C23C16/52 - page 8 - CPC Classification Index

#2101

20170362707

2017-12-21

Atomic layer deposition apparatus

#2102

20170362705

2017-12-21

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

#2103

20170356088

2017-12-14

Method of manufacturing an epitaxial wafer comprising measuring a level difference between a front surface of a susceptor and an upper surface of a lift pin and adjusting a ratio of the heat source output

#2104

20170356087

2017-12-14

Plasma atomic layer deposition

#2105

20170352531

2017-12-07

Apparatus and method for selective deposition

#2106

20170345647

2017-11-30

Substrate processing method

#2107

20170345645

2017-11-30

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2108

20170345644

2017-11-30

Carbon film forming method, carbon film forming apparatus, and storage medium

#2109

20170342556

2017-11-30

Method of cleaning a plasma processing device

#2110

20170342548

2017-11-30

METHOD OF FORMING CARBON FILM, APPARATUS OF FORMING CARBON FILM AND STORAGE MEDIUM

#2111

20170341938

2017-11-30

SYSTEM AND METHOD OF FORMING CARBON NANOTUBES

#2112

20170338085

2017-11-23

Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

#2113

20170336457

2017-11-23

Method for in-situ measuring electrical properties of carbon nanotubes

#2114

20170336338

2017-11-23

Device for in-situ measuring electrical properties of carbon nanotube array

#2115

20170335453

2017-11-23

Film deposition apparatus

#2116

20170335450

2017-11-23

Vapor delivery method and apparatus for solid and liquid precursors

#2117

20170335448

2017-11-23

Method for making carbon nanotube film

#2118

20170330746

2017-11-16

Phosphorus incorporation for n-type doping of diamond with (100) and related surface orientation

#2119

20170323813

2017-11-09

Advanced temperature control for wafer carrier in plasma processing chamber

#2120

20170321324

2017-11-09

Substrate pedestal module including backside gas delivery tube and method of making

#2121

20170315051

2017-11-02

Optical gas concentration measuring method by forming a differential signal using lights with different absorbabilities to a raw material in a gas flow path using a time-sharing method

#2122

20170314134

2017-11-02

CVD or PVD reactor for coating large-area substrates

#2123

20170314133

2017-11-02

PLASMA REACTOR HAVING DIVIDED ELECTRODES

#2124

20170314132

2017-11-02

PLASMA REACTOR HAVING DIVIDED ELECTRODES

#2125

20170309528

2017-10-26

Dynamic wafer leveling/tilting/swiveling steps for use during a chemical vapor deposition process

#2126

20170309525

2017-10-26

Method for PECVD overlay improvement

#2127

20170306483

2017-10-26

Film forming method and film forming apparatus

#2128

20170301539

2017-10-19

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2129

20170298516

2017-10-19

In situ tailoring of material properties in 3D printed electronics

#2130

20170298498

2017-10-19

Method of self-aligning deposition equipment

#2131

20170294306

2017-10-12

Formation of a layer on a semiconductor substrate

#2132

20170294305

2017-10-12

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2133

20170288025

2017-10-05

Silicon carbide epitaxial substrate and method of manufacturing silicon carbide semiconductor device

#2134

20170287914

2017-10-05

Method and apparatus for forming boron-doped silicon germanium film, and storage medium

#2135

20170287778

2017-10-05

Method and apparatus for forming silicon film and storage medium

#2136

20170283949

2017-10-05

Substrate processing apparatus

#2137

20170283945

2017-10-05

Substrate Processing Apparatus

#2138

20170283942

2017-10-05

Tungsten film forming method and storage medium

#2139

20170283262

2017-10-05

Interwoven Carbon Nanotube Mats

#2140

20170278699

2017-09-28

CONTROL DEVICE, SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND PROGRAM

#2141

20170278698

2017-09-28

Semiconductor device manufacturing method and semiconductor device manufacturing system

#2142

20170278697

2017-09-28

Nitride film forming method and storage medium

#2143

20170275757

2017-09-28

Substrate processing apparatus, gas supply method, substrate processing method, and film forming method

