing process recipe of substrate processing system

#3272
20100192854
2010-08-05

Gas supply system for semiconductor manufacturing facilities

#3273
20100180913
2010-07-22

METHODS FOR IN-SITU CHAMBER CLEANING PROCESS FOR HIGH VOLUME MANUFACTURE OF SEMICONDUCTOR MATERIALS

#3274
20100175713
2010-07-15

Method of cleaning plasma-treating apparatus, plasma-treating apparatus where the cleaning method is practiced, and memory medium memorizing program executing the cleaning method

#3275
20100170436
2010-07-08

Substrate treatment equipment and manufacturing method of substrate

#3276
20100170435
2010-07-08

Device for the temperature control of the surface temperatures of substrates in a CVD reactor

#3277
20100169255
2010-07-01

Coating color database creating method, search method using the database, their system, program, and recording medium

#3278
20100167541
2010-07-01

Method of manufacturing semiconductor device, cleaning method and cleaning control apparatus

#3279
20100166980
2010-07-01

Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method

#3280
20100166947
2010-07-01

SUBSTRATE PROCESSING APPARATUS, DEPOSITION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

#3281
20100166945
2010-07-01

Methods of calculating thicknesses of layers and methods of forming layers using the same

#3282
20100163112
2010-07-01

Gas supply unit, substrate processing apparatus and supply gas setting method

#3283
20100144145
2010-06-10

Substrate processing apparatus and method of manufacturing semiconductor device

#3284
20100143579
2010-06-10

Method and apparatus for manufacturing epitaxial silicon wafer

#3285
20100130024
2010-05-27

Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus for forming thin film containing at least two different elements

#3286
20100130009
2010-05-27

Substrate processing apparatus and method of manufacturing semiconductor device

#3287
20100129548
2010-05-27

ALD APPARATUS AND METHOD

#3288
20100124613
2010-05-20

Heater integrated thermocouple

#3289
20100124610
2010-05-20

SUBSTRATE POSITION DETECTION APPARATUS, SUBSTRATE POSITION DETECTION METHOD, FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND A COMPUTER READABLE STORAGE MEDIUM

#3290
20100119839
2010-05-13

System and Method for Forming a Thin-Film Phosphor Layer for Phosphor-Converted Light Emitting Devices

#3291
20100116788
2010-05-13

Substrate temperature control by using liquid controlled multizone substrate support

#3292
20100111511
2010-05-06

Use of infrared camera for real-time temperature monitoring and control

#3293
20100099271
2010-04-22

Method for improving process control and film conformality of PECVD film

#3294
20100093111
2010-04-15

METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING PLASMA REACTOR PROCESSING SYSTEM

#3295
20100086670
2010-04-08

Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process

#3296
20100075035
2010-03-25

Film formation method and film formation apparatus

#3297
20100063753
2010-03-11

Integrated vapor delivery systems for chemical vapor deposition precursors

#3298
20100062613
2010-03-11

Method of processing a substrate

#3299
20100062181
2010-03-11

METAL FILM PRODUCTION APPARATUS AND METAL FILM PRODUCTION METHOD

#3300
20100062158
2010-03-11

GAS SUPPLY METHOD AND GAS SUPPLY DEVICE