#2144

20170271218

2017-09-21

CONTROL DEVICE, SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND PROGRAM

#2145

20170271144

2017-09-21

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

#2146

20170271143

2017-09-21

Film forming method and film forming apparatus

#2147

20170271132

2017-09-21

Methods and apparatus for microwave plasma assisted chemical vapor deposition reactors

#2148

20170271130

2017-09-21

Durable 3D geometry conformal anti-reflection coating

#2149

20170268128

2017-09-21

System based on low-pressure chemical vapor deposition for fabricating perovskite film from organic halide compound and metal halide compound

#2150

20170268105

2017-09-21

Semiconductor device manufacturing method, substrate processing apparatus and recording medium

#2151

20170268104

2017-09-21

Method for processing a substrate and substrate processing apparatus

#2152

20170268102

2017-09-21

System and method for enhancing a diffusion limited CVI/CVD process

#2153

20170268101

2017-09-21

Method and apparatus for decreasing the radial temperature gradient in CVI/CVD furnaces

#2154

20170263511

2017-09-14

Wafer processing tool having a micro sensor

#2155

20170263455

2017-09-14

Mask structure forming method and film forming apparatus

#2156

20170263441

2017-09-14

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2157

20170263439

2017-09-14

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

#2158

20170261312

2017-09-14

Intelligent hardstop for gap detection and control mechanism

#2159

20170260629

2017-09-14

Quartz crystal microbalance assembly for ALD systems

#2160

20170256381

2017-09-07

SUBSTRATE PROCESSING APPARATUS

#2161

20170253989

2017-09-07

Method of growing crystal in recess and processing apparatus used therefor

#2162

20170253971

2017-09-07

Mixed gas multiple line supply system and substrate processing apparatus using same

#2163

20170253969

2017-09-07

VAPORIZATION RAW MATERIAL SUPPLYING DEVICE AND SUBSTRATE PROCESSING APPARATUS USING THE SAME

#2164

20170253968

2017-09-07

Substrate processing apparatus capable of adjusting flow rate of inert gas supplied to substrate

#2165

20170253961

2017-09-07

Film forming method and plasma chemical vapor deposition apparatus

#2166

20170250072

2017-08-31

Film forming method and film forming system

#2167

20170248487

2017-08-31

PRESSURE SENSOR STATE DETECTION METHOD AND SYSTEM

#2168

20170241776

2017-08-24

Apparatus and method for layer thickness measurement for a vapor deposition method

#2169

20170241771

2017-08-24

Use of a full width array imaging sensor to measure real time film thicknesses on film manufacturing equipment

#2170

20170241021

2017-08-24

Electric discharge generator and power supply device of electric discharge generator

#2171

20170241018

2017-08-24

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD AND COMPUTER READABLE MEDIUM

#2172

20170236733

2017-08-17

Common terminal heater for ceramic pedestals used in semiconductor fabrication

#2173

20170233867

2017-08-17

VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD

#2174

20170233866

2017-08-17

Film Forming Apparatus, Film Forming Method, and Computer-Readable Storage Medium

#2175

20170229311

2017-08-10

Atomic layer etching in continuous plasma

#2176

20170229293

2017-08-10

Systems and methods for internal surface conditioning in plasma processing equipment

#2177

20170226641

2017-08-10

SYSTEM AND METHOD BASED ON MULTI-SOURCE DEPOSITION FOR FABRICATING PEROVSKITE FILM

#2178

20170226639

2017-08-10

Substrate processing apparatus, substrate processing method and storage medium

#2179

20170226637

2017-08-10

PROCESS CHAMBER FOR DIELECTRIC GAPFILL

#2180

20170221699

2017-08-03

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2181

20170221698

2017-08-03

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

#2182

20170218515

2017-08-03

Semiconductor device manufacturing apparatus having plurality of gas exhausting pipes and gas sensors

#2183

20170218508

2017-08-03

Deposition apparatus

#2184

20170213727

2017-07-27

Method of forming silicon layer in manufacturing semiconductor device and recording medium

#2185

20170213699

2017-07-27

Gas splitting by time average injection into different zones by fast gas valves

#2186

20170212280

2017-07-27

PRODUCTION OF A THIN FILM REFLECTOR

#2187

20170207102

2017-07-20

SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD

#2188

20170204517

2017-07-20

Vapor deposition apparatus

#2189

20170200622

2017-07-13

Vacuum evacuation system

#2190

20170200599

2017-07-13

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS FOR FORMING FILM INCLUDING AT LEAST TWO DIFFERENT ELEMENTS

#2191

20170198397

2017-07-13

Substrate processing apparatus

#2192

20170186604

2017-06-29

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2193

20170183778

2017-06-29

Methods and apparatus for microwave plasma assisted chemical vapor deposition reactors

#2194

20170183775

2017-06-29

SUBSTRATE PROCESSING APPARATUS

#2195

20170183774

2017-06-29

Film formation apparatus and film formation method

#2196

20170183771

2017-06-29

Substrate processing apparatus

#2197

20170183770

2017-06-29

SUBSTRATE PROCESSING APPARATUS

#2198

20170178920

2017-06-22

Technique to tune sidewall passivation deposition conformality for high aspect ratio cylinder etch

#2199

20170178902

2017-06-22

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2200

20170178900

2017-06-22

Techniques for controlling ion/neutral ratio of a plasma source

#2201

20170178898

2017-06-22

Variable temperature hardware and methods for reduction of wafer backside deposition

#2202

20170176331

2017-06-22

Protective film detecting method for laser processing

#2203

20170175269

2017-06-22

Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition

#2204

20170175262

2017-06-22

EPITAXIAL GROWTH APPARATUS, EPITAXIAL GROWTH METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT

#2205

20170170065

2017-06-15

CARBON FILM FORMING METHOD, CARBON FILM FORMING APPARATUS, AND STORAGE MEDIUM

#2206

20170170004

2017-06-15

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2207

20170169995

2017-06-15

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

#2208

20170167028

2017-06-15

SELENIZATION OR SULFURIZATION METHOD OF ROLL TO ROLL METAL SUBSTRATES

#2209

20170167027

2017-06-15

Material delivery system and method

#2210

20170167026

2017-06-15

Gas flow monitoring method and gas flow monitoring apparatus

#2211

20170167019

2017-06-15

PLASMA PROCESSING APPARATUS AND FILM DEPOSITION METHOD

#2212

20170167017

2017-06-15

Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system

#2213

20170162855

2017-06-08

Separator for secondary cell having excellent heat resistance and shutdown properties

#2214

20170162386

2017-06-08

Method of manufacturing semiconductor device by forming and modifying film on substrate

#2215

20170162366

2017-06-08

FILM FORMING APPARATUS, RECORDING MEDIUM, AND FILM FORMING METHOD

#2216

20170159181

2017-06-08

SUBSTRATE PROCESSING APPARATUS

#2217

20170159175

2017-06-08

Raw material gas supply apparatus, raw material gas supply method and storage medium

#2218

20170154757

2017-06-01

Method and system for in-situ formation of intermediate reactive species

#2219

20170153174

2017-06-01

Plasma processing detection indicator using inorganic substance as a color-change layer

#2220

20170148670

2017-05-25

Methods for forming low-resistance contacts through integrated process flow systems

#2221

20170148628

2017-05-25

Plasma activated conformal dielectric film deposition

#2222

20170148611

2017-05-25

Particle generation suppresor by DC bias modulation

#2223

20170145564

2017-05-25

VAPOR DELIVERY SYSTEM

#2224

20170141002

2017-05-18

Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability

#2225

20170141001

2017-05-18

Systems and methods for detection of plasma instability by optical diagnosis

#2226

20170140983

2017-05-18

Techniques for filling a structure using selective surface modification

#2227

20170140968

2017-05-18

Systems and methods for controlling plasma instability in semiconductor fabrication

#2228

20170140901

2017-05-18

Pneumatic exhaust system

#2229

20170137944

2017-05-18

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#2230

20170137943

2017-05-18

Apparatus for UV flowable dielectric

#2231

20170135619

2017-05-18

Syringe with PECVD lubricity layer, apparatus and method for transporting a vessel to and from a PECVD processing station, and double wall plastic vessel

#2232

20170130359

2017-05-11

Multizone control of lamps in a conical lamphead using pyrometers

#2233

20170130335

2017-05-11

Shower head, vapor phase growth apparatus, and vapor phase growth method

#2234

20170130333

2017-05-11

Plasma processing method and plasma processing apparatus

#2235

20170125280

2017-05-04

Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films

#2236

20170121820

2017-05-04

Gas supply unit and substrate processing system

#2237

20170117155

2017-04-27

Method of forming low resistivity fluorine free tungsten film without nucleation

#2238

20170117134

2017-04-27

Selective inhibition in atomic layer deposition of silicon-containing films

#2239

20170110318

2017-04-20

Chemical vapor deposition apparatus and method for manufacturing semiconductor device using the same

#2240

20170108171

2017-04-20

Chamber pressure control apparatus for chemical vapor deposition systems

#2241

20170107621

2017-04-20

Method for depositing dielectric film in trenches by PEALD

#2242

20170107620

2017-04-20

Heating part, substrate processing apparatus, and method of manufacturing semiconductor device

#2243

20170103885

2017-04-13

Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium

#2244

20170103876

2017-04-13

Plasma generator, annealing device, deposition crystallization apparatus and annealing process

#2245

20170101715

2017-04-13

Gas control system and program for gas control system

#2246

20170101714

2017-04-13

Securing Base, Vapor Deposition Apparatus and Method of Measuring Deformation of To-Be-Treated Substrate

#2247

20170098565

2017-04-06

Methodology for chamber performance matching for semiconductor equipment

#2248

20170098561

2017-04-06

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#2249

20170097226

2017-04-06

THIN-FILM THICKNESS MEASURER AND THIN-FILM DEPOSITING APPARATUS INCLUDING THE SAME

#2250

20170096738

2017-04-06

Diffuser temperature control

#2251

20170096735

2017-04-06

Dynamic precursor dosing for atomic layer deposition

#2252

20170096734

2017-04-06

Rotating disk reactor with ferrofluid seal for chemical vapor deposition

#2253

20170093121

2017-03-30

Coating process for laser heat sinks

#2254

20170092549

2017-03-30

Raw material gas supply apparatus, raw material gas supply method and storage medium

#2255

20170092486

2017-03-30

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2256

20170088952

2017-03-30

High-throughput multichamber atomic layer deposition systems and methods

#2257

20170088950

2017-03-30

Film forming apparatus

#2258

20170088945

2017-03-30

Method of fabricating transition metal dichalcogenide

#2259

20170088941

2017-03-30

APPARATUS FOR PROCESSING OF A MATERIAL ON A SUBSTRATE AND METHOD FOR MEASURING OPTICAL PROPERTIES OF A MATERIAL PROCESSED ON A SUBSTRATE

#2260

20170087606

2017-03-30

Method of manufacturing semiconductor device, method of cleaning interior of process chamber, substrate processing apparatus, and recording medium

#2261

20170081782

2017-03-23

Transfer-free method for forming graphene layer

#2262

20170081764

2017-03-23

SUBSTRATE PROCESSING APPARATUS

#2263

20170081758

2017-03-23

Mask for vapor deposition apparatus, vapor deposition apparatus, vapor deposition method, and method for producing organic electroluminescence element

#2264

20170081756

2017-03-23

Deposition process based on stencil mask and application to the fabrication of tags supporting multi-functional traceable codes

#2265

20170076955

2017-03-16

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

#2266

20170076921

2017-03-16

Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

#2267

20170073811

2017-03-16

Heat treatment apparatus

#2268

20170069493

2017-03-09

Methods and apparatus for uniformly and high-rate depositing low resistivity microcrystalline silicon films for display devices

#2269

20170069487

2017-03-09

Method for manufacturing semiconductor device and semiconductor manufacturing apparatus used for the method

#2270

20170067163

2017-03-09

MULTIPLE CHAMBER CHEMICAL VAPOR DEPOSITION SYSTEM

#2271

20170067159

2017-03-09

Method of manufacturing semiconductor device

#2272

20170067156

2017-03-09

Plasma excitation for spatial atomic layer deposition (ALD) reactors

#2273

20170067154

2017-03-09

SYSTEMS AND METHOD FOR MICROPLASMA-BASED THREE-DIMENSIONAL PRINTING

#2274

20170067152

2017-03-09

Removal device for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus

#2275

20170062469

2017-03-02

VNAND tensile thick TEOS oxide

#2276

20170062286

2017-03-02

SEMICONDUCTOR MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS

#2277

20170062254

2017-03-02

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

#2278

20170062212

2017-03-02

Vapor phase growth apparatus and vapor phase growth method

#2279

20170058403

2017-03-02

Dichlorosilane compensating control strategy for improved polycrystalline silicon growth

#2280

20170058398

2017-03-02

FILM-FORMING APPARATUS AND FILM-FORMING METHOD

#2281

20170057094

2017-03-02

Substrate processing apparatus, recording medium, and method of processing substrates

#2282

20170053819

2017-02-23

Wear detection of consumable part in semiconductor manufacturing equipment

#2283

20170053811

2017-02-23

Pulsing RF power in etch process to enhance tungsten gapfill performance

#2284

20170053793

2017-02-23

METHOD AND SYSTEM FOR SCULPTING SPACER SIDEWALL MASK

#2285

20170053049

2017-02-23

PROCESS-SPECIFIC WAFER CARRIER CORRECTION TO IMPROVE THERMAL UNIFORMITY IN CHEMICAL VAPOR DEPOSITION SYSTEMS AND PROCESSES

#2286

20170051407

2017-02-23

Heating Source For Spatial Atomic Layer Deposition

#2287

20170051403

2017-02-23

Film forming apparatus

#2288

20170047227

2017-02-16

Method of manufacturing semiconductor device

#2289

20170044669

2017-02-16

Process and device for forming a graphene layer

#2290

20170044018

2017-02-16

METHOD AND SYSTEM FOR GRAPHENE FORMATION

#2291

20170040595

2017-02-09

System, method and apparatus for forming a thin film lithium ion battery

#2292

20170040157

2017-02-09

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2293

20170037537

2017-02-09

Apparatus for depositing a thin film

#2294

20170032974

2017-02-02

Method and apparatus for controlled dopant incorporation and activation in a chemical vapor deposition system

#2295

20170029950

2017-02-02

Apparatus and method for carbon film deposition profile control

#2296

20170029948

2017-02-02

METHODS AND APPARATUSES FOR TEMPERATURE-INDEXED THIN FILM DEPOSITION

#2297

20170029947

2017-02-02

Apparatuses for thin film deposition

#2298

20170029945

2017-02-02

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

#2299

20170029276

2017-02-02

CARBON NANOTUBE FOAMS WITH CONTROLLABLE MECHANICAL PROPERTIES

#2300

20170025271

2017-01-26

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2301

20170022611

2017-01-26

MULTI-ZONE TEMPERATURE CONTROL FOR SEMICONDUCTOR WAFER

#2302

20170021429

2017-01-26

Hard coating, cutting tool, and method for producing hard coating

#2303

20170018732

2017-01-19

Hybrid layers for use in coatings on electronic devices or other articles

#2304

20170018419

2017-01-19

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

#2305

20170016118

2017-01-19

PECVD process

#2306

20170016115

2017-01-19

Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition

#2307

20170016112

2017-01-19

APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF MANUFACTURING ARTICLE

#2308

20170011974

2017-01-12

SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

#2309

20170011951

2017-01-12

Apparatus for depositing a layer on a substrate in a processing gas

#2310

20170011893

2017-01-12

Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging

#2311

20170009375

2017-01-12

Vapor deposition method and vapor deposition apparatus

#2312

20170009348

2017-01-12

Chemical Deposition Apparatus Having Conductance Control

#2313

20170009342

2017-01-12

PEDESTAL AND METHOD FOR CONTROLLING THE SAME, TRAY, AND PROCESS CHAMBER

#2314

20170004961

2017-01-05

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2315

20170002469

2017-01-05

Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same

#2316

20170002467

2017-01-05

ADAPTIVE CONTROL FOR CHARGED PARTICLE BEAM PROCESSING

#2317

20170002452

2017-01-05

Method and system for depositing oxide on a porous component

#2318

20170001253

2017-01-05

Method and arrangement for building metallic objects by solid freeform fabrication using plasma transferred arc (PTA) torches

#2319

20160379897

2016-12-29

Heat treatment apparatus and temperature control method

#2320

20160379860

2016-12-29

SiC epitaxial wafer and method for producing same, and device for producing SiC epitaxial wafer

#2321

20160379827

2016-12-29

Method for selectively depositing a layer on a three dimensional structure

#2322

20160379826

2016-12-29

CAPPED ALD FILMS FOR DOPING FIN-SHAPED CHANNEL REGIONS OF 3-D IC TRANSISTORS

#2323

20160379802

2016-12-29

APPARATUS FOR MONITORING VACUUM ULTRAVIOLET AND PLASMA PROCESS EQUIPMENT INCLUDING THE SAME

#2324

20160376699

2016-12-29

SUBSTRATE PROCESSING APPARATUS, AND STORAGE MEDIUM

#2325

20160376695

2016-12-29

Method for monitoring usage of a physical vapor deposition (PVD) target with an ultrasonic transducer

#2326

20160372318

2016-12-22

Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges

#2327

20160372310

2016-12-22

Method for mass spectrometric examination of gas mixtures and mass spectrometer therefor

#2328

20160370173

2016-12-22

In-situ metrology method for thickness measurement during PECVD processes

#2329

20160369400

2016-12-22

Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors

#2330

20160362787

2016-12-15

Process gas management system and photoionization detector

#2331

20160362784

2016-12-15

Method of manufacturing semiconductor device and recording medium

#2332

20160358835

2016-12-08

Methods for semiconductor passivation by nitridation after oxide removal

#2333

20160358767

2016-12-08

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2334

20160355947

2016-12-08

Susceptor Heating For Epitaxial Growth Process

#2335

20160351426

2016-12-01

Wafer surface 3-D topography mapping based on in-situ tilt measurements in chemical vapor deposition systems

#2336

20160351401

2016-12-01

Deposition of low fluorine tungsten by sequential CVD process

#2337

20160343580

2016-11-24

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

#2338

20160340782

2016-11-24

Low volume showerhead with faceplate holes for improved flow uniformity

#2339

20160340781

2016-11-24

Deposition apparatus including edge plenum showerhead assembly

#2340

20160340776

2016-11-24

ROLLER FOR SPREADING OF A FLEXIBLE SUBSTRATE, APPARATUS FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD OF OPERATING THEREOF

#2341

20160336175

2016-11-17

METHOD AND APPARATUS FOR FORMING OXIDE THIN FILM

#2342

20160333497

2016-11-17

Apparatus and Method of Producing Diamond and Performing Real Time In Situ Analysis

#2343

20160333477

2016-11-17

Container for chemical precursors in a deposition process

#2344

20160333475

2016-11-17

Substrate pedestal module including backside gas delivery tube and method of making

#2345

20160332885

2016-11-17

Direct synthesis of reduced graphene oxide films on dielectric substrates

#2346

20160332416

2016-11-17

Multilayered carbon-carbon composite

#2347

20160329238

2016-11-10

Inhibitor plasma mediated atomic layer deposition for seamless feature fill

#2348

20160329208

2016-11-10

Substrate processing apparatus for forming film including at least two different elements

#2349

20160326650

2016-11-10

Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage

#2350

20160326648

2016-11-10

APPARATUS FOR SELECTIVELY SEALING A GAS FEEDTHROUGH

#2351

20160326643

2016-11-10

Method for controlling a processing system

#2352

20160322217

2016-11-03

Method of manufacturing semiconductor device and method of processing substrate

#2353

20160314959

2016-10-27

Method of manufacturing a SiOCN film, substrate processing apparatus and recording medium

#2354

20160307812

2016-10-20

Measuring individual layer thickness during multi-layer deposition semiconductor processing

#2355

20160305022

2016-10-20

Substrate processing apparatus and substrate processing method

#2356

20160305017

2016-10-20

Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and computer-readable recording medium

#2357

20160300713

2016-10-13

Eliminating first wafer metal contamination effect in high density plasma chemical vapor deposition systems

#2358

20160299084

2016-10-13

Systems and Methods to Reduce Delamination In Integrated Computational Elements Used Downhole

#2359

20160298238

2016-10-13

Deposition apparatus and deposition method

#2360

20160298236

2016-10-13

Substrate processing apparatus capable of forming films including at least two different elements

#2361

20160296973

2016-10-13

Methods for coating articles

#2362

20160293789

2016-10-06

VAPOR DEPOSITION EQUIPMENT INCLUDING A SELENIZATION PROCESS FOR FABRICATING CIGS FILM

#2363

20160293500

2016-10-06

Method of manufacturing semiconductor device

#2364

20160293460

2016-10-06

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

#2365

20160293441

2016-10-06

Mask etch for patterning

#2366

20160293398

2016-10-06

Deposition of conformal films by atomic layer deposition and atomic layer etch

#2367

20160293390

2016-10-06

Plasma processing apparatus, plasma processing method, and recording medium

#2368

20160290788

2016-10-06

IN-PROCESS MONITORING OF COATINGS ON GLASS ARTICLES

#2369

20160289836

2016-10-06

Device for Treating a Surface

#2370

20160289834

2016-10-06

Substrate processing device

#2371

20160289831

2016-10-06

Substrate processing apparatus and substrate processing method

#2372

20160289830

2016-10-06

Substrate processing systems having multiple gas flow controllers

#2373

20160289822

2016-10-06

Fluid-assisted thermal management of evaporation sources

#2374

20160289817

2016-10-06

Thin-film deposition methods with fluid-assisted thermal management of evaporation sources

#2375

20160288155

2016-10-06

Vaporizing system

#2376

20160284613

2016-09-29

Film forming method, film forming apparatus, and storage medium

#2377

20160284542

2016-09-29

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2378

20160284541

2016-09-29

Deposition of metal dielectric film for hardmasks

#2379

20160284534

2016-09-29

Method of forming thin film

#2380

20160284532

2016-09-29

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2381

20160282188

2016-09-29

Film forming apparatus and thermometry method

#2382

20160281238

2016-09-29

TPIR APPARATUS FOR MONITORING TUNGSTEN HEXAFLUORIDE PROCESSING TO DETECT GAS PHASE NUCLEATION, AND METHOD AND SYSTEM UTILIZING SAME

#2383

20160281231

2016-09-29

SOURCE SUPPLY APPARATUS, SOURCE SUPPLY METHOD AND STORAGE MEDIUM

#2384

20160281230

2016-09-29

Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma

#2385

20160281226

2016-09-29

Raw material supply method, raw material supply apparatus, and storage medium

#2386

20160281224

2016-09-29

Method and apparatus for forming thin film

#2387

20160281223

2016-09-29

Plasma enhanced ALD system

#2388

20160276148

2016-09-22

Ultrathin atomic layer deposition film accuracy thickness control

#2389

20160276147

2016-09-22

Silicon Nitride Film Forming Method and Silicon Nitride Film Forming Apparatus

#2390

20160273110

2016-09-22

DEPOSITION APPARATUS AND DEPOSITION METHOD

#2391

20160273108

2016-09-22

Dual-direction chemical delivery system for ALD/CVD chambers

#2392

20160273105

2016-09-22

Atomic layer deposition apparatus

#2393

20160273102

2016-09-22

TAPE-SUBSTRATE COATING LINE HAVING A MAGNETRON ARRANGEMENT

#2394

20160273101

2016-09-22

Raw material gas supply apparatus and film forming apparatus

#2395

20160268141

2016-09-15

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

#2396

20160268105

2016-09-15

Plasma processing device and operation method

#2397

20160265113

2016-09-15

Evaporation vessel apparatus and method

#2398

20160265112

2016-09-15

Pre-clean chamber and process with substrate tray for changing substrate temperature

#2399

20160265109

2016-09-15

Vacuum treatment apparatus

#2400

20160263634

2016-09-15

Optical endpoint detection system